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1. 发明授权

US5198323A Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component 失效
标题翻译：含有碱可溶性树脂，1,2-二酮双环化合物和抗高温组分的耐腐蚀组合物
公开(公告)号：US5198323A
公开(公告)日：1993-03-30
申请号：US694372
申请日：1991-04-30
申请人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
发明人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
IPC分类号： G03F7/022 , G03F7/09
CPC分类号： G03F7/0226 , G03F7/091 , Y10S430/116 , Y10S430/121 , Y10S430/123
摘要： A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): ##STR1## wherein Z is an oxygen or sulfur atom or a group of the formula: >N--R.sub.4 in which R.sub.4 is a hydrogen atom or an alkyl group; R.sub.1, R.sub.2 and R.sub.3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: --OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: ##STR2## --COOR or --CONHR' in R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.

2. 发明授权

US5736292A Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
标题翻译：包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5736292A
公开(公告)日：1998-04-07
申请号：US490511
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

3. 发明授权

US5362598A Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye 失效
标题翻译：醌基二氮化物光刻胶组合物，含有碱溶性树脂和紫外线吸收染料
公开(公告)号：US5362598A
公开(公告)日：1994-11-08
申请号：US132230
申请日：1993-10-06
申请人： Naoki Takeyama , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa
发明人： Naoki Takeyama , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa
IPC分类号： G03F7/09 , G03F7/023 , G03C1/61
CPC分类号： G03F7/091
摘要： A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.
摘要翻译：一种光致抗蚀剂组合物，其包含以下通式的化合物：其中R 1，R 2和R 3相同或不同，表示氢原子，羟基，-OCOR 4，-O-R 5，-OSi（ R6）3，卤素原子，任选取代的烷基，任选取代的烯基，任选取代的苯基或任选取代的芳烷基; R4，R5和R6表示任选取代的低级烷基或任意取代的苯基; X和Y相同或不同，表示-CN，-COOR 7，-CONR 8 R 9，R 7表示烷基; R8和R9相同或不同，表示氢原子，任意取代的烷基或苯基; R 10表示氢原子，任选取代的烷基或羟基; a为1〜2，适合于在高反射率的基板上形成分辨率高的精细图案。

4. 发明授权

US5792585A Radiation-sensitive positive resist composition 失效
标题翻译：辐射敏感正光刻胶组合物
公开(公告)号：US5792585A
公开(公告)日：1998-08-11
申请号：US217892
申请日：1994-03-25
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

5. 发明授权

US5283324A Process for preparing radiation sensitive compound and positive resist composition 失效
标题翻译：制备辐射敏感化合物和正型抗蚀剂组合物的方法
公开(公告)号：US5283324A
公开(公告)日：1994-02-01
申请号：US869968
申请日：1992-04-17
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C08G61/00 , C07C303/28 , C07C309/76 , C07D311/60 , G03F7/022 , H01L21/027
CPC分类号： G03F7/022 , C07C303/28 , C07D311/60
摘要： A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
摘要翻译：通过使酚化合物与醌二叠氮磺酰卤在相对介电常数不大于10的溶剂和相对介电常数为至少15的溶剂的混合物中反应制备的辐射敏感化合物，该化合物较少着色并得到具有良好分辨率的正性抗蚀剂组合物。

6. 发明授权

US5783355A Radiation-sensitive positive resist composition 失效
公开(公告)号：US5783355A
公开(公告)日：1998-07-21
申请号：US490512
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

7. 发明授权

US5436107A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5436107A
公开(公告)日：1995-07-25
申请号：US853547
申请日：1992-03-18
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： C07D311/64 , G03F7/0226
摘要： A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂; 至少一种下式的多元酚化合物的醌二叠氮化物磺酸盐：其中R 1至R 5独立地为氢原子，烷基，烯基，环烷基或芳基，条件是在 R1和R2中的至少一个是烷基，烯基，环烷基或芳基; 和式（II）的酚化合物的醌二叠氮基磺酸盐，其中R 6至R 10独立地为氢原子，烷基，烯基，环烷基或芳基，条件是至少一个 R6和R7是烷基，烯基，环烷基或芳基。

8. 发明授权

US5336583A Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone 失效
标题翻译：使用乳酸乙酯和2-庚酮的混合溶剂的正醌二叠氮化物抗蚀剂组合物
公开(公告)号：US5336583A
公开(公告)日：1994-08-09
申请号：US161440
申请日：1993-12-06
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03F7/022 , G03F7/004 , G03F7/039 , G03F7/22 , H01L21/027 , G03F7/023 , G03C1/61
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.
摘要翻译：一种正极抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和乳酸乙酯与至少一种选自（a）乙酸正戊酯和（b）2- 庚酮，重量比为5:95至80:20，该组合物具有良好的涂层性能并提供改进的轮廓和较大的聚焦深度。

9. 发明授权

US06383708B1 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06383708B1
公开(公告)日：2002-05-07
申请号：US08160290
申请日：1993-12-02
申请人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
发明人： Yasunori Uetani , Yasunori Doi , Kazuhiko Hashimoto , Haruyoshi Osaki , Ryotaro Hanawa
IPC分类号： G03C152
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有大的伽马值，并提供改进的轮廓和较大的焦点深度。

10. 发明授权

US5714620A Polyhydric phenol compound and positive resist composition comprising the same 失效
公开(公告)号：US5714620A
公开(公告)日：1998-02-03
申请号：US703436
申请日：1996-08-27
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , C07D311/60
CPC分类号： C07D311/64 , G03F7/0226
摘要： A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.

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