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1. 发明授权

US5403696A Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol 失效
标题翻译：包含由叔丁基 - 甲基苯酚制成的碱溶性树脂的辐射敏感正性抗蚀剂组合物
公开(公告)号：US5403696A
公开(公告)日：1995-04-04
申请号：US047374
申请日：1993-04-19
申请人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi
发明人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi
IPC分类号： C08G8/24 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition comprising a 1,2-quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of an aldehyde with a phenol mixture containing m-cresol and at least one selected from the group consisting of 2-tert.-butyl-4-methylphenol and 2-tert.-butyl-6-methylphenol, which has well balanced properties.
摘要翻译：包含1,2-醌二叠氮化合物和碱溶性树脂的正型抗蚀剂组合物，其包含通过醛与含有间甲酚的酚混合物和选自下组中的至少一种的缩合反应获得的树脂（I）由2-叔丁基-4-甲基苯酚和2-叔丁基-6-甲基苯酚组成，其具有良好的平衡性能。

2. 发明授权

US5407780A Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde 失效
标题翻译：包含由间甲酚，2-叔丁基-5-甲基苯酚和甲醛制成的碱溶性树脂的辐射敏感正性抗蚀剂组合物
公开(公告)号：US5407780A
公开(公告)日：1995-04-18
申请号：US240817
申请日：1994-05-11
申请人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi , Hiroshi Moriuma
发明人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi , Hiroshi Moriuma
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0236
摘要： A positive resist composition containing a 1,2-quinone diazide compound and an alkali-soluble resin which constitutes a resin (I) obtainable through a condensation reaction of a phenol mixture containing m-cresol and 2-tert.-butyl-5-methylphenol with an aldehyde., which has well balanced sensitivity, resolution and heat resistance properties.
摘要翻译：含有1,2-醌二叠氮化合物和碱溶性树脂的正性抗蚀剂组合物，其构成通过含有间甲酚和2-叔丁基-5-甲基苯酚的酚混合物的缩合反应得到的树脂（I）具有良好平衡的灵敏度，分辨率和耐热性能的醛。

3. 发明授权

US5736292A Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
标题翻译：包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5736292A
公开(公告)日：1998-04-07
申请号：US490511
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

4. 发明授权

US5792585A Radiation-sensitive positive resist composition 失效
标题翻译：辐射敏感正光刻胶组合物
公开(公告)号：US5792585A
公开(公告)日：1998-08-11
申请号：US217892
申请日：1994-03-25
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

5. 发明授权

US5783355A Radiation-sensitive positive resist composition 失效
公开(公告)号：US5783355A
公开(公告)日：1998-07-21
申请号：US490512
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

6. 发明授权

US5283155A Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative 失效
标题翻译：包含碱溶性树脂和羟基黄烷衍生物的醌二叠氮磺酸酯的正型抗蚀剂组合物
公开(公告)号：US5283155A
公开(公告)日：1994-02-01
申请号：US688514
申请日：1991-06-11
申请人： Yasunori Uetani , Hirotoshi Nakanishi , Yasunori Doi
发明人： Yasunori Uetani , Hirotoshi Nakanishi , Yasunori Doi
IPC分类号： G03F7/022 , G03F7/023 , G03F7/32
CPC分类号： G03F7/022
摘要： A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR1## wherein Y.sub.1, Y.sub.2, Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are independently a hydrogen atom, a hydroxyl group, a C.sub.1 -C.sub.4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group, and at least two of Z.sub.1 to Z.sub.7 are hydroxyl groups, and R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently a hydrogen atom, a C.sub.1 -C.sub.10 alkyl group, a C.sub.1 -C.sub.4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high .gamma.-value.
摘要翻译： PCT No.PCT / JP91 / 00013 Sec。 371日期1991年6月11日 102（e）1991年6月11日PCT 1991年1月11日PCT PCT。公开号WO92 / 12205 日本1992年7月23日。一种正型抗蚀剂组合物，其包含碱溶性树脂和作为敏化剂的下式的酚化合物的醌二叠氮磺酸酯：（* CHEMICAL STRUCTURE *）（I）其中Y1， Y2，Z1，Z2，Z3，Z4，Z5，Z6和Z7独立地为氢原子，羟基，可被卤素原子取代的C1-C4烷基，条件是Y 1和Y 2中的至少一个为羟基，Z1至Z7中的至少两个为羟基，R1，R2，R3，R4，R5和R6独立地为氢原子，C1-C10烷基，C1-C4烯基，环烷基基团或芳基，该组成具有高（γ）值。

7. 发明授权

US5456996A Radiation-sensitive positive resist composition 失效
标题翻译：辐射敏感正光刻胶组合物
公开(公告)号：US5456996A
公开(公告)日：1995-10-10
申请号：US224563
申请日：1994-04-07
申请人： Haruyoshi Ozaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
发明人： Haruyoshi Ozaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0226
摘要： A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a dissolution rate in a developer having a molecular weight of not more than 550 and represented by the general formula: ##STR1## wherein a, b, c, d, e, and f are the same or different and a number of 0-3, provided that d+f is not less than 1, and provided that if b, d and f are 1, then at least one of a, c, and e is not 0; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or aryl group, wherein an amount of said 1,2-quinone diazide compound is from 5 to 100% by weight and an amount of said polyphenol compound is from 4 to 40% by weight based on the total weight of said alkali-soluble resin, wherein the resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
摘要翻译：一种正性抗蚀剂组合物，其包含光敏1,2-醌二叠氮化合物，碱溶性树脂以结合成分和多酚化合物以控制分子量不大于550的显影剂中的溶解速率，并表示为其通式如下：其中a，b，c，d，e和f相同或不同，数为0-3，条件是d + f不小于1，条件是如果b ，d和f为1，则a，c和e中的至少一个不为0; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其中所述1,2-醌二叠氮化合物的量为5〜100重量％，所述多酚化合物的量为4〜40体积％基于所述碱溶性树脂的总重量，其中抗蚀剂组合物对辐射敏感，并且具有良好的灵敏度平衡，分辨能力和耐热性。

8. 发明授权

US5198323A Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component 失效
标题翻译：含有碱可溶性树脂，1,2-二酮双环化合物和抗高温组分的耐腐蚀组合物
公开(公告)号：US5198323A
公开(公告)日：1993-03-30
申请号：US694372
申请日：1991-04-30
申请人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
发明人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
IPC分类号： G03F7/022 , G03F7/09
CPC分类号： G03F7/0226 , G03F7/091 , Y10S430/116 , Y10S430/121 , Y10S430/123
摘要： A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): ##STR1## wherein Z is an oxygen or sulfur atom or a group of the formula: >N--R.sub.4 in which R.sub.4 is a hydrogen atom or an alkyl group; R.sub.1, R.sub.2 and R.sub.3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: --OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: ##STR2## --COOR or --CONHR' in R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.

9. 发明授权

US5188920A Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound 失效
标题翻译：含有1,2-二酮双酯化合物的阳离子组合物，碱溶性树脂和聚羟基苯酚添加剂化合物
公开(公告)号：US5188920A
公开(公告)日：1993-02-23
申请号：US712729
申请日：1991-06-10
申请人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
发明人： Hiroshi Moriuma , Haruyoshi Osaki , Takeshi Hioki , Yasunori Uetani
IPC分类号： G03F7/039 , C07C39/15 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226 , C07C39/15
摘要： A positive resist composition comprising a radiation-sensitive component and an alkali-soluble resin and a phenol compound of the formula: ##STR1## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.

10. 发明授权

US5080997A Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture 失效
标题翻译：通过混合二氢化亚油酸酯和酚醛树脂溶液的凝聚产物，不会从凝乳混合物分离凝结产物来制备阳性组合物的方法
公开(公告)号：US5080997A
公开(公告)日：1992-01-14
申请号：US446153
申请日：1989-12-05
申请人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
发明人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
IPC分类号： C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023
CPC分类号： G03F7/023
摘要： A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

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