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1. 发明公开

EP4376061A2 SPATIAL AND TEMPORAL CONTROL OF ION BIAS VOLTAGE FOR PLASMA PROCESSING 审中-公开
公开(公告)号：EP4376061A2
公开(公告)日：2024-05-29
申请号：EP24170540.9
申请日：2018-11-16
申请人： AES Global Holdings, Pte. Ltd.
发明人： SHAW, Denis , FAIRBAIRN, Kevin , CARTER, Daniel
IPC分类号： H01L21/683
CPC分类号： H01J37/32568 , H01J37/32706 , H01J37/32174 , H01J37/32935 , H01J37/32137
摘要： Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

2. 发明公开

EP3340746A1 STEUERUNGSEINHEIT ZUR STEUERUNG EINES HOCHFREQUENZGENERATORS 有权
公开(公告)号：EP3340746A1
公开(公告)日：2018-06-27
申请号：EP16206223.6
申请日：2016-12-22
申请人： Technische Hochschule Mittelhessen
发明人： Simon, Jens , Probst, Uwe
IPC分类号： H05H1/24 , H05H1/46 , F03H1/00 , H01J37/32
CPC分类号： H05H1/46 , F03H1/0018 , H01J37/321 , H01J37/32174 , H01J37/32522 , H01J37/3299 , H05H2001/4652 , H05H2001/4682
摘要： Gegenstand der Erfindung ist eine Steuerungseinheit 40 zur Steuerung eines Hochfrequenzgenerators, welche wenigstens folgende Bauelemente umfasst:
Eine Treiberstufe 410, welche so ausgebildet ist, dass sie die Schalter einer Leistungsstufe 20 eines Hochfrequenzgenerators 1 ansteuern kann und eine Steuerung (430), welche so ausgebildet ist, dass sie ein Steuer-signal zur Ansteuerung einer Leistungsstufe (20) erzeugen kann. Die Steuerungseinheit 40 umfasst weiterhin einen Stromsensor 440 zur Messung des Sekundärstroms Is im Resonanzkreis 30 des Hochfrequenzüberträgers des Hochfrequenzgenerators 1 und zur Übergabe der Messdaten der Messung des Sekundärstroms Is an die Steuerung 430.

3. 发明公开

EP3236718A4 RADIO FREQUENCY POWER SOURCE DEVICE, AND POWER SOURCE FOR DUAL CATHODES 有权
公开(公告)号：EP3236718A4
公开(公告)日：2018-03-14
申请号：EP15881133
申请日：2015-02-20
申请人： KYOSAN ELECTRIC MFG
发明人： YUZURIHARA ITSUO , KODAMA SHINICHI , ADACHI TOSHIYUKI
IPC分类号： H01J37/32 , C23C14/34 , H01L21/203 , H01L21/31 , H02M5/08 , H02M7/12 , H05H1/46
CPC分类号： H01L21/203 , C23C14/34 , H01J37/32174 , H01L21/31 , H02M5/08 , H02M7/12 , H05H1/46 , H05H2001/4682
摘要： In radio frequency power source devices for delivering AC voltage outputs in antiphase with each other, having a configuration to divide the voltage output from a radio frequency output circuit into two, it is not possible to perform switching as appropriate, between different voltage values, high voltage and low voltage, resulting in that the voltage at an output end is reduced to have a half peak value of the voltage output of the radio frequency output circuit. There is provided a radio frequency power source device configured to change a voltage ratio between two output end voltages, by switching a connection state of a voltage divider that divides the radio frequency voltage, in such a manner that the radio frequency voltage is divided into voltage outputs in antiphase with each other with respect to ground potential, and high voltage and low voltage are delivered in switching manner. Switching of the connection state in the voltage divider enables selective delivery of voltage having different values, high voltage or low voltage, and by selecting and delivering high voltage for the time high voltage is required, reduction of the voltage output from the radio frequency output circuit is prevented.

4. 发明公开

EP3254302A1 APPARATUS AND METHOD FOR PLASMA IGNITION WITH A SELF-RESONATING DEVICE 有权
标题翻译：具有自谐振装置的等离子体点火装置和方法
公开(公告)号：EP3254302A1
公开(公告)日：2017-12-13
申请号：EP16746990.7
申请日：2016-01-27
申请人： MKS Instruments, Inc.
发明人： SMITH, Shaun, T. , WALTHER, Steven, R. , WU, Chen
IPC分类号： H01J61/54
CPC分类号： H05H1/46 , H01J37/32082 , H01J37/32174 , H01J37/32192 , H01J37/32247 , H01J37/32311 , H05H2001/4607 , H05H2001/4652
摘要： Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self- resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.

5. 发明公开

EP3226280A1 SUBSTRATE PROCESSING SYSTEM INCLUDING A COIL WITH AN RF POWERED FARADAY SHIELD 审中-公开
标题翻译：基板处理系统，包括带RF功率法拉第屏蔽的线圈
公开(公告)号：EP3226280A1
公开(公告)日：2017-10-04
申请号：EP17162738.3
申请日：2017-03-24
申请人： LAM Research Corporation
发明人： PENG, Shen , PANDHUMSOPORN, Tamarak , NGUYEN, Anthony , MAROHL, Daniel
IPC分类号： H01J37/32
CPC分类号： H01J37/32651 , H01J37/321 , H01J37/3211 , H01J37/32174 , H01J37/32183 , H01J37/32477 , H01J37/32504 , H01J37/32715 , H01J2237/334 , H01L21/67069 , H01L41/332
摘要： A substrate processing system (10) includes a processing chamber (28) including a dielectric window (24) and a substrate support (32) arranged therein to support a substrate (34). A coil (16) is arranged outside of the processing chamber (28) adjacent to the dielectric window (24). A Faraday shield (20) is arranged between the coil (16) and the dielectric window (24). An RF generator (11) is configured to supply RF power to the coil (16). The Faraday shield (20) is coupled by stray capacitance and/or directly coupled to the coil (16). A capacitor is connected to one of the coil (16) and the Faraday shield (20) to adjust a position of a voltage standing wave along the coil (16).
摘要翻译：衬底处理系统（10）包括处理室（28），处理室（28）包括电介质窗（24）和布置在其中以支撑衬底（34）的衬底支撑件（32）。线圈（16）布置在处理室（28）的与电介质窗（24）相邻的外部。法拉第屏蔽（20）布置在线圈（16）和电介质窗口（24）之间。 RF发生器（11）被配置为向线圈（16）供应RF功率。法拉第屏蔽（20）通过杂散电容耦合和/或直接耦合到线圈（16）。电容器连接到线圈（16）和法拉第屏蔽（20）中的一个以调整沿着线圈（16）的电压驻波的位置。

6. 发明公开

EP3091559A1 PLASMA IMPEDANCE MATCHING UNIT, SYSTEM FOR SUPPLYING RF POWER TO A PLASMA LOAD, AND METHOD OF SUPPLYING RF POWER TO A PLASMA LOAD 审中-公开
标题翻译：等离子体阻抗匹配单元，一种用于提供一种等离子电荷和RF功率的方法喂养射频功率，以等离子充电
公开(公告)号：EP3091559A1
公开(公告)日：2016-11-09
申请号：EP15461529.8
申请日：2015-05-05
申请人： TRUMPF Huettinger Sp. Z o. o.
发明人： Dr. Bugyi,, Rafal , Glazek,, Wojciech
IPC分类号： H01J37/32 , H03H7/38
CPC分类号： H01J37/32183 , H01J37/32174 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H03H7/38
摘要： A plasma impedance matching unit (13) for a plasma power supply system (10, 100) comprises
a. a first power connector (40) for coupling the matching unit (13) to a power source (11),
b. a second power connector (41) for coupling the matching unit (13) to a plasma load (20),
c. a data link interface (45) for directly coupling the impedance matching unit (13) to another plasma impedance matching unit (14) of the plasma power supply system (10, 100) via a data link (48),
d. a controller (42) configured to control the matching unit (13) in order to match the impedance from the first power connector (40) to the impedance at the second power connector (41), wherein
e. the controller (42) is configured to operate as a master for at least one other impedance matching unit (14) and/or at least one RF power source (11, 12) of the plasma power supply system (10, 100), wherein the controller (42) communicates via the data link interface (45) with the other impedance matching unit(s) (14) and/or RF power source(s) (11, 12) of the plasma power supply system (10, 100).
摘要翻译：一种用于等离子功率供应系统（10，100）的等离子体阻抗匹配单元（13）包括：a。第一电源连接器（40），用于匹配单元（13）耦合到电源（11）中，b。第二电源连接器（41），用于匹配单元（13）耦合到等离子体负载（20）中，c。一个数据链路接口（45），用于直接通过数据链路（48）中，d阻抗匹配单元（13）耦合到所述等离子体电源系统（10，100）的另一种等离子体阻抗匹配单元（14）。配置以从所述第一电源连接器（40）的阻抗的阻抗在第二电源连接器（41），worinÈ匹配，以控制所述匹配单元（13）的控制器（42）。所述控制器（42）被配置为用于所述等离子体电源系统的至少一个其它阻抗匹配单元（14）和/或至少一个RF功率源（11，12）（10，100），worin作为主机进行操作所述控制器（42）经由数据链路接口（45）与所述等离子体电源系统的另一阻抗匹配单元（一个或多个）（14）和/或RF功率源（一个或多个）（11，12）（10，100通信）。

7. 发明授权

EP1749306B1 VACUUM PLASMA PROCESSOR INCLUDING CONTROL IN RESPONSE TO DC BIAS VOLTAGE 失效
标题翻译：与对照的真空等离子体处理器响应DC偏置
公开(公告)号：EP1749306B1
公开(公告)日：2016-07-13
申请号：EP05755919.7
申请日：2005-05-25
申请人： LAM RESEARCH CORPORATION
发明人： DHINDSA, Rajinder , KOZAKEVICH, Felix , TRUSSELL, Dave
IPC分类号： H01J37/32
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32165 , H01J37/32935 , H01J37/3299

8. 发明公开

EP2612544A4 SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：系统，VERFAHREN UND VORRICHTUNG ZUR STEUERUNG EINER IONENENERGIEVERTEILUNG
公开(公告)号：EP2612544A4
公开(公告)日：2016-03-09
申请号：EP11822326
申请日：2011-08-11
申请人： ADVANCED ENERGY IND INC
发明人： BROUK VICTOR , HECKMAN RANDY , HOFFMAN DANIEL J
IPC分类号： H05H1/36 , C23C14/54 , C23C16/52 , C23F1/08 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/24 , C23C14/345 , C23C16/50 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了一种用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内进行调制，所述周期性电压函数响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

9. 发明公开

EP2798582A4 A METHOD FOR PRODUCING AN RFID TRANSPONDER BY ETCHING 有权转让
标题翻译： VERFAHREN ZUR HERSTELLUNG EINES RFID-TRANSPONDERS DURCHÄTZUNG
公开(公告)号：EP2798582A4
公开(公告)日：2015-07-29
申请号：EP11878465
申请日：2011-12-29
申请人： SMARTRAC IP BV
发明人： VIRTANEN JUHANI
IPC分类号： G06K19/077 , B23K26/00 , G03F7/20 , H01Q1/38 , H05K3/00 , H05K13/00
CPC分类号： G06K1/12 , G06K19/07722 , G06K19/07773 , G06K19/07786 , H01J37/3211 , H01J37/32174 , H01J37/32889 , H01J2237/0203 , H01J2237/3341 , H01L21/306 , H01Q1/2208 , H01Q1/38 , H05K3/06

10. 发明授权

EP2737516B1 VERFAHREN UND VORRICHTUNG ZUM SCHUTZ VON AN EINEN HOCHFREQUENZGENERATOR ANGESCHLOSSENEN PASSIVEN KOMPONENTEN 有权
标题翻译：方法和设备来连无源元件高频发生器的保护
公开(公告)号：EP2737516B1
公开(公告)日：2015-06-03
申请号：EP12769007.1
申请日：2012-07-25
申请人： TRUMPF Hüttinger GmbH + Co. KG
发明人： FRITSCH, Christian , MANN, Ekkehard , SEIFERT, Gerhard
IPC分类号： H01J37/32
CPC分类号： G05F3/00 , H01J37/32174 , H05H1/46

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