专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5045431A Dry film, aqueous processable photoresist compositions 失效
标题翻译：干膜，水性可加工光致抗蚀剂组合物
公开(公告)号：US5045431A
公开(公告)日：1991-09-03
申请号：US656103
申请日：1991-02-13
申请人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
发明人： Robert D. Allen , Gregory M. Wallraff , Logan L. Simpson , William D. Hinsberg, III
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.
摘要翻译：新的聚合物系列被用于高速光刻胶。干膜光致抗蚀剂包括由甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/丙烯酸/丙烯酸乙酯和合适的引发剂制备的聚合物粘合剂。

2. 发明授权

US5071730A Liquid apply, aqueous processable photoresist compositions 失效
标题翻译：液体涂布，水性可加工光致抗蚀剂组合物
公开(公告)号：US5071730A
公开(公告)日：1991-12-10
申请号：US656105
申请日：1991-02-13
申请人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
发明人： Robert D. Allen , William D. Hinsberg, III , Logan L. Simpson , Gregory M. Wallraff
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/111
摘要： A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.
摘要翻译：新的聚合物系列显示用于高灵敏度，高分辨率的光致抗蚀剂。液体涂覆抗蚀剂包括甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/甲基丙烯酸的聚合物粘合剂和在暴露于辐射时产生酸的引发剂。

3. 发明授权

US5055439A Photoacid generating composition and sensitizer therefor 失效
标题翻译：光致发光组合物及其敏化剂
公开(公告)号：US5055439A
公开(公告)日：1991-10-08
申请号：US458048
申请日：1989-12-27
申请人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人： Robert D. Allen , William D. Hinsberg, III. , Logan L. Simpson , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
IPC分类号： C08F8/00 , C08G59/00 , C08G59/18 , C08G59/68 , G03C1/675 , G03F7/004 , G03F7/031 , G03F7/039 , H01L21/027
CPC分类号： G03F7/031
摘要： A composition including an initiator which generates acid upon exposure to radiation in the presence of a sensitizer. The composition may be mixed with an acid sensitive polymer or prepolymer to make a visible light or laser imageable photoresist. The sensitizer has phenylethynyl and methoxy substituents which, when properly positioned, allow it to utilize all of the visible argon ion laser lines.

4. 发明授权

US5272042A Positive photoresist system for near-UV to visible imaging 失效
标题翻译：用于近紫外到可见成像的正性光致抗蚀剂系统
公开(公告)号：US5272042A
公开(公告)日：1993-12-21
申请号：US761183
申请日：1991-09-17
申请人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
发明人： Robert D. Allen , William R. Brunsvold , Burton J. Carpenter , William D. Hinsberg , Joseph LaTorre , Michael G. McMaster , Melvin W. Montgomery , Wayne M. Moreau , Logan L. Simpson , Robert J. Tweig , Gregory M. Wallraff
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/73
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/127
摘要： Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
摘要翻译：公开了一种正性光致抗蚀剂。光致抗蚀剂具有基本上水和碱不溶性的光不稳定聚合物作为其聚合物组分。光致抗蚀剂还包括能够形成强酸的光酸产生剂。该光酸产生剂可以是衍生自N-羟基酰胺或N-羟基酰亚胺的磺酸酯。最后，光致抗蚀剂组合物包括适当的光敏剂。

5. 发明授权

US5372912A Radiation-sensitive resist composition and process for its use 失效
标题翻译：辐射敏感抗蚀剂组合物及其使用方法
公开(公告)号：US5372912A
公开(公告)日：1994-12-13
申请号：US998984
申请日：1992-12-31
申请人： Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
发明人： Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , H01L21/30 , H05K3/00 , G03C1/76
CPC分类号： G03F7/039 , Y10S430/111
摘要： The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.
摘要翻译：本发明涉及一种辐射敏感抗蚀剂组合物及其用于制造集成电路的方法。该组合物包含辐射敏感性酸产生剂，可溶于碱水溶液的粘合剂和具有酸不稳定侧基的丙烯酸酯共聚物。

6. 发明授权

US5250395A Process for imaging of photoresist including treatment of the photoresist with an organometallic compound 失效
标题翻译：用于光刻胶成像的方法，包括用有机金属化合物处理光致抗蚀剂
公开(公告)号：US5250395A
公开(公告)日：1993-10-05
申请号：US735420
申请日：1991-07-25
申请人： Robert D. Allen , Scott A. MacDonald , Dennis R. McKean , Hubert Schlosser , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人： Robert D. Allen , Scott A. MacDonald , Dennis R. McKean , Hubert Schlosser , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
IPC分类号： G03F7/039 , G03F7/09 , G03F7/26 , G03C5/16 , G03C1/72
CPC分类号： G03F7/039 , G03F7/091 , G03F7/265
摘要： The present invention relates to a process for negative tone imaging of photoresist to improve resolution of lithographic patterns.
摘要翻译：本发明涉及光刻胶的负色调成像方法，以提高光刻图案的分辨率。

7. 发明授权

US5580694A Photoresist composition with androstane and process for its use 失效
标题翻译：光致抗蚀剂组合物与雄甾烷及其使用方法
公开(公告)号：US5580694A
公开(公告)日：1996-12-03
申请号：US266044
申请日：1994-06-27
申请人： Robert D. Allen , Richard A. DiPietro , Gregory M. Wallraff
发明人： Robert D. Allen , Richard A. DiPietro , Gregory M. Wallraff
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027 , G03C1/492 , G03C5/00
CPC分类号： G03F7/0045 , Y10S430/111
摘要： The present invention relates to a radiation-sensitive resist composition comprising (a) a radiation-sensitive acid generator, (b) a substituted androstane, and (c) a copolymer binder. The copolymer binder comprises (meth)acrylic/(meth)acrylate copolymer.
摘要翻译：本发明涉及一种辐射敏感抗蚀剂组合物，其包含（a）辐射敏感性酸产生剂，（b）取代的雄甾烷和（c）共聚物粘合剂。共聚物粘合剂包含（甲基）丙烯酸/（甲基）丙烯酸酯共聚物。

8. 发明授权

US5264325A Composition for photo imaging 失效
标题翻译：摄影成像的组成
公开(公告)号：US5264325A
公开(公告)日：1993-11-23
申请号：US918304
申请日：1992-07-21
申请人： Robert D. Allen , Richard A. Day , Donald H. Glatzel , William D. Hinsberg , John R. Mertz , David J. Russell , Gregory M. Wallraff
发明人： Robert D. Allen , Richard A. Day , Donald H. Glatzel , William D. Hinsberg , John R. Mertz , David J. Russell , Gregory M. Wallraff
IPC分类号： G03F7/038 , G03F7/20 , H05K3/00 , H05K3/28 , D04H1/08
CPC分类号： G03F7/2053 , G03F7/0385 , H05K3/0082 , H05K3/287
摘要： An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which preferably is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. A third resin, either an epoxy cresol novolak or a polyepoxy resin, is also added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
摘要翻译：提供了一种改进的可光成像的可阳离子聚合的环氧基涂料，其适用于各种基材。该材料包括基本上由约10重量％至约80重量％的多元醇树脂组成的环氧树脂体系，多元醇树脂优选为分子量为约40,000至130,000的表氯醇和双酚A的缩合产物; 和约35重量％至72重量％的软化点为约60℃至约110℃，分子量为约600至2,500的溴化双酚A的环氧化缩水甘油醚。树脂体系中还加入第三树脂，环氧甲酚酚醛清漆或聚环氧树脂。向该树脂体系中添加约0.1〜约15重量份/ 100份阳离子光引发剂的树脂，其能够在暴露于光化辐射下引发所述环氧化树脂体系的聚合; 该系统的特征还在于，对于2.0密耳厚的膜，在330至700nm区域中的光的吸光度小于0.1。任选地，可加入光敏剂如苝及其衍生物或蒽及其衍生物。

9. 发明授权

US08937448B2 Systems and methods for downhole power factor correction 有权
标题翻译：井下功率因数校正的系统和方法
公开(公告)号：US08937448B2
公开(公告)日：2015-01-20
申请号：US13300900
申请日：2011-11-21
申请人： Robert D. Allen , William J. Carter , Dustin B. Campbell , John M. Knapp
发明人： Robert D. Allen , William J. Carter , Dustin B. Campbell , John M. Knapp
IPC分类号： G05F1/70 , E21B43/12 , H02P23/00
CPC分类号： E21B43/128 , H02P23/26 , Y02P80/112
摘要： Systems and methods for processing power provided to downhole electrical systems such as electric submersible pump motors to increase the power factor of the supplied power. In one embodiment, a system comprises a downhole motor and a power factor corrector. The motor may be coupled to drive an electric submersible pump. The power factor corrector is configured to receive input power, process the received input power using one or more capacitive electrical components and thereby impart a capacitive phase shift between the voltage and the current of the received input power. The processed output power is provided to the downhole motor, which consumes the processed output power with a power factor which is greater than it would have been in the absence of the correction.
摘要翻译：用于处理提供给井下电气系统的电力的系统和方法，例如电潜泵泵马达，以增加供电功率的因数。在一个实施例中，系统包括井下电动机和功率因数校正器。马达可以联接以驱动电潜泵。功率因数校正器被配置为接收输入功率，使用一个或多个电容性电气部件处理所接收的输入功率，从而在所接收的输入功率的电压和电流之间施加电容相移。处理的输出功率被提供给井下电动机，其以比在没有校正的情况下更大的功率因数来消耗处理的输出功率。

10. 发明授权

US08137874B2 Organic graded spin on BARC compositions for high NA lithography 有权
标题翻译：用于高NA光刻的BARC组合物上的有机分级纺丝
公开(公告)号：US08137874B2
公开(公告)日：2012-03-20
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： G03F7/09 , G03F7/40
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式