专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP4354484A1 REDUCTION OF POWER COMSUMPTION FOR A CHARGED PARTICLE SYSTEM 审中-公开
公开(公告)号：EP4354484A1
公开(公告)日：2024-04-17
申请号：EP23202626.0
申请日：2023-10-10
申请人： FEI COMPANY
发明人： van Rooij, Corné , Bischoff, Maarten , McCormack, Jamie , Smit, Casper , Veerhoek, Marcel
IPC分类号： H01J37/10 , H01J37/141 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/2820130101 , H01J2237/00220130101 , H01J37/10 , H01J37/141
摘要： The present invention relates to a method for reducing the power consumption of a charged particle system, the charged particle system comprising at least one charged particle optics element and a cooling assembly configured for cooling the at least one charged particle optics element, the method comprising the steps of running the charged particle system in a standby mode, wherein the total power consumption of the charged particle system is reduced compared to running the charged particle system in an operating mode. Furthermore, the present invention relates to a respective charged particle system.

2. 发明公开

EP3385977A1 CHARGED PARTICLE BEAM DEVICE AND SCANNING ELECTRON MICROSCOPE 有权
公开(公告)号：EP3385977A1
公开(公告)日：2018-10-10
申请号：EP16870658.8
申请日：2016-11-29
申请人： Matsusada Precision, Inc.
发明人： KUMAMOTO, Kazuya , MATSUDA, Sadayoshi
IPC分类号： H01J37/244 , H01J37/10 , H01J37/22 , H01J37/28
CPC分类号： H01J37/10 , H01J37/141 , H01J37/22 , H01J37/228 , H01J37/244 , H01J37/28 , H01J2237/2445 , H01J2237/24475 , H01J2237/2448
摘要： A charged particle beam device includes: a charged particle source configured to emit a charged particle beam(12); an acceleration electric power source connected to the charged particle source and configured to accelerate the charged particle beam (12); a second objective lens (26) configured to focus the charged particle beam (12) onto a sample (23); and a second detector (110). The second objective lens (26) is positioned on the opposite side of the sample (23) from where the charged particle beam (12) is incident on the sample (23). The second detector (110) is configured to receive at least one of (i) an electromagnetic wave that the sample (23) emits upon receiving the charged particle beam (12) and (ii) an electromagnetic wave that the sample (23) reflects upon receiving the charged particle beam (12). The second detector (110) carries out a detection of the received electromagnetic wave(s).

3. 发明公开

EP3384279A1 APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 审中-实审转让
公开(公告)号：EP3384279A1
公开(公告)日：2018-10-10
申请号：EP16871412.9
申请日：2016-11-30
申请人： Hermes Microvision Inc.
发明人： WEIMING, Ren , XUEDONG, Liu , XUERANG, Hu , ZHONGWEI, Chen
IPC分类号： G01N23/225 , H01J37/10 , H01J37/153
CPC分类号： H01J37/28 , H01J37/14 , H01J37/141 , H01J37/153 , H01J37/20 , H01J37/244 , H01J37/292 , H01J2237/0453 , H01J2237/1532 , H01J2237/24465 , H01J2237/24592 , H01J2237/2806 , H01J2237/2817
摘要： A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.

4. 发明授权

EP3140848B1 APPARATUS AND METHOD FOR INSPECTING A SAMPLE USING A PLURALITY OF CHARGED PARTICLE BEAMS 有权
公开(公告)号：EP3140848B1
公开(公告)日：2018-06-06
申请号：EP15726384.9
申请日：2015-04-23
申请人： Technische Universiteit Delft
发明人： KRUIT, Pieter , ZONNEVYLLE, Aernout Christiaan , REN, Yan
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/28 , H01J37/141 , H01J37/20 , H01J37/222 , H01J37/244 , H01J2237/2443 , H01J2237/24455 , H01J2237/24495 , H01J2237/2802 , H01J2237/2808
摘要： An apparatus for inspecting a sample includes a sample holder for holding the sample; a multi beam charged particle generator for generating an array of primary charged particle beams; an electro-magnetic lens system for directing the array of primary charged particle beams into an array of separate focused primary charged particle beams on the sample; a multi-pixel photon detector arranged for detecting photons created by the focused primary charged particle beams when the primary charged particle beams impinge on the sample or after transmission of said primary charged particle beams through the sample; and an optical assembly for conveying photons created by at least two adjacent focused primary charged particle beams of the array of separate focused primary charged particle beams to distinct and/or separate pixels or to distinct and/or separate groups of pixels of the multi-pixel photon detector.

5. 发明公开

EP3252797A1 CHARGED PARTICLE BEAM DEVICE AND SCANNING ELECTRON MICROSCOPE 有权
标题翻译：带电粒子束装置和扫描电子显微镜
公开(公告)号：EP3252797A1
公开(公告)日：2017-12-06
申请号：EP15880117.5
申请日：2015-12-03
申请人： Matsusada Precision, Inc.
发明人： KUMAMOTO, Kazuya , MATSUDA, Sadayoshi
IPC分类号： H01J37/141 , H01J37/20 , H01J37/28
CPC分类号： H01J37/21 , H01J37/141 , H01J37/20 , H01J37/244 , H01J37/28
摘要： [Object] To allow a charged particle beam device to have a higher performance
[Means to Attain Object] A charged particle beam device includes: a charged particle source 11; an acceleration electric power source 14 connected to the charged particle source 11 and configured to accelerate a charged particle beam 12 emitted by the acceleration electric power source 11; and an objective lens 26 configured to focus the charged particle beam 12 onto a sample 23, the objective lens 26 being positioned on a first side of the sample 23 which first side is opposite to a second side of the sample 23 on which second side the charged particle beam 12 is incident on the sample 23, the objective lens 26 including: a central magnetic pole 26a having a central axis coinciding with an ideal optical axis of the charged particle beam 12; an upper magnetic pole 26b; a cylindrical side-surface magnetic pole 26c; and a disk-shaped lower magnetic pole 26d, the central magnetic pole 26a having (i) an upper portion on a side of the sample 23 which upper portion has a diameter that is smaller at a position further above and (ii) a column-shaped lower portion, the upper magnetic pole 26b having a circular opening at a center thereof and being in a shape of a disk that is tapered to a center thereof and that is thinner at a position closer to a center of gravity of the central magnetic pole.
摘要翻译：本发明的目的在于提供一种带电粒子束装置，其具有更高的性能。[带电粒子束装置]具有带电粒子源11，连接到带电粒子源11并加速由加速电源11发射的带电粒子束12的加速电源14; 以及配置成将带电粒子束12聚焦到样本23上的物镜26，物镜26位于样本23的第一侧上，第一侧与样本23的第二侧相对，第二侧带电粒子束12入射到样本23上，物镜26包括：具有与带电粒子束12的理想光轴重合的中心轴的中心磁极26a; 一个上磁极26b; 圆柱形侧表面磁极26c; 以及圆盘状的下侧磁极26d构成，中央磁极26a具有：（i）上侧部分的上部直径在更上方的位置小的样品23侧;以及（ii）上磁极26b在其中心处具有圆形开口，并且呈圆盘形状，该圆盘向其中心渐缩，并且在靠近中心磁极的重心的位置处变薄。

6. 发明公开

EP3244419A2 A MULTI-AXIS MAGNETIC LENS 有权转让
公开(公告)号：EP3244419A2
公开(公告)日：2017-11-15
申请号：EP17168514.2
申请日：2010-01-22
申请人： Hermes Microvision Inc.
发明人： CHEN, Zhong-Wei , REN, Wei-Ming , Kanai, Kenichi , Liu, Xue-Dong
IPC分类号： G21K1/08 , H01J37/141
CPC分类号： H01J37/141 , H01J2237/1405
摘要： The present invention relates to a multi-axis magnetic lens for a charged particle beam system, comprising a pair of parallel magnetic conductor plates 40,41 having each a plurality holes, the holes in one plate being aligned with the holes in the other plate, and each hole comprising a magnetic insert ring 310-1,310-2. The hole pairs with their magnetic insert rings form a plurality of sub-lens modules. A common excitation coil provides magnetic flux to the plurality of sub-lens modules.
A gap is formed between the outer sidewall of each magnetic insert ring 310-1,310-2 and the inner sidewall of each hole.
The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.

7. 发明授权

EP2652485B1 APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC LENS 有权转让
标题翻译：具有多轴磁透镜的多孔带电粒子束装置
公开(公告)号：EP2652485B1
公开(公告)日：2017-05-24
申请号：EP11848482.3
申请日：2011-02-16
申请人： Hermes-Microvision, Inc.
发明人： CHEN, Zhongwei , REN, Weiming , KANAI, Kenichi , LIU, Xuedong
IPC分类号： G21K1/08 , H01J37/141 , H01J37/28
CPC分类号： H01J37/141 , H01J37/28 , H01J2237/1035 , H01J2237/1415 , H01J2237/1534

8. 发明公开

EP2835688A1 NANO-PATTERNED SYSTEM AND MAGNETIC-FIELD APPLYING DEVICE THEREOF 有权
标题翻译：纳米结构和设备以便在其是应用磁FIELDS
公开(公告)号：EP2835688A1
公开(公告)日：2015-02-11
申请号：EP12873678.2
申请日：2012-07-17
申请人： Institute Of Physics Chinese Academy Of Sciences
发明人： YU, Guoqiang , GUO, Peng , HAN, Xiufeng , GUO, Chaohui , SUN, Xiaoyu , ZHOU, Xiangqian
IPC分类号： G03F7/20 , G01R31/00
CPC分类号： H01J37/09 , G01R33/093 , G01R33/096 , H01F7/202 , H01F7/204 , H01F41/00 , H01J37/141 , H01J2237/0262 , H01J2237/0264 , H01J2237/28 , H01J2237/31754 , H01L43/12
摘要： Disclosed are a nano-patterned system and a magnetic-field applying device thereof. The nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device. The magnetic-field applying device comprises a power supply, a magnetic-feld generation device and a pair of magnetic poles. The magnetic-field generation device comprises a coil and a magnetic conductive soft iron core. The power supply is connected to the coil, and the coil is wound on the magnetic conductive soft iron core to generate a magnetic field. The magnetic conductive soft iron core is of a semi-closed frame structure, and the magnetic poles are respectively arranged at the two ends of the semi-closed frame structure. The sample stage is arranged inside a vacuum chamber of the nano-patterned system. The magnetic poles are oppositely arranged inside the vacuum chamber relative to the sample stage. The coil and the magnetic conductive soft iron core are arranged outside the vacuum chamber. The magnetic conductive soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles are used for locating a sample on the sample stage and applying a local magnetic field.

9. 发明公开

EP2510523A4 A MULTI-AXIS MAGNETIC LENS 有权转让
标题翻译：多轴磁透镜
公开(公告)号：EP2510523A4
公开(公告)日：2014-10-01
申请号：EP10744493
申请日：2010-01-22
申请人： HERMES MICROVISION INC
发明人： CHEN ZHONGWEI , REN WEIMING , KANAI KENICHI , LIU XUEDONG
IPC分类号： G21K1/08 , H01J37/141
CPC分类号： H01J37/141 , H01J2237/1405

10. 发明公开

EP2742779A1 SYSTEM AND METHOD FOR X-RAY SOURCE WEIGHT REDUCTION 有权
标题翻译：系统和方法的X射线源减重
公开(公告)号：EP2742779A1
公开(公告)日：2014-06-18
申请号：EP12796177.9
申请日：2012-06-08
申请人： Rapiscan Systems, Inc.
发明人： LANGEVELD, Willem Gerhardus, Johannes , GOZANI, Tsahi , BENDAHAN, Joseph
IPC分类号： H05G1/10
CPC分类号： H01J35/30 , G21K1/093 , H01J35/08 , H01J35/14 , H01J37/141 , H01J37/1475 , H01J2235/081 , H01J2235/086 , H05G1/52
摘要： The invention provides an X-ray source having a generator for generating an electron beam, an accelerator for accelerating the generated electron beam in a desired direction, one or more magnetic elements for transporting portions of the electron beam in a more than one desired direction, and a shaped target made from a material having an atomic number lying within a predetermined range of values, the transported parts of the electron beam producing a fan beam of X rays upon striking the shaped target.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式