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    • 3. 发明授权
    • Positive type resist composition
    • 正型抗蚀剂组合物
    • US5326665A
    • 1994-07-05
    • US24499
    • 1993-03-01
    • Haruyoshi OsakiHiroshi MoriumaYasunori Uetani
    • Haruyoshi OsakiHiroshi MoriumaYasunori Uetani
    • C08G8/04G03F7/023G03F7/039H01L21/027G03F7/30
    • C08G8/04G03F7/0236
    • A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): ##STR2## wherein R.sub.4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R.sub.5 to R.sub.7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.
    • 包含碱溶性树脂和醌二叠氮化合物的正型抗蚀剂组合物,其中所述含碱树脂(A)的树脂可通过与至少一种由以下通式(I)表示的酚化合物的缩合反应获得: (I)其中R1至R3彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基,k表示1或2,至少一种由以下通式(II)表示的化合物: :其中R 4表示氢原子,具有1-4个碳原子的烷基或苯基,R 5至R 7彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基 碳原子,n表示1或2,醛化合物。 该组合物在灵敏度,耐热性和轮廓性能之间的平衡方面是优异的,并且没有浮渣。
    • 7. 发明授权
    • Radiation-sensitive positive resist composition
    • 辐射敏感正光刻胶组合物
    • US5792585A
    • 1998-08-11
    • US217892
    • 1994-03-25
    • Ayako IdaHaruyoshi OsakiTakeshi HiokiYasunori DoiYasunori UetaniRyotaro Hanawa
    • Ayako IdaHaruyoshi OsakiTakeshi HiokiYasunori DoiYasunori UetaniRyotaro Hanawa
    • C07C39/15G03F7/004G03F7/022G03F7/023H01L21/027H01L21/30
    • G03F7/022C07C39/15G03F7/0226G03F7/0236
    • A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
    • 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂(A),其包含可通过间甲酚,2,5-二氯苯的混合物的缩合反应获得的树脂(I) 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆(II)的对甲酚,其重均分子量为200至2000,转化为聚苯乙烯,碱溶性树脂(B)包含树脂( I)和通式(III)的化合物:其中R 1,R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基,m和n分别为0〜 3,R'是氢原子或C1-C3烷基,或碱溶性树脂(C),其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂(IV) - 三甲基苯酚与摩尔比为80:20至30:70的醛,其具有良好的灵敏度,改进的分辨率和耐热性。