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1. 发明授权

EP1749230B1 CATADIOPTRIC IMAGING SYSTEM EMPLOYING IMMERSION LIQUID FOR USE IN BROAD BAND MICROSCOPY, AND CORRESPONDING METHOD 有权
标题翻译：与浸液折反射式图象系统FOR USE IN宽带观察及相应方法
公开(公告)号：EP1749230B1
公开(公告)日：2015-06-03
申请号：EP05731783.6
申请日：2005-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： ARMSTRONG, J., Joseph , CHUANG, Yung-Ho , SHAFER, David, R.
IPC分类号： G02B17/08 , G02B21/04 , G03F7/20 , G02B21/33
CPC分类号： G03F7/70341 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G02B21/04 , G02B21/33 , G03F7/70225

2. 发明公开

EP2639575A2 Systems and methods of advanced site-based nanotopography for wafer surface metrology 有权
标题翻译：系统和Verfahren zur动词dessertenen standortbasierten NanotopographiefürWaferoberflächenmetrologie
公开(公告)号：EP2639575A2
公开(公告)日：2013-09-18
申请号：EP13001240.4
申请日：2013-03-12
申请人： KLA-Tencor Technologies Corporation
发明人： Chen, Haiguang , Kamensky, Sergey , Sinha, Jaydeep , Vukkadala, Pradeep
IPC分类号： G01N21/95
CPC分类号： G06T7/0004 , G06T5/20 , G06T2207/20021 , G06T2207/30148
摘要： The invention generally relates to systems and methods for providing micro defect inspection capabilities for optical systems. Each given wafer image is filtered, treated and normalized prior to performing surface feature detection and quantification. A partitioning scheme is utilized to partition the wafer image into a plurality of measurement sites and metric values are calculated for each of the plurality of measurement sites. Furthermore, transformation steps may also be utilized to extract additional process relevant metric values for analysis purposes
摘要翻译：本发明一般涉及用于为光学系统提供微缺陷检测能力的系统和方法。在进行表面特征检测和定量之前，对每个给定的晶片图像进行过滤，处理和归一化。利用分割方案将晶片图像分割成多个测量位置，并且针对多个测量位置中的每一个计算度量值。此外，转换步骤也可以用于提取附加过程相关度量值用于分析目的

3. 发明授权

EP1481279B1 MULTI-DETECTOR MICROSCOPIC INSPECTION SYSTEM 失效
标题翻译：与多个探测器微观调查制度
公开(公告)号：EP1481279B1
公开(公告)日：2013-06-19
申请号：EP03715985.2
申请日：2003-02-05
申请人： KLA-Tencor Technologies Corporation
发明人： LANGE, Steven, R.
IPC分类号： G02B21/00 , G02B21/18 , G02B17/08 , G02B21/36 , G02B21/02 , G02B17/04 , G02B21/04
CPC分类号： G02B17/086 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/0016 , G02B21/025 , G02B21/04 , G02B21/18 , G02B21/367

4. 发明公开

EP2369695A3 Fiber amplifier based light source for semiconductor inspection 有权
标题翻译：光纤放大器光源用于测试半导体
公开(公告)号：EP2369695A3
公开(公告)日：2012-02-08
申请号：EP11001760.5
申请日：2005-08-16
申请人： KLA-Tencor Technologies Corporation
发明人： Chuang, Yung-Ho , Armstrong, J. Joseph
IPC分类号： H01S3/23 , H01S3/067 , G01N21/95 , G01N21/88
CPC分类号： H01S3/2383 , G01N21/8806 , G01N21/9501 , G02B6/02347 , G02B6/02366 , H01S3/005 , H01S3/0057 , H01S3/06708 , H01S3/06729 , H01S3/06741 , H01S3/06745 , H01S3/06754 , H01S3/06791 , H01S3/094007 , H01S3/094019 , H01S3/09415 , H01S3/1118
摘要： The invention relates to a laser illuminator for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system comprising a laser arrangement comprising a laser oscillator (1101) configured to produce coherent laser light; and a fiber laser amplifier (1102) arrangement comprising a plurality of fiber laser amplifiers (1102) connected in parallel and configured to amplify said coherent light produced by said laser oscillator (1101) and transmit said amplified coherent light toward a specimen for purposes of inspecting the specimen, wherein said laser arrangement employs mode-locking (1103) to selectively produce energy bursts having desired properties for inspecting the specimen in a selected imaging mode. According to the invention a method for inspecting a specimen, comprising: pumping a laser oscillator (1101) within a laser arrangement to generate coherent light; amplifying said coherent light using at least one fiber laser amplifier (1102); and transmitting amplified coherent light from the fiber laser amplifier (1102) toward the specimen for purposes of inspecting the specimen, wherein said laser arrangement employs mode-locking (1103) to selectively produce energy burst having desired properties for inspecting the specimen in a selected imaging mode and wherein said amplifying and transmitting occurs free of supercontinuum processing, is also provided.

5. 发明授权

EP1601931B1 METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 有权
标题翻译：过程识别覆盖误差BY散射
公开(公告)号：EP1601931B1
公开(公告)日：2011-04-06
申请号：EP04713795.5
申请日：2004-02-23
申请人： KLA-Tencor Technologies Corporation
发明人： MIEHER, Walter, D. , LEVY, Ady , GOLOVANEVSKY, Boris , FRIEDMANN, Michael , SMITH, Ian , ADEL, Michael , FABRIKANT, Anatoly , BEVIS, Christopher, F. , FIELDEN, John , BAREKET, Noah , GROSS, Kenneth P. , ZALICKI, Piotr , WACK, Dan , DECECCO, Paola , GHINOVKER, Mark , KNOLL, Noam , MOSHE, Baruch
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatuses: a reflectometric, a ellipsomertic, imaging, interferometric, and/ or scanning angle system.

6. 发明公开

EP2187251A3 Small ultra-high NA catadioptric objective using a Mangin mirror 失效
标题翻译：窄折反射透镜用超高NA和曼京镜
公开(公告)号：EP2187251A3
公开(公告)日：2010-08-25
申请号：EP10000348.2
申请日：2006-03-13
申请人： KLA-Tencor Technologies Corporation
发明人： Shafer, David , Armstrong, Joseph J. , Chuang, Yung-Ho
IPC分类号： G02B17/00 , G02B17/08
CPC分类号： G02B17/0856 , G02B17/008 , G02B17/0892 , G02B21/04
摘要： The invention relates to an objective for imaging a specimen comprising a lens group (401,501) comprising a focusing lens forming an intermediate image; a catadioptric arrangement (403,503) having an aspheric surface and comprising a mirror (409,509) and one Mangin mirror (411,511), imaging said intermediate image in a final image. The catadioptric arrangement (403,503) additionally comprises one lens (410,510) placed between the mirror (409,509) and the Mangin mirror (411,511).

7. 发明公开

EP1896811A2 MEASURING OVERLAY AND PROFILE ASYMMETRY USING SYMMETRIC AND ANTI-SYMMETRIC SCATTEROMETRY SIGNALS 审中-公开
标题翻译：叠加，PROFILE非对称性测量使用平衡和抗平衡扩频测量信号
公开(公告)号：EP1896811A2
公开(公告)日：2008-03-12
申请号：EP06772390.8
申请日：2006-06-06
申请人： KLA-Tencor Technologies Corporation
发明人： KANDEL, Daniel , GROSS, Ken , FRIEDMANN, Michael , FU, Jiyou , KRISHNAN, Shankar , GOLOVANEVSKY, Boris
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01N21/9501 , G01N21/956 , G03F7/70633
摘要： Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer (111) and analyzer (115). Another optional embodiment uses an analyzing prism (144) to simultaneously collect two polarization components of reflected light.

8. 发明公开

EP1869435A1 ALL-REFLECTIVE OPTICAL SYSTEMS FOR BROADBAND WAFER INSPECTION 审中-公开
标题翻译：全方位优化系统ZUR BREITBANDWAFERINSPEKTION
公开(公告)号：EP1869435A1
公开(公告)日：2007-12-26
申请号：EP06739004.7
申请日：2006-03-21
申请人： KLA-Tencor Technologies Corporation
发明人： LANGE, Steven, R.
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G02B17/061 , G01N21/9501 , G01N2021/9563 , G01N2201/0636
摘要： All-reflective optical systems for broadband wafer inspection are provided. One system configured to inspect a wafer includes an optical subsystem. All light-directing components of the optical subsystem are reflective optical components except for one or more refractive optical components, which are located only in substantially collimated space. The refractive optical component(s) may include, for example, a refractive beamsplitter element that can be used to separate illumination and collection pupils. The optical subsystem may also include one or more reflective optical components located in substantially collimated space. The optical subsystem is configured for inspection of the wafer across a waveband of greater than 20 nm. In some embodiments, the optical subsystem is configured for inspection of the wafer at wavelengths less than and greater than 200 nm.
摘要翻译：提供了用于宽带晶圆检测的全反射光学系统。配置为检查晶片的一个系统包括光学子系统。光学子系统的所有光指向部件都是反射光学部件，除了一个或多个折射光学部件，其仅位于基本准直的空间中。折射光学部件可以包括例如可用于分离照明和收集瞳孔的折射分束器元件。光学子系统还可以包括位于基本上准直的空间中的一个或多个反射光学部件。光学子系统被配置用于跨越大于20nm的波段检查晶片。在一些实施例中，光学子系统被配置为在小于或大于200nm的波长下检查晶片。

9. 发明公开

EP1864177A2 SMALL ULTRA-HIGH NA CATADIOPTRIC OBJECTIVE 有权
标题翻译：窄折射物镜和制度，超高NA
公开(公告)号：EP1864177A2
公开(公告)日：2007-12-12
申请号：EP06739860.2
申请日：2006-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： CHUANG, Yung-Ho , SHAFER, David , ARMSTRONG, Joseph, J.
IPC分类号： G02B21/00
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/02 , G02B21/04 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group comprising at least one focusing lens configured to receive light energy and form focused light energy. The focused light energy forms an intermediate image. The objective further comprises at least one field lens located in proximity to an intermediate image, and a catadioptric arrangement positioned to receive the intermediate light energy from the at and form controlled light energy. The catadioptric arrangement may comprise at least one Mangin element and can include a meniscus lens element.

10. 发明公开

EP1864175A2 SMALL ULTRA-HIGH NA CATADIOPTRIC OBJECTIVE USING ASPHERIC SURFACES 审中-公开
标题翻译：具有超HIGH NA窄折射物镜使用非球面
公开(公告)号：EP1864175A2
公开(公告)日：2007-12-12
申请号：EP06738149.1
申请日：2006-03-13
申请人： KLA-Tencor Technologies Corporation
发明人： SHAFER, David , ARMSTRONG, J. Joseph , CHUANG, Yung-Ho
IPC分类号： G02B17/00
CPC分类号： G02B17/0856 , G02B17/008 , G02B17/0892 , G02B21/04
摘要： A relatively high NA objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide, in certain instances, an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

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