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2. 发明公开

EP1080522A4 RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE F 2? LASER 审中-公开
标题翻译：低带宽，高重复和较高的生产质量可靠的模块化F2激光
公开(公告)号：EP1080522A4
公开(公告)日：2005-10-05
申请号：EP99937141
申请日：1999-05-18
申请人： CYMER INC
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , DUFFEY THOMAS P , MELCHIOR JOHN T , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： C23C14/06 , C23C14/16 , C23C14/22 , C23C14/24 , G01J9/00 , G02B1/10 , G02B5/18 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/223 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/10
CPC分类号： G03F7/70025 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G01J9/00 , G02B1/105 , G02B5/1852 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/09713 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H03K3/57 , H03K17/80
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module.Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

3. 发明公开

EP1668313A4 GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE 有权转让
标题翻译： GASENTLADUNGS-MOPA-LASER-SPEKTRALANALYSE-MODUL
公开(公告)号：EP1668313A4
公开(公告)日：2010-11-24
申请号：EP04784260
申请日：2004-09-15
申请人： CYMER INC
发明人： RAO RAJASEKHAR M , MELCHIOR JOHN T , GLATZEL HOGER K
IPC分类号： G01B9/02 , G01J3/02 , G01J3/26 , G01J9/02 , H01S3/13
CPC分类号： G01J3/26 , G01J3/02 , G01J3/027 , G01J9/0246
摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Deltalambda= lambda0 [DOD DID2] / [8f -D0 ] where lambda0 is an assumed constant wavelength and D0 = (DOD - DID)2, and f is the focal length.
摘要翻译：一种用于测量具有输出激光束的高重复率气体放电激光器的带宽的波长计和方法，该输出激光束包括脉冲输出大于或等于15mJ /脉冲，亚纳米带宽调谐范围脉冲具有飞行器带宽精度和数十公开了用于以4000Hz及以上的脉冲重复频率测量基于脉冲到脉冲的带宽的飞行器带宽精度范围，其可以包括具有焦距的聚焦透镜; 产生干涉条纹图案的光学干涉仪; 位于聚焦透镜的焦距处的光学检测装置; 以及带宽计算器，从入射到光学检测装置的干涉条纹图案中的干涉条纹的位置计算带宽，限定DID和DOD，一对第一边缘边界之间的相应距离和一对第二边缘之间的相应距离干涉图案的轴上的干涉图案，并且根据公式Deltalambda =λ0[DOD <2> DID2] / <> [8f2-D2]>其中λ0是假定的恒定波长和D0 =（DOD-DID）2，f是焦距。

4. 发明公开

EP1668312A4 GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE 有权转让
标题翻译： GASENTLADUNGS-MOPA-LASER-SPEKTRALANALYSE-MODUL
公开(公告)号：EP1668312A4
公开(公告)日：2010-11-24
申请号：EP04784259
申请日：2004-09-15
申请人： CYMER INC
发明人： RAO RAJASEKHAR M , MELCHIOR JOHN T , GLATZEL HOGER K
IPC分类号： G01B9/02 , G01J3/02 , G01J3/26 , G01J9/02 , H01S3/13
CPC分类号： G01J3/26 , G01J3/02 , G01J3/027 , G01J9/0246

5. 发明公开

EP1252691A4 WAVEMETER FOR GAS DISCHARGE LASER 有权
标题翻译：波长计气体放LASER
公开(公告)号：EP1252691A4
公开(公告)日：2007-04-25
申请号：EP00984004
申请日：2000-12-06
申请人： CYMER INC
发明人： NEWMAN PETER C , MELCHIOR JOHN T , SANDSTROM RICHARD L
IPC分类号： H01S3/13 , G01J1/42 , G01J3/02 , G01J3/18 , G01J3/26 , G01J3/36 , G01J9/00 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225
CPC分类号： G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/0291 , G01J3/26 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70483 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/02 , H01S3/03 , H01S3/0811 , H01S3/0971 , H01S3/225
摘要： An optical configuration to illuminate an etalon (79) in a laser wavemeter (120) with a minimum level of light intensity. The system includes optical components to direct a portion of the laser output beam representing the entire cross section of the beam, through an etalon (79) positioned in an etalon housing, and onto a photodetector (180). A first lens (400) condenses the size of the beam sample, and a second lens (402) re-collimates the beam which then passes into the etalon housing, ensuring that all of the spatial components of the beam are adequately sampled. A diffractive diffusing element (406) is incorporated into the optical path. In a preferred embodiment, the diffractive diffusing element (406) is placed within the etalon housing. In another preferred embodiment, the diffusing element (406) is located up stream but outside the housing in the optical path.

6. 发明公开

EP1502334A4 HIGH POWER DEEP ULTRAVIOLET LASER WITH LONG LIFE OPTICS 有权转让
标题翻译：高功率激光至深紫外区域耐用OPTICS
公开(公告)号：EP1502334A4
公开(公告)日：2006-05-17
申请号：EP03719926
申请日：2003-04-23
申请人： CYMER INC
发明人： YAGER THOMAS A , PARTLO WILLIAM N , SANDSTROM RICHARD L , PAN XIAOJIANG , MELCHIOR JOHN T , ALGOTS JOHN M , BALL MATTHEW , ERSHOV ALEXANDER I , FLEUROV VLADIMIR , GILLESPIE WALTER D , GLATZEL HOLGER K , LUBLIN LEONARD , MARSH ELIZABETH , MORTON RICHARD D , UJAZDOWSKI RICHARD C , WARKENTIN DAVID J , WEBB R KYLE
IPC分类号： H01S3/225 , G03F7/20 , H01S3/034 , H01S3/23
CPC分类号： H01S3/225 , G03F7/7055 , H01S3/1024 , H01S3/2251 , H01S3/2258 , H01S3/2333
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

7. 发明公开

EP1386377A4 GAS DISCHARGE LASER WITH IMPROVED BEAM PATH 审中-公开
标题翻译：具有改进的束路径GAS放电激光器
公开(公告)号：EP1386377A4
公开(公告)日：2006-03-29
申请号：EP02769660
申请日：2002-04-17
申请人： CYMER INC
发明人： PARTLO WILLIAM N , SANDSTROM RICHARD L , GLATZEL HOLGER K , CYBULSKI RAY F , NEWMAN PETER C , HOWEY JAMES K , HULBURD WILLIAM , MELCHIOR JOHN T , IVASCHENKO ALEX P
IPC分类号： H01S3/22 , G03F7/20 , H01S3/00 , H01S3/034 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.

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