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1. 发明授权

EP1664885B1 CATADIOPTRIC IMAGING SYSTEM FOR BROAD BAND MICROSCOPY 有权
标题翻译：折反射PICTURE SYSTEM FOR宽带观察
公开(公告)号：EP1664885B1
公开(公告)日：2016-11-16
申请号：EP04786521.7
申请日：2004-08-18
申请人： KLA-Tencor Technologies Corporation
发明人： SHAFER, David, R. , CHUANG, Yung-Ho , ARMSTRONG, J., Joseph
IPC分类号： G02B17/08 , G02B21/04
CPC分类号： G02B21/04 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70225 , G03F7/70341

2. 发明公开

EP2660854A3 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：一种投影光学系统，曝光装置及曝光方法
公开(公告)号：EP2660854A3
公开(公告)日：2014-03-26
申请号：EP13174487.2
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

3. 发明公开

EP2672307A2 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译： Optisches Projektionssystem，Belichtungsvorrichtung und Belichtungsverfahren
公开(公告)号：EP2672307A2
公开(公告)日：2013-12-11
申请号：EP13175504.3
申请日：2004-05-06
申请人： Nikon Corporation
发明人： Omura, Yasuhiro
IPC分类号： G02B17/08 , H01L21/027
CPC分类号： G03B27/522 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
摘要翻译：用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投射光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差（诸如色差和曲率）进行校正并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。投影光学系统包括至少两个反射镜（CM1，CM2）和第一表面侧的表面具有正折射力的边界透镜（Lb），并且填充了边界透镜和第二表面之间的光路具有折射率大于1.1的介质（Lm）。每个发射构件和具有形成投影光学系统的折射能力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

4. 发明公开

EP2660854A2 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：EP2660854A2
公开(公告)日：2013-11-06
申请号：EP13174487.2
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没式投影光学系统减少了充满液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括发光表面（Lpb），该发光表面（Lpb）被成形为关于在第二平面上彼此垂直的两个轴向（XY轴）基本对称。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆形（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴从光轴（AX）在两个轴向（Y轴）中的一个轴向偏心。

5. 发明公开

EP2572224A1 A COMPACT, LIGHT-TRANSFER SYSTEM FOR USE IN IMAGE RELAY DEVICES, HYPERSPECTRAL IMAGERS AND SPECTROGRAPHS 审中-公开
标题翻译：用于图像中继设备，超光谱成像仪和光谱仪的紧凑型光传输系统
公开(公告)号：EP2572224A1
公开(公告)日：2013-03-27
申请号：EP11782797.2
申请日：2011-05-12
申请人： Itres Research Limited
发明人： ACHAL, Stephen
IPC分类号： G02B17/00 , G01J3/18 , G02B17/08 , G02B27/40
CPC分类号： G02B17/08 , G01J3/0208 , G01J3/021 , G01J3/2823 , G02B13/22 , G02B17/0892
摘要： The invention provides a light-transfer imager that can be incorporated into a hyperspectral line-scanner, a spectrograph or a non-diffractive image relay device, and more particularly, to a design having a simpler optical design that is easier to fabricate, and has superior imaging quality than most previous designs. The invention includes a generic first optical assembly to deliver incoming light onto a slit or pinhole, a second optical assembly operating as a refractive corrector that directs incoming light onto a curved reflective diffraction grating or curved mirror such that the spectrally dispersed or reflected light (dependent upon the particular embodiment) passes back through the same second optical assembly which focuses that light onto a focal plane array in approximately the same plane as the slit. The slit and the FPA are preferably displaced symmetrically on opposite sides of the optical axis of the refractive corrector.
摘要翻译：本发明提供了一种可结合到高光谱线扫描仪，光谱仪或非衍射图像中继装置中的光传输成像器，更具体地，涉及具有更简单的光学设计的设计，其更容易制造，并且具有卓越的成像质量比以往大多数设计。本发明包括将入射光传送到狭缝或针孔上的通用第一光学组件，作为折射矫正器操作的第二光学组件，其将入射光引导到曲面反射衍射光栅或曲面镜上，使得光谱分散或反射光在特定实施例中）通过相同的第二光学组件，该光学组件将该光聚焦到焦平面阵列上与焦缝平面大致相同的平面上。狭缝和FPA优选地在折射率校正器的光轴的相对侧上对称地移位。

6. 发明公开

EP1630585A4 PROJECTION OPTICAL SYSTEM, AND EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译：光学投影系统和曝光装置以及曝光方法
公开(公告)号：EP1630585A4
公开(公告)日：2010-07-14
申请号：EP04731484
申请日：2004-05-06
申请人： NIPPON KOGAKU KK
发明人： OMURA YASUHIRO
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G03B27/522 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

7. 发明公开

EP2189848A3 Catadioptric projection objective 失效转让
标题翻译：反折射投影物镜
公开(公告)号：EP2189848A3
公开(公告)日：2010-06-09
申请号：EP09015829.6
申请日：2005-07-08
申请人： Carl Zeiss SMT AG
发明人： Shafer, David , Ulrich, Wilhelm , Dodoc, Aurelian , Von Bünau, Rudolf , Mann, Hans-Jürgen , Epple, Alexander , Beder, Susanne , Singer, Wolfgang
IPC分类号： G03F7/20 , G02B13/14
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' · NA 2 ) and wherein the condition COMP1
摘要翻译：用于将提供在投影物镜的物平面中的图案成像到投影物镜的成像平面上的折反射投影物镜具有：第一折射物镜部分，用于将提供在物平面中的图案成像为第一中间图像; 第二物镜部分，其包括用于将第一中间成像成像为第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将第二中间成像成像到像平面上; 其中投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2）并且其中条件COMP1 <10成立。

8. 发明公开

EP2136231A1 High aperture catadioptric system 审中-公开
标题翻译： Katadioptrisches系统mit hoher Apertur
公开(公告)号：EP2136231A1
公开(公告)日：2009-12-23
申请号：EP08010944.0
申请日：2008-06-17
申请人： Carl Zeiss SMT AG
发明人： Dodoc, Aurelian
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70225 , G02B17/0812 , G02B17/0856 , G02B17/0888 , G02B17/0892 , G02B26/06 , G02B27/0018 , G03F7/70266
摘要： An optical system forming an image of a pattern provided in an object plane of the optical system in an image plane of the optical system, comprises: a plurality of non-parallel optical axis segments; a plurality of intermediate images; and a plurality of mirrors. Radiation emerging from an intermediate image is incident in this order on a first mirror positioned optically remote from a pupil position, a second mirror positioned optically near to a pupil position to form a pupil mirror, and a third mirror positioned optically remote from a pupil position, prior to forming another intermediate image, wherein the first mirror a first concave mirror, and the third mirror is a second concave mirror.
摘要翻译：一种在所述光学系统的像平面中形成设置在所述光学系统的物体平面中的图案的光学系统，包括：多个非平行光轴段; 多个中间图像; 和多个反射镜。从中间图像出射的辐射以这样的顺序入射到光学远离光瞳位置的第一反射镜上，光学上靠近光瞳位置定位的第二镜，以形成瞳孔镜，以及光学远离光瞳位置的第三镜在形成另一中间图像之前，其中所述第一反射镜为第一凹面镜，所述第三反射镜为第二凹面镜。

9. 发明公开

EP1936421A1 Catadioptric optical system and catadioptric optical element 审中-公开
标题翻译：魔术师系统
公开(公告)号：EP1936421A1
公开(公告)日：2008-06-25
申请号：EP07018247.2
申请日：2007-09-18
申请人： Carl Zeiss SMT AG
发明人： Rostalski, Hans-Jürgen , Bittner, Boris
IPC分类号： G02B17/08 , G03F7/00
CPC分类号： G02B17/0892 , G02B5/0858 , G02B17/0812 , G03F7/70225
摘要： A catadioptric optical system comprises a plurality of optical elements arranged to image a pattern from an effective object field in an object surface of the optical system to an effective image field in an image surface of the optical system with operating radiation at an operating wavelength. The optical elements include a plurality of lenses and at least one concave mirror. The optical elements include a catadioptric optical element comprising: a body made from a body material transparent to radiation at the operating wavelength, the body having a first surface and a second surface opposite to the first surface, wherein the first surface is a concave surface having a first surface portion and a second surface portion adjacent to the first surface portion, a reflective coating is applied to the first surface portion and the second surface portion is transparent to the operating radiation, whereby the reflective coating forms the concave mirror and the second portion of the first surface forms a concave lens surface. A catadioptric optical element is also disclosed.
摘要翻译：反折射光学系统包括多个光学元件，其被布置成将来自光学系统的物体表面中的有效物体的图案成像到具有工作波长的操作辐射的光学系统的图像表面中的有效图像场。光学元件包括多个透镜和至少一个凹面镜。光学元件包括反折射光学元件，其包括：由在工作波长处对辐射透明的主体材料制成的主体，所述主体具有第一表面和与第一表面相对的第二表面，其中第一表面是具有第一表面部分和与第一表面部分相邻的第二表面部分，反射涂层施加到第一表面部分，并且第二表面部分对于操作辐射是透明的，由此反射涂层形成凹面镜，第二部分的第一表面形成凹透镜表面。还公开了一种反折射光学元件。

10. 发明公开

EP1855160A3 Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs 有权转让
标题翻译：投影曝光装置，投影曝光方法和使用的投影透镜的
公开(公告)号：EP1855160A3
公开(公告)日：2008-05-28
申请号：EP07008471.0
申请日：2007-04-26
申请人： Carl Zeiss SMT AG
发明人： Rostalski, Hans-Jürgen , Feldmann, Heiko , Ulrich, Wilhelm
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： Eine Projektionsbelichtungsanlage zur Belichtung eines im Bereich einer Bildfläche eines Projektionsobjektivs angeordneten strahlungsempfindlichen Substrats mit mindestens einem Bild eines im Bereich einer Objektfläche des Projektionsobjektivs angeordneten Musters einer Maske hat eine Lichtquelle zur Abgabe von Ultraviolettlicht aus einem Wellenlängenband mit einer Bandbreite Δλ > 10 pm um eine zentrale Arbeitswellenlänge λ > 200 nm; ein Beleuchtungssystem zum Empfang des Lichtes der Lichtquelle und zur Formung von auf das Muster der Maske gerichteter Beleuchtungsstrahlung; und ein Projektionsobjektiv zur Abbildung der Struktur der Maske auf ein lichtempfindliches Substrat. Das Projektionsobjektiv ist ein katadioptrisches Projektionsobjektiv mit mindestens einem Konkavspiegel, der im Bereich einer Pupillenfläche des Projektionsobjektivs angeordnet ist. In unmittelbarer Nähe des Konkavspiegels ist in einem pupillennahen Bereich eine Negativgruppe mit mindestens einer Negativlinse angeordnet ist, wobei in dem pupillennahen Bereich die Randstrahlhöhe der Abbildung größer ist als die Hauptstrahlhöhe.

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