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    • 7. 发明申请
    • Extreme ultra violet light source device
    • 极紫外光源装置
    • US20080035865A1
    • 2008-02-14
    • US11882253
    • 2007-07-31
    • Hiroshi KomoriAkira EndoHakaru Mizoguchi
    • Hiroshi KomoriAkira EndoHakaru Mizoguchi
    • H05G2/00
    • H05G2/001H05G2/005
    • An extreme ultra violet light source apparatus in which both a mechanism of supplying a droplet target to a laser application position at a high speed and a mechanism of trapping charged particles generated from plasma are managed without disturbing a track of the target. The apparatus includes: a target nozzle that injects a target material toward a plasma generation point; an electric charge supply unit that charges the injected target material; an acceleration unit that accelerates the charged target material; a laser oscillator that applies a laser beam to the target material at the plasma generation point to generate plasma; and electromagnets that form a magnetic field at the plasma generation point such that the magnetic field has substantially straight lines of magnetic flux in substantially parallel with a traveling direction of the target material in the track of the target material.
    • 一种极端的超紫外光源装置,其中既管理将液滴靶向高速激光施加位置提供的机构和捕获由等离子体产生的带电粒子的机制,也不会妨碍目标的轨迹。 该装置包括:向等离子体产生点注入目标材料的目标喷嘴; 电荷供给单元,对注入的目标材料进行充电; 加速单元,加速带电目标材料; 激光振荡器,其在等离子体产生点处将激光束施加到目标材料以产生等离子体; 以及在等离子体产生点处形成磁场的电磁体,使得磁场具有与目标材料的轨道中的目标材料的行进方向基本平行的基本上直线的磁通量。