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1. 发明公开

EP3062126A1 PULSE PROCESSING 审中-公开
标题翻译： IMPULSVERARBEITUNG
公开(公告)号：EP3062126A1
公开(公告)日：2016-08-31
申请号：EP16156848.0
申请日：2016-02-23
申请人： FEI Company
发明人： Kontaras, Nikolaos , Janssen, Bart , Kooijman, Cornelis , Antunes, Duarte
IPC分类号： G01T1/17
CPC分类号： H01J37/244 , G01T1/17 , H01J37/28 , H01J2237/22
摘要： The invention relates to a method for analyzing an analogue signal (fig. 3, 400) comprising randomly spaced events (301, 302), the event having an event height, the method comprising:
• Converting the signal to a series of samples S(t), with t the moment of sampling, thereby forming a sampled, discrete time signal,
• Detecting the presence of an event, the event detected at t = T,
• Estimating the event height using a number of samples preceding the event and a number of samples following S(T),
the method further comprising:
• Using a model (412, fig. 5) to estimate a noise contribution N(t) for t = (T-Δ 1 ) to t = (T+Δ 2 ), the noise contribution derived from samples S(t) with t ≤ (T-Δ 1 ) and/or samples S(t) with t ≥ (T+Δ 2 ), with Δ 1 and Δ 2 predetermined or preset time periods, Δ 1 having a value such that the event has a negligible contribution to samples taken before (T-Δ 1 ) and Δ 2 having a value such that the event has a negligible contribution to samples taken after (T+Δ 2 ),
• Estimating the event height E by integrating the series of samples from (T-Δ 1 ) to (T+Δ 2 ) minus the noise contribution for said samples, E = ∑ t = T − Δ 1 t = T + Δ 2 S t − ∑ t = T − Δ 1 t = T + Δ 2 N t = ∑ t = T − Δ 1 t = T + Δ 2 S t − N t .
In an important aspect of the invention, the sampled signal is subjected to a sparsification operation that causes said event to be temporally compressed.
This method is particularly useful for X-ray detectors, such as Silicon Drift Detectors, used in a SEM. By estimating the noise contribution to the signal, the step height is estimated with improved accuracy. The invention further describes several methods to be used as a model.
摘要翻译：本发明涉及一种用于分析包含随机间隔事件（301,302）的模拟信号（图3，400）的方法，所述事件具有事件高度，所述方法包括：将信号转换为一系列样本S （t），t为采样时刻，从而形成采样的离散时间信号，¢检测事件的存在，t = T时检测到的事件，¢使用前面的多个样本估计事件高度事件和S（T）之后的多个样本，该方法还包括：使用模型（412，图5）估计t =（T-1）到t =的噪声贡献N（t）（T +“2），从t‰（T - 1）和/或样本S（t）得到的样本S（t）的噪声贡献与t‰（T +”2），“1和”2 预定或预设的时间段，“1具有使得事件对（T-1）之前采取的样本的贡献可忽略不计的值，并且”2具有使得事件具有可忽略的公理对（T +“2）之后采样的样本的贡献，¢通过将来自（T-1）到（T + 2）的一系列样本减去所述样本的噪声贡献来估计事件高度E，E ='t = T'“1 t = T +”2 S t“t = T'”1 t = T +“2 N t ='t = T'”1 t = T + t'N t。在本发明的一个重要方面，采样信号经受使所述事件被时间压缩的稀疏化操作。该方法对于SEM中使用的X射线检测器，例如硅漂移探测器特别有用。通过估计对信号的噪声贡献，以提高的精度估计台阶高度。本发明还描述了用作模型的几种方法。

2. 发明公开

EP2509098A1 Method of protecting a radiation detector in a charged particle instrument 有权
标题翻译：保护带电粒子仪器中的辐射探测器的方法
公开(公告)号：EP2509098A1
公开(公告)日：2012-10-10
申请号：EP12163264.0
申请日：2012-04-05
申请人： FEI COMPANY
发明人： Otten, Max , Van Hoften, Gerald , Lof, Joeri
IPC分类号： H01J37/26 , H01J37/244 , H01J37/302
CPC分类号： H01J37/26 , H01J37/244 , H01J37/302 , H01J2237/0203 , H01J2237/043 , H01J2237/065 , H01J2237/22 , H01J2237/2441 , H01J2237/24455 , H01J2237/24507 , H01J2237/26 , H01J2237/262 , H01J2237/2802
摘要： The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.
摘要翻译：本发明涉及一种保护TEM中的直接电子探测器（151）的方法。本发明涉及在设置新的光束参数（例如聚光透镜（104），投影透镜（106）的激励和/或光束能量的改变）之前预测检测器上的电流密度。预测是使用光学模型或查找表进行的。当检测器的预测曝光量小于预定值时，进行期望的改变，否则产生警告消息并且延迟对设置的改变。

3. 发明公开

EP2396809A1 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：清洁离子源半导体处理系统
公开(公告)号：EP2396809A1
公开(公告)日：2011-12-21
申请号：EP09840155.7
申请日：2009-08-12
申请人： Advanced Technology Materials, Inc.
发明人： SWEENEY, Joseph, D. , YEDAVE, Sharad, N. , BYL, Oleg , KAIM, Robert , ELDRIDGE, David , FENG, Lin , BISHOP, Steven, E. , OLANDER, W., Karl , TANG, Ying
IPC分类号： H01L21/265
CPC分类号： H01J37/08 , C23C14/48 , C23C14/54 , C23C14/564 , H01J27/08 , H01J37/16 , H01J37/18 , H01J37/3171 , H01J37/32862 , H01J2237/0209 , H01J2237/022 , H01J2237/082 , H01J2237/22
摘要： Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

4. 发明公开

EP2002473A4 HOLE INSPECTION APPARATUS AND HOLE INSPECTION METHOD USING THE SAME 审中-公开
标题翻译：冲击测试装置和冲击测试程序
公开(公告)号：EP2002473A4
公开(公告)日：2011-08-03
申请号：EP07745797
申请日：2007-04-03
申请人： CEBT CO LTD
发明人： KIM HO SEOB
IPC分类号： H01L21/66
CPC分类号： H01J37/28 , G01R31/307 , H01J37/244 , H01J2237/0635 , H01J2237/22 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/281 , H01J2237/2817 , H01J2237/317 , H01L22/12 , H01L22/14

5. 发明公开

EP1261016A4 ELECTRON BEAM DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD USING THE DEVICE 审中-公开
标题翻译： ELECTRON DEVICE而那些使用的半导体模块的制造方法
公开(公告)号：EP1261016A4
公开(公告)日：2007-06-27
申请号：EP01980965
申请日：2001-11-02
申请人： EBARA CORP
发明人： NAKASUJI MAMORU , NOJI NOBUHARU , SATAKE TOHRU , HAMASHIMA MUNEKI , HATAKEYAMA MASAHIRO , WATANABE KENJI , KATO TAKAO , SOBUKAWA HIROSI , KARIMATA TSUTOMU , YOSHIKAWA SHOJI , KIMBA TOSHIFUMI , OOWADA SHIN , SAITO MUTSUMI
IPC分类号： G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/027 , H01L21/66
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam device for applying a primary electron beam onto a sample, and detecting a secondary electron beam produced from a sample surface by the irradiation to evaluate the sample surface, characterized in that the cathode of an electron gun for emitting primary electron beam have a plurality of emitters disposed at intervals on one circle centered on the optical axis of a primary electron optical system and emitting a primary electron beam, and the plurality of emitters are disposed so that points projected on a line parallel to the scanning direction of the primary electron beam are arranged at equal intervals.

6. 发明公开

EP1339100A1 INSPECTION METHOD AND APPARATUS USING ELECTRON BEAM, AND DEVICE PRODUCTION METHOD USING IT 审中-公开
标题翻译：研究的方法和设备具有电子这些组件使用的过程
公开(公告)号：EP1339100A1
公开(公告)日：2003-08-27
申请号：EP01980962.3
申请日：2001-11-02
申请人： Ebara Corporation
发明人： KIMBA, Toshifumi , SATAKE, Tohru , KARIMATA, Tsutomu , WATANABE, Kenji , NOJI, Nobuharu , MURAKAMI, Takeshi , HATAKEYAMA, Masahiro , NAKASUJI, Mamoru , SOBUKAWA, Hirosi , YOSHIKAWA, Shoji , OOWADA, Shin , SAITO, Mutsumi
IPC分类号： H01L21/66 , H01J37/29 , G01N23/225
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (Fig. 1) of the present invention performs the following steps of: carrying a substrate "S" to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

7. 发明公开

EP1304717A1 SHEET BEAM TEST APPARATUS 审中-公开
标题翻译： SHEET-BEAM试验装置
公开(公告)号：EP1304717A1
公开(公告)日：2003-04-23
申请号：EP01945626.8
申请日：2001-06-27
申请人： EBARA CORPORATION
发明人： NAKASUJI, Mamoru , NOJI, Nobuharu , SATAKE, Tohru , KIMBA, Toshifumi , SOBUKAWA, Hirosi , KARIMATA, Tsutomu , OOWADA, Shin , YOSHIKAWA, Shoji , SAITO, Mutsumi
IPC分类号： H01J37/29 , H01J37/244 , H01J37/20 , G01B15/00 , G01N23/225 , H01L21/30
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

8. 发明公开

EP3001338A1 INFORMATION PROCESSING DEVICE AND INFORMATION PROCESSING METHOD 有权
标题翻译：信息管理系统
公开(公告)号：EP3001338A1
公开(公告)日：2016-03-30
申请号：EP15185698.6
申请日：2015-09-17
申请人： JEOL Ltd.
发明人： SHIMAMURA, Daisuke
IPC分类号： G06F19/00
CPC分类号： H01J37/244 , G16H40/63 , H01J37/28 , H01J2237/22 , H01J2237/2801 , H01J2237/2806
摘要： An information processing device (10) includes a placement section (22) that places a result display area within a display screen (40) based on operation information, a setting section (24) that sets at least one data processing method designated by the user to the result display area, and a data processing section (20) that assigns measurement data to the result display area based on the operation information, performs data processing on the measurement data assigned to the result display area using the data processing method set to the result display area, and displays the data processing results within the result display area.
摘要翻译：信息处理装置（10）包括：基于操作信息将结果显示区域放置在显示画面（40）内的放置部（22）;设定部（24），其设定由用户指定的至少一个数据处理方法和结果显示区域的数据处理部（20），以及基于操作信息向测量结果显示区域分配测量数据的数据处理部（20），使用设定为结果显示区域的数据处理方法对分配给结果显示区域的测量数据进行数据处理结果显示区域，并在结果显示区域内显示数据处理结果。

9. 发明公开

EP2624040A3 An image-enhancing spotlight mode for digital microscopy 审中-公开
标题翻译：用于数字显微图像增强显示模式选择的图像区域
公开(公告)号：EP2624040A3
公开(公告)日：2013-08-21
申请号：EP13153161.8
申请日：2013-01-30
申请人： FEI Company
发明人： Bahm, Alan , Parker, N. William , Utlaut, Mark
IPC分类号： G02B21/36
CPC分类号： H04N5/23216 , G02B21/365 , H01J37/265 , H01J2237/22 , H01J2237/28 , H04N1/62
摘要： An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

10. 发明公开

EP2624040A2 An image-enhancing spotlight mode for digital microscopy 审中-公开
标题翻译：数字显微镜的图像增强聚光灯模式
公开(公告)号：EP2624040A2
公开(公告)日：2013-08-07
申请号：EP13153161.8
申请日：2013-01-30
申请人： FEI Company
发明人： Bahm, Alan , Parker, N. William , Utlaut, Mark
IPC分类号： G02B21/36
CPC分类号： H04N5/23216 , G02B21/365 , H01J37/265 , H01J2237/22 , H01J2237/28 , H04N1/62
摘要： An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.
摘要翻译：一种允许数字显微镜原始图像的观看者操纵显示器和/或显微镜以获得原始图像内的感兴趣区域的增强视图的设备。在一个优选实施例中，聚光灯模式将聚光灯区域的灰度色标匹配到聚光灯区域中存在的像素强度变化。然后可以将用于聚光灯模式的灰度等级标准推广到原始图像。在优选实施例中，聚光灯模式提供了一种容易的机制，用于允许用户命令从显示的图像中对选定的聚光灯区域进行重新成像。这种重新成像可以允许使用更适合聚光灯区域的成像参数选择。

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