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    • 1. 发明授权
    • Radiation-sensitive positive resist composition
    • 辐射敏感正光刻胶组合物
    • US5792585A
    • 1998-08-11
    • US217892
    • 1994-03-25
    • Ayako IdaHaruyoshi OsakiTakeshi HiokiYasunori DoiYasunori UetaniRyotaro Hanawa
    • Ayako IdaHaruyoshi OsakiTakeshi HiokiYasunori DoiYasunori UetaniRyotaro Hanawa
    • C07C39/15G03F7/004G03F7/022G03F7/023H01L21/027H01L21/30
    • G03F7/022C07C39/15G03F7/0226G03F7/0236
    • A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
    • 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂(A),其包含可通过间甲酚,2,5-二氯苯的混合物的缩合反应获得的树脂(I) 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆(II)的对甲酚,其重均分子量为200至2000,转化为聚苯乙烯,碱溶性树脂(B)包含树脂( I)和通式(III)的化合物:其中R 1,R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基,m和n分别为0〜 3,R'是氢原子或C1-C3烷基,或碱溶性树脂(C),其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂(IV) - 三甲基苯酚与摩尔比为80:20至30:70的醛,其具有良好的灵敏度,改进的分辨率和耐热性。