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1. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

2. 发明授权

US4788577A Substrate surface deflecting device 失效
标题翻译：基板表面偏转装置
公开(公告)号：US4788577A
公开(公告)日：1988-11-29
申请号：US142698
申请日：1988-01-11
申请人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
发明人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
IPC分类号： G02F1/13 , G03B27/32 , G03F7/20 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
摘要翻译：曝光装置包括：设置在舞台上的底板; 柔性卡盘板，其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构，包括设置在基板处的预定间隔的多个进给螺杆，用于旋转地驱动每个进给螺杆的多个旋转致动器，以及插入在卡盘板和基板之间的多个弹簧构件以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构，用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构，由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动掩模和用于测量基板的水平的机构，以便使基板经由柔性卡盘板偏转，从而在掩模和基板之间产生均匀的间隙。

3. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

4. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

5. 发明授权

US4777641A Method and apparatus for alignment 失效
标题翻译：对准方法和装置
公开(公告)号：US4777641A
公开(公告)日：1988-10-11
申请号：US918004
申请日：1986-10-14
申请人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
发明人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
IPC分类号： G02B7/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G21K5/00
CPC分类号： G03F9/70
摘要： A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
摘要翻译：一种用于X射线曝光等的对准用的方法和装置，其中提供具有由形成在掩模的周边部分中的至少一个线性部分构成的取向图案的掩模和晶片，其具有：形成与由掩模的对准图形相同的方向形成并由直线段构成的对准图案。照明装置沿着对准方向倾斜的方向照射到掩模对准图案，并且将掩模对准图案和晶片对准图案成像并变换为视频信号。 A / D将视频信号转换为数字信号，并将数字信号存储在存储器中。从存储器中读出数字视频信号，并通过去除由掩模对准图形引起的阴影部分并以平均的晶片对准图案信号和平均的晶片对准图案在晶片对准图案区域中平均化，以掩模对准图案平均化提供信号。从平均的掩模对准图案信号中检测掩模和晶片之间的相对位移，并且通过移动掩模和晶片中的至少一个来对准平均的晶片对准图案信号并且掩模和晶片，使得掩模和晶片之间的位移不存在。

6. 发明授权

US4213117A Method and apparatus for detecting positions of chips on a semiconductor wafer 失效
标题翻译：用于检测半导体晶片上的芯片位置的方法和装置
公开(公告)号：US4213117A
公开(公告)日：1980-07-15
申请号：US964353
申请日：1978-11-28
申请人： Yukio Kembo , Asahiro Kuni , Hiroshi Makihira
发明人： Yukio Kembo , Asahiro Kuni , Hiroshi Makihira
IPC分类号： H01L23/544 , G06K9/04
CPC分类号： H01L23/544 , H01L2223/54453 , H01L2924/0002
摘要： A method and apparatus for detecting positions of chips on a semiconductor wafer. The method comprises an illuminating step for illuminating obliquely the semiconductor wafer from above including at least a position detecting direction; a totalizing step for optically totalizing, when the irregular reflecting rays reflecting at the semiconductor wafer illuminated at the illuminating step are photographed by an image pickup element or device, the irregular reflecting rays in the direction normal to the position detecting direction or for electrically totalizing the levels of a video signal produced by the image pickup element or device in the same direction; a video signal detecting step for producing a video signal with coordinates lying in the position detecting direction by photographing an image resulting from optical totalization at the totalizing step by the image pickup element or device or electrically totalizing the image; and a street position detecting step for detecting a street position between chips by extracting a specific coordinate with a wide width and a low level corresponding to dark from the video signal produced at the video signal detecting step. The apparatus executes the above-mentioned method.
摘要翻译：一种用于检测半导体晶片上的芯片位置的方法和装置。该方法包括用于从至少位置检测方向从上方倾斜地照射半导体晶片的照明步骤; 当在照明步骤照射的半导体晶片处反射的不规则反射光线被图像拾取元件或器件拍摄时，在垂直于位置检测方向的方向上的不规则反射光线或用于电气地将由图像拾取元件或装置在相同方向上产生的视频信号的电平; 视频信号检测步骤，用于通过拍摄由图像拾取元件或装置的累积步骤产生的由光学累积得到的图像，或者电子地对图像进行电积分，产生具有处于位置检测方向的坐标的视频信号; 以及街道位置检测步骤，用于通过从视频信号检测步骤中产生的视频信号提取具有与深度对应的宽宽度和低电平的特定坐标来检测码片之间的街道位置。该装置执行上述方法。

7. 发明授权

US4391511A Light exposure device and method 失效
标题翻译：曝光装置及方法
公开(公告)号：US4391511A
公开(公告)日：1983-07-05
申请号：US245193
申请日：1981-03-18
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G03F7/20 , G03F7/24 , G03F9/02 , H01L21/683 , G03B27/52
CPC分类号： G03F7/707 , G03F7/24 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T279/11
摘要： A light exposure device and method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface of the substrate, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposure surface and deforming means for imparting a force to the back surface of the substrate to deform the substrate, and control means for controlling the deforming means of the chuck in accordance with the curvature of the exposure surface of the substrate measured by the measuring means such that the exposure surface of the substrate conforms to an image surface of the pattern over an entire exposure area within a predetermined allowable error.
摘要翻译：一种用于在基板的曝光表面上曝光和印刷预定图案的曝光装置和方法，包括：用于测量基板的曝光表面的曲率的测量装置，包括用于吸附和保持基板的背面的吸持和保持装置的卡盘与曝光面相反的基板和用于赋予基板背面使其变形的变形机构，以及控制装置，用于根据基板的曝光面的曲率来控制卡盘的变形装置，该曲率由所述测量装置使得所述基板的曝光表面在预定的允许误差范围内在整个曝光区域上符合所述图案的图像表面。

8. 发明授权

US4491787A Flatness measuring device 失效
标题翻译：平面度测量装置
公开(公告)号：US4491787A
公开(公告)日：1985-01-01
申请号：US292933
申请日：1981-08-14
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa
IPC分类号： G01B5/28 , G01B7/34 , G01B11/30 , G01B21/30 , H01L21/66 , G01N27/00
CPC分类号： G01B7/345 , G01B5/285
摘要： A device for measuring a flatness of a plate such as a silicon wafer, a GGG wafer, a printed circuit board, a ceramic substrate, or the like. The measuring device is provided with a disc which is disposed in parallel with the plate on one of the surfaces of the plate and is driven by a rotating drive source and a plurality of detectors for detecting a distance from the detector to the surface of the plate, the detectors being disposed on the surface closer to the disc. With this arrangement, distance data from the plurality of the detectors to the surface of the plate is obtained during the course of the rotation of the disc, and a flatness of the plate is measured.
摘要翻译：用于测量诸如硅晶片，GGG晶片，印刷电路板，陶瓷基板等的板的平坦度的装置。测量装置设置有盘，该盘在板的一个表面上与板平行设置，并由旋转驱动源和多个检测器驱动，用于检测从检测器到板的表面的距离检测器设置在靠近盘的表面上。利用这种布置，在盘的旋转过程中获得从多个检测器到板的表面的距离数据，并且测量板的平坦度。

9. 发明授权

US4475223A Exposure process and system 失效
标题翻译：曝光过程和系统
公开(公告)号：US4475223A
公开(公告)日：1984-10-02
申请号：US387206
申请日：1982-06-10
申请人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
发明人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
IPC分类号： H01L21/027 , G03B27/02 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , G21K5/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.
摘要翻译： X射线曝光处理和系统，用于使用X射线将掩模图案转印到晶片上，其中通过非接触测量型的掩模高度测量装置在光干涉条带下测量许多点上的掩模上的高度在X射线曝光位置，掩模被安装在填充有He气体等的室中以防止X射线源的衰减，在晶片高度测量位置处测量许多点上的晶片上的高度与所述曝光位置不同，并且根据测量结果，通过在其上的许多点吸附并保持晶片的卡盘，晶片被独立地独立地向上或向下（即变形）精细地移动，使得晶片之间的间隙掩模和晶片被调节到期望的水平。

10. 发明申请

US20080087820A1 PROBE CONTROL METHOD FOR SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：用于扫描探针显微镜的探测控制方法
公开(公告)号：US20080087820A1
公开(公告)日：2008-04-17
申请号：US11867476
申请日：2007-10-04
申请人： Toru KURENUMA , Hiroaki Yanagimoto , Yukio Kembo , Yuichi Kunitomo , Takafumi Morimoto , Satoshi Sekino
发明人： Toru KURENUMA , Hiroaki Yanagimoto , Yukio Kembo , Yuichi Kunitomo , Takafumi Morimoto , Satoshi Sekino
IPC分类号： G01N23/00
CPC分类号： G01Q10/06 , G01Q30/06
摘要： This probe control method is applied to the scanning probe microscope having a probe section with a probe pointed at a sample, a detection section for detecting physical quantity between the sample and the probe, a measurement section for measuring the surface of the sample to obtain the surface information on the basis of the physical quantity when scanning the sample surface by the probe, and a movement mechanism with at least two degree of freedom. The probe control method has steps of moving the probe in a scanning direction different from the contact direction while making the probe come into contact with the sample surface, detecting the torsional state of the probe during the movement of the probe, and adjusting either or both of the rate in the scanning direction and the force in the contact direction on the basis of the detected value obtained by the detection step.
摘要翻译：将该探针控制方法应用于具有探针指向样品的探针部的扫描探针显微镜，用于检测样品与探针之间的物理量的检测部，测定样品表面的测定部，基于通过探针扫描样品表面时的物理量的表面信息，以及具有至少两个自由度的移动机构。探针控制方法具有使探针沿着与接触方向不同的扫描方向移动的步骤，同时使探针与样品表面接触，检测探针移动期间探针的扭转状态，并且调节任一或两者基于通过检测步骤获得的检测值，扫描方向上的速率和接触方向上的力。

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