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1. 发明授权

US5080997A Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture 失效
标题翻译：通过混合二氢化亚油酸酯和酚醛树脂溶液的凝聚产物，不会从凝乳混合物分离凝结产物来制备阳性组合物的方法
公开(公告)号：US5080997A
公开(公告)日：1992-01-14
申请号：US446153
申请日：1989-12-05
申请人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
发明人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
IPC分类号： C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023
CPC分类号： G03F7/023
摘要： A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

2. 发明授权

US5290656A Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound 失效
标题翻译：抗酚组合物，新型苯酚化合物和醌二叠氮磺酸酯新型酚类化合物
公开(公告)号：US5290656A
公开(公告)日：1994-03-01
申请号：US5429
申请日：1993-01-19
申请人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi , Jun Tomioka
发明人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi , Jun Tomioka
IPC分类号： G03F7/022 , G03C1/52 , C07C309/76
CPC分类号： G03F7/022
摘要： A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.2 is a hydrogen atom, an alkyl or aryl group is present at the ortho position to a hydroxyl group which is present at the ortho position to X provides a positive resist composition which has a high .gamma.-value.
摘要翻译：通式（I）的酚化合物的醌二叠氮磺酸酯：其中Y 1，Y 2，Y 3和Y 4相同或不同，各自为氢原子，烷基，卤素原子或羟基，条件是Y 1，Y 2，Y 3和Y 4中的至少一个为羟基; Z 1，Z 2，Z 3，Z 4，Z 5和Z 6相同或不同，各自为氢原子，烷基，芳基，卤素原子或羟基，条件是Z1，Z2，Z3，Z4中的至少一个 Z5和Z6是羟基; X为，其中R 1和R 2相同或不同，并且各自为氢原子，烷基，烯基，环烷基，烷氧基或芳基，条件是当至少一个 R1和R2是氢原子，烷基或芳基存在于与X的邻位存在的羟基的邻位，提供具有高γ值的正性抗蚀剂组合物。

3. 发明授权

US5059507A Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin 失效
标题翻译：酚醛化合物和碱性可溶性树脂的喹啉二异氰酸酯的积极抗性组合物
公开(公告)号：US5059507A
公开(公告)日：1991-10-22
申请号：US364123
申请日：1989-06-12
申请人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi
发明人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： G03F7/022
摘要： A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1 and Y.sub.2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are the same or different and each a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are hydroxyl groups; R.sub.1, R.sub.2 and R.sub.3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

4. 发明授权

US5124228A Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester 失效
标题翻译：含有碱性可溶性树脂和O-喹啉二酸硫酸酯的阳性光电组合物
公开(公告)号：US5124228A
公开(公告)日：1992-06-23
申请号：US381298
申请日：1989-07-18
申请人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Fumio Oi
发明人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Fumio Oi
IPC分类号： G03F7/022
CPC分类号： G03F7/0226
摘要： A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR1## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 or 2, b is 0, 1 or 2, and a+b and c+d are not less than 2; R and R' are the same or different and an alkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

5. 发明授权

US5378586A Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester 失效
标题翻译：抗蚀剂组合物，其包含醌二叠氮磺酸二酯和醌二叠氮磺酸酯
公开(公告)号：US5378586A
公开(公告)日：1995-01-03
申请号：US152891
申请日：1993-11-16
申请人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Fumio Oi
发明人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Fumio Oi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0226
摘要： A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, wherein(a) the first ester is a quinone diazide sulfonic acid diester of a phenol compound having not less than three hydroxyl groups which exhibits a pattern area that is not less than 40% of all pattern areas corresponding to the sensitizer in a high pressure liquid chromatography (HPLC) pattern measured with a primary detector using UV light having a wavelength of 254 nm, and(b) the second ester is a quinone diazide sulfonic acid ester that is a complete ester of a phenol compound having not less than two hydroxyl groups which exhibits a pattern area corresponding to not less than 5% and is less than 60% of all pattern areas corresponding to the sensitizer in the HPLC pattern.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂和作为敏化剂的酚化合物的第一和第二醌二叠氮磺酸酯，其中（a）第一酯是苯酚化合物的醌二叠氮磺酸二酯在使用波长为254的紫外光的主要检测器测量的高压液相色谱（HPLC）图案中，具有不小于3个羟基的图案面积不小于对应于敏化剂的所有图案区域的40％ nm，和（b）第二酯是醌二叠氮基磺酸酯，其是具有不少于2个羟基的酚化合物的完全酯，其显示对应于不小于5％且小于60％的图案面积，在HPLC图案中对应于敏化剂的所有图案区域。

6. 发明授权

US5283324A Process for preparing radiation sensitive compound and positive resist composition 失效
标题翻译：制备辐射敏感化合物和正型抗蚀剂组合物的方法
公开(公告)号：US5283324A
公开(公告)日：1994-02-01
申请号：US869968
申请日：1992-04-17
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C08G61/00 , C07C303/28 , C07C309/76 , C07D311/60 , G03F7/022 , H01L21/027
CPC分类号： G03F7/022 , C07C303/28 , C07D311/60
摘要： A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
摘要翻译：通过使酚化合物与醌二叠氮磺酰卤在相对介电常数不大于10的溶剂和相对介电常数为至少15的溶剂的混合物中反应制备的辐射敏感化合物，该化合物较少着色并得到具有良好分辨率的正性抗蚀剂组合物。

7. 发明授权

US5413895A Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. 失效
标题翻译：包含醌二叠层磺酸酯，酚醛清漆树脂和多酚化合物的正型抗蚀剂组合物。
公开(公告)号：US5413895A
公开(公告)日：1995-05-09
申请号：US931316
申请日：1992-08-18
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Yasunori Uetani , Ayako Ida
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Yasunori Uetani , Ayako Ida
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0226
摘要： A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.
摘要翻译：含有通过酚化合物与羰基化合物的缩合反应得到的酚醛清漆树脂的碱溶性树脂的正型抗蚀剂组合物，其GPC图案的面积为转化为聚苯乙烯的分子量的范围为不大于900不超过除了未反应的酚化合物之外的整个图案区域的20％，醌二叠氮化合物和下式的多酚化合物：其中R 1和R 2独立地为氢原子，卤素原子，烷基，烷氧基或基团：其中R 3为烷基或苯基的-OCOR 3，x和y独立地为1〜3的整数，m为0〜4的整数，其中，所述多酚化合物（I）与所述碱溶性树脂的重量比为3:10〜5:10，耐热性，灵敏度，分辨率和焦深均优异，显影后无浮渣。

8. 发明申请

US20060073411A1 Chemically amplified resist composition 审中-公开
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US20060073411A1
公开(公告)日：2006-04-06
申请号：US11233130
申请日：2005-09-23
申请人： Satoshi Yamamoto , Yukio Hanamoto , Koji Kuwana
发明人： Satoshi Yamamoto , Yukio Hanamoto , Koji Kuwana
IPC分类号： G03C1/76
CPC分类号： G03F7/0397 , G03F7/0392
摘要： The present invention provides a chemically amplified resist composition comprising a treated resin (1), an acid generator and a solvent, wherein resin (1) is (a) a (meth)acrylic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid, and which comprises a repeating unit having an alicyclic hydrocarbon group in its side chain or (b) a styrenic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid, and which comprises a repeating unit derived from hydroxystyrene, and wherein the treated resin (1) is obtained by (A) contacting crude resin (1) with activated carbon at 40 to 90° C. to obtain hemi-treated crude resin (1) and contacting the hemi-treated resin (1) with at least one member selected from the group consisting of kieselguhr and silica gel, or (B) contacting crude resin (1) with activated carbon and at least one member selected from the group consisting of kieselguhr and silica gel at 40 to 90 ° C.
摘要翻译：本发明提供一种化学增幅抗蚀剂组合物，其包含处理过的树脂（1），酸产生剂和溶剂，其中树脂（1）是（a）在碱水溶液中不溶或难溶的（甲基）丙烯酸树脂并且通过酸的作用而溶于碱性水溶液中，并且其侧链含有具有脂环族烃基的重复单元或（b）在碱性水溶液中不溶或难溶于苯乙烯树脂，成为通过酸的作用可溶于碱性水溶液，其中含有由羟基苯乙烯衍生的重复单元，其中，（A）将粗树脂（1）与40〜90的活性炭接触而得到得到半经处理的粗树脂（1），并将半经处理的树脂（1）与选自硅藻土和硅胶的至少一种物质接触，或（B）使粗树脂（1）与活性炭和选自硅藻土和硅胶中的至少一种在40至90℃。

9. 发明授权

US08557410B2 Secondary battery with a spirally-rolled electrode group 有权
标题翻译：具有螺旋卷绕电极组的二次电池
公开(公告)号：US08557410B2
公开(公告)日：2013-10-15
申请号：US12550637
申请日：2009-08-31
申请人： Isao Matsumoto , Hua Zhou , Koji Kuwana
发明人： Isao Matsumoto , Hua Zhou , Koji Kuwana
IPC分类号： H01M10/00 , H01M10/02 , H01M10/04
CPC分类号： H01M2/18 , H01M2/0413 , H01M2/263 , H01M10/0413 , H01M10/0431 , H01M10/0468
摘要： An electrode group E in which a positive electrode 1 and a negative electrode 2 are spirally-rolled interposing a separator 3 is contained in a bottomed cylindrical can 4. A metal exposure portion 1a provided on an end surface of the positive electrode 1 of the electrode group E or a metal-made current collecting plate 9 electrically connected to the metal exposure portion 1a (called a current collecting portion of a positive electrode) and a cover body 8 also functioning as a positive electrode terminal are electrically connected by a metal lead plate 5. One or more electrolyte resistant metal pressers 10 are arranged and electrically connected between the current collecting portion of the positive electrode and the cover body 8. The electrode group E is applied pressure by the cover body 8 and the bottom portion 4a of the bottomed cylindrical can 4.
摘要翻译：其中正极1和负极2螺旋卷绕插入隔板3的电极组E包含在有底圆筒形罐4中。设置在电极的正极1的端面上的金属曝光部分1a 电气连接到金属曝光部分1a（称为正电极的集电部分）的组E或金属制集电板9以及也用作正极端子的盖体8通过金属引线板电连接一个或多个耐电解质的金属按压件10布置并电连接在正电极的集流部分和盖体8之间。电极组件E被盖体8和底部部分4a的底部部分4a施加圆筒罐4。

10. 发明申请

US20100055548A1 Secondary Battery with a Spirally-Rolled Electrode Group 有权
标题翻译：带有螺旋状电极组的二次电池
公开(公告)号：US20100055548A1
公开(公告)日：2010-03-04
申请号：US12550637
申请日：2009-08-31
申请人： Isao Matsumoto , Hua Zhou , Koji Kuwana
发明人： Isao Matsumoto , Hua Zhou , Koji Kuwana
IPC分类号： H01M6/10
CPC分类号： H01M2/18 , H01M2/0413 , H01M2/263 , H01M10/0413 , H01M10/0431 , H01M10/0468
摘要： An electrode group E in which a positive electrode 1 and a negative electrode 2 are spirally-rolled interposing a separator 3 is contained in a bottomed cylindrical can 4. A metal exposure portion 1a provided on an end surface of the positive electrode 1 of the electrode group E or a metal-made current collecting plate 9 electrically connected to the metal exposure portion 1a (called a current collecting portion of a positive electrode) and a cover body 8 also functioning as a positive electrode terminal are electrically connected by a metal lead plate 5. One or more electrolyte resistant metal pressers 10 are arranged and electrically connected between the current collecting portion of the positive electrode and the cover body 8. The electrode group E is applied pressure by the cover body 8 and the bottom portion 4a of the bottomed cylindrical can 4.
摘要翻译：其中正极1和负极2螺旋卷绕插入隔板3的电极组E包含在有底圆筒形罐4中。设置在电极的正极1的端面上的金属曝光部分1a 电气连接到金属曝光部分1a（称为正电极的集电部分）的组E或金属制集电板9以及也用作正极端子的盖体8通过金属引线板电连接一个或多个耐电解质的金属按压件10布置并电连接在正电极的集流部分和盖体8之间。电极组件E被盖体8和底部部分4a的底部部分4a施加圆筒罐4。

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