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    • 76. 发明公开
    • Power semiconductor mounting
    • Leistungshalbleitermontage
    • EP2782124A1
    • 2014-09-24
    • EP13159954.0
    • 2013-03-19
    • ABB Technology AG
    • Dugal, Franc
    • H01L21/60H01L23/488
    • H01L24/29H01L24/83H01L2224/29083H01L2224/32225H01L2224/32245H01L2224/8284H01L2224/83101H01L2224/83191H01L2224/83192H01L2224/83439H01L2224/83444H01L2224/83447H01L2224/83825H01L2224/8384H01L2924/157H01L2924/15787H01L2924/00014
    • The present invention provides a method for forming a joint (13) between a high power semiconductor (11) and a metallization of a substrate (12), comprising the steps of providing an electrically conducting preform (14), bonding the preform (14) onto the substrate (12), thereby forming a first bonding layer (15) between the substrate (12) and the preform (14), and bonding the high power semiconductor (11) onto the preform (14), thereby forming a second bonding layer (16) between the preform (14) and the high power semiconductor (11). The present invention further provides a method for mounting a high power semiconductor (11) onto a metallization of a substrate (12), comprising the step of forming a joint (13) according to the above method between the high power semiconductor (11) and the substrate (12). Still further, the invention provides a joint (13) between a high power semiconductor (11) and a metallization of a substrate (12), whereby the joint (13) is formed according to the above method as well as an assembly (10) comprising a high power semiconductor (11) and a substrate (12), whereby the substrate (12) comprises a metallization and the high power semiconductor (11) is mounted to the metallization with a joint (13) formed according to the above method.
    • 本发明提供了一种用于在大功率半导体(11)和基板(12)的金属化之间形成接头(13)的方法,包括以下步骤:提供导电预成型件(14),将预型件(14) 到基板(12)上,从而在基板(12)和预成型件(14)之间形成第一粘合层(15),并将大功率半导体(11)接合到预成型件(14)上,从而形成第二接合 在预成型件(14)和高功率半导体(11)之间的层(16)。 本发明还提供一种将大功率半导体(11)安装在基板(12)的金属化上的方法,其特征在于,包括在大功率半导体(11)与高功率半导体(11)之间形成根据上述方法的接头(13) 基板(12)。 此外,本发明提供了在大功率半导体(11)和基板(12)的金属化之间的接头(13),由此根据上述方法形成接头(13)以及组件(10) 包括高功率半导体(11)和衬底(12),由此衬底(12)包括金属化,并且高功率半导体(11)通过根据上述方法形成的接头(13)安装到金属化。