专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2660853A2 Projection optical system, exposure apparatus and exposure method 有权
公开(公告)号：EP2660853A2
公开(公告)日：2013-11-06
申请号：EP13174486.4
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B21/33 , G02B1/06
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

2. 发明授权

EP2660852B1 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：一种投影光学系统，曝光装置及曝光方法
公开(公告)号：EP2660852B1
公开(公告)日：2015-09-02
申请号：EP13174484.9
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

3. 发明公开

EP2660853A3 Projection optical system, exposure apparatus and exposure method 有权
标题翻译： Optisches Projektionssystem，Belichtungsvorrichtung und Belichtungsverfahren
公开(公告)号：EP2660853A3
公开(公告)日：2014-03-26
申请号：EP13174486.4
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B21/33 , G02B1/06
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸液）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）大致对称的发光表面（Lpb）。发光表面具有基本上与对应于折射光学元件的光进入表面（Lpa）的圆周的圆（40）的中心轴线（40a）重合的中心轴线（Lpba）。发光面的中心轴从光轴（AX）的两个轴向（Y轴）的一方偏心。

4. 发明公开

EP2660852A3 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：一种投影光学系统，曝光装置及曝光方法
公开(公告)号：EP2660852A3
公开(公告)日：2014-03-26
申请号：EP13174484.9
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

5. 发明公开

EP2660854A3 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：一种投影光学系统，曝光装置及曝光方法
公开(公告)号：EP2660854A3
公开(公告)日：2014-03-26
申请号：EP13174487.2
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

6. 发明公开

EP2660854A2 Projection optical system, exposure apparatus and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：EP2660854A2
公开(公告)日：2013-11-06
申请号：EP13174487.2
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没式投影光学系统减少了充满液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括发光表面（Lpb），该发光表面（Lpb）被成形为关于在第二平面上彼此垂直的两个轴向（XY轴）基本对称。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆形（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴从光轴（AX）在两个轴向（Y轴）中的一个轴向偏心。

7. 发明公开

EP3232270A3 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
公开(公告)号：EP3232270A3
公开(公告)日：2017-12-13
申请号：EP17156239.0
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： G03F7/20 , H01L21/027 , G02B13/24 , G02B17/08 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

8. 发明公开

EP3232270A2 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：EP3232270A2
公开(公告)日：2017-10-18
申请号：EP17156239.0
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： G03F7/20 , H01L21/027 , G02B13/24 , G02B17/08 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没式投影光学系统减少了充满液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括发光表面（Lpb），该发光表面（Lpb）被成形为关于在第二平面上彼此垂直的两个轴向（XY轴）基本对称。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆形（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴从光轴（AX）在两个轴向（Y轴）中的一个轴向偏心。

9. 发明授权

EP2660853B1 Projection optical system, exposure apparatus and exposure method 有权
公开(公告)号：EP2660853B1
公开(公告)日：2017-07-05
申请号：EP13174486.4
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： G03F7/20 , H01L21/027 , G02B13/24 , G02B17/08 , G02B21/33 , G02B1/06
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

10. 发明公开

EP2660852A2 Projection optical system, exposure apparatus and exposure method 有权
公开(公告)号：EP2660852A2
公开(公告)日：2013-11-06
申请号：EP13174484.9
申请日：2006-05-08
申请人： Nikon Corporation
发明人： Omura, Yasuhiro , Okada, Takaya , Nagasaka, Hiroyuki
IPC分类号： H01L21/027 , G02B13/24 , G02B17/08 , G03F7/20 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式