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1. 发明授权

US09507259B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US09507259B2
公开(公告)日：2016-11-29
申请号：US13482595
申请日：2012-05-29
申请人： Mingqi Li , Emad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
发明人： Mingqi Li , Emad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0397
摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

2. 发明申请

US20130137038A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20130137038A1
公开(公告)日：2013-05-30
申请号：US13482595
申请日：2012-05-29
申请人： Mingqi Li , Amad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
发明人： Mingqi Li , Amad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0397
摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.
摘要翻译：光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。

3. 发明授权

US08603728B2 Polymer composition and photoresist comprising the polymer 有权
标题翻译：包含聚合物的聚合物组合物和光致抗蚀剂
公开(公告)号：US08603728B2
公开(公告)日：2013-12-10
申请号：US13482559
申请日：2012-05-29
申请人： Gregory P. Prokopowicz , Gerhard Polhers , Mingqi Li , Chunyi Wu , Cong Liu , Cheng-bai Xu
发明人： Gregory P. Prokopowicz , Gerhard Polhers , Mingqi Li , Chunyi Wu , Cong Liu , Cheng-bai Xu
IPC分类号： G03F7/039 , C08F214/18 , C08F218/14 , C08F22/14
CPC分类号： C08F214/186 , C08F214/18 , C08F220/28 , G03F7/0046 , G03F7/0397 , C08F2220/283 , C08F2220/185 , C08F220/32
摘要： A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
摘要翻译：共聚物包含式（I）的可溶于碱的单体的聚合产物：其中R a是H，F，C 1-10烷基或C 1-10氟代烷基，L 1是m价C 2-30亚烷基，C 3-30亚环烷基，C 6-30亚芳基，C 3-30亚烷基，X 1独立地是包含β-二酮，β-酯 - 酮，β-二酯或包含前述的至少一种的组合的基础可溶性有机基团; 和可与式（I）的碱溶性单体共聚的另外的单体。

4. 发明申请

US20120301823A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER 有权
标题翻译：聚合物组合物和包含聚合物的光催化剂
公开(公告)号：US20120301823A1
公开(公告)日：2012-11-29
申请号：US13482559
申请日：2012-05-29
申请人： Gregory P. Prokopowicz , Gerhard Pohlers , Mingqi Li , Chunyi Wu , Cong Liu , Cheng-bai Xu
发明人： Gregory P. Prokopowicz , Gerhard Pohlers , Mingqi Li , Chunyi Wu , Cong Liu , Cheng-bai Xu
IPC分类号： C08F224/00 , G03F7/004
CPC分类号： C08F214/186 , C08F214/18 , C08F220/28 , G03F7/0046 , G03F7/0397 , C08F2220/283 , C08F2220/185 , C08F220/32
摘要： A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
摘要翻译：共聚物包含式（I）的可溶于碱的单体的聚合产物：其中R a是H，F，C 1-10烷基或C 1-10氟烷基，L 1是m价的C 2-30亚烷基，C 3-30亚环烷基，C 6-30亚芳基，C 3-30亚烷基，X 1独立地为包含二 - 二酮，二酯 - 酮，二 - 二酯的基础可溶性有机基团，或包含至少一种前面的; 和可与式（I）的碱溶性单体共聚的另外的单体。

5. 发明授权

US08722825B2 Surface active additive and photoresist composition comprising same 有权
标题翻译：包含其的表面活性添加剂和光致抗蚀剂组合物
公开(公告)号：US08722825B2
公开(公告)日：2014-05-13
申请号：US13482574
申请日：2012-05-29
申请人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
发明人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
IPC分类号： C08F226/06 , C08F214/18 , C08F220/34
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/32 , C08F220/34 , C08F220/36 , C08F220/38 , C08F220/58 , C08F226/06 , C08F2220/1833 , C08F2220/283 , G03F7/0045 , G03F7/0046 , G03F7/09 , G03F7/2041
摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.
摘要翻译：聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体，：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

6. 发明申请

US20130137035A1 SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
标题翻译：表面活性添加剂和包含其的光电组合物
公开(公告)号：US20130137035A1
公开(公告)日：2013-05-30
申请号：US13482574
申请日：2012-05-29
申请人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
发明人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
IPC分类号： C08F220/34 , C08F226/06
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/32 , C08F220/34 , C08F220/36 , C08F220/38 , C08F220/58 , C08F226/06 , C08F2220/1833 , C08F2220/283 , G03F7/0045 , G03F7/0046 , G03F7/09 , G03F7/2041
摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.
摘要翻译：聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体，：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

7. 发明申请

US20140065540A1 PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME 审中-公开
标题翻译：包含它们的光电子和涂层基底
公开(公告)号：US20140065540A1
公开(公告)日：2014-03-06
申请号：US14076724
申请日：2013-11-11
申请人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
发明人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/24 , C08F220/32 , C08F220/34 , C08F220/36 , C08F220/38 , C08F220/58 , C08F226/06 , C08F2220/1833 , C08F2220/283 , G03F7/0045 , G03F7/0046 , G03F7/09 , G03F7/2041
摘要： A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a, L1, LN, Ra, Rb, Rc, and X are defined herein. The polymer is a useful component of a photoresist composition.
摘要翻译：聚合物包括包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可脱保护的单体，：其中a，L1，LN，Ra，Rb，Rc和X在本文中定义。聚合物是光致抗蚀剂组合物的有用组分。

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