专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5432047A Patterning process for bipolar optical storage medium 失效
标题翻译：双极光存储介质的图案化处理
公开(公告)号：US5432047A
公开(公告)日：1995-07-11
申请号：US897626
申请日：1992-06-12
申请人： John C. Cheng , William D. Hinsberg, III , Robert T. Lynch, Jr. , Scott A. MacDonald , Lester A. Pederson , James S. Wong
发明人： John C. Cheng , William D. Hinsberg, III , Robert T. Lynch, Jr. , Scott A. MacDonald , Lester A. Pederson , James S. Wong
IPC分类号： G11B7/24 , G11B7/26
CPC分类号： G11B7/261 , Y10S430/146
摘要： An optical data storage device having a substrate has guide ridges, or reverse grooves, in a concentric or spiral shape formed thereon, and disposed in a plane parallel to and disposed from the substrate surface. The device further has pits formed approximately midway between the guide ridges and disposed in the substrate and having bottoms below the plane of the substrate surface. A method for manufacturing the optical data storage device having both address pits and guide ridges is disclosed. A dual tone photosensitive material is applied to a substrate, exposed with a laser light source comprising two distinct wavelengths, and developed to provide a desired bipolar geometry thereon.
摘要翻译：具有基板的光学数据存储装置具有形成在其上的同心或螺旋形状的导向脊或反向槽，并且设置在与基板表面平行并布置的平面中。该装置还具有形成在导向脊之间的中间的凹坑并且设置在基板中并且具有在基板表面的平面下方的底部。公开了一种具有地址坑和引导脊的光数据存储装置的制造方法。将双色感光材料施加到基板上，用包括两个不同波长的激光光源曝光，并显影以在其上提供期望的双极几何形状。

2. 发明授权

US5372912A Radiation-sensitive resist composition and process for its use 失效
标题翻译：辐射敏感抗蚀剂组合物及其使用方法
公开(公告)号：US5372912A
公开(公告)日：1994-12-13
申请号：US998984
申请日：1992-12-31
申请人： Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
发明人： Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , H01L21/30 , H05K3/00 , G03C1/76
CPC分类号： G03F7/039 , Y10S430/111
摘要： The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.
摘要翻译：本发明涉及一种辐射敏感抗蚀剂组合物及其用于制造集成电路的方法。该组合物包含辐射敏感性酸产生剂，可溶于碱水溶液的粘合剂和具有酸不稳定侧基的丙烯酸酯共聚物。

3. 发明授权

US5045431A Dry film, aqueous processable photoresist compositions 失效
标题翻译：干膜，水性可加工光致抗蚀剂组合物
公开(公告)号：US5045431A
公开(公告)日：1991-09-03
申请号：US656103
申请日：1991-02-13
申请人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
发明人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.
摘要翻译：新的聚合物系列被用于高速光刻胶。干膜光致抗蚀剂包括由甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/丙烯酸/丙烯酸乙酯和合适的引发剂制备的聚合物粘合剂。

4. 发明授权

US5625579A Stochastic simulation method for processes containing equilibrium steps 失效
标题翻译：包含平衡步骤的过程的随机模拟方法
公开(公告)号：US5625579A
公开(公告)日：1997-04-29
申请号：US241316
申请日：1994-05-10
申请人： William D. Hinsberg, III , Frances A. Houle
发明人： William D. Hinsberg, III , Frances A. Houle
IPC分类号： B01J19/00 , G06F17/18 , G06F17/50 , G06G7/48
CPC分类号： G06F17/18 , B01J19/0033 , G06F17/5009 , G06F2217/10
摘要： A system and method for simulating a mechanistic kinetic process, such as a chemical process including one or more chemical reactions, over a predetermined time period is provided. The simulation proceeds stochastically, by taking discrete time steps through the time period, and performing events (i.e., chemical reactions), based on the relationship between their probabilities of occurrence and the time steps taken. The system and method of the invention include means or method steps for detecting equilibrium conditions, in which a reaction moves forward and backward with a reaction probability which is high, relative to the probabilities of other reactions being simulated. When a reaction in equilibrium is detected, a probability calculation is made, based on the non-equilibrium reactions being simulated. Time steps are made, and events are simulated, based only on the non-equilibrium reactions. Thus, processing time, which would otherwise be consumed simulating back-and-forth events in the equilibrium reaction, is saved.
摘要翻译：提供了一种用于在预定时间段内模拟机械动力学过程（例如包括一个或多个化学反应的化学过程）的系统和方法。该模拟随机地进行，通过在该时间段内采取离散时间步骤，并且基于它们发生的概率与所采用的时间步骤之间的关系来执行事件（即，化学反应）。本发明的系统和方法包括用于检测平衡条件的手段或方法步骤，其中反应以相对于正在模拟的其他反应的概率为高的反应概率向前和向后移动。当检测到平衡反应时，基于模拟的非平衡反应进行概率计算。仅基于非平衡反应，进行时间步长和模拟事件。因此，节省了在平衡反应中模拟反向事件的处理时间。

5. 发明授权

US5446870A Spatially resolved stochastic simulation system 失效
标题翻译：空间解析随机仿真系统
公开(公告)号：US5446870A
公开(公告)日：1995-08-29
申请号：US317421
申请日：1994-10-04
申请人： William D. Hinsberg, III , Frances A. Houle
发明人： William D. Hinsberg, III , Frances A. Houle
IPC分类号： G06F19/00 , G05B17/02 , G06F17/18 , G06F17/50 , G06F15/20
CPC分类号： G06F17/18 , G05B17/02 , G06F17/5009 , G06F2217/10 , G06F2217/80
摘要： The present invention comprises a simulator including at least one data storage apparatus and at least one processor. The simulator further has a material property data group, a system state data group comprising geometrical data for defining a plurality of geometrical subvolumes and system condition data for each subvolume of a simulated system, an event probability data group including a plurality of event subgroups for uniquely identifying a set of events, event probabilities being associated with at least one of the geometrical subvolumes, and an event process data group including the time dependent process functions for all events which can occur in the system. These data groups and at least one functional-relationship link for correlating all of them are stored in the data storage apparatus. Thus, the material energy system can be represented by such data groups without requiring an explicit multiple dimension data structure. The processor performs a simulating process comprising the steps of: (a) computing the probability of occurrence for each of the events and determining a time step by using a total probability of occurrence for each of the events; (b) randomly selecting a simulated event for the time step and updating the system condition data group representing the system state; and (c) repeating the steps (a) and (b) until a predefined simulation end time is reached.
摘要翻译：本发明包括一个包括至少一个数据存储装置和至少一个处理器的模拟器。模拟器还具有材料属性数据组，系统状态数据组包括用于定义多个几何子体积的几何数据和用于模拟系统的每个子体积的系统条件数据，事件概率数据组包括用于唯一的多个事件子组识别一组事件，与几何子体积中的至少一个相关联的事件概率，以及包括可在系统中发生的所有事件的时间相关过程函数的事件过程数据组。这些数据组和用于将它们全部关联的至少一个功能关系链路存储在数据存储装置中。因此，材料能量系统可以由这样的数据组来表示，而不需要显式的多维数据结构。处理器执行模拟处理，其包括以下步骤：（a）计算每个事件的发生概率，并且通过使用每个事件的总发生概率来确定时间步长; （b）随机选择时间步长的模拟事件，更新表示系统状态的系统条件数据组; 和（c）重复步骤（a）和（b），直到达到预定的模拟结束时间。

6. 发明授权

US5071730A Liquid apply, aqueous processable photoresist compositions 失效
标题翻译：液体涂布，水性可加工光致抗蚀剂组合物
公开(公告)号：US5071730A
公开(公告)日：1991-12-10
申请号：US656105
申请日：1991-02-13
申请人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
发明人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.
摘要翻译：新的聚合物系列显示用于高灵敏度，高分辨率的光致抗蚀剂。液体涂覆抗蚀剂包括甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/甲基丙烯酸的聚合物粘合剂和在暴露于辐射时产生酸的引发剂。

7. 发明授权

US5055439A Photoacid generating composition and sensitizer therefor 失效
标题翻译：光致发光组合物及其敏化剂
公开(公告)号：US5055439A
公开(公告)日：1991-10-08
申请号：US458048
申请日：1989-12-27
申请人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
IPC分类号： C08F8/00 , C08G59/00 , C08G59/18 , C08G59/68 , G03C1/675 , G03F7/004 , G03F7/031 , G03F7/039 , H01L21/027
CPC分类号： G03F7/031
摘要： A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.

8. 发明授权

US4767723A Process for making self-aligning thin film transistors 失效
标题翻译：制造自对准薄膜晶体管的工艺
公开(公告)号：US4767723A
公开(公告)日：1988-08-30
申请号：US115470
申请日：1987-10-30
申请人： William D. Hinsberg, III , Webster E. Howard , Carlton G. Willson
发明人： William D. Hinsberg, III , Webster E. Howard , Carlton G. Willson
IPC分类号： H01L21/027 , H01L21/30 , H01L21/336 , H01L27/12 , H01L29/423 , H01L29/49 , H01L29/78 , H01L29/786 , H01L21/265 , H01L21/44 , H01L21/465 , H01L21/48
CPC分类号： G03F7/095 , H01L21/0274 , H01L29/42384 , H01L29/4908 , H01L29/66765 , Y10S148/137 , Y10S438/928
摘要： A process for making a self-aligned thin film transistor, said process comprising the steps of: (1) providing a gate which comprises a glass substrate, a transparent electrode on top thereof, and a metal electrode on top of said transparent electrode, (2) forming a stack by depositing over said gate a triple layer structure consisting of gate dielectric material, active material and a top passivating dielectric, (3) coating the top of said triple layer with a dual-tone photoresist, (4) exposing said photoresist from the top through a mask having transparent areas, opaque areas and areas transparent to selective wavelengths, using broad band UV light, (5) developing the photoresist by treatment with a solvent, (6) etching the stack with a liquid etchant through to the glass substrate, (7) exposing the photoresist from the bottom through the glass substrate using near UV light, (8) developing the photoresist with a solvent, and (9) etching off the top passivating layer of the stack.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式