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1. 发明专利

JP2013229052A Method for discontinuous type fluid flow rate switch control using pressure type flow rate control device 有权
标题翻译：使用压力类型流量控制装置的不连续流体流量开关控制方法
公开(公告)号：JP2013229052A
公开(公告)日：2013-11-07
申请号：JP2013144428
申请日：2013-07-10
申请人： Tohoku Univ , 国立大学法人東北大学 , Tokyo Electron Ltd , 東京エレクトロン株式会社 , Fujikin Inc , 株式会社フジキン
发明人： OMI TADAHIRO , NISHINO KOJI , DOI RYOSUKE , NAGASE MASAAKI , SUGITA KATSUYUKI , HIRATA KAORU , HIROSE TAKASHI , SHINOHARA TSUTOMU , IKEDA SHINICHI , YOSHIDA TOSHIHIDE , TANAKA HISASHI
IPC分类号： G05D7/00
CPC分类号： G05D7/0635 , G01F1/42 , G01F7/005 , Y10T137/0379
摘要： PROBLEM TO BE SOLVED: To maintain accuracy in flow rate control without increasing the number of switching steps in a pressure type flow rate control device such that switching flow rate ranges controls fluid flow rates.SOLUTION: The pressure type flow rate control device has fluid passages as two or more parallel fluid passages, which have orifices different in fluid flow rate property interposed therein, respectively. To control fluid flow rates in a first flow rate range, fluid in the first flow rate range is passed to an orifice in a fluid passage. To control fluid flow rates in the other plural flow rate ranges, fluid in the other respective flow rate ranges is passed to the orifice in the fluid passage to pass fluid in the first flow rate range through and orifices in fluid passages to pass fluid in the other respective flow rate ranges through. The flow rate ranges are set so that: the maximum flow rate of the first flow rate range is lower than the minimum flow rate of any other flow rate range; and the other respective flow rate ranges have different minimum flow rates and different maximum flow rates, respectively. Flow rate ranges included in neither the first flow rate range nor the other flow rate ranges are excluded from objects of flow rate control.
摘要翻译：要解决的问题：为了保持流量控制的精度，而不增加压力式流量控制装置中的切换步骤数，使得切换流量范围控制流体流量。解决方案：压力型流量控制装置具有流体通道作为两个或更多个平行的流体通道，其分别具有插入其中的流体流速特性的孔。为了在第一流量范围内控制流体流速，第一流量范围内的流体被传递到流体通道中的孔口。为了控制另外多个流量范围内的流体流量，在另一个流量范围内的流体被传递到流体通道中的孔口，以使第一流量范围内的流体通过流体通道中的孔并使流体在其他各个流量范围通过。流量范围设定为：第一流量范围的最大流量比任何其它流量范围的最小流量低; 其他各自的流量范围分别具有不同的最小流量和不同的最大流量。不包括第一流量范围和其他流量范围内的流量范围都不包括流量控制对象。

2. 发明专利

JP2013077710A Vaporizer 有权
标题翻译：蒸气器
公开(公告)号：JP2013077710A
公开(公告)日：2013-04-25
申请号：JP2011216885
申请日：2011-09-30
申请人： Tohoku Univ , 国立大学法人東北大学 , Fujikin Inc , 株式会社フジキン
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , NAGASE MASAAKI , YAMASHITA SATORU , HIDAKA ATSUSHI , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI , HIRAO YOSHIYUKI
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/4481
摘要： PROBLEM TO BE SOLVED: To provide a vaporizer that can stabilize behavior of pressure in the vaporizer.SOLUTION: A vaporizer includes: a chamber with an inlet and an outlet; a heater to heat the inside of the chamber; a partition structure 13 that is disposed in the chamber and divides a liquid material in the chamber into a plurality of sections; and fluid communication parts 20 that are disposed at lower parts of the partition structure 13 and permit a fluid communication between the individual sections divided by the partition structure 13. The partition structure has lattice-like, honeycomb-like, mesh-like, or pipe-like partitions.
摘要翻译：要解决的问题：提供可以稳定蒸发器中的压力行为的蒸发器。蒸发器包括：具有入口和出口的室; 用于加热室内部的加热器; 分隔结构13，其设置在所述室中并将所述室中的液体材料分成多个部分; 和流体连通部20，其配置在分隔结构体13的下部并允许由分隔结构13分隔的各个部分之间的流体连通。分隔结构具有格子状，蜂窝状，网状或管状像分区。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2007004644A Flow rate range variable flow control device 有权
标题翻译：流量范围可变流量控制装置
公开(公告)号：JP2007004644A
公开(公告)日：2007-01-11
申请号：JP2005185845
申请日：2005-06-27
申请人： Fujikin Inc , Tohoku Univ , Tokyo Electron Ltd , 国立大学法人東北大学 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SAITO MASAHITO , HINO SHOICHI , SHIMAZU TSUTOMU , MIURA KAZUYUKI , NISHINO KOJI , NAGASE MASAAKI , SUGITA KATSUYUKI , HIRATA KAORU , DOI RYOSUKE , HIROSE TAKASHI , SHINOHARA TSUTOMU , IKEDA SHINICHI , IMAI TOMOKAZU , YOSHIDA SHUNEI , TANAKA HISASHI
IPC分类号： G05D7/00 , G01F1/00 , G01F1/42 , G01F1/48 , G01F1/684 , G01F7/00
CPC分类号： G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
摘要： PROBLEM TO BE SOLVED: To miniaturize a flow control device and to reduce the facility cost by enabling accurate flow control of a fluid in a further wide flow area by use of one flow control device. SOLUTION: The pressure type flow control device is adapted to calculate the flow rate of a fluid passing through an orifice 8 using an orifice upstream pressure P 1 and/or an orifice downstream pressure P 2 as Qc=KP 1 (K is a proportionality factor) or Qc=KP 2 m (P 1 -P 2 ) n (K is a proportionality factor, and m and n are constant numbers). In this pressure type flow control device, a fluid passage between the downstream side of a control valve and a fluid supplying conduit is formed of at least two or more parallel fluid passages, and orifices differed in fluid flow characteristic are interposed in the parallel fluid passages, respectively. The fluid in a small flow area is distributed to one orifice in flow control of the fluid in the small flow area, and the fluid in a large flow area is switchingly distributed to the other orifice in flow control of the fluid in the large flow area. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过使用一个流量控制装置，能够在更宽的流动区域中对流体进行精确的流量控制，从而使流量控制装置小型化并降低设备成本。解决方案：压力型流量控制装置适于计算通过孔口上游压力P 1 和/或孔口下游压力P 2 作为Qc = KP 1 （K是比例因子）或Qc = KP 2 m（SP （K是比例因子，m和n是常数）。在该压力式流量控制装置中，控制阀的下游侧与流体供给管道之间的流体通路由至少两个以上的平行流体通路形成，并且流体流动特性不同的孔插入到并联流体通路，分别。小流量区域中的流体在小流量区域中的流体的流动控制中分配到一个孔口，并且在大流量区域中的流体的流量控制中，大流量区域中的流体被切换地分配到另一个孔口。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2006031498A Flow control method of clustered fluid and flow control apparatus for clustered fluid to be used therefor 有权
标题翻译：用于其所使用的聚集流体的流体流量和流量控制装置的流量控制方法
公开(公告)号：JP2006031498A
公开(公告)日：2006-02-02
申请号：JP2004210967
申请日：2004-07-20
申请人： Fujikin Inc , Tohoku Univ , Tokyo Electron Ltd , 国立大学法人東北大学 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SUGIYAMA KAZUHIKO , MIZUSAWA KANEYOSHI , TAKAHASHI EIJI , UNO TOMIO , NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI , NAGASE MASAAKI
IPC分类号： G05D7/06
摘要： PROBLEM TO BE SOLVED: To attain flow control with high precision of a clustered fluid such as a hydrogen fluoride gas to be supplied to a vacuum chamber or the like with respect to a flow rate range of 3-300SCCM by using a compression flow controller.
SOLUTION: The flow control method for the clustered fluid to use the compression flow controller which operates as Q=KP
1 (where K is a constant) a flow rate Q of a gas circulating through an orifice in a state that gas pressure P
1 on an orifice upstream side and gas pressure P
2 on an orifice downstream side are held equal to or below a critical pressure ratio of the gas. In the method, by warming the compression flow controller up to a temperature at 40°C or higher or adding a dilution gas to the clustered fluid to make it equal to or lower than partial pressure, association of molecules is dissociated and the clustered fluid put into a single molecular state is later circulated through the orifice.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过使用压缩方式相对于3-300SCCM的流量范围来获得要供应到真空室等的诸如氟化氢气体的聚集流体的高精度的流量控制流量控制器解决方案：聚集流体使用压缩流量控制器的流量控制方法，该压缩流量控制器作为Q = KP 1 （其中K是常数），循环通过孔口上游侧的气体压力P 1 的孔口和孔口下游侧的气体压力P 2 保持在等于或低于加油站。在该方法中，通过将压缩流量控制器加热至40℃以上的温度，或者向聚集流体添加稀释气体使其等于或低于分压，使分子的缔合解离，聚集的液体放置进入单一分子状态后来循环通过孔口。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2012033188A Variable flow rate range type flow control device 有权
标题翻译：可变流量范围流量控制装置
公开(公告)号：JP2012033188A
公开(公告)日：2012-02-16
申请号：JP2011219478
申请日：2011-10-03
申请人： Fujikin Inc , Tohoku Univ , Tokyo Electron Ltd , 国立大学法人東北大学 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , SIATO MASAHITO , HINO SHOICHI , SHIMAZU TSUYOSHI , MIURA KAZUYUKI , NISHINO KOJI , NAGASE MASAAKI , SUGITA KATSUYUKI , HIRATA KAORU , DOI RYOSUKE , HIROSE TAKASHI , SHINOHARA TSUTOMU , IKEDA SHINICHI , IMAI TOMOKAZU , YOSHIDA TOSHIHIDE , TANAKA HISASHI
IPC分类号： G05D7/06
摘要： PROBLEM TO BE SOLVED: To miniaturize a flow control device and reduce equipment cost by enabling a single flow control device to highly accurately control a wider flow rate range of fluids.SOLUTION: In a pressure type flow rate control device which calculates a flow rate of a fluid flowing through an orifice using either pressures at an upstream side of the orifice Pand at a downstream side of the orifice or at least the pressure at the upstream side of the orifice P, a fluid passage between the downstream side of a first valve 2 of the pressure type flow rate control device and a fluid supply pipe conduit 5 is bifurcated into two parallel fluid passages, one fluid passage 5c provided with a second valve 34 and a first orifice 8c and the other fluid passage 5g provided with no valve and a second orifice 8a. The one fluid passage 5c is controlled by an opening and closing of the second valve 34 and allows the fluid in a large flow rate range to flow to the first orifice 8c. The other fluid passage 5g is continuous all the time and allows the fluid in a small flow rate range to flow to the second orifice 8a.
摘要翻译：要解决的问题：通过使单个流量控制装置能够高精度地控制流体的更宽的流量范围，来使流量控制装置小型化并降低设备成本。解决方案：在压力式流量控制装置中，使用压力在孔口P 1 的上游侧计算流过孔口的流体的流量，以及在孔口的下游侧或孔口的上游侧的压力至少为压力类型的第一阀2的下游侧之间的流体通路流量控制装置和流体供给管道5分成两个平行的流体通道，一个流体通道5c设置有第二阀34和第一孔口8c，另一个流体通道5g没有设置阀和第二孔口8a。通过第二阀34的打开和关闭来控制一个流体通道5c，并允许大流量范围内的流体流向第一孔口8c。另一个流体通道5g始终是连续的，并允许流体在小流量范围内流到第二孔口8a。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2007057474A Gasket type orifice and pressure type flow control device using the same 有权
标题翻译：垫圈型式和压力型流量控制装置使用它
公开(公告)号：JP2007057474A
公开(公告)日：2007-03-08
申请号：JP2005245804
申请日：2005-08-26
申请人： Fujikin Inc , Tohoku Univ , 国立大学法人東北大学 , 株式会社フジキン
发明人： OMI TADAHIRO , NISHINO KOJI , DOI RYOSUKE , IKEDA SHINICHI , NAGASE MASAAKI , HIRATA KAORU , SUGITA KATSUYUKI , SHINOHARA TSUTOMU , HIROSE TAKASHI , IMAI TOMOKAZU , YOSHIDA SHUNEI , TANAKA HISASHI
IPC分类号： G01F1/42 , G05D7/06
CPC分类号： F16K27/003 , F16L55/02718 , G01F1/36 , G01F15/001 , G01F15/005 , G05D7/0635
摘要： PROBLEM TO BE SOLVED: To easily switch, without decomposition and fabrication of a pressure type flow control device, orifices in the device and to easily switch controlled flow rates. SOLUTION: The flow inlet of a valve body 23 of a control valve 2 and a mounting block 39 on the flow inlet, and the flow outlet of the valve body 23 and a mounting block 43 on the outlet are respectively connected dissociatably and airtightly. Thus, a flow passage is formed so that gas flows through the control valve 2. A gasket type orifice 38 of the device A is inserted to fit attachably and detachably between a gasket type orifice insertion hole 42c on the outlet of the valve body 23 and a gasket type orifice insertion hole 43b of the mounting block 43 on the outlet. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了容易地在不分解和制造压力式流量控制装置的情况下切换装置中的孔口并且容易地切换受控的流量。解决方案：控制阀2的阀体23和流入口上的安装块39的流入口以及阀体23的流出口和出口上的安装块43分别分别连接和气密性。因此，形成流路，使得气体流过控制阀2.装置A的垫圈型孔38被插入以可装卸地安装在阀体23的出口上的垫圈型孔插入孔42c和出口上的安装块43的垫圈型孔插入孔43b。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2014238391A 原料流体濃度検出器有权
标题翻译：原料流体浓度检测器
公开(公告)号：JP2014238391A
公开(公告)日：2014-12-18
申请号：JP2014096920
申请日：2014-05-08
申请人：国立大学法人徳島大学 , Univ Of Tokushima , 株式会社フジキン , Fujikin Inc
发明人： DEGUCHI YOSHIHIRO , NAGASE MASAAKI , DOI RYOSUKE , IKEDA NOBUKAZU , NISHINO KOJI , YAMAJI MICHIO , YAKUSHIJIN TADAYUKI
IPC分类号： G01N21/05 , G01N21/33
CPC分类号： G01N9/00 , G01N9/24 , G01N21/05 , G01N21/33 , G01N21/59 , G01N21/85 , G01N2201/08
摘要：【課題】有機原料流体の供給系等で使用する濃度計の構造の簡素化、小型化、製品コストの引下げを図り、光透過窓の透明度を一定に保って安定した濃度測定が出来ると共に、気密性能や耐パーティクル性を高めた濃度計を提供する。【解決手段】検出器本体2と、検出器本体2の上面または下面に設けた光発振部及び光検出部とからなる光分析式原料流体濃度検出器であって、検出器本体には上面及び下面に少なくとも一つの凹部を形成し、検出器本体の流体入口から凹部に連通する流体流路と、凹部間を連通する流体通路と、凹部から検出器本体の流体出口に連通する流体流路とを備えた構成とし、最も入口に近い凹部に光発振部を配置し、残りの凹部に光検出部を配置する構成とする。【選択図】図1
摘要翻译：要解决的问题：为了提供一种在具有简化的结构的有机原料流体的供给系统等中使用的浓度计的尺寸和制造成本的降低，能够在保持透光性的同时保持稳定的浓度测量窗口常数，并提高气密性能和颗粒阻力性能。解决方案：一种光分析型原料流体浓度检测器，包括检测器主体2和设置在检测器主体2的上表面或下表面上的光振动部分和光检测部分检测器主体在其上表面和下表面上具有至少一个凹部，包括：从所述检测器主体的流体入口与所述凹部连通的流体流动通道; 在所述凹部之间连通的流体通路; 以及从所述凹部与所述检测器主体的流体出口连通的流体流路。光振动部配置在最靠近入口的凹部，光检测器配置在残留凹部。

8. 发明专利

JP2013019003A Raw material gas supply device for semiconductor manufacturing device 有权
标题翻译：用于半导体制造设备的原材料气体供应装置
公开(公告)号：JP2013019003A
公开(公告)日：2013-01-31
申请号：JP2011151375
申请日：2011-07-08
申请人： Fujikin Inc , 株式会社フジキン
发明人： NAGASE MASAAKI , HIDAKA ATSUSHI , HIRATA KAORU , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： C23C16/448 , H01L21/31
CPC分类号： C23C16/448 , C23C16/4485 , C23C16/45561 , C23C16/52 , Y10T137/86485
摘要： PROBLEM TO BE SOLVED: To provide a raw material gas supply device that is configured to achieve the simplification and miniaturization of a structure, in which only a raw material gas which is vapor of a liquid raw material gas can be stably supplied to a process chamber while controlling a flow rate at high precision without using a carrier gas.SOLUTION: The raw material gas supply device is constituted in such a manner that the temperature of a source tank 5 storing a liquid raw material gas is held to a set value, further, the supply pressure of the raw material gas G1, which is vapor of the liquid raw material gas derived from an upper space part inside the source tank, to a process chamber 11 is controlled by an automatic pressure regulator 6, and the raw material gas G1 is supplied to the process chamber via an throttle part while holding the pressure of the raw material gas inside the secondary side gas flow passage of the automatic pressure regulator to a desired set pressure.
摘要翻译：解决的问题：提供一种原料气体供给装置，其被构造为实现仅能够将液态原料气体的蒸汽的原料气体稳定地供给到的结构的简化和小型化处理室，同时以高精度控制流量而不使用载气。解决方案：原料气体供给装置构成为使得储存液体原料气体的源罐5的温度保持在设定值，此外，原料气体G1的供给压力，将来自源槽内的上部空间部分的液体原料气体的蒸气通过自动压力调节器6控制到处理室11，原料气体G1经由节气门部分同时将原料气体的压力保持在自动压力调节器的次级侧气体流路内，达到期望的设定压力。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2010218571A Pressure type flow control device 有权
标题翻译：压力式流量控制装置
公开(公告)号：JP2010218571A
公开(公告)日：2010-09-30
申请号：JP2010118206
申请日：2010-05-24
申请人： Fujikin Inc , Tadahiro Omi , Tokyo Electron Ltd , 忠弘大見 , 東京エレクトロン株式会社 , 株式会社フジキン
发明人： OMI TADAHIRO , NISHINO KOJI , MATSUMOTO ATSUSHI , DOI RYOSUKE , IKEDA SHINICHI , SUGIYAMA KAZUHIKO
IPC分类号： G05D7/06 , G01F1/00 , G01F1/50 , G01L9/00
摘要： PROBLEM TO BE SOLVED: To achieve a pressure type flow control device, measuring fluid pressure and a fluid temperature of the same point in a fluid at the same time and controlling an orifice passing flow with high accuracy.
SOLUTION: In the pressure type flow control device, a pressure sensor and a temperature sensor are formed as one pressure-temperature sensor 10 in which a constant current power supply is connected between input terminals of a bridge circuit taking four resistors formed on pressure receiving surfaces as four sides to detect a fluid pressure by a voltage change between output terminals thereof, and a fluid temperature is detected by a voltage change between the input terminals. The pressure type flow control device includes: a gas temperature correction means for making correction corresponding to the fluid temperature T and converting it to a fluid pressure P
1 , and making temperature correction with a proportional constant K of a flow arithmetic expression corresponding to the fluid temperature T from the temperature converting means; and a comparator circuit for taking a difference between the correction operation flow Q
C and a preset flow Q
S as a control signal and outputting the same to a control valve.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了实现压力式流量控制装置，同时测量流体中的相同点的流体压力和流体温度，并以高精度控制孔流动流动。解决方案：在压力式流量控制装置中，形成压力传感器和温度传感器作为一个压力 - 温度传感器10，其中恒定电流电源连接在桥接电路的输入端之间，作为四个侧面的压力接收表面通过其输出端之间的电压变化来检测流体压力，并且通过输入端子之间的电压变化来检测流体温度。压力型流量控制装置包括：气体温度校正装置，用于根据流体温度T进行校正，并将其转换为流体压力P 1 ，并且使用比例常数K进行温度校正对应于来自温度转换装置的流体温度T的流动算术表达式; 以及用于将校正操作流程Q C 和预设流程Q SB SB之间的差作为控制信号的比较器电路，并将其输出到控制阀。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010190430A Piezoelectric element driven metal diaphragm control valve 有权
标题翻译：压电元件驱动金属膜片控制阀
公开(公告)号：JP2010190430A
公开(公告)日：2010-09-02
申请号：JP2010123009
申请日：2010-05-28
申请人： Fujikin Inc , 株式会社フジキン
发明人： MATSUMOTO ATSUSHI , HIRATA KAORU , DOI RYOSUKE , IKEDA SHINICHI , NISHINO KOJI
IPC分类号： F16K31/02 , F16K7/14 , H02N2/00
摘要： PROBLEM TO BE SOLVED: To perform accurate and stable flow rate control even under a high-temperature environment; and to adjust a compressive force applied on a metal diaphragm 8. SOLUTION: A piezoelectric element driven metal diaphragm control valve includes the metal diaphragm 8 brought into contact with and separated from a valve seat 7c via a diaphragm presser 12 through extension of a piezoelectric element 13. In the control valve, a disk spring mechanism 14 arranged between the piezoelectric element 13 and the metal diaphragm 8 is composed of a diaphragm presser holder 22 into which the diaphragm presser 12 is inserted at the lower end and in which a storage space 22b is formed with its upper part opened at the upper end, a plurality of disk springs 23 arranged in the storage space 22b of the diaphragm presser holder 22, a ball receiver 24 placed on the upper surface of the top disk spring 23 and positioned below the piezoelectric element 13 for transmitting the extension of the piezoelectric element 13 to the disk springs 23, and a spring-adjusting nut 25 screwed to the diaphragm presser holder 22 so as to adjust the repulsion force of the disk springs 23 and to prevent the ball receiver 24 and the disk springs 23 from dropping out. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使在高温环境下也能进行精确稳定的流量控制; 并调整施加在金属隔膜8上的压缩力。解决方案：压电元件驱动的金属隔膜控制阀包括通过隔膜压紧件12与阀座7c接触并与阀座7c分离的金属隔膜8，压电元件13.在控制阀中，布置在压电元件13和金属隔膜8之间的盘弹簧机构14由隔膜推压器保持器22构成，隔膜推压器12在下端插入其中，其中存储空间22b形成为其上部开口的上部，布置在隔膜压紧保持器22的存储空间22b中的多个盘簧23，放置在顶部盘簧23的上表面上的球接收器24，以及位于压电元件13的下方，用于将压电元件13的延伸部分传递到盘形弹簧23;以及弹簧调节螺母25，以调节盘簧23的排斥力并防止球接收器24和盘弹簧23脱落。版权所有（C）2010，JPO＆INPIT

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