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1. 发明授权

EP2676285B1 FOCUSING A CHARGED PARTICLE IMAGING SYSTEM 有权
标题翻译：图像聚焦系统带电粒子
公开(公告)号：EP2676285B1
公开(公告)日：2015-05-20
申请号：EP12707198.3
申请日：2012-02-17
申请人： Applied Materials Israel Ltd. , Carl Zeiss SMT GmbH
发明人： RODGERS, Steven R. , KNIPPELMEYER, Rainer K. , KEMEN, Thomas , SCHUBERT, Stefan , ELMALIAH, Nissim
IPC分类号： H01J37/09 , H01J37/21 , H01J37/22 , H01J37/28
CPC分类号： H01J37/21 , H01J37/06 , H01J37/09 , H01J37/153 , H01J37/22 , H01J37/222 , H01J37/244 , H01J37/261 , H01J37/28 , H01J37/29 , H01J2237/0453 , H01J2237/049 , H01J2237/063 , H01J2237/1532 , H01J2237/21 , H01J2237/2817
摘要： A charged particle beam focusing apparatus (200) includes a charged particle beam generator (202) configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam (217) onto locations on a surface of a specimen (39), thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector (31) configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor (32) analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

2. 发明公开

EP2741310A1 Système de détection de cathodoluminescence optimisant la collection du signal, la résolution spectrale et la conservation de la brillance, et microscope mettant en oeuvre un tel système 有权转让
标题翻译：使用该系统具有改进的信号接收，光谱分辨率和亮度保持和显微镜阴极发光检测系统
公开(公告)号：EP2741310A1
公开(公告)日：2014-06-11
申请号：EP14156672.9
申请日：2011-04-29
申请人： Centre National de la Recherche Scientifique , Université Paris-Sud 11 (Paris XI)
发明人： Kociak, Mathieu , Zagonel, Luiz Fernando , Tence, Marcel , Mazzucco, Stefano
IPC分类号： H01J37/02 , H01J37/244 , H01J37/256
CPC分类号： G01N23/2254 , G01N2201/08 , H01J37/228 , H01J37/244 , H01J37/261 , H01J37/28 , H01J2237/024 , H01J2237/063 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2602 , H01J2237/2802 , H01J2237/2808
摘要： L'invention concerne un système de détection de cathodoluminescence comprenant une source de particules chargées éclairant un échantillon avec un faisceau de particules chargées, et un chemin optique comprenant au moins deux éléments optiques pour collecter et transporter un rayonnement lumineux provenant dudit échantillon éclairé vers des moyens d'analyse, caractérisé en ce que chaque élément optique est choisi de sorte que :
- l'angle maximal de sortie dudit élément optique est inférieur ou égal à 120% de l'angle maximal d'acceptance de l'élément optique suivant ; et
- le diamètre du rayonnement provenant dudit élément optique dans le plan d'entrée de l'élément optique suivant est inférieur ou égal à 120% du diamètre utile d'entrée de l'élément optique suivant.
摘要翻译：所述可调节系统包括用于收集从通过带电粒子的束照射的样品所获得的光辐射并反射的光辐射引导到分析单元，用于定位所述收集光学器件沿维度外部圆筒形管的单元的收集光学器件（112）也被置于相对于在由收集光学器件的反射光辐射的传播轴和刚性地固定到所述收集光学器件，而在接收的光辐射适配单元外缸（306）放置内部圆筒形管。所述可调节系统包括用于收集从通过带电粒子的束照射的样品所获得的光辐射并反射的光辐射引导到分析单元，用于定位所述收集光学器件沿维度外部圆筒形管的单元的收集光学器件（112）也被置于相对于在由收集光学器件，用于接收所述光辐射适配单元注入的光反射，并刚性地固定到收集光学器件到外缸（306）放置内部圆筒形管的光辐射的传播轴在辐射在光纤（116），用于在光辐射，用于分析由收集光学器件收集的光辐射的单元，和一个密封单元的传播方向相反发射光束传播的光的来源。所述定位单元包括用于沿的空间，对于在旋转轴周围旋转的收集光学器件的单元，并且可动转盘方向的收集光学器件的水平方向的移动的元素。收集光学器件包括抛物面反射镜，并用一个聚光透镜相关联的平面镜或椭圆形的并放置在平面镜的下游，并且被集成到可动转盘。内筒是自由地相对于外筒旋转。适配单元被配置为适应角度和大小的光辐射收集gemäß的尺寸，并在检测器或光纤的开口的，并且在收集光学器件的下游。光束被引导朝向由收集光学器件的样品。所述分析单元包括分光计，电荷耦合器件照相机或光电倍增管。收集光学器件在压力这是小于在大气压下的室（302）放置。所述适配单元在将压力比在腔室中的压力大一个环境放置。密封单元在所述室和所述适配单元，以保持在所述腔室中的压力之间放置。一个独立的claimsoft包括用于显微镜。

3. 发明公开

EP2426693A3 Ion source 审中-公开
标题翻译：离子源
公开(公告)号：EP2426693A3
公开(公告)日：2013-01-16
申请号：EP11009107.1
申请日：2000-12-13
申请人： Semequip, Inc.
发明人： Horsky, Thomas N. , Williams, John N.
IPC分类号： H01J37/08 , H01J3/02 , H01J37/317 , C23C14/48 , H01J27/20 , H01L21/265
CPC分类号： H01J37/3171 , C23C14/48 , H01J27/205 , H01J37/08 , H01J2237/047 , H01J2237/049 , H01J2237/063 , H01J2237/0812 , H01J2237/0815 , H01J2237/082 , H01J2237/083 , H01J2237/0835 , H01J2237/31701 , H01J2237/31703 , H01J2237/31705 , H01L21/26513 , H01L21/2658 , H01L21/823814
摘要： In an ion source (1) for use with an ion implant device comprising:
an ionization chamber (5) defined by a plurality of side walls defining an ionization volume (16), one (13) of said side walls including an ion extraction aperture (37) for enabling an ion beam to be extracted from said ionization chamber (16) along a predetermined axis defining an ion beam axis; and a gas source (2) in fluid communication with said ionization chamber (16); an electron source (12) for producing an electron beam for ionizing the gas in said ionization chamber (16); said electron source (12) has an emitter (33) external to the ionization volume (16) and one (13) of said sidewalls (13) includes an electron entrance aperture , said emitter (33) configured relative to said aperture to cause an electron beam (32) to be directed across the ionization chamber (16) and ionize said gas by direct electron impact ionization by energetic electrons

4. 发明公开

EP2106555A2 METHOD FOR S/TEM SAMPLE ANALYSIS 有权
标题翻译：法S / TEM样品分析
公开(公告)号：EP2106555A2
公开(公告)日：2009-10-07
申请号：EP07868540.1
申请日：2007-10-22
申请人： FEI Company
发明人： ARJAVAC, Jason , ZOU, Pei , TASKER, David James , OTTEN, Maximus Theodorus , DANIEL, Gerhard
IPC分类号： G01R31/305
CPC分类号： G01N1/28 , G01N1/06 , G01N1/08 , G01N1/32 , G01N23/04 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/26 , H01J37/28 , H01J37/3056 , H01J2237/063 , H01J2237/182 , H01J2237/204 , H01J2237/208 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (

5. 发明公开

EP1245036A1 ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD 有权
标题翻译：离子源
公开(公告)号：EP1245036A1
公开(公告)日：2002-10-02
申请号：EP00988056.8
申请日：2000-12-13
申请人： Semequip, Inc.
发明人： HORSKY, Thomas, N. , WILLIAMS, John N.
IPC分类号： H01J3/02
CPC分类号： H01J37/3171 , C23C14/48 , H01J27/205 , H01J37/08 , H01J2237/047 , H01J2237/049 , H01J2237/063 , H01J2237/0812 , H01J2237/0815 , H01J2237/082 , H01J2237/083 , H01J2237/0835 , H01J2237/31701 , H01J2237/31703 , H01J2237/31705 , H01L21/26513 , H01L21/2658 , H01L21/823814
摘要： An ion source (1) for ion implantation system includes a vaporizer (2) for producing process gas; an electron source (12) for directing an electron beam (32) to ionize the process gas within an ionization volume (16); a beam dump (11); an ionization chamber (5); and an extraction aperture (37) for extracting an ion beam.

6. 发明授权

EP2741310B1 Système de détection de cathodoluminescence optimisant la collection du signal, la résolution spectrale et la conservation de la brillance, et microscope mettant en oeuvre un tel système 有权转让
标题翻译：系统检测阴极发光Optimisant la collection du信号，分辨率光谱和等离子体光谱，以及显微镜mettant en oeuvre un tel系统
公开(公告)号：EP2741310B1
公开(公告)日：2017-06-14
申请号：EP14156672.9
申请日：2011-04-29
申请人： Centre National de la Recherche Scientifique , Université Paris-Sud
发明人： Kociak, Mathieu , Zagonel, Luiz Fernando , Tence, Marcel , Mazzucco, Stefano
IPC分类号： H01J37/02 , H01J37/244 , H01J37/256
CPC分类号： G01N23/2254 , G01N2201/08 , H01J37/228 , H01J37/244 , H01J37/261 , H01J37/28 , H01J2237/024 , H01J2237/063 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2602 , H01J2237/2802 , H01J2237/2808

7. 发明授权

EP2862196B1 PLASMA SOURCE APPARATUS AND METHODS FOR GENERATING CHARGED PARTICLE BEAMS 有权
标题翻译：等离子体源装置及其制造方法带电粒子束
公开(公告)号：EP2862196B1
公开(公告)日：2016-08-10
申请号：EP13723940.6
申请日：2013-05-20
申请人： The Welding Institute
发明人： RIBTON, Colin , SANDERSON, Allan
IPC分类号： H01J27/18 , H01J37/077 , H01J37/30
CPC分类号： H01J37/077 , H01J27/18 , H01J37/3002 , H01J2237/061 , H01J2237/063 , H01J2237/0817 , H01J2237/083 , H01J2237/31 , H01J2237/3104

8. 发明公开

EP3005397A1 LENTILLE ELECTROSTATIQUE A MEMBRANE SEMICONDUCTRICE DIELECTRIQUE 审中-公开
标题翻译：介电半导电膜静电透镜
公开(公告)号：EP3005397A1
公开(公告)日：2016-04-13
申请号：EP14726368.5
申请日：2014-05-26
申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives , Constancias, Christophe
发明人： CONSTANCIAS, Christophe
IPC分类号： H01J37/12
CPC分类号： H01J37/12 , H01J2237/063 , H01J2237/12 , H01J2237/1534 , H01J2237/21
摘要： The invention relates to electrostatic lenses for focusing a beam (EB) of charged particles, and in particular an electron beam. Said lenses are used especially in the electron guns of electron microscopes or electron-beam lithography apparatuses. One aim of the invention is to improve the possibilities for focusing the particle beam, in particular an electron beam emitted by a cathode. The lens comprises at least one conducting electrode (EL2) having at least one through-opening for the passage of an electron beam. Different electric fields are set up upstream and downstream of the opening. The passage opening is at least partially closed by a planar or curved thin membrane (M) of semi-conducting material that is transparent to electrons and has a high dielectric permittivity. Structuring the membrane (holes or thickened portions or electrodes deposited on the membrane) makes it possible to correct lens aberration defects.

9. 发明授权

EP2104946B1 METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE 有权
标题翻译：制备方法技术探针干细胞和一个样本结构
公开(公告)号：EP2104946B1
公开(公告)日：2015-08-12
申请号：EP07844522.8
申请日：2007-10-22
申请人： FEI Company
发明人： BLACKWOOD, Jeff , STONE, Stacey
IPC分类号： H01J37/305 , G01N1/32 , G06K9/46
CPC分类号： G01N1/28 , G01N1/06 , G01N1/08 , G01N1/32 , G01N23/04 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/26 , H01J37/28 , H01J37/3056 , H01J2237/063 , H01J2237/182 , H01J2237/204 , H01J2237/208 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749

10. 发明授权

EP2106555B1 METHOD FOR S/TEM SAMPLE ANALYSIS 有权
标题翻译：法S / TEM样品分析
公开(公告)号：EP2106555B1
公开(公告)日：2015-01-07
申请号：EP07868540.1
申请日：2007-10-22
申请人： FEI Company
发明人： ARJAVAC, Jason , ZOU, Pei , TASKER, David James , OTTEN, Maximus Theodorus , DANIEL, Gerhard
IPC分类号： G01N1/28 , H01J37/26 , G01N1/06 , G01N1/08 , H01J37/305 , G01N1/32 , G01N23/04
CPC分类号： G01N1/28 , G01N1/06 , G01N1/08 , G01N1/32 , G01N23/04 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/26 , H01J37/28 , H01J37/3056 , H01J2237/063 , H01J2237/182 , H01J2237/204 , H01J2237/208 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749

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