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1. 发明公开

EP3159910A1 ADAPTIVE CONTROL FOR CHARGED PARTICLE BEAM PROCESSING 审中-公开
标题翻译：带电粒子束加工的自适应控制
公开(公告)号：EP3159910A1
公开(公告)日：2017-04-26
申请号：EP15190491.9
申请日：2015-10-20
申请人： FEI Company
发明人： STRAW, Marcus , RUE, Chad , RANDOLPH, Steven , BOTMAN, Aurélien , CHANDLER, Clive , UTLAUT, Mark
IPC分类号： H01J37/302 , B28B1/00 , B33Y10/00 , C23C16/04
CPC分类号： C23C16/047 , B29C64/386 , B33Y10/00 , B33Y50/02 , H01J37/3026 , H01J37/317 , H01J2237/30455 , H01J2237/30483 , H01J2237/31749
摘要： An improved process control for a charged beam system is provided that allows the capability of accurately producing complex two and three dimensional structures from a computer generated model in a material deposition process. The process control actively monitors the material deposition process and makes corrective adjustments as necessary to produce a pattern or structure that is within an acceptable tolerance range with little or no user intervention. The process control includes a data base containing information directed to properties of a specific pattern or structure and uses an algorithm to instruct the beam system during the material deposition process. Feedback through various means such as image recognition, chamber pressure readings, and EDS signal can be used to instruct the system to make automatic system modifications, such as, beam and gas parameters, or other modifications to the pattern during a material deposition run.
摘要翻译：提供了一种改进的带电束系统的过程控制，该过程控制允许在材料沉积过程中从计算机生成的模型准确地产生复杂的二维和三维结构。过程控制主动监控材料沉积过程，并根据需要进行纠正性调整，以在很少或没有用户干预的情况下生成在可接受的公差范围内的图案或结构。过程控制包括数据库，该数据库包含针对特定模式或结构的属性的信息，并使用算法在材料沉积过程期间指示射束系统。通过图像识别，腔室压力读数和EDS信号等各种方式的反馈可用于指示系统在材料沉积运行期间对系统进行自动系统修改，例如光束和气体参数或对图案的其他修改。

2. 发明公开

EP2313231A2 METHOD AND APPARATUS FOR LASER MACHINING 审中-公开
标题翻译：方法和装置的激光加工
公开(公告)号：EP2313231A2
公开(公告)日：2011-04-27
申请号：EP09795202.2
申请日：2009-07-09
申请人： FEI COMPANY
发明人： STRAW, Marcus , SAMSAVAR, Amin , UTLAUT, Mark , TOTH, Milos
IPC分类号： B23K26/36 , B23K26/42 , G01N23/225 , G01N23/00
CPC分类号： B23K26/03 , B23K26/0622 , B23K26/0853 , B23K26/14 , B23K26/1423 , B23K26/1429 , H01J2237/2813
摘要： A charged particle beam and a laser beam are used together to micromachine a substrate. A first beam alters the state of a region of the work piece, and the second beam removes material whose state was altered. In one embodiment, an ion beam can create photon absorbing defects to lower the local ablation threshold, allowing the laser beam to remove material in a region defined by the ion beam. The combination of laser beam and charged particle beam allows the creation of features similar in size to the charged particle beam spot size, at milling rates greater than charged particle processing because of the increased energy provided by the laser beam.

3. 发明公开

EP2313230A2 METHOD AND APPARATUS FOR LASER MACHINING 审中-公开
标题翻译：用于激光加工的方法和设备
公开(公告)号：EP2313230A2
公开(公告)日：2011-04-27
申请号：EP09795135.4
申请日：2009-07-08
申请人： FEI Company
发明人： STRAW, Marcus , TOTH, Milos , UTLAUT, Mark , NARUM, David, H. , KNIPPELS, Guido , VEEN, Gerardus Nicolaas Anne van
IPC分类号： B23K26/36 , B23K26/42 , G01N23/225 , B23K26/12
CPC分类号： B23K26/03 , B23K26/0622 , B23K26/0853 , B23K26/14 , B23K26/1423 , B23K26/1429 , H01J2237/2813
摘要： Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. Endpointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
摘要翻译：激光加工通过使用终点或通过使用带电粒子束与激光一起来增强。终点检测使用来自衬底的诸如光子，电子，离子或中性粒子等排放物来确定激光器下方的材料何时发生变化或即将发生变化。从样品中移除的材料可以偏转以避免沉积到激光光学器件上。

4. 发明授权

EP1185857B1 METHOD AND APPARATUS FOR ENHANCING YIELD OF SECONDARY IONS 有权
标题翻译：方法和设备二次离子产量增加
公开(公告)号：EP1185857B1
公开(公告)日：2007-09-12
申请号：EP00949267.9
申请日：2000-07-05
申请人： Koninklijke Philips Electronics N.V. , FEI COMPANY
发明人： GERLACH, Robert, L. , CHRISTMAN, Locke , UTLAUT, Mark
IPC分类号： G01N23/225 , H01J37/252 , H01J37/256
CPC分类号： G01N23/225 , H01J37/256 , H01J2237/2527 , H01J2237/31744 , Y10S977/843 , Y10S977/881 , Y10S977/891 , Y10S977/895 , Y10S977/949
摘要： The sensitivity of a secondary ion mass spectrometer (SIMS) is increased by using water vapor to enhance the yield of positive secondary ions sputtered by a primary focused ion beam. Water vapor is injected through a needle that is positioned close to the sample and electrically biased to reduce interference with secondary ion collection field. The sensitivity is enhanced for metals in particular, which tend to be sputtered as positive ions.

5. 发明公开

EP1185857A2 METHOD AND APPARATUS FOR ENHANCING YIELD OF SECONDARY IONS 有权
标题翻译：方法和设备二次离子产量增加
公开(公告)号：EP1185857A2
公开(公告)日：2002-03-13
申请号：EP00949267.9
申请日：2000-07-05
申请人： Koninklijke Philips Electronics N.V. , FEI COMPANY
发明人： GERLACH, Robert, L. , CHRISTMAN, Locke , UTLAUT, Mark
IPC分类号： G01N23/225 , H01J37/252 , H01J37/256
CPC分类号： G01N23/225 , H01J37/256 , H01J2237/2527 , H01J2237/31744 , Y10S977/843 , Y10S977/881 , Y10S977/891 , Y10S977/895 , Y10S977/949
摘要： The sensitivity of a secondary ion mass spectrometer (SIMS) is increased by using water vapor to enhance the yield of positive secondary ions sputtered by a primary focused ion beam. Water vapor is injected through a needle that is positioned close to the sample and electrically biased to reduce interference with secondary ion collection field. The sensitivity is enhanced for metals in particular, which tend to be sputtered as positive ions.

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