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1. 发明公开

EP3332417A1 CHARGED PARTICLE BEAM SYSTEM, OPTO-ELECTRO SIMULTANEOUS DETECTION SYSTEM AND METHOD 有权
公开(公告)号：EP3332417A1
公开(公告)日：2018-06-13
申请号：EP17807686.5
申请日：2017-05-10
申请人： Focus-eBeam Technology (Beijing) Co., Ltd.
发明人： HE, Wei , LI, Shuai , WANG, Peng
IPC分类号： H01J37/26
CPC分类号： G01N21/84 , G01N21/6458 , G01N21/65 , G01N23/2251 , H01J37/18 , H01J37/20 , H01J37/228 , H01J37/26 , H01J2237/2006
摘要： A charged particle beam system includes: a particle source (101), a column (103) and a specimen chamber (105) with a first movable vacuum window (106). The particle source (101) is configured to generate a charged particle beam (102) which impinges the specimen (114) to be detected placed in a specimen chamber (105). The column (103) includes a deflection device (104) for deflecting the charged particle beam (102) and a focusing device (113) for focusing the charged particle beam (102). The charged particle beam system is compatible with multiple external optical systems to achieve simultaneous detection or fast-switching detection of the specimen.

2. 发明公开

EP3289113A1 VERFAHREN ZUR HERSTELLUNG VON BESCHICHTETEN SUBSTRATEN 审中-实审
标题翻译：生产涂层基材的方法
公开(公告)号：EP3289113A1
公开(公告)日：2018-03-07
申请号：EP16714365.0
申请日：2016-03-31
申请人： Bühler Alzenau GmbH
发明人： PISTNER, Jürgen , HAGEDORN, Harro
IPC分类号： C23C14/00 , C23C14/54
CPC分类号： C23C14/0078 , C23C14/547 , H01J37/18 , H01J37/32036 , H01J37/32119 , H01J37/32155
摘要： The invention relates to a method for producing substrates having a plasma coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device, comprising moving a substrate relative to the plasma device by means of a movement device along a curve, and depositing coating material on a surface of the substrate in a coating region along a trajectory lying on the surface of the substrate using the plasma device. Also provided is: a) the determining of actual values of a layer thickness of deposited coating material on at least parts of the trajectory in the movement direction of the substrate; b) the comparing of the actual values with target values of the layer thickness on the at least parts of the trajectory; c) the determining of parameters of the plasma device to change the amount of coating material deposited per time unit i accordance with the position of the substrate, in such a way that the actual values of the layer thickness of deposited coating material deviate by less than a predetermined difference from the target values; d) the setting of parameters of the plasma device to change the amount of coating material deposited per time unit according to point c); and e) depositing coating material by means of the plasma device, using the parameters set in point d). The invention further relates to a device for producing substrates (10, 100) having a plasma-coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device (31, 32, 150, 180), comprising a movement device for moving a substrate (10, 100) relative to the plasma device (31, 32, 150, 180) along a curve, wherein by means of the plasma device (31, 32, 150, 180) coating material is deposited on a surface (11, 101) of the substrate (10, 100) in a coating region along a trajectory lying on the surface of the substrate (12, 105), comprising a control module (140) which is designed and configured to carry out the method.

3. 发明授权

EP2859573B1 DEVICE FOR GENERATING PLASMA AND DIRECTING AN ELECTRON BEAM TOWARDS A TARGET 有权
标题翻译：用于产生等离子体并引导电子束进入目标的装置
公开(公告)号：EP2859573B1
公开(公告)日：2018-02-28
申请号：EP13744816.3
申请日：2013-06-11
申请人： Noivion S.r.l.
发明人： Skocdopolova, Libuse
IPC分类号： H01J3/02 , H01J37/077 , H01J37/34 , H01J37/32
CPC分类号： H01J37/3244 , C23C14/34 , H01J37/077 , H01J37/18 , H01J37/301 , H01J37/3053 , H01J37/315 , H01J37/34 , H01J2237/3137
摘要： A device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) for generating plasma and for directing an electron beam towards a target (3); the device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) comprises a hollow element (5); an activation group (21), which is designed to impose a difference in potential between the hollow element (5) and another element which is separate from it, in such a way as to direct the electron beam towards said separate element; and a de Laval nozzle (23), having at least one tapered portion (13), which is tapered towards the separate element and is designed to accelerate a gas flow towards the separate element.

4. 发明公开

EP3226278A1 QUANTITATIVE ANALYSIS DEVICE FOR TRACE CARBON AND QUANTITATIVE ANALYSIS METHOD FOR TRACE CARBON 有权
标题翻译：痕量碳的定量分析装置及痕量碳的定量分析方法
公开(公告)号：EP3226278A1
公开(公告)日：2017-10-04
申请号：EP15862942.8
申请日：2015-03-23
申请人： JFE Steel Corporation
发明人： TANAKA Yuji , YAMASHITA Takako , NAGOSHI Masayasu
IPC分类号： H01J37/20 , G01N23/207 , G01N23/225 , H01J37/18 , H01J37/252 , H01J37/28
CPC分类号： G01N23/2252 , G01N23/207 , H01J37/18 , H01J37/256 , H01J37/28 , H01J2237/022 , H01J2237/2067 , H01J2237/2807 , H01J2237/2813
摘要： The present invention makes it possible to analyze trace carbon in a sample without the effects of contamination. In an electron probe microanalyzer, a liquid nitrogen trap (6) and a plasma or oxygen radical generator are jointly used as a means for suppressing contamination, and two or more carbon detection units (9, 10) for detecting characteristic x-rays (8) of carbon in the sample (7) are provided.
摘要翻译：本发明使得能够分析样品中的痕量碳而没有污染的影响。在电子探针显微分析仪中，共同使用液氮阱（6）和等离子体或氧自由基发生器作为抑制污染的手段，以及两个或更多个用于检测特征X射线（8）的碳检测单元（9,10））的样品（7）中的碳。

5. 发明公开

EP3180552A1 MULTI-VANE THROTTLE VALVE 审中-公开
标题翻译：多叶片节流阀
公开(公告)号：EP3180552A1
公开(公告)日：2017-06-21
申请号：EP14899842.0
申请日：2014-08-14
申请人： Ferrotec (USA) Corporation
发明人： SIN, Pheng
IPC分类号： F16K27/12 , F16K51/02
CPC分类号： F16K1/223 , F16K1/222 , F16K49/007 , F16K51/02 , H01J37/18 , H01J2237/186 , H01J2237/3132
摘要： A multi-vane throttling valve for a vacuum process chamber includes a reciprocal vane pivotally connected to and extending backwardly away from a back side of each of a plurality of rotatable vanes, and a stationary reciprocal vane angling assembly fixed in a predefined position and having an assembly pin extending transversely toward the reciprocal vane a predefined distance sufficient to support the reciprocal vane whereby the stationary angling assembly causes the reciprocal vane to pivot in a range between a substantially parallel position with the respective rotatable vane and a transverse position with the respective rotatable vane when the respective rotatable vane is rotated.
摘要翻译：用于真空处理室的多叶片节流阀包括可枢转地连接到多个可旋转叶片中的每一个的背侧并向后延伸的往复叶片以及固定在预定位置并且具有所述装配销横向朝向所述往复叶片延伸足够的预定距离以支撑所述往复叶片，由此所述固定成角度组件使得所述往复叶片在与相应可旋转叶片的基本平行位置和相应可旋转叶片的横向位置之间的范围内枢转当相应的可旋转叶片旋转时。

6. 发明公开

EP3096343A1 ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE 有权
标题翻译：方法用于成像的样品与带电粒子束利用气体图
公开(公告)号：EP3096343A1
公开(公告)日：2016-11-23
申请号：EP16169828.7
申请日：2016-05-17
申请人： FEI Company
发明人： Shanley, Toby , Scott, John , Toth, Milos
IPC分类号： H01J37/244
CPC分类号： H01J37/18 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/182 , H01J2237/2448 , H01J2237/2605 , H01J2237/2608 , H01J2237/2801 , H01J2237/2806
摘要： Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.
摘要翻译：使用气体放大具有改善的气体的成像提供带电粒子束成像和测量系统。该系统包括用于将带电粒子束到工件，用于聚焦带电粒子到工件上的聚焦透镜，和在电极用于加速由所述带电实践束从工件照射而产生的二次电子的带电粒子束源，或其它气体级联检测方案。气体成像在高压扫描电子显微镜（HPSEM）室中进行用于封闭所述改进的成像气体包括CH 3 CH 2 OH（乙醇）的蒸气。电极加速二次电子虽然CH 3 CH 2 OH通过电离级联电离CH 3 CH 2 OH以放大探测二次电子的数量。的最优配置提供了一种用于使用改进的成像气体的，并且提供的技术来进行的有机液体和溶剂，以及其他CH 3 CH 2 OH基的流程成像研究。

7. 发明授权

EP2248153B1 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 失效转让
标题翻译：清洁离子源半导体处理系统
公开(公告)号：EP2248153B1
公开(公告)日：2016-09-21
申请号：EP09709805.7
申请日：2009-02-11
申请人： ENTEGRIS, INC.
发明人： SWEENEY, Joseph, D. , YEDAVE, Sharad, N. , BYL, Oleg , KAIM, Robert , ELDRIDGE, David , SERGI, Steven , FENG, Lin , BISHOP, Steven, E. , OLANDER, Karl, W. , TANG, Ying
IPC分类号： H01L21/265 , H01J37/317 , H01J37/16 , H01J37/18 , C23G5/00 , C23C16/44 , H01J37/08 , C23C14/48 , C23C14/54 , C23C14/56
CPC分类号： H01J37/3171 , C23C14/48 , C23C14/54 , C23C14/564 , H01J37/08 , H01J37/16 , H01J37/18 , H01J2237/082 , H01J2237/22

8. 发明公开

EP2796862A1 AUTOMATIC X-RAY INSPECTION APPARATUS FOR SMT INLINE PROCESS 审中-公开
标题翻译：自动化工程机械
公开(公告)号：EP2796862A1
公开(公告)日：2014-10-29
申请号：EP12860408.9
申请日：2012-12-21
申请人： Sec Co., Ltd.
发明人： KIM, Jong-hyun , KIM, Man-seok , RYU, Ki-ung , RYU, Ki-jun
IPC分类号： G01N23/04 , G01B15/00
CPC分类号： G01N23/046 , G01N2223/419 , H01J37/18
摘要： The invention relates to an automatic X-ray inspection apparatus for a SMT inline process, comprising: a stage unit for supporting an object to be inspected such that the object is attachable/detachable, the stage unit being movable on an X-axis and Y-axis in a plane and rotatable; an X-ray vacuum tube arranged beneath the stage unit so as to irradiate the object arranged on the stage unit with X-rays; and a detector arranged above the stage unit so as to swivel toward one side in order to detect X-rays transmitted through the object. The X-ray vacuum tube swivels in synchronization with the swiveling of the detector, and an X-ray emission surface of the X-ray vacuum tube is arranged so as to be parallel to the stage unit. The stage unit has a hollow shaft, and a hollow bearing that supports the hollow shaft such that the hollow shaft is rotatable.
摘要翻译：本发明涉及一种用于SMT在线处理的自动X射线检查装置，包括：用于支撑待检查物体的台架单元，使得物体可附接/可拆卸，台架单元可在X轴上移动，Y 在一个平面上可旋转的轴; X射线真空管，布置在载物台单元下方，以便用X射线照射设置在载物台单元上的物体; 以及检测器，其布置在平台单元的上方，以朝向一侧旋转，以便检测透过物体的X射线。 X射线真空管与检测器的旋转同步地旋转，并且X射线真空管的X射线发射表面被布置成平行于平台单元。舞台单元具有中空轴和支撑空心轴的中空轴承，使得中空轴可旋转。

9. 发明授权

EP2024750B1 Compact scanning electron microscope 有权
标题翻译：紧凑型扫描电子显微镜
公开(公告)号：EP2024750B1
公开(公告)日：2014-04-23
申请号：EP07798254.4
申请日：2007-06-07
申请人： FEI COMPANY
发明人： BIERHOFF, Mart Petrus Maria , BUIJSSE, Bart , KOOIJMAN, Cornelis Sander , VAN LEEUWEN, Hugo , TAPPEL, Hendrik Gezinus , SANFORD, Colin August , STOKS, Sander Richard Marie , BERGER, Steven , BORMANS, Ben Jacobus Marie , DRIESSEN, Koen Arnoldus Wilhelmus , PERSOON, Johannes A.H.W.G.
IPC分类号： H01J37/16 , H01J37/18 , H01J37/20 , H01J37/28 , H01J37/244 , H01J37/22
CPC分类号： H01J37/26 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/20 , H01J37/21 , H01J37/226 , H01J37/244 , H01J37/261 , H01J37/28 , H01J37/302 , H01J2237/1405 , H01J2237/162 , H01J2237/1825 , H01J2237/188 , H01J2237/2003 , H01J2237/2006
摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

10. 发明授权

EP2450935B1 Environmental cell for charged particle beam system 有权
标题翻译：用于带电粒子的系统环境单元
公开(公告)号：EP2450935B1
公开(公告)日：2014-01-08
申请号：EP11187989.6
申请日：2011-11-07
申请人： FEI Company
发明人： Novak, Libor , Uncovsky, Marek , Toth, Milos , Cafourek, Martin , Parker, N. William
IPC分类号： H01J37/20 , H01J37/18 , H01J37/244
CPC分类号： H01J37/20 , H01J37/18 , H01J37/244 , H01J2237/024 , H01J2237/2001 , H01J2237/2003 , H01J2237/2445
摘要： An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.

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