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1. 发明公开

EP3208604A1 OPTICS FOR ANALYSIS OF MICROWELLS 有权
标题翻译：光学分析微孔
公开(公告)号：EP3208604A1
公开(公告)日：2017-08-23
申请号：EP16156735.9
申请日：2016-02-22
申请人： F. Hoffmann-La Roche AG , Roche Diagnostics GmbH
发明人： Wietzorrek, Joachim
IPC分类号： G01N21/64 , C12Q1/68 , G02B17/00 , G02B17/06 , G01N35/02 , G01N21/25
CPC分类号： G01N21/6456 , C12Q1/686 , G01N21/253 , G01N21/6452 , G01N2021/6463 , G01N2035/0418 , G01N2201/0245 , G01N2201/0631 , G02B17/008 , G02B17/0605 , G02B17/0812 , G02B27/0025 , H04N5/2256 , C12Q2563/107 , C12Q2565/607
摘要： The present invention is directed to an optical measurement device (10), preferably being part of a PCR system, which includes a sample holder (1) defining a sample plane, wherein the sample holder (1) is configured to arrange a sample carrier, such as a micowell plate, including an array of measurement positions in the sample plane, an illumination unit (2b) configured to illuminate the sample plane, a detector (4) and an optical imaging system (3) configured to image the sample plane including the array of measurement positions onto the detector (4), the optical imaging system (3) including two or more curved reflective elements (31, 32) adapted to image the sample plane onto the detector (4) with a magnification of between 2:1 and 1:2, preferably substantially 1, and the detector (4) being configured to take an image of all measurement positions of the array of measurement positions at a time. Preferably, the two or more reflective elements (31, 32) are arranged in an Offner-type configuration.
摘要翻译：本发明涉及一种光学测量装置（10），优选为PCR系统的一部分，其包括限定样本平面的样本保持器（1），其中样本保持器（1）被配置为布置样本载体，诸如微孔板，其包括样品平面中的测量位置阵列，配置成照射样品平面的照射单元（2b），配置成对样品平面成像的检测器（4）和光学成像系统（3）（4）上的测量位置阵列，所述光学成像系统（3）包括两个或更多个曲面反射元件（31,32），所述曲面反射元件适于以2：1的放大倍率将所述样品平面成像到所述检测器（4） 1和1：2，优选基本为1，并且检测器（4）被配置为一次拍摄测量位置阵列的所有测量位置的图像。优选地，两个或更多个反射元件（31,32）以Offner型构造布置。

2. 发明授权

EP1864177B1 SMALL ULTRA-HIGH NA CATADIOPTRIC OBJECTIVE AND SYSTEM 有权
标题翻译：窄折射物镜和制度，超高NA
公开(公告)号：EP1864177B1
公开(公告)日：2014-05-28
申请号：EP06739860.2
申请日：2006-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： CHUANG, Yung-Ho , SHAFER, David , ARMSTRONG, Joseph, J.
IPC分类号： G02B21/04 , G03F7/20 , G02B17/08 , G02B21/02
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/02 , G02B21/04 , G03F7/70225 , G03F7/70275 , G03F7/70341

3. 发明授权

EP2367043B1 Optical apparatus for magnifying a view of an object at a distance 有权
标题翻译：用于对象的视图的从远处的放大光学装置
公开(公告)号：EP2367043B1
公开(公告)日：2013-06-05
申请号：EP11155295.6
申请日：2011-02-22
申请人： Shirasaki, Masataka
发明人： Shirasaki, Masataka
IPC分类号： G02B25/00 , G02B17/00 , G02C7/08
CPC分类号： G02B17/002 , G02B17/0808 , G02B17/0812 , G02B17/086 , G02B25/007 , G02B27/10 , G02C7/08

4. 发明公开

EP2579087A1 Dispositif bispectral à deux miroirs, système correspondant 有权转让
标题翻译： Bispektralvorrichtung mit zwei Spiegeln und entsprechendes系统
公开(公告)号：EP2579087A1
公开(公告)日：2013-04-10
申请号：EP12187043.0
申请日：2012-10-02
申请人： SAGEM DEFENSE SECURITE
发明人： Cau, Françoise , Kling, Emmanuel
IPC分类号： G02B23/00 , G02B17/08 , G02B23/04 , G02B27/14 , F41G7/26 , F41G3/26 , G02B17/06 , G02B23/14
CPC分类号： F41G3/22 , G01S3/784 , G01S17/023 , G02B17/0808 , G02B17/0812 , G02B17/0896 , G02B23/04
摘要： L'invention concerne un dispositif adapté pour recevoir un flux lumineux incident comportant une première bande (λ1) de longueurs d'onde et une deuxième bande de longueurs d'onde, la première bande et la deuxième bande étant distinctes entre elles, comportant
- un miroir primaire (M1),
- un miroir secondaire (M2),
- une première lame (21) semi-réfléchissante dichroïque, et
- une deuxième lame (22) semi-réfléchissante dichroïque,
le miroir primaire (M1) étant adapté pour recevoir le flux lumineux incident et le réfléchir vers le miroir secondaire (M2) ;
le miroir secondaire (M2) étant adapté pour recevoir le flux lumineux à partir du miroir primaire (M1) et le réfléchir vers la première lame (21) semi-réfléchissante;

le dispositif comportant en outre
un système de double coudage de la deuxième bande de longueurs d'onde.
L'invention concerne également un système optique comportant un objectif bispectral et un dispositif précité.
摘要翻译：该装置具有用于双波长波长的系统和适于通过另一个二向色半反射叶片（22）向波长透镜（3）透射波长的另一波段（λ1）的二向色半反射叶片（21））并将前一波长波段反映到系统。后半半反射叶片适于从系统接收后一波长波段，并将波长的后一个波段朝向透镜反射，其中两个波长波段彼此不同。

5. 发明授权

EP1980890B1 CATA-DIOPTRIC IMAGING SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 无效
标题翻译： CATADIOPTISCHES图象系统，曝光装置以及元件制造工艺
公开(公告)号：EP1980890B1
公开(公告)日：2011-09-28
申请号：EP06835158.4
申请日：2006-12-25
申请人： Nikon Corporation
发明人： OMURA, Yasuhiro
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027 , G02B13/22
CPC分类号： G02B17/0812 , G02B13/22 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70308
摘要： A catadioptric imaging optical system of a high numerical aperture in which various aberrations are properly corrected without using a reflection surface having an aspherical shape of high order or a reciprocal optical element. The catadioptric imaging optical system forms an image of a first plane (R) on a second plane (W) and includes a first imaging system (G1) for forming a first intermediate image of the first plane based on light from the first plane, a second imaging system (G2) having two concave reflection mirrors (CM21, CM22) for forming a second intermediate image of the first plane based on light from the first intermediate image, and a third imaging system (G3) for forming a final image of the first plane on the second plane based on light from the second intermediate image. The two concave reflection mirrors have prolate spheroidal-shaped reflection surfaces.

6. 发明公开

EP2006739A2 Catadioptric projection objective 审中-公开
标题翻译：加泰罗尼亚
公开(公告)号：EP2006739A2
公开(公告)日：2008-12-24
申请号：EP08013084.2
申请日：2005-01-13
申请人： Carl Zeiss SMT AG
发明人： Shafer, David , Ulrich, Wilhelm , Dodoc, Aurelian , von Bünau, Rudolf , Mann, Hans-Jürgen , Epple, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: an optical axis, a plurality of lenses and at least one concave mirror having a continuous mirror surface having no hole in the area of a footprints of the radiation beam on the reflecting surfaces. The projection objective is an unobscured system having no pupil obscuration. Further, the projection objective has negative isotropic magnification such that an object field disposed on one side of the optical axis is imaged into an image field disposed on the opposite side of the optical axis without image flip, whereby no change of chirality occurs between the object field and the image field. This allows to use the same type of reticles also used for imaging with refractive projection objectives.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：光轴，多个透镜和至少一个具有不具有孔的连续镜面的凹面镜辐射束在反射表面上的脚印的面积。投影物镜是没有光瞳遮蔽的视野系统。此外，投影物镜具有负各向同性放大率，使得设置在光轴的一侧上的物场成像为设置在光轴的相对侧上的图像，而不进行图像翻转，由此在物体之间不发生手性改变字段和图像字段。这允许使用与用于具有折射投影物镜的成像相同类型的光罩。

7. 发明授权

EP1855137B1 Rear-projection system with obliquely incident light beam 有权
标题翻译：视觉保护系统错误的入射光束
公开(公告)号：EP1855137B1
公开(公告)日：2008-10-01
申请号：EP07075682.0
申请日：2000-07-12
申请人： NEC Display Solutions, Ltd.
发明人： Matsuo, Eiki
IPC分类号： G02B13/16 , G02B17/08
CPC分类号： G02B17/0852 , G02B13/16 , G02B13/18 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03B21/10 , G03B21/28

8. 发明公开

EP1855137A3 Rear-projection system with obliquely incident light beam 有权
标题翻译：倾斜入射光束的背投系统
公开(公告)号：EP1855137A3
公开(公告)日：2007-11-21
申请号：EP07075682.0
申请日：2000-07-12
申请人： NEC Display Solutions, Ltd.
发明人： Matsuo, Eiki
IPC分类号： G02B13/16 , G02B17/08
CPC分类号： G02B17/0852 , G02B13/16 , G02B13/18 , G02B17/08 , G02B17/0812 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03B21/10 , G03B21/28
摘要： Oblique projector, capable of rear-projection, wherein a luminous flux, from one conjugate surface (A), having a divergence angle of at least 10° sequentially passes through a first optical system (30) having a convergent action in the vicinity of its reference axis and a second optical system (31) having a divergent action in the vicinity of its reference axis, and images on another conjugate surface (B). A specific condition is given to the converging distance of each converging point at a luminous flux section, including a principal ray according to the passing position of the luminous flux through the first optical system (30) to thereby implement an oblique-incident optical system having a half angle of at least 60° and a comparatively simple structure irrespective of the type of optical element used.
摘要翻译：能够背投的倾斜投影仪，其中来自一个共轭表面（A）的具有至少10°发散角的光通量依次通过在其附近具有会聚作用的第一光学系统（30）以及在其参考轴附近具有发散作用的第二光学系统（31）和在另一个共轭表面（B）上的图像。根据通过第一光学系统（30）的光通量的通过位置，在包括主光线在内的光通量部分处的每个会聚点的会聚距离给予特定的条件，从而实现一种倾斜入射光学系统，与所用光学元件的类型无关，至少60°的半角和相对简单的结构。

9. 发明公开

EP1664885A2 CATADIOPTRIC IMAGING SYSTEM FOR BROAD BAND MICROSCOPY 有权
标题翻译：折反射PICTURE SYSTEM FOR宽带观察
公开(公告)号：EP1664885A2
公开(公告)日：2006-06-07
申请号：EP04786521.7
申请日：2004-08-18
申请人： KLA-Tencor Technologies Corporation
发明人： SHAFER, David, R. , CHUANG, Yung-Ho , ARMSTRONG, J., Joseph
IPC分类号： G02B17/00
CPC分类号： G02B21/04 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70225 , G03F7/70341
摘要： A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000nm, 157nm through infrared, and other ranges. The objective comprises a focusing lens group (311) comprising at least one focusing lens (304) configured to receive light, a field lens (305) oriented to receive focused light energy from said focusing lens group (311) and provide intermediate light energy, and a Mangin mirror arrangement (312) positioned to receive the intermediate light energy from the field lens (305) and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100mm, and a maximum corrected field size of approximately 0.15mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen (310) inspected.

10. 发明授权

EP1318425B1 Catadioptric optical system and exposure apparatus equipped with the same 有权
标题翻译：与这样的系统中的反射折射光学系统和曝光装置
公开(公告)号：EP1318425B1
公开(公告)日：2006-03-08
申请号：EP03000101.0
申请日：2000-07-13
申请人： NIKON CORPORATION
发明人： Suenaga, Yutaka , Miyashita, Tomohiro , Yamaguchi, Kotaro
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A catadioptric optical system comprising a first imaging optical system for forming an intermediate image of a first plane surface, a second imaging optical system for forming a final image of the first plane surface onto a second plane surface which is substantially parallel to the first plane surface, and a catadioptric type optical system disposed in the optical path from the first plane surface to the second plane surface and including a first reflecting surface which reflects light coming from through the first plane surface and a second reflecting surface for directing the light reflected by the first reflecting surface toward the second plane surface. At least one of the first and second reflecting surfaces is a concave reflecting surface. All of the optical elements of the catadioptric optical system are disposed on a single linear optical axis.

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