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1. 发明授权

US5047568A Sulfonium salts and use and preparation thereof 失效
标题翻译：锍盐及其使用及制备
公开(公告)号：US5047568A
公开(公告)日：1991-09-10
申请号：US272965
申请日：1988-11-18
申请人： Raymond W. Angelo , Jeffrey D. Gelorme , Joseph P. Kuczynski , William H. Lawrence , Socrates P. Pappas , Logan L. Simpson
发明人： Raymond W. Angelo , Jeffrey D. Gelorme , Joseph P. Kuczynski , William H. Lawrence , Socrates P. Pappas , Logan L. Simpson
IPC分类号： C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029
CPC分类号： G03F7/029 , C07C381/12 , C07C2103/24 , Y10S430/115
摘要： Sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R.sub.1 is a divalent organic bridge; each R.sub.2 and R.sub.3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided thatn not more than one of R.sub.2 and R.sub.3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.

2. 发明授权

US5102772A Photocurable epoxy composition with sulfonium salt photoinitiator 失效
标题翻译：光固化环氧组合物与锍盐光引发剂
公开(公告)号：US5102772A
公开(公告)日：1992-04-07
申请号：US727935
申请日：1991-07-10
申请人： Raymond W. Angelo , Jeffrey D. Gelorme , Joseph P. Kuczynski , William H. Lawrence , Socrates P. Pappas , Logan L. Simpson
发明人： Raymond W. Angelo , Jeffrey D. Gelorme , Joseph P. Kuczynski , William H. Lawrence , Socrates P. Pappas , Logan L. Simpson
IPC分类号： G03F7/038
CPC分类号： G03F7/0385 , Y10S430/115
摘要： Photocurable compositions with, as photoinitiator, sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R.sub.1 is a divalent organic bridge; each R.sub.2 and R.sub.3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R.sub.2 and R.sub.3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
摘要翻译：作为光引发剂的具有下式的锍盐的光固化组合物：其中Ar是稠合芳族基团; R1是二价有机桥; 每个R 2和R 3分别是烷基，芳基，烷芳基，芳烷基或取代的芳基，条件是不多于一个R 2和R 3是烷基; 而A是非亲核阴离子; 其用途及其制备。

3. 发明授权

US5498765A Positive photoresist composition containing photoacid generator and use thereof 失效
标题翻译：含有光致酸发生剂的正性光致抗蚀剂组合物及其用途
公开(公告)号：US5498765A
公开(公告)日：1996-03-12
申请号：US311027
申请日：1994-09-26
申请人： Burton J. Carpenter, Jr. , Michael G. McMaster , Joseph LaTorre , Logan L. Simpson
发明人： Burton J. Carpenter, Jr. , Michael G. McMaster , Joseph LaTorre , Logan L. Simpson
IPC分类号： G03F7/004 , G03F7/029 , G03F7/039 , H01L21/027 , H01L21/30 , H05K3/06 , G03F7/30 , G03F7/40
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
摘要翻译：包含成膜反应性聚合物的正性光致抗蚀剂; 碘鎓引发剂或在暴露于辐射时产生三氟甲磺酸的非离子化合物; 并提供多官能有机羧酸及其用途。

4. 发明授权

US5266444A Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition 失效
标题翻译：基于光抑制获得环氧树脂配方中的图像反转的方法和组合物
公开(公告)号：US5266444A
公开(公告)日：1993-11-30
申请号：US943075
申请日：1992-09-10
申请人： Burton J. Carpenter, Jr. , Joseph LaTorre , Michael G. McMaster , Logan L. Simpson
发明人： Burton J. Carpenter, Jr. , Joseph LaTorre , Michael G. McMaster , Logan L. Simpson
IPC分类号： G03F7/004 , G03F7/038 , G03F7/38 , C03C1/725
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/38 , Y10S430/118
摘要： A method and composition are shown for producing a positive-acting photoimagible epoxy resin. In addition to the epoxy resin, the compositions include a dual component cross-linking system which combines a basic curing agent with an onium or arylonium salt. The onium or arylonium salt produces a protic acid upon exposure to irradiation causing a reaction with the basic curing agent which renders the agent ineffective as an epoxy curing agent during subsequent heating. During a subsequent bake operation, only the unexposed regions of the epoxy will cross-link. As a result, the exposed areas wash away, leaving only the cured reverse image.
摘要翻译：显示了用于制备正性光可氧化环氧树脂的方法和组合物。除了环氧树脂之外，组合物还包括将碱性固化剂与鎓盐或芳基鎓盐组合的双组分交联体系。鎓或芳基盐在暴露于照射时产生质子酸，引起与碱性固化剂的反应，其使得该试剂在随后的加热期间作为环氧固化剂无效。在随后的烘烤操作中，仅环氧树脂的未曝光区域将交联。结果，暴露的区域被洗掉，只剩下固化的反转图像。

5. 发明授权

US5071730A Liquid apply, aqueous processable photoresist compositions 失效
标题翻译：液体涂布，水性可加工光致抗蚀剂组合物
公开(公告)号：US5071730A
公开(公告)日：1991-12-10
申请号：US656105
申请日：1991-02-13
申请人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
发明人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.
摘要翻译：新的聚合物系列显示用于高灵敏度，高分辨率的光致抗蚀剂。液体涂覆抗蚀剂包括甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/甲基丙烯酸的聚合物粘合剂和在暴露于辐射时产生酸的引发剂。

6. 发明授权

US5055439A Photoacid generating composition and sensitizer therefor 失效
标题翻译：光致发光组合物及其敏化剂
公开(公告)号：US5055439A
公开(公告)日：1991-10-08
申请号：US458048
申请日：1989-12-27
申请人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
IPC分类号： C08F8/00 , C08G59/00 , C08G59/18 , C08G59/68 , G03C1/675 , G03F7/004 , G03F7/031 , G03F7/039 , H01L21/027
CPC分类号： G03F7/031
摘要： A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.

7. 发明授权

US5045431A Dry film, aqueous processable photoresist compositions 失效
标题翻译：干膜，水性可加工光致抗蚀剂组合物
公开(公告)号：US5045431A
公开(公告)日：1991-09-03
申请号：US656103
申请日：1991-02-13
申请人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
发明人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.
摘要翻译：新的聚合物系列被用于高速光刻胶。干膜光致抗蚀剂包括由甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/丙烯酸/丙烯酸乙酯和合适的引发剂制备的聚合物粘合剂。

8. 发明授权

US5439766A Composition for photo imaging 失效
标题翻译：摄影成像的组成
公开(公告)号：US5439766A
公开(公告)日：1995-08-08
申请号：US976115
申请日：1992-11-13
申请人： Richard A. Day , Donald H. Glatzel , John R. Mertz , Joel L. Roth , David J. Russell , Logan L. Simpson
发明人： Richard A. Day , Donald H. Glatzel , John R. Mertz , Joel L. Roth , David J. Russell , Logan L. Simpson
IPC分类号： G03C1/725
CPC分类号： G03C1/725
摘要： According to the present invention, good image resolution of a cationically polymerized epoxy based coating, such as a solder mask or dielectric or etch resist, is provided by combining a cationically polymerized epoxy based coating with conventional epoxy glass substrates cured with a curing agent that does not produce basic reaction products. Preferably, the coating is photoimagable. The method for making the same is also provided. The coating material includes an epoxy resin system comprising between from about 10% to about 90%, preferably about 28% to about 57% by weight of a polyol epoxy resin, and from about 10% to about 90%, preferably about 43% to 72% by weight, of a brominated epoxy resin. Optionally, a polyepoxy resin or an epoxy creosol novolak resin is added to the resin system. The polyepoxy resin may be added from an effective amount up to less than 90% of the resin system; the epoxy creosol novolak may be added from an effective amount up to about 80 pph.
摘要翻译：根据本发明，通过将阳离子聚合的环氧基涂层与用固化剂固化的常规环氧玻璃基底组合来提供阳离子聚合的环氧基涂层（例如焊料掩模或电介质或抗蚀剂）的良好图像分辨率，不产生碱性反应产物。优选地，涂层是可光成像的。还提供了制造它们的方法。涂料包括环氧树脂体系，其包含约10％至约90％，优选约28％至约57％重量的多元醇环氧树脂，以及约10％至约90％，优选约43％至 72重量％的溴化环氧树脂。任选地，在树脂体系中加入聚环氧树脂或环氧酚醛清漆树脂。聚环氧树脂可以从有效量添加到树脂体系的90％以下; 可以从高达约80pph的有效量加入环氧裂解酚醛清漆。

9. 发明授权

US5374500A Positive photoresist composition containing photoacid generator and use thereof 失效
标题翻译：含有光致酸发生剂的正性光致抗蚀剂组合物及其用途
公开(公告)号：US5374500A
公开(公告)日：1994-12-20
申请号：US41460
申请日：1993-04-02
申请人： Burton J. Carpenter, Jr. , Michael G. McMaster , Joseph LaTorre , Logan L. Simpson
发明人： Burton J. Carpenter, Jr. , Michael G. McMaster , Joseph LaTorre , Logan L. Simpson
IPC分类号： G03F7/004 , G03F7/029 , G03F7/039 , H01L21/027 , H01L21/30 , H05K3/06 , C03C1/492
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
摘要翻译：包含成膜反应性聚合物的正性光致抗蚀剂; 碘鎓引发剂或在暴露于辐射时产生三氟甲磺酸的非离子化合物; 并提供多官能有机羧酸及其用途。

10. 发明授权

US5272042A Positive photoresist system for near-UV to visible imaging 失效
标题翻译：用于近紫外到可见成像的正性光致抗蚀剂系统
公开(公告)号：US5272042A
公开(公告)日：1993-12-21
申请号：US761183
申请日：1991-09-17
申请人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
发明人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/73
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/127
摘要： Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
摘要翻译：公开了一种正性光致抗蚀剂。光致抗蚀剂具有基本上水和碱不溶性的光不稳定聚合物作为其聚合物组分。光致抗蚀剂还包括能够形成强酸的光酸产生剂。该光酸产生剂可以是衍生自N-羟基酰胺或N-羟基酰亚胺的磺酸酯。最后，光致抗蚀剂组合物包括适当的光敏剂。

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