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1. 发明公开

EP2414884A1 IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE 审中-公开
标题翻译：图光学和投影曝光设备FOR MIKROLITOGRAFIE用图片看，这TYPE
公开(公告)号：EP2414884A1
公开(公告)日：2012-02-08
申请号：EP10711331.8
申请日：2010-03-11
申请人： Carl Zeiss SMT GmbH
发明人： MANN, Hans-Jürgen , ZELLNER, Johannes , DODOC, Aurelian , ZAHLTEN, Claus , MENKE, Christoph , PRETORIUS, Marco , ULRICH, Wilhelm , ROSTALSKI, Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： An imaging optics (36) has a plurality of mirrors (M1 to M6), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). A first mirror (M1) is arranged in the imaging beam path of imaging light after the object field (4) and a last mirror (M6) is arranged in the imaging beam path before the image field (8). In the unfolded imaging beam path, an impingement point of a chief ray (16), which belongs to a central object field point, on a useful face (23) of each of the mirrors (M1 to M6), which is configured to guide the imaging light (3), has a mirror spacing (Z
M ) from the image plane (9). The mirror spacing (Z
M1 ) of the first mirror (Ml) is greater than the mirror spacing (Z
M6 ) of the last mirror (M6). The mirror spacing (z
M3 ) of a fourth to last mirror (M3) is greater than the mirror spacing (z
M1 ) of the first mirror (M1). In a further aspect of the invention, a reflection surface of at least one of the mirrors (M1 to M6) of the imaging optics (36) is configured as a static free form surface which cannot be described by a rotationally symmetrical function. This differs from an aspherical surface best adapted thereto, which can be described by a rotationally symmetrical function in that a normal (FNB) to a free form surface element (20) of a used region (23) of the free form surface, which is configured to guide the imaging light (3), adopts an angle (α) of a maximum of 70 μrad with a normal (FN) to a corresponding asphere surface element (22) of the aspherical surface (21). With the two aspects, a handleable combination of small imaging errors, manageable production and good throuhput for the imaging light results.

2. 发明公开

EP2367041A1 Flat field schmidt telescope with extended field of view 审中-公开
标题翻译： Flach Schmidt-Feldteleskop mit erweitertem Sichtfeld
公开(公告)号：EP2367041A1
公开(公告)日：2011-09-21
申请号：EP11150132.6
申请日：2011-01-04
申请人： Raytheon Company
发明人： Cook, Lacy G.
IPC分类号： G02B17/08
CPC分类号： G02B17/0888
摘要： Various embodiments provide a flat field Schmidt-type telescope including a spherical primary mirror, an aspheric correcting plate spaced apart from the primary mirror, a detector disposed between the primary mirror and the corrector plate, and a field lens disposed between the primary mirror and the detector. The field lens is configured to reshape a curved field plane formed by the primary mirror into a flat field plane. A material of the field lens is selected to transmit in the infrared wavelength range (e.g., SWIR and/or MWIR) and is selected to have a desired refractive index so as to achieve a field of view (FOV) of the telescope greater than approximately 10 degrees.
摘要翻译：各种实施例提供一种平坦的施密特型望远镜，其包括球形初级反射镜，与主反射镜间隔开的非球面校正板，设置在主反射镜和校正板之间的检测器，以及设置在主反射镜和探测器。场透镜被配置为将由主反射镜形成的弯曲场平面重新形成平坦场平面。选择场透镜的材料在红外波长范围（例如，SWIR和/或MWIR）中传输，并且被选择为具有期望的折射率，以便实现望远镜的视场（FOV）大于大约 10度。

3. 发明授权

EP0785453B1 Equatorial mount 失效
标题翻译：赤道仪
公开(公告)号：EP0785453B1
公开(公告)日：2001-10-31
申请号：EP96120638.0
申请日：1993-12-08
申请人： Masunaga, Shuichi , Masunaga, Sumie
发明人： Masunaga, Shuichi , Masunaga, Sumie
IPC分类号： G02B23/16
CPC分类号： G02B17/0888 , G02B17/02 , G02B17/04 , G02B17/061 , G02B17/0808 , G02B23/00 , G02B23/16 , G02B23/165 , G02B23/18

4. 发明公开

EP0770224A1 HIGH SPEED OPTICAL SYSTEM 失效
标题翻译：高速光学系统
公开(公告)号：EP0770224A1
公开(公告)日：1997-05-02
申请号：EP95922012.0
申请日：1995-06-07
申请人： INDUSTRIAL RESEARCH LIMITED
发明人： BEACH, Allan, David
IPC分类号： G02B17
CPC分类号： G02B17/0888 , G02B17/0808 , G02B17/082 , G02B17/084 , G02B17/0852
摘要： The present invention provides a lens system and/or a method of imaging onto an imaging detector. The lens system and method are used in focusing substantially parallel incident light onto the said detector. The lens system comprises: (a) a concentric spherical Cassegrain-like system of two mirrors; (b) a concentric spherical focal reducer; (c) a transfer lens system which combines the concentricity of the Cassegrain-like system of two mirrors and of the contrentric spherical focal reducer by imaging the first centre of concentricity that is of the system of two mirrors onto the second centre of cencentricity, that is, of the focal reducer to thereby provide a single optically cencentric system which combines their advantages. Also present in the system are: (d) means to correct the sum of the spherical aberation of all the spherical mirros in the entire system and (e) an aperture stop.

5. 发明公开

EP2447753A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type 审中-公开
标题翻译：成像光学器件和投射曝光系统的用于微光刻与这样的成像光学器件
公开(公告)号：EP2447753A1
公开(公告)日：2012-05-02
申请号：EP11185707.4
申请日：2010-03-11
申请人： Carl Zeiss SMT GmbH
发明人： Mann, Dr. Hans-Jürgen , Zellner, Dr. Johannes , Dodoc, Dr. Aurelian , Zahlten, Claus , Menke, Dr. Christoph , Pretorius, Dr. Marco , Ulrich, Wilhelm , Rostalski, Dr. Hans-Jürgen
IPC分类号： G02B17/06 , G03F7/20 , G02B17/08
CPC分类号： G03F7/70233 , G02B17/0663 , G02B17/0888
摘要： An imaging optics (36) has a plurality of mirrors (M1 to M6), which image an object field (4) in an object plane (5) in an image field (8) in an image plane (9). A reflection surface of at least one of the mirrors (M1 to M6) of the imaging optics (36) is configured as a static free form surface which cannot be described by a rotationally symmetrical function. This differs from an aspherical surface best adapted thereto, which can be described by a rotationally symmetrical function in that a normal (FNB) to a free form surface element (20) of a used region (23) of the free form surface, which is configured to guide the imaging light (3), adopts an angle (α) of a maximum of 70 µrad with a normal (FN) to a corresponding asphere surface element (22) of the aspherical surface (21). A handleable combination of small imaging errors, manageable production and good throughput for the imaging light results.
摘要翻译：成像光学器件（36）的平面具有反射镜的多个（M1至M6），其中图像中的图像平面上的物体场（4）在对象（5）转换成的像场（8）（9）。所述成像光学器件（36）的反射镜中的至少一个的反射表面（M1至M6）被配置为静态自由曲面不能由旋转对称函数描述。这不同于在非球面最佳改编于此，其可以由旋转对称函数在做了正常（FNB）来描述的自由形式表面的使用区域（23）的自由曲面元件（20），所有这些是配置为引导所述成像光（3）采用在具有正常（FN）的最大70微弧度的角度（±）非球面表面（21）的对应非球面表面元件（22）。小成像误差，可管理生产和成像光效果良好的吞吐量的处理能力相结合。

6. 发明授权

EP0805995B1 COLLECTION SYSTEM FOR A PROJECTOR 失效
标题翻译：收集系统用于投影仪
公开(公告)号：EP0805995B1
公开(公告)日：2003-04-09
申请号：EP96938413.0
申请日：1996-11-29
申请人： Koninklijke Philips Electronics N.V.
发明人： SHIMIZU, Jeffrey, A.
IPC分类号： G02B19/00
CPC分类号： G02B17/0888 , G02B19/0028 , G02B19/0047 , G03B21/20

7. 发明公开

EP1178293A1 Spectrometer with double off-axis Schmidt telescope 有权
标题翻译： Spektrometer mit doppeltem ausseraxialen Schmidt-Teleskop
公开(公告)号：EP1178293A1
公开(公告)日：2002-02-06
申请号：EP00830399.2
申请日：2000-06-05
申请人： FINMECCANICA S.p.A.
发明人： Paolinetti, Riccardo , Pieri, Silvano , Romoli, Andrea
IPC分类号： G01J3/12
CPC分类号： G02B17/0888 , G01J3/02 , G01J3/0208 , G01J3/0218 , G01J3/0243 , G01J3/14 , G02B19/0028 , G02B19/0085
摘要： The spectrometer comprises, in combination: a slit (1) for the entry of a light beam; a collimator; a dispersion system (9); focusing means and a detector (13). The collimator comprises at least a first concave spherical mirror (3) and at least a first Schmidt plate (5) in an off-axis arrangement.
摘要翻译：光谱仪组合包括用于进入光束的狭缝（1）; 准直器分散系统（9）; 聚焦装置和检测器（13）。准直器包括至少第一凹球面镜（3）和至少第一施密特板（5），其处于离轴布置。

8. 发明授权

EP0601565B1 Binocular reflecting telescope 失效
标题翻译： Binokulares reflektierendes望远镜
公开(公告)号：EP0601565B1
公开(公告)日：1998-03-25
申请号：EP93119803.0
申请日：1993-12-08
申请人： Masunaga, Shuichi , Masunaga, Sumie
发明人： Masunaga, Shuichi , Masunaga, Sumie
IPC分类号： G02B23/00 , G02B17/06 , G02B23/16 , G02B23/18
CPC分类号： G02B17/0888 , G02B17/02 , G02B17/04 , G02B17/061 , G02B17/0808 , G02B23/00 , G02B23/16 , G02B23/165 , G02B23/18

9. 发明公开

EP0785453A1 Equatorial mount 失效
标题翻译： ÄquatorialeMontierung
公开(公告)号：EP0785453A1
公开(公告)日：1997-07-23
申请号：EP96120638.0
申请日：1993-12-08
申请人： Masunaga, Shuichi , Masunaga, Sumie
发明人： Masunaga, Shuichi , Masunaga, Sumie
IPC分类号： G02B23/16
CPC分类号： G02B17/0888 , G02B17/02 , G02B17/04 , G02B17/061 , G02B17/0808 , G02B23/00 , G02B23/16 , G02B23/165 , G02B23/18
摘要： An equatorial mount comprising a pedestal 1, a polar shaft 2 rotatably supported on said pedestal 1 so as to extend toward the celestial north pole, a support barrel 3a fixed to said polar shaft so as to extend therefrom at a right angle, a second shaft 3 rotatably supported in said support barrel 3a, a second support barrel 4a fixed to one end of said second shaft 3 so as to extend therefrom at a right angle, a third shaft 4 rotatably supported in said second support barrel 4a for supporting a telescope 10, 10' on its free end, a crank 5 mounted on the other end of said second shaft 3 so as to extend sideways, and counterweights 6, 7 coupled to said crank so as to be disposed on a line extending from a line 96 connecting a steady point 3X and the center of gravity 9a of the telescope 10, 10' so as to balance with the weight of the telescope.
摘要翻译：一种赤道安装座，包括基座1，可旋转地支撑在所述基座1上以朝向天体北极延伸的基座2，固定到所述极轴从而以直角延伸的支撑筒3a，第二轴 3，可旋转地支撑在所述支撑筒3a中，第二支撑筒4a，固定到所述第二轴3的一端以便从其直角延伸;第三轴4，可旋转地支撑在所述第二支撑筒4a中，用于支撑望远镜10 在其自由端上具有10'，安装在所述第二轴3的另一端以便侧向延伸的曲柄5，以及联接到所述曲柄的配重6,7，以便布置在从连接望远镜10,10'的稳定点3X和重心9a，以便与望远镜的重量平衡。

10. 发明公开

EP3183611A1 COMPACT SHORT FLAT-FIELD SCHMIDT OPTICS FOR MM-WAVE OPERATION 审中-公开
标题翻译：用于MM波运行的紧凑短平场SCHMIDT光学系统
公开(公告)号：EP3183611A1
公开(公告)日：2017-06-28
申请号：EP15734030.8
申请日：2015-06-26
申请人： Raytheon Company
发明人： COOK, Lacy, G.
IPC分类号： G02B17/08 , G01V8/00 , G01S13/89 , G02B23/06
CPC分类号： H04N5/33 , G01V8/005 , G02B17/08 , G02B17/0852 , G02B17/0888 , G02B23/06
摘要： Millimeter-wave optical imaging systems and methods. In one example, a mm-wave optical imaging system includes a mm-wave imaging detector located at a focal plane of the optical imaging system, an immersion lens directly coupled to the imaging detector and configured to focus the electromagnetic radiation onto the imaging detector, the immersion lens having a curved first surface and an opposing planar second surface, wherein the focal plane is located on the planar second surface and the imaging detector is directly coupled to the planar second surface, a positive power primary mirror configured to reflect the electromagnetic radiation towards the immersion lens, and a Schmidt aspheric corrector configured to receive and direct the electromagnetic radiation towards the primary mirror, wherein the system aperture stop is located on the Schmidt aspheric corrector.
摘要翻译：毫米波光学成像系统和方法。在一个示例中，毫米波光学成像系统包括位于光学成像系统的焦平面处的毫米波成像检测器，直接耦合到成像检测器并被配置为将电磁辐射聚焦到成像检测器上的浸没透镜，所述浸没式透镜具有弯曲的第一表面和相对的平面式第二表面，其中所述焦平面位于所述平面式第二表面上并且所述成像探测器直接耦合至所述平面式第二表面，正功率主镜被配置为反射所述电磁辐射以及施密特非球面校正器，所述施密特非球面校正器被配置成接收并引导朝向主镜的电磁辐射，其中系统孔径光阑位于施密特非球面校正器上。

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