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1. 发明公开

EP2365512A2 Inspection system by charged particle beam 审中-公开
标题翻译： Untersuchungsvorrichtung mit geladenen teilchenstrahlen
公开(公告)号：EP2365512A2
公开(公告)日：2011-09-14
申请号：EP11004165.4
申请日：2001-06-27
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Nakasuji, Mamoru , Noji, Nobuharu , Satake, Toru , Hatakeyama, Masahiro , Kimba, Toshifumi , Sobukawa, Hirosi , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Karimata, Tsutomu , Oowada, Shin , Saito, Mutsumi , Yamazaki, Yuichiro , Nagai, Takamitsu , Nagahama, Ichirota
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66 , H01L21/677
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束的检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子光学系统;以及用于检测由电子束投影的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳舞台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; ; 以及用于通过装载室将物体传送到舞台系统的装载器60。

2. 发明公开

EP2365512A3 Inspection system by charged particle beam 审中-公开
标题翻译：与带电粒子束的检查装置
公开(公告)号：EP2365512A3
公开(公告)日：2012-01-04
申请号：EP11004165.4
申请日：2001-06-27
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Nakasuji, Mamoru , Noji, Nobuharu , Satake, Toru , Hatakeyama, Masahiro , Kimba, Toshifumi , Sobukawa, Hirosi , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Karimata, Tsutomu , Oowada, Shin , Saito, Mutsumi , Yamazaki, Yuichiro , Nagai, Takamitsu , Nagahama, Ichirota
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66 , H01L21/677 , G01N23/225 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/67
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

3. 发明公开

EP1291900A3 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权
标题翻译：装置用于检测样品和方法的表面上的微细结构的用于制造半导体器件
公开(公告)号：EP1291900A3
公开(公告)日：2003-05-28
申请号：EP02020243.8
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/26 , G01N21/88 , G06T7/00 , G21K7/00
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：用于样品的表面上检测精细的几何形状，worin照射光束的检测装置照射针对在不同的环境气氛的differentFrom和二次辐射从样品发出放置由传感器检测到的样品，并且所述worin 传感器设置在在不同的环境的内部布置为处理来自所述传感器的检测信号的处理装置在对不同环境的外部布置，并且一个传输装置从所述传感器到所述处理装置发送检测信号。

4. 发明公开

EP2587515A1 Inspection system by charged particle beam and method of manufacturing devices using the system 审中-公开
标题翻译：通过带电粒子的束，并使用该系统的制造装置的方法的测试系统
公开(公告)号：EP2587515A1
公开(公告)日：2013-05-01
申请号：EP13000328.8
申请日：2001-06-27
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Nakasuji, Mamoru , Noji, Nobuharu , Satake, Tohru , Hatakeyama, Masahiro , Kimba, Toshifumi , Sobukawa, Hirosi , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Karimata, Tsutomu , Oowada, Shin , Saito, Mutsumi , Yamazaki, Yuichiro , Nagai, Takamitsu , Nagahama, Ichirota
IPC分类号： H01J37/063 , H01J37/29 , H01L21/027 , H01L21/66 , G03F1/86
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：在包括由电子束检查装置70具有为电子 - 光学系统，用于从在电子束源与一次电子束照射物体的电子光学器件，和用电子投射用于检测所述二次电子图像检测器光学系统; 用于保持和相对于电子光学系统中的物体移动的阶段系统50; 用于供给清洁气体至该物体，以防止接触到物体灰尘微环境腔室20; 用于容纳所述载物台装置的工作室31，工作腔室是可控制的，以便具有一个真空气氛; 至少两个装载室41，42中的微环境腔和工作腔，angepasst之间布置成unabhängig可控的，从而有一个真空气氛; ; 和用于传递环装载机60通过装载室中的对象到载置台系统。

5. 发明公开

EP2190002A1 Apparatus for detecting a fine geometry and device manufacturing method 有权
标题翻译： Verfahren zur Erfassung einer feinen Geometrie
公开(公告)号：EP2190002A1
公开(公告)日：2010-05-26
申请号：EP10001779.7
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且通过传感器检测从样品发出的二次辐射，并且其中传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，并且传输装置将检测信号从传感器传送到处理装置。

6. 发明授权

EP1291900B1 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权
标题翻译：装置用于检测样品和方法的表面上的微细结构的用于制造半导体器件
公开(公告)号：EP1291900B1
公开(公告)日：2011-01-12
申请号：EP02020243.8
申请日：2002-09-10
申请人： EBARA CORPORATION , KABUSHIKI KAISHA TOSHIBA
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/26 , G01N21/88 , G06T7/00 , G21K7/00
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446

7. 发明公开

EP1291900A2 Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device 有权
标题翻译：用于检测样品表面上的精细几何结构的设备以及制造半导体器件的方法
公开(公告)号：EP1291900A2
公开(公告)日：2003-03-12
申请号：EP02020243.8
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/26 , G01N21/88 , G06T7/00 , G21K7/00
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446
摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
摘要翻译：一种检测装置，用于检测样品表面上的精细几何形状，其中照射光束照射放置在不同于大气的不同环境中的样品，并且由样品发出的二次辐射由传感器检测，并且其中，传感器布置在不同环境的内部，处理来自传感器的检测信号的处理装置布置在不同环境的外部，并且传输装置将来自传感器的检测信号传输到处理装置。

8. 发明授权

EP2190002B1 Method for detecting a fine geometry 有权
标题翻译：用于检测精细几何的方法
公开(公告)号：EP2190002B1
公开(公告)日：2016-06-01
申请号：EP10001779.7
申请日：2002-09-10
申请人： EBARA CORPORATION , Kabushiki Kaisha Toshiba
发明人： Hatakeyama, Masahiro , Murakami, Takeshi , Satake, Tohru , Noji, Nobuharu , Nagahama, Ichirota , Yamazaki, Yuichiro
IPC分类号： H01J37/244 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , G01N21/9501 , G03F1/84 , H01J37/285 , H01J2237/2441 , H01J2237/2446

9. 发明公开

EP1936953A3 A tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 审中-公开
标题翻译：装置TDI检测，实现系统，在该装置的电子束装置，以及设施和制造方法，具有该电子束装置的半导体器件
公开(公告)号：EP1936953A3
公开(公告)日：2009-12-30
申请号：EP08007124.4
申请日：2002-05-14
申请人： EBARA CORPORATION
发明人： Hatakeyama, Masahiro , Satake, Tohru , Murakami, Takeshi , Watanabe, Kenji , Noji, Nobuharu
IPC分类号： H04N3/15 , H01J37/26 , G01N21/956 , H01R13/00 , H01J37/22 , H01J37/244 , H01R13/24 , H04N5/225
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

10. 发明公开

EP1914423A2 Trap apparatus and trap system 审中-公开
标题翻译： Falle und Fallensystem
公开(公告)号：EP1914423A2
公开(公告)日：2008-04-23
申请号：EP08002135.5
申请日：1999-01-21
申请人： EBARA CORPORATION
发明人： Nomura, Norihiko , Noji, Nobuharu
IPC分类号： F04B37/16 , F04B37/08
CPC分类号： F04B37/16 , B01D45/08 , F04B37/08
摘要： The present invention provides a trap apparatus which is capable of increasing the trapping efficiency while fulfilling a conductance allowed by a vacuum chamber in a depositing process or the like, for thereby increasing the service life of a vacuum pump and protecting a toxic substance removing device for increased operation reliability, and reducing equipment and running costs. The trap apparatus has a trap unit (18) disposed in a discharge passage (14) for discharging therethrough a gas from a vacuum chamber (10) with a vacuum pump (12) for trapping and removing a product in a discharged gas. The trap unit (18) has trap passages comprising an upstream passage portion (44) spreading outwardly from the center and a downstream passage portion (42) directed inwardly toward the center.
摘要翻译：本发明提供一种捕集装置，其能够在沉积过程等中实现真空室允许的导电性的同时提高捕集效率，从而提高真空泵的使用寿命并保护有毒物质去除装置提高运行可靠性，降低设备运行成本。捕集装置具有设置在排出通道（14）中的捕集单元（18），用于通过真空室（10）从真空室（10）中排出气体，用于在排放气体中捕获和去除产物。捕集器（18）具有捕集通道，该通道包括从中心向外展开的上游通道部分（44）和向内朝向中心的下游通道部分（42）。

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