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1. 发明授权

US08629417B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08629417B2
公开(公告)日：2014-01-14
申请号：US13540314
申请日：2012-07-02
申请人： Shinji Nagai , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Takanobu Ishihara , Osamu Wakabayashi
IPC分类号： G01N21/33 , H01J1/50 , G21K5/08
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译：一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

2. 发明授权

US08624208B2 Extreme ultraviolet light generation system 有权
标题翻译：极紫外光发生系统
公开(公告)号：US08624208B2
公开(公告)日：2014-01-07
申请号：US13048454
申请日：2011-03-15
申请人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
发明人： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC分类号： G21K5/00
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
摘要翻译：极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外光发生系统可包括：室入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个光学元件以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

3. 发明授权

US08569723B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08569723B2
公开(公告)日：2013-10-29
申请号：US13183217
申请日：2011-07-14
申请人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
发明人： Shinji Nagai , Takanobu Ishihara , Kouji Kakizaki , Tamotsu Abe
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
摘要翻译：极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部检索对等离子体的产生无贡献的残留目标。

4. 发明授权

US08450706B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08450706B2
公开(公告)日：2013-05-28
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： G21F5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译：即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解。该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。

5. 发明授权

US08436328B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08436328B2
公开(公告)日：2013-05-07
申请号：US12638571
申请日：2009-12-15
申请人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
发明人： Tatsuya Yanagida , Akira Endo , Hiroshi Komori , Shinji Nagai , Kouji Kakizaki , Tamotsu Abe , Hideo Hoshino
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
摘要翻译：在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

6. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

7. 发明授权

US08288743B2 Apparatus for and method of withdrawing ions in EUV light production apparatus 有权
标题翻译： EUV光产生装置中离子离子的设备和方法
公开(公告)号：US08288743B2
公开(公告)日：2012-10-16
申请号：US12406388
申请日：2009-03-18
申请人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
发明人： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC分类号： B01D59/44
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
摘要翻译：一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子，其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

8. 发明授权

US08173984B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08173984B2
公开(公告)日：2012-05-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

9. 发明授权

US07880153B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07880153B2
公开(公告)日：2011-02-01
申请号：US12073001
申请日：2008-02-28
申请人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
发明人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
IPC分类号： H05G2/00 , G01J1/42
CPC分类号： G03F7/70916 , G03F7/70033
摘要： An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.
摘要翻译： EUV光源装置，能够防止过滤EUV光的过滤器的劣化和/或破损。 EUV光源装置包括产生EUV光的EUV产生室; 目标材料供应单元，用于将目标材料供应到EUV光产生室中; 激光源，用于将激光束施加到提供到EUV光产生室中的目标材料以产生等离子体; 用于收集从等离子体辐射的EUV光的收集光学器件; 用于过滤由收集光学器件收集的EUV光的滤光器; 以及设置在等离子体和过滤器之间的过滤器保护构件，用于通过阻挡从等离子体飞向过滤器的飞散物质来保护过滤器。

10. 发明申请

US20100019173A1 Extreme ultraviolet light source apparatus and nozzle protection device 有权
标题翻译：极紫外光源设备和喷嘴保护装置
公开(公告)号：US20100019173A1
公开(公告)日：2010-01-28
申请号：US12385955
申请日：2009-04-24
申请人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
发明人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
IPC分类号： G21F5/02 , F28D15/00
CPC分类号： H05G2/003 , H05G2/006
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译：一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。

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