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1. 发明授权

EP3365910B1 ELECTRON BEAM GENERATION FOR TRANSMISSION ELECTRON MICROSCOPE 有权
公开(公告)号：EP3365910B1
公开(公告)日：2019-09-04
申请号：EP16785438.9
申请日：2016-10-20
申请人： Technische Universiteit Eindhoven
发明人： LUITEN, Otger Jan
IPC分类号： H01J37/06 , H01J37/26 , H01J37/063 , H01J37/065 , H01J37/073 , H01J37/285

2. 发明授权

EP2264738B1 Electron gun used in a particle beam device 有权转让
标题翻译：电子枪用于粒子束装置
公开(公告)号：EP2264738B1
公开(公告)日：2017-12-06
申请号：EP09163176.2
申请日：2009-06-18
申请人： Carl Zeiss NTS Ltd. , York Probe Sources Limited
发明人： Hayn, Armin , El-Gomati, Mohamed
IPC分类号： H01J37/063
CPC分类号： H01J37/063 , H01J2237/06308 , H01J2237/06341 , H01J2237/06375
摘要： The invention relates to an electron gun (101, 201) used in a particle beam device, for example in an electron microscope. The electron gun (101, 201) has a relatively good brightness and may be operated under vacuum conditions which can be easily achieved (i.e., for example, at a residual pressure of about 10 -6 or 10 -7 mbar). The electron gun (101, 201) comprises an electron source (300) having an electron emission surface (306). Furthermore, the electron gun (101, 201) comprises a first electrode (301) configured to control a path of electrons emitted from the electron emission surface (306), a second electrode (304) which is configured to suppress emissions of electrons from a side surface of the electron source (300) and a third electrode (305) configured to accelerate electrons emitted from the electron source (300) to a final energy. A first voltage, a second voltage and a third voltage are adjusted to avoid any crossover of electrons emitted from the electron emission surface (306).

3. 发明授权

EP2911181B1 METHOD OF CONTROLLING AN ELECTRON GUN AND ELECTRON BEAM ADDITIVE MANUFACTURING MACHINE 有权转让
标题翻译：控制电子枪和电子束添加剂制造机的方法
公开(公告)号：EP2911181B1
公开(公告)日：2017-10-11
申请号：EP15154861.7
申请日：2015-02-12
申请人： Jeol Ltd.
发明人： Satoh, Takashi
IPC分类号： H01J37/305 , H01J37/063
CPC分类号： H01J3/08 , B22F3/1055 , B23K15/002 , B23K15/0026 , B23K15/0086 , B23K15/06 , B33Y30/00 , H01J3/02 , H01J3/024 , H01J3/027 , H01J37/063 , H01J37/305 , H01J2237/06308 , H01J2237/065 , H01J2237/3128 , Y02P10/295

4. 发明授权

EP2444990B1 Simplified particle emitter and method of operating thereof 有权
标题翻译：简化粒子发射器及其操作方法
公开(公告)号：EP2444990B1
公开(公告)日：2014-06-25
申请号：EP10187979.9
申请日：2010-10-19
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Lanio, Stefan , Frosien, Jürgen
IPC分类号： H01J37/063 , H01J37/06 , H01J37/08 , H01J37/09 , H01J37/16
CPC分类号： H01J37/063 , H01J37/06 , H01J37/08 , H01J37/09 , H01J37/16 , H01J2237/06375

5. 发明公开

EP2492949A3 Stable cold field emission electron source 有权
标题翻译： Stabile，kalte Feldemissionselektronenquelle
公开(公告)号：EP2492949A3
公开(公告)日：2014-01-22
申请号：EP12155682.3
申请日：2012-02-16
申请人： FEI Company
发明人： Liu, Kun , Schwind, Gregory A.
IPC分类号： H01J37/063 , H01J37/073
CPC分类号： H01J23/06 , H01J37/063 , H01J37/073 , H01J2237/022
摘要： A cold field emission (CFE) electron source for a focused electron beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), or scanning electron microscope (SEM) is disclosed which substantially improves both source emission stability and frequency noise characteristics. The source employs an emitter enclosure electrode (552) behind the CFE tip (503) which, in conjunction with the extractor electrode (508), defines a closed volume that can be thoroughly cleaned by electron impact desorption (EID) and radiative heating from a heated filament (530) located between the emitter enclosure electrode and extractor electrode.
摘要翻译：公开了用于聚焦电子束系统如透射电子显微镜（TEM），扫描透射电子显微镜（STEM）或扫描电子显微镜（SEM）的冷场发射（CFE）电子源，其基本上改善了源极发射稳定性和频率噪声特性。该源使用在CFE尖端（503）后面的发射器外壳电极（552），其与提取器电极（508）一起限定可以通过电子轰击解吸（EID）彻底清洁的封闭体积和来自位于发射体外壳电极和提取器电极之间的加热丝（530）。

6. 发明授权

EP1602121B1 APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS 有权转让
标题翻译：器具，用于产生SUB射线的各种
公开(公告)号：EP1602121B1
公开(公告)日：2012-06-27
申请号：EP04719157.2
申请日：2004-03-10
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： KRUIT, Pieter
IPC分类号： H01J37/317 , H01J37/063 , H01J3/07
CPC分类号： H01J3/07 , B82Y10/00 , B82Y40/00 , H01J37/063 , H01J37/12 , H01J37/153 , H01J37/3174 , H01J37/3177 , H01J2237/1205 , H01J2237/151 , H01J2237/1536 , H01J2237/26 , H01J2237/31774
摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

7. 发明公开

EP2405458A1 A multiple beam charged particle optical system 审中-公开
标题翻译： Optisches Systemfürmehrere Strahlen geladener Teilchen
公开(公告)号：EP2405458A1
公开(公告)日：2012-01-11
申请号：EP11183870.2
申请日：2007-07-13
申请人： Mapper Lithography IP B.V.
发明人： Kruit, Pieter , Zhang, Yanxia , Van Bruggen, Martijn J , Steenbrink, Stijn Willem Herman Karel
IPC分类号： H01J37/12 , H01J37/063
CPC分类号： H01J37/12 , H01J2237/0453 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/153 , H01J2237/26 , H01J2237/3175
摘要： The invention relates to a multiple beam charged particle optical system comprising a charged particle source for emitting a beam of charged particles, an aperture array element included between said source and a target. Each aperture of said aperture array element constitutes a current limiting aperture for a beamlet, said aperture array element being a single unit in which each aperture of said current limiting array is provided in communication with a separate hole in said aperture array element, wherein each hole has a larger diameter than said aperture in communication therewith, and each said hole has a diameter smaller than a thickness of said unit.
摘要翻译：本发明涉及一种多光束带电粒子光学系统，其包括用于发射带电粒子束的带电粒子源，包括在所述源极和靶之间的孔阵列元件。所述孔径阵列元件的每个孔口构成用于子束的限流孔，所述孔阵列元件是单个单元，其中所述限流阵列的每个孔口设置成与所述孔阵列元件中的单独的孔连通，其中每个孔具有比与其连通的所述孔径更大的直径，并且每个所述孔的直径小于所述单元的厚度。

8. 发明公开

EP2068339A1 ELECTRON SOURCE 审中-公开
标题翻译：电子源
公开(公告)号：EP2068339A1
公开(公告)日：2009-06-10
申请号：EP07828468.4
申请日：2007-09-26
申请人： Denki Kagaku Kogyo Kabushiki Kaisha
发明人： TERUI, Yoshinori , NAKAHARA, Fumihiro , SAKAWA, Seiichi
IPC分类号： H01J1/304 , H01J37/063 , H01J37/073
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3174 , H01J2237/06316 , H01J2237/065 , H01J2237/2817
摘要： An electron source showing little surplus current even at a time of high angular intensity operation is provided. An electron source comprising an electron emitting portion, a suppressor electrode and an extractor electrode, wherein the electron emitting portion is present at a leading edge of an end of a single crystal rod having a shape comprising a first truncated cone portion or a cone portion, and a second truncated cone portion continuing therefrom. It is preferably the electron source, wherein the single crystal rod has an oxide of a metal element selected from the group consisting of Ca, Sr, Ba, Sc, Y, La, Ti, Zr, Hf and lanthanoide elements as a diffusion source, and the single crystal rod is made of tungsten or molybden of orientation.
摘要翻译：提供了即使在高角度强度操作时也几乎没有剩余电流的电子源。 1，一种电子源，包括电子发射部分，抑制电极和抽取电极，其中电子发射部分存在于具有包括第一截头锥体部分或锥体部分的形状的单晶棒末端的前缘处，和从其延续的第二截头圆锥部分。优选电子源，其中单晶棒具有选自Ca，Sr，Ba，Sc，Y，La，Ti，Zr，Hf和镧系元素的金属元素的氧化物作为扩散源，单晶棒由<100>方向的钨或钼制成。

9. 发明授权

EP1587129B1 Improvements relating to charged particle beams 有权
标题翻译：有关带电粒子束的改进
公开(公告)号：EP1587129B1
公开(公告)日：2009-04-29
申请号：EP05009210.5
申请日：1998-09-24
申请人： THE WELDING INSTITUTE
发明人： Sanderson, Allan
IPC分类号： H01J37/063 , H01J37/065
CPC分类号： H01J37/075 , H01J37/063 , H01J37/065 , H01J37/301 , H01J2237/3104

10. 发明公开

EP1105914A1 PARTICLE-OPTICAL APPARATUS INCLUDING A PARTICLE SOURCE THAT CAN BE SWITCHED BETWEEN HIGH BRIGHTNESS AND LARGE BEAM CURRENT 有权
标题翻译：带之间的高明亮的大喷流中的颗粒切换KORPUSKULAROPTISCHES UNIT
公开(公告)号：EP1105914A1
公开(公告)日：2001-06-13
申请号：EP00949186.1
申请日：2000-06-15
申请人： Philips Electron Optics B.V.
发明人： TIEMEIJER, Peter, C.
IPC分类号： H01J37/063
CPC分类号： H01J37/063 , H01J2237/28
摘要： An electron source for, for example, an electron microscope cannot exhibit a high brightness and a large beam current at the same time, because the virtual emitter dimension is enlarged by Coulomb repulsion in the electron beam in the case of a large beam current, thus reducing the brightness. In a conventional electron source switching-over could take place from a high brightness to a large beam current by varying the dimension of a beam-limiting diaphragm; however, this is objectionable because the location of such a diaphragm is not readily accessible. In accordance with the invention said switching-over can take place by arranging two lenses (26, 28) in the source, which lenses parallelize. In the described circumstances the beam is either directly behind the emitter (4) (large current) or directly in front of the diaphragm aperture (32) (high brightness).

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