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1. 发明授权

US4788577A Substrate surface deflecting device 失效
标题翻译：基板表面偏转装置
公开(公告)号：US4788577A
公开(公告)日：1988-11-29
申请号：US142698
申请日：1988-01-11
申请人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
发明人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
IPC分类号： G02F1/13 , G03B27/32 , G03F7/20 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
摘要翻译：曝光装置包括：设置在舞台上的底板; 柔性卡盘板，其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构，包括设置在基板处的预定间隔的多个进给螺杆，用于旋转地驱动每个进给螺杆的多个旋转致动器，以及插入在卡盘板和基板之间的多个弹簧构件以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构，用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构，由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动掩模和用于测量基板的水平的机构，以便使基板经由柔性卡盘板偏转，从而在掩模和基板之间产生均匀的间隙。

2. 发明授权

US07631548B2 Scanning probe microscope 失效
标题翻译：扫描探针显微镜
公开(公告)号：US07631548B2
公开(公告)日：2009-12-15
申请号：US11737779
申请日：2007-04-20
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01B5/28
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

3. 发明申请

US20070266780A1 Scanning Probe Microscope 失效
标题翻译：扫描探头显微镜
公开(公告)号：US20070266780A1
公开(公告)日：2007-11-22
申请号：US11737779
申请日：2007-04-20
申请人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01N13/10
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

4. 发明授权

US5062715A Method and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor device 失效
标题翻译：用于检测光声信号的方法和装置以及用于检测半导体器件的内部缺陷的方法
公开(公告)号：US5062715A
公开(公告)日：1991-11-05
申请号：US479712
申请日：1990-02-14
申请人： Toshihiko Nakata , Yukio Kembo
发明人： Toshihiko Nakata , Yukio Kembo
IPC分类号： G01N29/00 , G01N29/04 , G01N29/24 , G02B21/00
CPC分类号： G02B21/0072 , G01N29/2418 , G01N2291/0423 , G01N2291/2697
摘要： A photoacoustic signal detecting method and apparatus for intensity-modulating light having a wavelength penetrating a sample such as a semiconductor device at a desired frequency, the light being emitted from a first light source, focusing the intensity-modulated light on the sample as a light spot, by changing the position of the sample and the optical constant of the means for focusing, scanning the light spot inside the sample in a depth direction thereof to detect the photoacoustic effect generated in the sample, and extracting information relative to the surface and inside of the sample and defect information therein. The photoacoustic effect is detected using an interferometer. Light incident on the sample surface for a second light source in order to obtain interference light and the interference light reflected from the sample surface are adjusted in response to a signal indicative of the depth of the light spot to detect optimum interference light. Light reflected from the sample surface when light emitted from a third light source is incident on the surface is detected through the focusing optical system to generate the signal indicative of the depth of the light spot.
摘要翻译：一种光声信号检测方法和装置，用于强度调制具有以期望频率穿透诸如半导体器件的样品的波长的光，所述光从第一光源发射，将强度调制光聚焦在样品上作为光通过改变样品的位置和聚焦装置的光学常数，扫描样品内的光斑在其深度方向上，以检测样品中产生的光声效应，并提取相对于表面和内部的信息的样品和缺陷信息。使用干涉仪检测光声效应。为了获得干涉光和从样品表面反射的干涉光，入射到用于第二光源的样品表面上的光被响应于指示光斑的深度的信号来调节以检测最佳干涉光。通过聚焦光学系统检测从第三光源发射的光入射在表面上的从样品表面反射的光，以产生指示光斑深度的信号。

5. 发明申请

US20080223122A1 SCANNING PROBE MICROSCOPE 有权
标题翻译：扫描探针显微镜
公开(公告)号：US20080223122A1
公开(公告)日：2008-09-18
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
CPC分类号： G01Q70/04 , G01Q10/06
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译：扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。

6. 发明授权

US5136172A Method and apparatus for detecting photoacoustic signal 失效
标题翻译：用于检测光电信号的方法和装置
公开(公告)号：US5136172A
公开(公告)日：1992-08-04
申请号：US567319
申请日：1990-08-14
申请人： Toshihiko Nakata , Yukio Kembo , Tsuguo Sawada , Takehiko Kitamori
发明人： Toshihiko Nakata , Yukio Kembo , Tsuguo Sawada , Takehiko Kitamori
IPC分类号： G01N21/17 , G01N21/88
CPC分类号： G01N21/88 , G01N21/1702 , G01N2021/1765
摘要： A method and apparatus are disclosed for detection of surface defects and internal defect information of a sample, such as a semiconductor device, using the photoacoustic effect. Operationally, an intensity-modulated laser beam is provided having a predetermined desired frequency. The intensity-modulated laser beam is focused on the sample thereby inducing said photoacoustic effect inside the sample which is detected in two-dimensional directions of the sample so as to compose a two-dimensional photoacoustic image of the excited sample. Surface and internal information of the sample is then extracted from the two-dimensional photoacoustic image and an inverse filtering factor is in turn computed on the basis of a thermal impulse response of the particular sample for compensating degradation of the resolution of the actual photoacoustic image obtained. Lastly, the computed inverse filtering factor is then applied to the detected photoacoustic image to arrive at an image having greatly improved resolution.

7. 发明授权

US08011230B2 Scanning probe microscope 有权
标题翻译：扫描探针显微镜
公开(公告)号：US08011230B2
公开(公告)日：2011-09-06
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
CPC分类号： G01Q70/04 , G01Q10/06
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译：扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。

8. 发明授权

US08844061B2 Scanning probe microscope 有权
标题翻译：扫描探针显微镜
公开(公告)号：US08844061B2
公开(公告)日：2014-09-23
申请号：US13726764
申请日：2012-12-26
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
IPC分类号： G01Q60/28 , G01Q10/04 , G01Q60/24 , G01Q10/00 , G01Q60/34 , B82Y35/00
CPC分类号： G01Q10/00 , B82Y35/00 , G01Q60/28 , G01Q60/34
摘要： In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译：在测量具有陡峭侧壁的图案的情况下，当接近图案侧壁时，探针通过作用在探针和侧壁之间的范德华力附着在侧壁上，并且在测量的轮廓中发生错误侧壁部分。当测量具有几乎等于探针直径的槽宽度的图案时，探针粘附到两个侧壁，探针不能到达凹槽底部，并且不能测量凹槽深度。当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时，通过检测探针与图案侧壁的粘附力使探针到达侧壁底部，并暂时增加探针和样品之间的接触力。此外，通过利用图案的形状数据获得悬臂的扭转量的数据，通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。

9. 发明授权

US08342008B2 Scanning probe microscope 有权
标题翻译：扫描探针显微镜
公开(公告)号：US08342008B2
公开(公告)日：2013-01-01
申请号：US12187430
申请日：2008-08-07
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
IPC分类号： G01B5/28 , G01Q60/28
CPC分类号： G01Q10/00 , B82Y35/00 , G01Q60/28 , G01Q60/34
摘要： In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译：在测量具有陡峭侧壁的图案的情况下，当接近图案侧壁时，探针通过作用在探针和侧壁之间的范德华力附着在侧壁上，并且在测量的轮廓中发生错误侧壁部分。当测量具有几乎等于探针直径的槽宽度的图案时，探针粘附到两个侧壁，探针不能到达凹槽底部，并且不能测量凹槽深度。当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时，通过检测探针与图案侧壁的粘附力使探针到达侧壁底部，并暂时增加探针和样品之间的接触力。此外，通过利用图案的形状数据获得悬臂的扭转量的数据，通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。

10. 发明申请

US20090158828A1 Scanning Probe Microscope 有权
标题翻译：扫描探头显微镜
公开(公告)号：US20090158828A1
公开(公告)日：2009-06-25
申请号：US12187430
申请日：2008-08-07
申请人： Shuichi BABA , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
发明人： Shuichi BABA , Masahiro Watanabe , Toshihiko Nakata , Yukio Kembo , Toru Kurenuma , Takafumi Morimoto , Manabu Edamura , Satoshi Sekino
IPC分类号： G01B5/28
CPC分类号： G01Q10/00 , B82Y35/00 , G01Q60/28 , G01Q60/34
摘要： In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译：在测量具有陡峭侧壁的图案的情况下，当接近图案侧壁时，探针通过作用在探针和侧壁之间的范德华力粘附到侧壁，并且在测量的轮廓中发生错误侧壁部分。当测量具有几乎等于探针直径的槽宽度的图案时，探针粘附到两个侧壁，探针不能到达凹槽底部，并且不能测量凹槽深度。当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时，通过检测探针与图案侧壁的粘附力使探针到达侧壁底部，并暂时增加探针和样品之间的接触力。此外，通过利用图案的形状数据获得悬臂的扭转量的数据，通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。

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