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1. 发明授权

EP1131474B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS WITH INGOT MAGAZINE 有权
标题翻译： ELEKTRONENSTRAHLBEDAMPFUNGSANLAGE WITH斯特布·马格齐恩
公开(公告)号：EP1131474B1
公开(公告)日：2004-11-17
申请号：EP00950976.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , WILLEN, William, Seth
IPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a rotatable magazine (102) that supports multiple ingots (26) of the coating material (26) beneath the coating chamber (12). The magazine (102) is indexed to individually align multiple stacks of one or more ingots (26) with an aperture (56) to the coating chamber (12) for sequentially feeding the ingots (26) into the coating chamber (12) without interrupting deposition of the coating material (26).

2. 发明授权

EP1121475B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：设备，电力RAY PVD涂层
公开(公告)号：EP1121475B1
公开(公告)日：2009-04-08
申请号：EP00950977.9
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, SR. , MARICOCCHI, Antonio, Frank , WILLEN, William, Seth , WORTMAN, David, John , VIGUIE, Rudolfo , RIGNEY, David, Vincent
IPC分类号： C23C14/30 , C23C14/56 , C23C14/24
CPC分类号： C23C14/30 , C23C14/246 , C23C14/56 , C23C14/564

3. 发明授权

EP1117853B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：电动RAY PVD设备
公开(公告)号：EP1117853B1
公开(公告)日：2002-11-06
申请号：EP00953799.4
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , BETSCHER, Keith, H. , MARICOCCHI, Antonio, Frank , WORTMAN, David, John , BOWLIN, William, Allen , DILLON, Harold, Phillips, II
IPC分类号： C23C14/56 , C23C14/46
CPC分类号： C23C14/30 , C23C14/566
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) that includes loading, preheat and coating chambers (16, 18, 14, 12) which must operate at elevated temperatures and subatmospheric pressures. The apparatus (10) further includes a movable platform system (24) that facilitates the relative positioning of the loading and preheat chambers (16, 18, 14) of the apparatus (10). The platform system (24) supports at least one loading chamber (16, 18), and is movable relative to the preheat chamber (14) so as to bring the loading chamber (16, 18) into and out of alignment with the preheat chamber (14). The platform system (24) has an extremely low elevational profile, preferably not more than 2.5 cm, so as to essentially eliminate any risk to the operators of the EBPVD apparatus (10) during repositioning of the loading chamber (16, 18).

4. 发明公开

EP1131474A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS WITH INGOT MAGAZINE 有权
标题翻译：带有INGOT杂志的电子束物理气相沉积设备
公开(公告)号：EP1131474A1
公开(公告)日：2001-09-12
申请号：EP00950976.1
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , MARICOCCHI, Antonio, Frank , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , WILLEN, William, Seth
IPC分类号： C23C14/30 , C23C14/56
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a rotatable magazine (102) that supports multiple ingots (26) of the coating material (26) beneath the coating chamber (12). The magazine (102) is indexed to individually align multiple stacks of one or more ingots (26) with an aperture (56) to the coating chamber (12) for sequentially feeding the ingots (26) into the coating chamber (12) without interrupting deposition of the coating material (26).
摘要翻译：电子束物理气相沉积（EBPVD）装置（10）和使用该装置（10）在物品（20）上产生涂层（例如陶瓷热障涂层）的方法。 EBPVD设备（10）通常包括可在高温和低于大气压下操作的涂覆室（12）。电子束枪（30）将电子束（28）投射到涂覆室（12）中并且投射到室（12）内的涂层材料（26）上，使涂层材料（26）熔化并蒸发。物品（20）被支撑在涂布室（12）内，使得涂料（26）的蒸气沉积在物品（20）上。 EBPVD设备（10）的操作通过包括支撑涂覆室（12）下面的涂覆材料（26）的多个锭（26）的可旋转仓库（102）而得到增强。将料盒（102）转位以单独地将具有孔（56）的一个或多个锭块（26）的多个堆叠排列到涂覆室（12），以顺序地将锭块（26）供给到涂覆室（12）中而不中断沉积涂层材料（26）。

5. 发明授权

EP1123422B1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD 有权
标题翻译：电子束物理气相沉积设备和方法
公开(公告)号：EP1123422B1
公开(公告)日：2002-11-06
申请号：EP00950945.6
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , MARICOCCHI, Antonio, Frank , EVANS, John, Douglas, Sr. , BETSCHER, Keith, Humphries , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , LAGEMANN, Christopher, Lee , WILLEN, William, Seth
IPC分类号： C23C14/54 , C23C14/46 , H01J37/317 , H01J37/305 , H01J37/30
CPC分类号： C23C14/246 , C23C14/30 , C23C14/52 , C23C14/541 , C23C14/56 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus (10) at coating pressures above 0.010 mbar.
摘要翻译：电子束物理气相沉积（EBPVD）装置（10）和使用该装置（10）在物品（20）上产生涂层（例如陶瓷热障涂层）的方法。 EBPVD设备（10）通常包括可在高温和低于大气压下操作的涂覆室（12）。电子束枪（30）将电子束（28）投射到涂覆室（12）中并且投射到室（12）内的涂层材料（26）上，使涂层材料（26）熔化并蒸发。物品（20）被支撑在涂布室（12）内，使得涂料（26）的蒸气沉积在物品（20）上。 EBPVD设备（10）的操作通过包括或适应一种或多种机械和/或工艺改进（包括在涂覆压力高于0.010毫巴时操作设备（10）时必需或有益的那些）来增强。

6. 发明公开

EP1123422A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD 有权
标题翻译： DEVICE AND METHOD FOR ELECTRIC RAY PVD涂层
公开(公告)号：EP1123422A1
公开(公告)日：2001-08-16
申请号：EP00950945.6
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , MARICOCCHI, Antonio, Frank , EVANS, John, Douglas, Sr. , BETSCHER, Keith, Humphries , VIGUIE, Rudolfo , WORTMAN, David, John , RIGNEY, David, Vincent , LAGEMANN, Christopher, Lee , WILLEN, William, Seth
IPC分类号： C23C14/54 , C23C14/46 , H01J37/317 , H01J37/305 , H01J37/30
CPC分类号： C23C14/246 , C23C14/30 , C23C14/52 , C23C14/541 , C23C14/56 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus (10) at coating pressures above 0.010 mbar.

7. 发明公开

EP1121475A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：设备，电力RAY PVD涂层
公开(公告)号：EP1121475A1
公开(公告)日：2001-08-08
申请号：EP00950977.9
申请日：2000-08-03
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, SR. , MARICOCCHI, Antonio, Frank , WILLEN, William, Seth , WORTMAN, David, John , VIGUIE, Rudolfo , RIGNEY, David, Vincent
IPC分类号： C23C14/30 , C23C14/56 , C23C14/24
CPC分类号： C23C14/30 , C23C14/246 , C23C14/56 , C23C14/564
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) and a method for using the apparatus (10) to produce a coating (e.g., a ceramic thermal barrier coating) on an article (20). The EBPVD apparatus (10) generally includes a coating chamber (12) that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun (30) projects an electron beam (28) into the coating chamber (12) and onto a coating material (26) within the chamber (12), causing the coating material (26) to melt and evaporate. An article (20) is supported within the coating chamber (12) so that vapors of the coating material (26) deposit on the article (20). The operation of the EBPVD apparatus (10) is enhanced by the inclusion of a crucible (56) that supports the coating material (26) and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber (12).

8. 发明公开

EP1117853A1 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS 有权
标题翻译：电子束物理气相沉积设备
公开(公告)号：EP1117853A1
公开(公告)日：2001-07-25
申请号：EP00953799.4
申请日：2000-08-02
申请人： GENERAL ELECTRIC COMPANY
发明人： BRUCE, Robert, William , EVANS, John, Douglas, Sr. , BETSCHER, Keith, H. , MARICOCCHI, Antonio, Frank , WORTMAN, David, John , BOWLIN, William, Allen , DILLON, Harold, Phillips, II
IPC分类号： C23C14/56 , C23C14/46
CPC分类号： C23C14/30 , C23C14/566
摘要： An electron beam physical vapor deposition (EBPVD) apparatus (10) that includes loading, preheat and coating chambers (16, 18, 14, 12) which must operate at elevated temperatures and subatmospheric pressures. The apparatus (10) further includes a movable platform system (24) that facilitates the relative positioning of the loading and preheat chambers (16, 18, 14) of the apparatus (10). The platform system (24) supports at least one loading chamber (16, 18), and is movable relative to the preheat chamber (14) so as to bring the loading chamber (16, 18) into and out of alignment with the preheat chamber (14). The platform system (24) has an extremely low elevational profile, preferably not more than 2.5 cm, so as to essentially eliminate any risk to the operators of the EBPVD apparatus (10) during repositioning of the loading chamber (16, 18).
摘要翻译：电子束物理气相沉积（EBPVD）装置（10）包括必须在高温和低于大气压下操作的加载，预热和涂覆室（16,18,14,12）。装置（10）还包括便于装置（10）的装载室和预热室（16,18,14）的相对定位的可移动平台系统（24）。平台系统（24）支撑至少一个装载室（16,18），并且可相对于预热室（14）移动，以使装载室（16,18）进入和不与预热室对准（14）。平台系统（24）具有非常低的高度轮廓，优选不超过2.5厘米，从而基本上消除了重新定位装载室（16,18）期间EBPVD设备（10）的操作者的任何危险。

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