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1. 发明授权

US4791586A Method of and apparatus for checking geometry of multi-layer patterns for IC structures 失效
标题翻译：用于检查IC结构的多层图案几何的方法和装置
公开(公告)号：US4791586A
公开(公告)日：1988-12-13
申请号：US812928
申请日：1985-12-23
申请人： Shunji Maeda , Hitoshi Kubota , Satoru Fushimi , Hiroshi Makihira , Takanori Ninomiya , Yasuo Nakagawa
发明人： Shunji Maeda , Hitoshi Kubota , Satoru Fushimi , Hiroshi Makihira , Takanori Ninomiya , Yasuo Nakagawa
IPC分类号： H01L21/66 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G06T2207/10056 , G06T2207/30148
摘要： Method of and apparatus for checking the geometry of multi-layer patterns for IC structures having identical functions, each of the multi-layer patterns including layer patterns arranged in different level layers, wherein electrical image signals corresponding to any two of the multi-layer patterns and having more than two levels are registered with each other and then compared to determine unmatched and matched portions. The comparison of the registered electric image signals may be performed with respect to their amplitude or their gradients. The registration and comparison of two electric image signals may be repeated for all of the layer patterns with the matched portions being no longer subjected to the registration and comparison. A defect detection signal is produced from finally unmatched portions, if any, of the electric image signals having undergone the said registration and comparison.
摘要翻译：用于检查具有相同功能的IC结构的多层图案的几何形状的方法和装置，每个多层图案包括布置在不同层级中的层图案，其中对应于多层图案中的任何两个的电图像信号并且具有两个以上的级别彼此登记，然后进行比较以确定不匹配和匹配的部分。登记的电图像信号的比较可以相对于它们的振幅或梯度进行。对于所有的层图案，可以对匹配的部分不再进行注册和比较来重复两个电图像信号的配准和比较。如果有的话，经过所述登记和比较的电子图像信号的最终不匹配的部分产生缺陷检测信号。

2. 发明授权

US5649022A Pattern checking method and checking apparatus 失效
标题翻译：模式检查方法和检查装置
公开(公告)号：US5649022A
公开(公告)日：1997-07-15
申请号：US888494
申请日：1992-05-27
申请人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
发明人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
IPC分类号： G06T7/00 , G06K9/00
CPC分类号： G06T7/0044 , G06T7/001 , G06T2207/30148
摘要： A pattern checking method wherein an image of a certain position of one pattern is detected; the detected image is positioned with respect to an image of a position corresponding to the certain position, in a reference pattern image; and the positioned images are compared with each other, whereby a discrepant place among these positioned images is judged as a defect the positioning operations of the images of the detected patterns are controlled based upon either pattern information such as density of the images of the detected patterns, or information obtained from the positioning operations for images of other positions in the patterns. An image sensor unit for detecting images of patterns is constructed which has such a structure that a plurality of one-dimensional image sensors functioning as a pattern detector are arranged in a two-dimensional form, and an output of a certain one-dimensional image sensor for imaging a certain position of one pattern is delayed for a predetermined time period, and also both of an output of an one-dimensional image sensor adjoining the first-mentioned one-dimensional image sensor, which images the same position of the same pattern, and the delayed output of the certain one-dimensional image sensor are sequentially added to derive a summation output. The image sensor unit is inclined at a predetermined angle with respect to a plane perpendicular to the reflection light from the patterns, and the reflection light from the patterns is focused via a confocal focusing optical system onto this image sensor unit.
摘要翻译：一种图案检查方法，其中检测到一个图案的某个位置的图像; 检测图像相对于与特定位置对应的位置的图像在参考图案图像中定位; 并且定位的图像彼此进行比较，由此将这些定位的图像中的不一致的位置判断为检测图案的图像的定位操作的缺陷，基于诸如检测图案的图像的密度的图案信息或者从图案中的其他位置的图像的定位操作获得的信息。用于检测图案的图像的图像传感器单元被构造成具有以二维形式配置作为图案检测器的多个一维图像传感器的结构，以及某一个一维图像传感器的输出对于一个图案的某个位置的成像被延迟预定的时间段，并且与相同图案的相同位置成像的第一个提到的一维图像传感器邻接的一维图像传感器的输出，并且依次添加特定一维图像传感器的延迟输出以导出求和输出。图像传感器单元相对于与图案的反射光垂直的平面以预定角度倾斜，并且来自图案的反射光经由共聚焦聚焦光学系统聚焦到该图像传感器单元上。

3. 发明授权

US5430548A Method and apparatus for pattern detection 失效
标题翻译：模式检测方法和装置
公开(公告)号：US5430548A
公开(公告)日：1995-07-04
申请号：US12468
申请日：1993-02-02
申请人： Takashi Hiroi , Hitoshi Kubota , Shunji Maeda , Hiroshi Makihira , Mitsunobu Isobe
发明人： Takashi Hiroi , Hitoshi Kubota , Shunji Maeda , Hiroshi Makihira , Mitsunobu Isobe
IPC分类号： G01B11/24 , G01B11/245 , G01N21/88 , G01N21/956 , G03F1/84 , G06K9/64 , G06T1/00 , H01L21/027 , H01L21/30 , G01N21/01 , G01N21/15
CPC分类号： G01N21/95607
摘要： The inventive pattern detection method and apparatus produce, from an optical image of a pattern in attention and an optical image of a pattern which should be identical to the pattern in attention, an optical image by merging the images, with a relative phase shift being imposed, and pattern information is detected or observed in the merged optical image or a signal produced from the optical image through the conversion with an opto-electric transducer means.
摘要翻译：本发明的图案检测方法和装置从注意图案的光学图像和应注意的图案的图案的光学图像产生通过合并图像的光学图像，并施加相对相移，并且通过使用光电换能器装置的转换，在合并的光学图像中检测或观察图案信息或从光学图像产生的信号。

4. 发明授权

US5153444A Method and apparatus for detecting patterns 失效
标题翻译：用于检测图案的方法和装置
公开(公告)号：US5153444A
公开(公告)日：1992-10-06
申请号：US641001
申请日：1991-01-14
申请人： Shunji Maeda , Takashi Hiroi , Hitoshi Kubota , Hiroshi Makihira , Fumiaki Endo
发明人： Shunji Maeda , Takashi Hiroi , Hitoshi Kubota , Hiroshi Makihira , Fumiaki Endo
IPC分类号： G01N21/956 , G06T7/00
CPC分类号： G06T7/001 , G01N21/95607 , G01N2021/8896 , G01N2021/95615 , G06T2207/30148
摘要： A method and apparatus for detecting a defect in a circuit pattern by detecting a gray image signal from each of a plurality of circuit patterns as objects of inspection, which circuit patterns have been fabricated so as to be identical with one another, and detecting a defect as a difference of edge position between two circuit patterns by comparing the detected gray image signal of one circuit pattern with the detected gray image signal of another circuit pattern.
摘要翻译：通过检测作为检查对象的多个电路图案中的每一个的灰度图像信号来检测电路图案中的缺陷的方法和装置，其中已经制造出彼此相同的电路图案，并且检测缺陷作为两个电路图案之间的边缘位置的差异，通过将检测到的一个电路图案的灰度图像信号与另一个电路图案的检测到的灰度图像信号进行比较。

5. 发明授权

US4725722A Automatic focusing method and apparatus utilizing contrasts of projected pattern 失效
标题翻译：自动聚焦方法和利用投影图案对比的装置
公开(公告)号：US4725722A
公开(公告)日：1988-02-16
申请号：US850682
申请日：1986-04-11
申请人： Shunji Maeda , Hiroshi Makihira , Hitoshi Kubota
发明人： Shunji Maeda , Hiroshi Makihira , Hitoshi Kubota
IPC分类号： G02B7/38 , G01B11/24 , G01N21/956 , G02B7/28 , G02B7/32 , G03F1/84 , H01L21/027 , H01L21/30 , G01J1/20 , G01J1/36
CPC分类号： G02B21/245 , G01N21/956 , G02B7/32
摘要： A method of auto-focusing suitable for fine patterns of LSIs and an apparatus therefor, particularly applied for checking the geometry of a circuit pattern of a semiconductor device formed on an LSI wafer. A stripe pattern is projected on a specified location on an object to be checked and contrast of an image of the stripe pattern is used for focusing. The specified location is imaged by an optical system and detected simultaneously by two detectors. A position at which contrast of an output signal of one detector coincides with that of the other detector is determined to be an in-focus position. Am image of a multi-layer pattern representative of the circuit pattern is focused on another detector disposed at the in-focus position and detected for checking. The output signal of the detector is divided by mean brightness of the stripe pattern image so as to be normalized. Since the two detectors produce their output signals simultaneously, the difference between the output signals is normalized to improve accuracies of computation.
摘要翻译：适用于LSI的精细图案的自动对焦的方法及其装置，特别适用于检查形成在LSI晶片上的半导体器件的电路图案的几何形状。将条纹图案投影在要检查的对象上的指定位置，并且将条纹图案的图像的对比度用于聚焦。指定位置由光学系统成像，并由两个检测器同时检测。一个检测器的输出信号的对比度与另一个检测器的输出信号的对比度的位置被确定为对焦位置。表示电路图案的多层图案的图像集中在设置在对焦位置的另一检测器，并被检测用于检查。检测器的输出信号除以条纹图案图像的平均亮度，以便被归一化。由于两个检测器同时产生其输出信号，所以输出信号之间的差异被归一化以提高计算精度。

6. 发明授权

US06317512B1 Pattern checking method and checking apparatus 失效
标题翻译：模式检查方法和检查装置
公开(公告)号：US06317512B1
公开(公告)日：2001-11-13
申请号：US08753011
申请日：1996-11-19
申请人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
发明人： Shunji Maeda , Hitoshi Kubota , Hiroshi Makihira , Takashi Hiroi
IPC分类号： G06K900
CPC分类号： G06T7/001 , G06T7/74 , G06T2207/30148
摘要： A pattern checking method wherein an image of a certain position of one pattern is detected; the detected image is positioned with respect to an image of a position corresponding to the certain position, in a reference pattern image; and the positioned images are compared with each other, whereby a discrepant place among these positioned images is judged as a defect the positioning operations of the images of the detected patterns are controlled based upon either pattern information such as density of the images of the detected patterns, or information obtained from the positioning operations for images of other positions in the patterns. An image sensor unit for detecting images of patterns is constructed which has such a structure that a plurality of one-dimensional image sensors functioning as a pattern detector are arranged in a two-dimensional form, and an output of a certain one-dimensional image sensor for imaging a certain position of one pattern is delayed for a predetermined time period, and also both of an output of an one-dimensional image sensor adjoining the first-mentioned one-dimensional image sensor, which images the same position of the same pattern, and the delayed output of the certain one-dimensional image sensor are sequentially added to derive a summation output. The image sensor unit is inclined at a predetermined angle with respect to a plane perpendicular to the reflection light from the patterns, and the reflection light from the patterns is focused via a confocal focusing optical system onto this image sensor unit.
摘要翻译：一种图案检查方法，其中检测到一个图案的某个位置的图像; 检测图像相对于与特定位置对应的位置的图像在参考图案图像中定位; 并且定位的图像彼此进行比较，由此将这些定位的图像中的不一致的位置判断为检测图案的图像的定位操作的缺陷，基于诸如检测图案的图像的密度的图案信息或者从图案中的其他位置的图像的定位操作获得的信息。用于检测图案的图像的图像传感器单元被构造成具有以二维形式配置作为图案检测器的多个一维图像传感器的结构，以及某一个一维图像传感器的输出对于一个图案的某个位置的成像被延迟预定的时间段，并且与相同图案的相同位置成像的第一个提到的一维图像传感器邻接的一维图像传感器的输出，并且依次添加特定一维图像传感器的延迟输出以导出求和输出。图像传感器单元相对于与图案的反射光垂直的平面以预定角度倾斜，并且来自图案的反射光经由共聚焦聚焦光学系统聚焦到该图像传感器单元上。

7. 发明授权

US07061600B2 Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected 失效
公开(公告)号：US07061600B2
公开(公告)日：2006-06-13
申请号：US10098478
申请日：2002-03-18
申请人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
发明人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/95615 , G01N2201/0618 , G01N2201/0634
摘要： A pattern detection method and apparatus for inspecting, with high resolution, a micro fine defect of a pattern on an inspected object, and a semiconductor substrate manufacturing method and system with a high yield. A micro fine pattern on the inspected object is inspected by annular-looped illumination through an objective lens onto a wafer, the wafer having micro fine patterns thereon. The illumination may be polarized and controlled according to an image detected on the pupil of the objective lens, and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect. Simultaneously, micro fine defects on the micro-fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect.

8. 发明授权

US06263099B1 Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected 失效
标题翻译：半导体基板的制造方法以及检查被检查体的图案的缺陷的方法和装置
公开(公告)号：US06263099B1
公开(公告)日：2001-07-17
申请号：US09107432
申请日：1998-06-30
申请人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
发明人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
IPC分类号： G06K900
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/95615 , G01N2201/0618 , G01N2201/0634
摘要： A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect which occurs on the pattern.
摘要翻译：一种用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法及其装置以及以高产率制造半导体晶片等半导体基板的半导体基板的制造方法和系统。通过将通过物镜的环形照明照射到安装在台架上的晶片上，检查被检查物体上的微细图案，晶片上具有微细精细图案。照明光可以根据在物镜的光瞳上检测到的图像而被圆形或椭圆偏振并且被控制，并且通过检测来自晶片的反射光来获得图像信号。将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷，从而同时以高分辨率检测微细微图案或微细图案上的缺陷。此外，通过分析缺陷的原因和在图案上发生的缺陷因素来控制生产线的工艺条件。

9. 发明授权

US5309108A Method of inspecting thin film transistor liquid crystal substrate and apparatus therefor 失效
标题翻译：检查薄膜晶体管液晶基板的方法及其装置
公开(公告)号：US5309108A
公开(公告)日：1994-05-03
申请号：US921583
申请日：1992-07-30
申请人： Shunji Maeda , Hitoshi Kubota , Makoto Ono
发明人： Shunji Maeda , Hitoshi Kubota , Makoto Ono
IPC分类号： G06T7/00 , G09G3/00 , G01R31/02 , G06K9/00
CPC分类号： G09G3/006 , G06T7/001 , G06T2207/10048 , G06T2207/30121
摘要： The invention relates to a method of inspecting and correcting a thin film transistor liquid crystal substrate and an apparatus therefor, where a plurality of scan lines and signal lines are connected electrically in common at each one terminal side respectively, and an infrared image outside the pixel domain is detected after lapse of a prescribed time from the time point of applying voltage between the scan lines and the signal lines, and an infrared image outside the pixel domain is detected after lapse of a prescribed time from the time point of stopping the voltage application, and the scan lines and the signal lines relating to variation of the heating state are detected from difference or quotient between an infrared image at the voltage applying state and an infrared image at the stopping state of voltage application, thereby a pixel address with a shortcircuit defect occurring is specified. If an image part being equal to the set threshold value or more does not exist in the difference infrared image in the pixel address, a wiring pattern position in the pixel address is detected from a visible image of the pixel address, and this wiring pattern and one from a neighboring pixel address are compared to detect a short circuit defect which can be removed by laser.
摘要翻译：本发明涉及一种薄膜晶体管液晶基板的检查和校正方法及其装置，其中多个扫描线和信号线分别在每个一个端子侧共同电连接，并且在该像素之外的红外图像在从施加扫描线和信号线之间的电压的时间点经过规定时间之后检测域，并且在从停止施加电压的时间点经过规定时间之后检测像素域外的红外图像，并且在电压施加状态下的红外图像与在施加电压的停止状态的红外图像之间的差或商检测与加热状态的变化相关的扫描线和信号线，从而具有短路的像素地址指定缺陷发生。如果像素地址中的差异红外图像中不存在等于设定阈值的图像部分，则从像素地址的可视图像检测像素地址中的布线图案位置，并且该布线图案和比较来自相邻像素地址的一个，以检测可以通过激光去除的短路缺陷。

10. 发明申请

US20080302964A1 METHOD AND APPARATUS FOR INSPECTING INTEGRATED CIRCUIT PATTERN 有权
标题翻译：用于检查集成电路图案的方法和装置
公开(公告)号：US20080302964A1
公开(公告)日：2008-12-11
申请号：US12190388
申请日：2008-08-12
申请人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Mari Nozoe , Haruo Yoda , Kimiaki Ando , Katsuhiro Kuroda , Yutaka Kaneko , Maki Tanaka , Shunji Maeda , Hitoshi Kubota , Aritoshi Sugimoto , Katsuya Sugiyama , Atsuko Takafuji , Yusuke Yajima , Hiroshi Tooyama , Tadao Ino , Takashi Hiroi , Kazushi Yoshimura , Yasutsugu Usami
IPC分类号： G01N23/00 , G01R31/305
CPC分类号： G01R31/305 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined changed state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
摘要翻译：电路图案检查方法及其装置，其中待检查的样品的待检查部分的整体部分处于预定的改变状态，被检查的部分用成像高分辨率照射，在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

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