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    • 7. 发明公开
    • METHODS FOR LOW-TEMPERATURE GRAPHENE PRECIPITATION ONTO GLASS, AND ASSOCIATED ARTICLES/DEVICES
    • 方法低温GRAPHENAUSFÄLLUNG在玻璃和相关产品/设备
    • EP2969945A1
    • 2016-01-20
    • EP14729493.8
    • 2014-03-13
    • Guardian Industries Corp.
    • VEERASAMY, Vijayen S.
    • C01B31/04C23C26/00
    • C01B31/0453B82Y30/00B82Y40/00C01B32/186C23C16/0281C23C16/26C23C26/00H01B13/0026Y10T29/49002Y10T156/10
    • Certain example embodiments relate to methods for large area graphene precipitation onto glass, and associated articles/devices. For example, coated articles including graphene-inclusive films on substrates, and/or methods of making the same, are provided. A metal-inclusive catalyst layer (e.g., of or including Ni and/or the like) is disposed on the substrate. The substrate with the catalyst layer thereon is exposed to a precursor gas and a strain-inducing gas at a temperature of no more than 350-600 degrees C for 10s or 100s of minutes. Graphene is formed and/or allowed to form both over and contacting the catalyst layer, and between the substrate and the catalyst layer, in making the coated article. The catalyst layer, together with graphene formed thereon, is removed, e.g., through excessive strain introduced into the catalyst layer as associated with the graphene formation. Products including such articles, and/or methods of making the same, also are contemplated.
    • 某些示例实施例涉及一种用于大面积的石墨烯沉淀法在玻璃上,以及相关的物品/装置。 例如,包含在基板上的石墨烯包容膜,和/或制备其的方法涂布的制品中,提供了。 的金属包层的催化剂(E. G.,或包括Ni和/或类似物)被设置在基底上。 其上具有催化剂层的基材在不超过350〜600℃下10秒或分钟的100秒的温度下暴露于前体气体和应变诱导气体。 石墨烯形成和/或允许形成两种以上并接触催化剂层,以及在基板和催化剂层,在使涂覆的制品之间。 催化剂层中,在其上的石墨烯形成在一起,被移除,E. G.,通过过度应变引入到催化剂层与所述石墨烯形成相关。 产品,包括搜索的文章,和/或制造相同的方法,因此被考虑。
    • 8. 发明公开
    • Laser-induced deposition on a seed layer
    • Laserinsduzierte Abscheidung au e einer Keimschicht
    • EP2703520A1
    • 2014-03-05
    • EP13182113.4
    • 2013-08-29
    • FEI COMPANY
    • Randolph, StevenStraw, Marcus
    • C23C16/02C23C16/04C23C16/18
    • C23C16/0281C23C16/047C23C16/18
    • A method of creating a layer of a target deposit-material, in a first target pattern, on a substrate surface. The substrate surface is placed in a vacuum and exposed to a first chemical vapor, having precursor molecules for a seed deposit-material, thereby forming a first substrate surface area that has adsorbed the precursor molecules. Then, a charged particle beam is applied to the first substrate surface area in a second target pattern, largely identical to the first target pattern thereby forming a seed layer in a third target pattern. The seed layer is exposed to a second chemical vapor, having target deposit-material precursor molecules, which are adsorbed onto the seed layer. Finally, a laser beam is applied to the seed layer and neighboring area, thereby forming a target deposit-material layer over and about the seed layer, where exposed to the laser beam.
    • 在基板表面上以第一目标图案形成目标沉积物层的方法。 将基板表面放置在真空中并暴露于具有用于种子沉积物材料的前体分子的第一化学蒸气,从而形成吸附了前体分子的第一基底表面区域。 然后,将带电粒子束以与第一目标图案大致相同的第二目标图案施加到第一基板表面区域,从而形成第三目标图案中的种子层。 种子层暴露于第二化学蒸气,其具有吸附在种子层上的目标沉积物前体分子。 最后,将激光束施加到种子层和相邻区域,从而在暴露于激光束的种子层上方和周围形成目标沉积物层。