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    • 12. 发明公开
    • Micromachined film bulk acoustic resonator
    • MikrostrukturierterDünnfilmresonator
    • EP1548768A2
    • 2005-06-29
    • EP04078526.3
    • 2004-12-24
    • INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW
    • Tilmans, Hendrikus A.C.Pan, Wanling
    • H01G5/14
    • H03H9/172H01G5/18H01G5/38H03H3/02H03H3/04H03H9/02102H03H2003/022H03H2003/027H03H2009/241
    • The present invention provides an FBAR device with a means for internally varying a capacitance. The device comprises a bottom electrode and a top electrode, said bottom electrode and said top electrode have an overlap area A, the overlap being defined by the projection of the top electrode onto the bottom electrode in a direction substantially perpendicular to the plane of the bottom electrode. Furthermore, the device comprises a piezoelectric layer in between said bottom electrode and said top electrode and a dielectric layer in between the piezoelectric layer and the bottom electrode. The device also comprises means for reversibly varying an internal impedance of the device. The capacitance may be tuned by either varying the thickness of the dielectric layer, by changing the overlap between the bottom electrode and the top electrode or by shifting a different dielectric material between the electrodes.
    • 本发明提供一种具有内部改变电容的装置的FBAR装置。 该装置包括底部电极和顶部电极,所述底部电极和所述顶部电极具有重叠区域A,所述重叠由所述顶部电极在基本上垂直于所述底部平面的方向上投影到所述底部电极上而限定 电极。 此外,该器件包括位于所述底部电极和所述顶部电极之间的压电层和在压电层和底部电极之间的介电层。 该装置还包括用于可逆地改变装置的内部阻抗的装置。 可以通过改变电介质层的厚度,通过改变底部电极和顶部电极之间的重叠或通过在电极之间移动不同的介电材料来调节电容。
    • 16. 发明公开
    • COMPOSITE PIEZOELECTRIC SUBSTRATE MANUFACTURING METHOD
    • VERFAHREN ZUR HERSTELLUNG EINES PIEZOELEKTRISCHEN VERBUNDSUBSTRATS
    • EP2226934A1
    • 2010-09-08
    • EP08863984.4
    • 2008-10-23
    • Murata Manufacturing Co. Ltd.
    • KANDO, HajimeYOSHII, Yoshiharu
    • H03H3/08H01L41/09H01L41/18H01L41/22H03H3/02H03H9/17
    • H01L41/27G02F1/035H01L41/187H01L41/25H01L41/257H01L41/312H01L41/335H01L41/337H03H3/02H03H3/08H03H2003/021H03H2003/023H03H2003/027Y10T29/42Y10T29/49005Y10T29/49155
    • The present invention provides a method for manufacturing a composite piezoelectric substrate capable of forming an ultrathin piezoelectric film having a uniform thickness by efficiently using a piezoelectric material. a) A piezoelectric substrate (2) and a supporting substrate (10) are prepared, b) ions are implanted from a surface (2a) of the piezoelectric substrate (2) to form a defective layer (4) in a region having a predetermined depth from the surface (2a) of the piezoelectric substrate (2), c) impurities adhering to at least one of the surface (2a) of the piezoelectric substrate (2) in which the defective layer (4) is formed and a surface (10a) of the supporting substrate (1) are removed to directly expose the constituent atoms of the surfaces (2a and 10a) and activate them, d) the supporting substrate (10) is bonded to the surface (2a) of the piezoelectric substrate (2) to form a substrate bonded body (40), e) the substrate bonded body (40) is separated at the defective layer (4) formed in the piezoelectric substrate (2) so that a separation layer (3) between the surface (2a) of the piezoelectric substrate (2) and the defective layer (4) is separated from the piezoelectric substrate (2) and bonded to the supporting substrate (10) to form a composite piezoelectric substrate (30), and f) the surface (3a) of the separation layer (3) of the composite piezoelectric substrate (30) is smoothed.
    • 本发明提供一种能够通过有效地使用压电材料形成具有均匀厚度的超薄压电膜的复合压电基片的制造方法。 a)制备压电基板(2)和支撑基板(10),b)从压电基板(2)的表面(2a)注入离子,在具有预定的区域的区域中形成缺陷层(4) 从压电基板(2)的表面(2a)的深度,c)附着到其中形成有缺陷层(4)的压电基板(2)的表面(2a)中的至少一个的杂质和表面 去除支撑基板(1)的直径10a(10a)以直接暴露表面(2a和10a)的构成原子并激活它们,d)支撑基板(10)结合到压电基板的表面(2a) 2)形成基板接合体(40),e)在形成在压电基板(2)的缺陷层(4)处分离基板接合体(40),使得在表面 压电基板(2)的缺陷层(2a)和缺陷层(4)与压电基板(2)分离 结合到支撑基板(10)上以形成复合压电基板(30),以及f)复合压电基板(30)的分离层(3)的表面(3a)被平滑化。
    • 17. 发明公开
    • Micromachined film bulk acoustic resonator
    • 微机械薄膜体声波谐振器
    • EP1548935A1
    • 2005-06-29
    • EP03447311.6
    • 2003-12-24
    • INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW
    • Tilmans, HarriePan, Wanling
    • H03H9/02
    • H03H3/04H01G5/18H01G5/38H03H9/02102H03H9/172H03H2003/022H03H2003/027H03H2009/241
    • The present invention provides an FBAR device with a means for internally varying a capacitance. The device comprises a bottom electrode and a top electrode, said bottom electrode and said top electrode have an overlap area A, the overlap being defined by the projection of the top electrode onto the bottom electrode in a direction substantially perpendicular to the plane of the bottom electrode. Furthermore, the device comprises a piezoelectric layer in between said bottom electrode and said top electrode and a dielectric layer in between the piezoelectric layer and the bottom electrode. The capacitance may be tuned by either varying the thickness of the dielectric layer or by changing the overlap between the bottom electrode and the top electrode. The bottom electrode may be made from a different material than the top electrode to compensate for temperature drift.
    • 本发明提供了一种具有用于内部改变电容的装置的FBAR装置。 该装置包括底部电极和顶部电极,所述底部电极和所述顶部电极具有重叠区域A,所述重叠由顶部电极在底部电极上在基本垂直于底部平面的方向上的投影限定 电极。 此外,该装置包括位于所述底部电极和所述顶部电极之间的压电层以及位于压电层和底部电极之间的介电层。 可通过改变介电层的厚度或通过改变底部电极与顶部电极之间的重叠来调谐电容。 底部电极可以由与顶部电极不同的材料制成以补偿温度漂移。