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1. 发明授权

EP1916695B1 Charged particle beam apparatus and method for operating it 有权
公开(公告)号：EP1916695B1
公开(公告)日：2018-12-05
申请号：EP06022329.4
申请日：2006-10-25
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Frosien, Jürgen , Banzhof, Helmut , Levin, Jacob , Shemesh, Dror
IPC分类号： H01J37/28 , H01J37/244 , H01J37/147
CPC分类号： H01J37/1478 , H01J37/244 , H01J37/28 , H01J2237/1506 , H01J2237/2448 , H01J2237/26 , H01J2237/2806 , H01J2237/31745 , H01J2237/31749
摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column (2) for generating a primary charged particle beam (10); a focussing assembly, such as a charged particle lens, e.g. an electrostatic lens, for focussing the primary charged particle beam on a specimen (4); a detector (40) for detecting charged signal particles (18) which are emerging from the specimen (4); and a deflector arrangement (32) for deflecting the primary charged particle beam (10). The deflector arrangement (32) is arranged downstream of the focussing assembly and is adapted for allowing the charged signal particles (18) passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focussing deflector arrangement.

2. 发明公开

EP3069367A1 WORKPIECE TRANSPORT AND POSITIONING APPARATUS 审中-公开
标题翻译：工件运输和定位设备
公开(公告)号：EP3069367A1
公开(公告)日：2016-09-21
申请号：EP14859522.6
申请日：2014-11-11
申请人： Howard Hughes Medical Institute
发明人： PRICE, John, H. , BOCK, Dravida
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , G01N1/32 , G01N35/00732 , H01J37/023 , H01J37/185 , H01J37/261 , H01J2237/2007 , H01J2237/201 , H01J2237/20278 , H01J2237/20285 , H01J2237/20292 , H01J2237/204 , H01J2237/26 , H01J2237/2602
摘要： An automated workpiece processing apparatus including a processing section including a processing module configured for processing a workpiece at a process location, a transport module including a first shuttle stage, a second shuttle stage independent of the first stage, and an end effector connected to at least one of the first and second stages, the end effector being configured to hold and transport the workpiece into and out of the processing module, and having a range of motion, defined by a combination of the first and second stage, extending from a workpiece holding station outside the processing module to the processing location inside the processing module so the end effector defines a processing stage of the processing module, and an automated loading and transport section including a load port module through which workpieces are loaded into the automated loading and transport section, and being communicably connected to the transport module.
摘要翻译：一种自动化工件处理设备，包括：处理部分，其包括处理模块，该处理模块被配置用于在处理位置处处理工件;运送模块，其包括第一梭步骤，独立于第一步骤的第二梭步骤，以及末端执行器，第一和第二阶段中的一个，末端执行器构造成保持和运输工件进出处理模块，并且具有由第一和第二阶段的组合限定的运动范围，该运动范围从工件保持件将处理模块外部的工作站移动到处理模块内部的处理位置，使得末端执行器限定处理模块的处理阶段，以及包括装载端口模块的自动装载和运输部分，工件通过所述装载端口模块被装载到自动装载和运输部分中并且可通信地连接到运输模块。

3. 发明公开

EP2827357A1 Magnetic lens for focusing a beam of charged particles 审中-公开
标题翻译： Magnetische Linse zum Fokussieren eines Strahls geladener Teilchen
公开(公告)号：EP2827357A1
公开(公告)日：2015-01-21
申请号：EP13176980.4
申请日：2013-07-18
申请人： FEI COMPANY
发明人： Shanel, Ondrej
IPC分类号： H01J37/141 , H01J37/14
CPC分类号： G21K1/093 , H01F2003/106 , H01J37/141 , H01J37/26 , H01J2237/1415 , H01J2237/26 , Y10T29/4978
摘要： Prior art magnetic charged particle lens show a yoke and an air gap. The air gap defines the position where a magnetic field is present on the optical axis of the lens. A lens (10) according to the invention has no air gap, but uses a part (15) of the yoke (13 + 16) that is saturated. This results in a lens with lower spherical aberration due to a more gradual break-out of the magnetic field. This also eliminates the alignment problems that prior art lenses show between upper and lower pole pieces. Preferably the part of the yoke that is saturated is an insert (16), resulting in better tolerances, better machinability and lower cost due to smaller size. Also, the insert (16) may show magnetic properties different from the rest of the yoke (13).
摘要翻译：现有技术的磁性带电粒子透镜显示轭和气隙。气隙限定了在透镜的光轴上存在磁场的位置。根据本发明的透镜（10）没有气隙，而是使用饱和的轭（13 + 16）的一部分（15）。这导致由于磁场的逐渐断开而具有较低球面像差的透镜。这也消除了现有技术透镜在上和下极片之间显示的对准问题。优选地，饱和的轭的部分是插入件（16），由于较小的尺寸，导致更好的公差，更好的机加工性和更低的成本。此外，插入件（16）可以显示与磁轭（13）的其余部分不同的磁性。

4. 发明授权

EP2446457B1 METHOD FOR DISCRIMINATION OF BACKSCATTERED FROM INCOMING ELECTRONS IN IMAGING ELECTRON DETECTORS WITH A THIN ELECTRON-SENSITIVE LAYER 有权
标题翻译：方法和区别背散射电子撞击于成像电子探测器具有电子敏感薄层之间
公开(公告)号：EP2446457B1
公开(公告)日：2014-12-17
申请号：EP10731660.6
申请日：2010-06-25
申请人： Gatan, Inc.
发明人： MOONEY, Paul
IPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , G01T1/00
CPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J2237/05 , H01J2237/2441 , H01J2237/24455 , H01J2237/24485 , H01J2237/26 , H01J2237/2802

5. 发明公开

EP2755226A1 Sample carrier for an electron microscope 有权
标题翻译： ProbenträgerfürElektronenmikroskop
公开(公告)号：EP2755226A1
公开(公告)日：2014-07-16
申请号：EP13151244.4
申请日：2013-01-15
申请人： FEI COMPANY
发明人： Nederlof, Frank
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/2251 , H01J2237/201 , H01J2237/26
摘要： The invention relates to a sample carrier (10) for a transmission electron microscope. When using state of the art sample carriers, such as half-moon grids in combination with detectors detecting, for example, X-ray emitted at a large emittance angle, shadowing is a problem. Similar problems occur when performing tomography, in which the sample is rotated over a large angle.
The invention provides a solution to shadowing by forming the parts (16) of the grid bordering the interface between sample and grid as tapering parts.
摘要翻译：本发明涉及一种用于透射电子显微镜的样品载体（10）。当使用现有技术的样品载体（例如半月板结合检测器检测例如以大的发射角发射的X射线）时，阴影是一个问题。执行断层扫描时会发生类似的问题，其中样品在大角度旋转。本发明通过形成与样品和栅格之间的界面接近的网格的部分（16）作为渐缩部分来提供阴影的解决方案。

6. 发明授权

EP2487704B1 Detection method for use in charged-particle microscopy 有权
标题翻译：检测方法用在显微镜带电粒子
公开(公告)号：EP2487704B1
公开(公告)日：2014-01-08
申请号：EP12155058.6
申请日：2012-02-13
申请人： FEI Company
发明人： Hlavenka, Petr , Uncovsky, Marek
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , G01N21/6447 , G01N2201/08 , H01J37/224 , H01J37/226 , H01J37/28 , H01J2237/2441 , H01J2237/2443 , H01J2237/2445 , H01J2237/26 , H01J2237/2605 , H01J2237/2802 , H01J2237/31749

7. 发明公开

EP2487704A2 Detection method for use in charged-particle microscopy 有权
标题翻译： Detektionsverfahren zur Verwendung in der Mikroskopie mit geladenen Teilchen
公开(公告)号：EP2487704A2
公开(公告)日：2012-08-15
申请号：EP12155058.6
申请日：2012-02-13
申请人： FEI Company
发明人： Hlavenka, Petr , Uncovsky, Marek
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , G01N21/6447 , G01N2201/08 , H01J37/224 , H01J37/226 , H01J37/28 , H01J2237/2441 , H01J2237/2443 , H01J2237/2445 , H01J2237/26 , H01J2237/2605 , H01J2237/2802 , H01J2237/31749
摘要： A method of investigating a sample using a charged-particle microscope, comprising the steps of:
- Providing a charged-particle microscope, having a particle-optical column;
- Using the particle-optical column to direct an imaging beam of charged particles at the sample;
- Irradiating the sample with the imaging beam, as a result of which a flux ("Photon Flux") of output radiation is caused to emanate from the sample;
- Examining at least a portion of said output radiation using a detector, which method comprises the following additional steps:
- Embodying said detector to comprise a Solid State Photo-Multiplier (1) that is connected to a power supply providing an adjustable electrical bias ("MPPC Bias");
- Adjusting said bias so as to adjust a gain value ("MPPC Gain") of the Solid State Photo-Multiplier;
- Matching said gain value to the magnitude of said flux, so as to cause the Solid State Photo-Multiplier to operate below its saturation threshold.
A Solid State Photo-Multiplier is also sometimes referred to as a Silicon Photo-Multiplier (SiPM), on-chip pixelated Avalanche Photodiode array (with shared/common detection circuitry), MPPC®, etc.
摘要翻译：一种使用带电粒子显微镜研究样品的方法，包括以下步骤： - 提供具有粒子 - 光学柱的带电粒子显微镜; - 使用粒子 - 光学柱来引导样品上带电粒子的成像束; - 用成像光束照射样品，结果导致从样品发出输出辐射的通量（“光子通量”）; - 使用检测器检查所述输出辐射的至少一部分，该方法包括以下附加步骤： - 将所述检测器包含固体光电倍增器（1），所述固态光电倍增器（1）连接到提供可调电偏压的电源 “MPPC偏差”）; - 调整所述偏置以调整固态光电倍增器的增益值（“MPPC Gain”）; - 将所述增益值与所述通量的大小相匹配，以使固态光电倍增器工作在其饱和阈值以下。固态光电倍增管有时也被称为硅光电倍增器（SiPM），片上像素化雪崩光电二极管阵列（共享/公共检测电路），MPPC®等。

8. 发明公开

EP2463888A1 Backscatter reduction in thin electron detectors 有权
标题翻译： dünnenElektronendetektoren的Verringerung vonRückstreuereignissen
公开(公告)号：EP2463888A1
公开(公告)日：2012-06-13
申请号：EP10193887.6
申请日：2010-12-07
申请人： FEI COMPANY
发明人： Van Hoften, Gerald , Stekelenburg, Michael , Lof, Joeri , Schuurmans, Frank , Henderson, Richard , McMullan, Gregory , Faruqi, Abdul , Turcheta, Renato , Guerrini, Nicola
IPC分类号： H01J37/26 , H01J37/244 , H01J37/22
CPC分类号： H01J37/22 , H01J37/244 , H01J37/26 , H01J37/263 , H01J2237/2441 , H01J2237/24455 , H01J2237/2446 , H01J2237/2447 , H01J2237/24578 , H01J2237/26 , H01J2237/2802
摘要： In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor.
摘要翻译：在直接电子检测器中，防止从传感器下方将电子反向散射到检测器体积中。在一些实施例中，在传感器下方保持空的空间。在其他实施例中，传感器下方的结构包括几何形状，例如多个高方面比例的通道，或者延伸到传感器或从传感器捕获电子，或倾斜表面的结构以偏转通过传感器的电子。

9. 发明公开

EP2405462A1 Method and system for preparing a sample 审中-公开
标题翻译： Verfahren und System zur Vorbereitung einer Probe
公开(公告)号：EP2405462A1
公开(公告)日：2012-01-11
申请号：EP11172554.5
申请日：2011-07-04
申请人： Camtek Ltd.
发明人： Boguslavsky, Dimitry , SMITH, Colin
IPC分类号： H01J37/305 , H01J37/302 , G01N1/32
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/3005 , H01J37/302 , H01J2237/202 , H01J2237/24455 , H01J2237/26 , H01J2237/3151
摘要： A system and method for preparing a sample (21), the method may include manipulating a mask (50) and a sample (21) and thereby exposing different sides of the sample to an ion miller (40). The manipulating may include rotating the mask and the sample while maintaining the spatial relationship between the sample and the mask unchanged.
摘要翻译：一种用于制备样品（21）的系统和方法，所述方法可以包括操纵掩模（50）和样品（21），从而将样品的不同侧暴露于离子铣刀（40）。操作可以包括旋转掩模和样品，同时保持样品和掩模之间的空间关系不变。

10. 发明公开

EP2405461A1 Method and system for preparing a lamella 审中-公开
标题翻译： Verfahren und System zur Herstellung einer Lamelle
公开(公告)号：EP2405461A1
公开(公告)日：2012-01-11
申请号：EP11172562.8
申请日：2011-07-04
申请人： Camtek Ltd.
发明人： Boguslavsky, Dimitry , Smith, Colin
IPC分类号： H01J37/302 , H01J37/305 , G01N1/32
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/3005 , H01J37/302 , H01J2237/202 , H01J2237/26 , H01J2237/3151
摘要： A system and a method for preparing a lamella. The method may include aligning, by the manipulator, a mask (50) and a sample (21). Positioning the mask and the sample in front of an ion miller while unchanging the spatial relationship between the mask and the sample. Milling a first exposed portion of the sample until exposing a first sidewall of the lamella. Positioning the mask and the sample in front of the ion miller so that the mask masks a second masked portion of the sample. Milling, by the ion miller, the second exposed portion of the sample until exposing a second sidewall of the lamella. Removing, by the miller, matter from both sides of the lamella; and detaching the lamella from the sample.
摘要翻译：一种制备薄片的系统和方法。该方法可以包括通过机械手对准掩模（50）和样品（21）。将掩模和样品定位在离子磨机的前面，同时不改变掩模和样品之间的空间关系。铣削样品的第一暴露部分直到暴露薄片的第一侧壁。将掩模和样品定位在离子磨机的前面，使得掩模掩盖样品的第二掩蔽部分。通过离子研磨机研磨样品的第二暴露部分，直到暴露薄片的第二侧壁。由磨机从薄片的两边取出物质; 并从样品中分离薄片。

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