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1. 发明授权

US4391511A Light exposure device and method 失效
标题翻译：曝光装置及方法
公开(公告)号：US4391511A
公开(公告)日：1983-07-05
申请号：US245193
申请日：1981-03-18
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G03F7/20 , G03F7/24 , G03F9/02 , H01L21/683 , G03B27/52
CPC分类号： G03F7/707 , G03F7/24 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T279/11
摘要： A light exposure device and method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface of the substrate, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposure surface and deforming means for imparting a force to the back surface of the substrate to deform the substrate, and control means for controlling the deforming means of the chuck in accordance with the curvature of the exposure surface of the substrate measured by the measuring means such that the exposure surface of the substrate conforms to an image surface of the pattern over an entire exposure area within a predetermined allowable error.
摘要翻译：一种用于在基板的曝光表面上曝光和印刷预定图案的曝光装置和方法，包括：用于测量基板的曝光表面的曲率的测量装置，包括用于吸附和保持基板的背面的吸持和保持装置的卡盘与曝光面相反的基板和用于赋予基板背面使其变形的变形机构，以及控制装置，用于根据基板的曝光面的曲率来控制卡盘的变形装置，该曲率由所述测量装置使得所述基板的曝光表面在预定的允许误差范围内在整个曝光区域上符合所述图案的图像表面。

2. 发明授权

US4491787A Flatness measuring device 失效
标题翻译：平面度测量装置
公开(公告)号：US4491787A
公开(公告)日：1985-01-01
申请号：US292933
申请日：1981-08-14
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
IPC分类号： G01B5/28 , G01B7/34 , G01B11/30 , G01B21/30 , H01L21/66 , G01N27/00
CPC分类号： G01B7/345 , G01B5/285
摘要： A device for measuring a flatness of a plate such as a silicon wafer, a GGG wafer, a printed circuit board, a ceramic substrate, or the like. The measuring device is provided with a disc which is disposed in parallel with the plate on one of the surfaces of the plate and is driven by a rotating drive source and a plurality of detectors for detecting a distance from the detector to the surface of the plate, the detectors being disposed on the surface closer to the disc. With this arrangement, distance data from the plurality of the detectors to the surface of the plate is obtained during the course of the rotation of the disc, and a flatness of the plate is measured.
摘要翻译：用于测量诸如硅晶片，GGG晶片，印刷电路板，陶瓷基板等的板的平坦度的装置。测量装置设置有盘，该盘在板的一个表面上与板平行设置，并由旋转驱动源和多个检测器驱动，用于检测从检测器到板的表面的距离检测器设置在靠近盘的表面上。利用这种布置，在盘的旋转过程中获得从多个检测器到板的表面的距离数据，并且测量板的平坦度。

3. 发明授权

US4925755A Method of correcting defect in circuit pattern 失效
标题翻译：校正电路图案缺陷的方法
公开(公告)号：US4925755A
公开(公告)日：1990-05-15
申请号：US152159
申请日：1988-02-04
申请人： Hiroshi Yamaguchi , Keiya Saito , Akira Shimase , Satoshi Haraichi , Susumu Aiuchi , Nobuyuki Akiyama , Shinji Kuniyoshi , Takeshi Kimura
发明人： Hiroshi Yamaguchi , Keiya Saito , Akira Shimase , Satoshi Haraichi , Susumu Aiuchi , Nobuyuki Akiyama , Shinji Kuniyoshi , Takeshi Kimura
IPC分类号： G03F1/00 , G03F1/72 , G03F1/74 , H01L21/027
CPC分类号： G03F1/74 , G03F1/22
摘要： A method of correcting a circuit pattern such as an X-ray mask, carried out by first preparing a circuit pattern structure where a circuit pattern on a conductive film is coated with a protective film, then forming a hole or a slit by irradiating a high-intensity focused ion beam to a dropout defective portion in the circuit pattern of the circuit pattern structure, and plating such hole or slit while utilizing the conductive film as a plating electrode, thereby forming a metal frame to correct the dropout defective portion.

4. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

5. 发明授权

US4788577A Substrate surface deflecting device 失效
标题翻译：基板表面偏转装置
公开(公告)号：US4788577A
公开(公告)日：1988-11-29
申请号：US142698
申请日：1988-01-11
申请人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
发明人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
IPC分类号： G02F1/13 , G03B27/32 , G03F7/20 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
摘要翻译：曝光装置包括：设置在舞台上的底板; 柔性卡盘板，其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构，包括设置在基板处的预定间隔的多个进给螺杆，用于旋转地驱动每个进给螺杆的多个旋转致动器，以及插入在卡盘板和基板之间的多个弹簧构件以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构，用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构，由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动掩模和用于测量基板的水平的机构，以便使基板经由柔性卡盘板偏转，从而在掩模和基板之间产生均匀的间隙。

6. 发明授权

US4475223A Exposure process and system 失效
标题翻译：曝光过程和系统
公开(公告)号：US4475223A
公开(公告)日：1984-10-02
申请号：US387206
申请日：1982-06-10
申请人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
发明人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
IPC分类号： H01L21/027 , G03B27/02 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , G21K5/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.
摘要翻译： X射线曝光处理和系统，用于使用X射线将掩模图案转印到晶片上，其中通过非接触测量型的掩模高度测量装置在光干涉条带下测量许多点上的掩模上的高度在X射线曝光位置，掩模被安装在填充有He气体等的室中以防止X射线源的衰减，在晶片高度测量位置处测量许多点上的晶片上的高度与所述曝光位置不同，并且根据测量结果，通过在其上的许多点吸附并保持晶片的卡盘，晶片被独立地独立地向上或向下（即变形）精细地移动，使得晶片之间的间隙掩模和晶片被调节到期望的水平。

7. 发明授权

US5278012A Method for producing thin film multilayer substrate, and method and apparatus for detecting circuit conductor pattern of the substrate 失效
标题翻译：薄膜多层基板的制造方法以及检测基板电路导体图案的方法和装置
公开(公告)号：US5278012A
公开(公告)日：1994-01-11
申请号：US938516
申请日：1992-09-02
申请人： Chie Yamanaka , Toshiaki Ichinose , Takanori Ninomiya , Hisafumi Iwata , Yasuo Nakagawa , Nobuyuki Akiyama
发明人： Chie Yamanaka , Toshiaki Ichinose , Takanori Ninomiya , Hisafumi Iwata , Yasuo Nakagawa , Nobuyuki Akiyama
IPC分类号： G01N21/956 , H01L21/00 , H01L21/48 , H01L21/66 , H05K3/22 , G01N21/88 , G01N21/64
CPC分类号： H01L21/67121 , G01N21/95684 , H01L21/4857 , H01L22/20 , H05K3/225 , G01N2021/8825
摘要： A method for producing a thin film multilayer substrate having a base substrate, and, which a plurality of conductor pattern layers superposed thereon through dielectric layers therebetween comprises the steps of: optically detecting the uppermost conductor pattern layer whenever the conductor pattern layer is formed on the base substrate; inspecting an absence and/or presence of a fault of the conductor pattern layer; and repairing a faulty portion in accordance with fault position data detected by the inspecting. According to this method, it is possible to enhance a production yield of relatively large size of thin film multilayer substrates which needs a relatively small amount of production at a high production cost, for mounting LSI chips thereon.
摘要翻译：一种制造具有基底基板的薄膜多层基板的方法，其中通过介电层叠置在其上的多个导体图案层之间包括以下步骤：每当在导体图案层上形成导体图案层时，光学检测最上面的导体图案层基底; 检查导体图案层的缺陷和/或存在故障; 并根据检查检测到的故障位置数据修复故障部分。根据这种方法，可以提高生产成本较高的相对大尺寸薄膜多层基板的生产成本，以便在其上安装LSI芯片。

8. 发明授权

US4343553A Shape testing apparatus 失效
标题翻译：形状检测仪
公开(公告)号：US4343553A
公开(公告)日：1982-08-10
申请号：US181768
申请日：1980-08-27
申请人： Yasuo Nakagawa , Hiroshi Makihira , Yoshitada Oshida , Nobuyuki Akiyama
发明人： Yasuo Nakagawa , Hiroshi Makihira , Yoshitada Oshida , Nobuyuki Akiyama
IPC分类号： G01B11/25 , G01B11/00
CPC分类号： G01B11/2545
摘要： A shape detecting apparatus comprises a slit projecting means for projecting a slit image on a three-dimensional object such as a soldered area, a positioning means for positioning the three-dimensional object relative to the slit projecting means, an image pickup means for two-dimensionally scanning the slit image projected by the slit projecting means to pickup the image, a light segment extracting circuit including a center position extracting means for extracting a mean position (Z.sub.1 +Z.sub.2)/2 of two position signals Z.sub.1 and Z.sub.2 at which a video signal derived by transversely scanning the slit image by the image pickup means corresponds, to a first higher reference V.sub.1 when the video signal exceeds the first higher reference V.sub.1, a maximum value position extracting circuit for extracting a position Z corresponding to a maximum value of the video signal when the maximum value of the video signal is no higher than the first higher reference V.sub.1 and exceeds a second lower reference V.sub.2 and an erasing means for erasing the position signal when the maximum value of the video signal is no higher than the second lower reference V.sub.2, and a detecting means for detecting undersoldered condition and oversoldered condition by analyzing and evaluating the three-dimensional object based on the light segment position information derived from the light segment extracting circuit.
摘要翻译：一种形状检测装置，包括：狭缝突出装置，用于将缝合图像投射在诸如焊接区域的三维物体上;定位装置，用于相对于狭缝突出装置定位三维物体;图像拾取装置，对由狭缝投影装置投影的狭缝图像进行二维扫描以拾取图像;光段提取电路，包括中心位置提取装置，用于提取两个位置信号Z1和Z2的平均位置（Z1 + Z2）/ 2，通过图像拾取装置横向扫描狭缝图像导出的信号对应于当视频信号超过第一较高参考值V1时的第一较高参考V1，最大值位置提取电路，用于提取对应于最大值的位置Z 当视频信号的最大值不高于第一较高参考V1并且超过第二较低参考值V2和呃时，视频信号当视频信号的最大值不高于第二较低参考值V2时，用于擦除位置信号的灰度装置;以及检测装置，用于通过基于光段对三维物体进行分析和评估来检测底部状态和过弯状态从光段提取电路得到的位置信息。

9. 发明申请

US20130168437A1 NOBLE METAL PASTE FOR BONDING OF SEMICONDUCTOR ELEMENT 有权
标题翻译：用于粘合半导体元件的金属磷酸盐
公开(公告)号：US20130168437A1
公开(公告)日：2013-07-04
申请号：US13822334
申请日：2011-09-30
申请人： Masayuki Miyairi , Nobuyuki Akiyama , Katsuji Inagaki , Toshinori Ogashiwa
发明人： Masayuki Miyairi , Nobuyuki Akiyama , Katsuji Inagaki , Toshinori Ogashiwa
IPC分类号： B23K35/30
CPC分类号： B23K35/3006 , B23K35/3013 , H01L24/29 , H01L24/83 , H01L2224/04026 , H01L2224/05166 , H01L2224/05644 , H01L2224/29101 , H01L2224/29294 , H01L2224/29339 , H01L2224/29344 , H01L2224/83203 , H01L2224/8384 , H01L2924/00011 , H01L2924/00013 , H01L2924/01004 , H01L2924/01006 , H01L2924/01023 , H01L2924/01033 , H01L2924/01047 , H01L2924/01079 , H01L2924/014 , H01L2924/0665 , H01L2924/10253 , H01L2924/351 , H01L2924/3512 , H01L2924/00 , H01L2224/29298 , H01L2924/00015 , H01L2224/29099 , H01L2224/29199 , H01L2224/29299 , H01L2224/2929 , H01L2924/01203 , H01L2224/29144 , H01L2924/00014 , H01L2224/29139
摘要： A precious metal paste which does not cause contamination of a member, which can be uniformly coated to a member to be bonded, and which is in good condition after bonding is provided. The present invention relates to a precious metal paste for bonding a semiconductor element, of the paste including a precious metal powder and an organic solvent, in which the precious metal powder has a purity of 99.9 mass % or more and an average particle diameter of 0.1 to 0.5 μm, the organic solvent has a boiling point of 200 to 350° C., and a thixotropy index (TI) value calculated from a measurement value of a viscosity at a shear rate of 4/s with respect to a viscosity at a shear rate of 40/s at 23° C. by means of a rotational viscometer is 6.0 or more.
摘要翻译：提供了不会使被均匀地涂覆在待接合部件上并且在接合后处于良好状态的部件被污染的贵金属糊料。本发明涉及一种用于粘合半导体元件的贵金属糊料，其中贵金属粉末的纯度为99.9质量％以上且平均粒径为0.1的贵金属粉末和有机溶剂至0.5μm，有机溶剂的沸点为200〜350℃，触变性指数（TI）值由剪切速度4 / s时的粘度的测定值相对于通过旋转粘度计在23℃下的剪切速率为40 / s为6.0以上。

10. 发明申请

US20100073926A1 Flame Detector 有权
标题翻译：火焰探测器
公开(公告)号：US20100073926A1
公开(公告)日：2010-03-25
申请号：US12561185
申请日：2009-09-16
申请人： Akihisa Kudoh , Kazuyoshi Sakurai , Hiroshi Kaneko , Nobuyuki Akiyama , Masahiro Katagiri
发明人： Akihisa Kudoh , Kazuyoshi Sakurai , Hiroshi Kaneko , Nobuyuki Akiyama , Masahiro Katagiri
IPC分类号： F21V1/00 , G01J5/02
CPC分类号： G08B17/12 , G08B29/08
摘要： A flame detector is provided. A circuit board is disposed in a housing. A first light source emits first light. A light guide member comprised of translucent material guides the first light from the first light source to a light emission portion of the light guide member. A first light receiving element detects second light having a predetermined wavelength unique to the flames. A second light source emits third light to a translucent cover which is disposed between an opening of the housing and the first light receiving element. A second light receiving element detects the third light passed through the translucent cover to test the translucency. The first light source, the second light source and the second light receiving element are mounted on the circuit board. The light emission portion is formed into a substantially annular shape which encloses the first light receiving element at a front side of the housing to limit a field of view of the first light receiving element to a predetermined range. And the light guide member has a light entrance portion and a light exit portion for the third light to form a light path from the second light source to the second light receiving element through the translucent cover and the light guide member.
摘要翻译：提供火焰探测器。电路板设置在壳体中。第一光源发射第一光。由半透明材料构成的导光构件将来自第一光源的第一光引导到导光构件的发光部分。第一光接收元件检测具有特定于火焰的预定波长的第二光。第二光源将第三光发射到设置在壳体的开口和第一光接收元件之间的半透明盖。第二光接收元件检测通过半透明盖的第三光以测试半透明度。第一光源，第二光源和第二光接收元件安装在电路板上。光发射部分形成为大致环形的形状，其将第一光接收元件封装在壳体的前侧，以将第一光接收元件的视野限制在预定范围内。并且导光部件具有用于第三光的光入射部分和光出射部分，以通过半透明盖和导光部件形成从第二光源到第二光接收元件的光路。

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