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1. 发明授权

US09255079B2 Photoacid generators and photoresists comprising same 有权
标题翻译：含有它的光酸产生剂和光致抗蚀剂
公开(公告)号：US09255079B2
公开(公告)日：2016-02-09
申请号：US12965368
申请日：2010-12-10
申请人： Mingqi Li , Emad Aqad , Cong Liu , Joseph Mattia , Cheng-Bai Xu , George G. Barclay
发明人： Mingqi Li , Emad Aqad , Cong Liu , Joseph Mattia , Cheng-Bai Xu , George G. Barclay
IPC分类号： C07D333/46 , C07D335/02 , C07D337/04 , C07C303/32 , C07C309/06 , C07C309/12 , G03F7/004 , C07C381/12 , C07D493/20 , C07J31/00 , G03F7/039 , G03F7/038
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07C321/30 , C07C381/12 , C07C2603/74 , C07D333/46 , C07D335/02 , C07D337/04 , C07D493/20 , C07J31/006 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
摘要翻译：提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。在特定方面，提供含锍（S +）光酸产生剂和合成锍光酸发生剂的方法。

2. 发明授权

US06849381B2 Copolymers and photoresist compositions comprising same 失效
标题翻译：包含其的共聚物和光致抗蚀剂组合物
公开(公告)号：US06849381B2
公开(公告)日：2005-02-01
申请号：US10408522
申请日：2003-04-07
申请人： George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
发明人： George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
IPC分类号： C08F220/18 , C08F222/06 , C08F232/00 , C08L33/06 , C08L35/00 , C08L45/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.
摘要翻译：本发明包括聚合物和光致抗蚀剂组合物，其包含作为树脂粘合剂组分的聚合物。本发明的光刻胶包括可以在短波长例如亚200nm，特别是193nm下有效成像的化学放大的正性抗蚀剂。本发明的聚合物适当地含有1）优选含有脂环族部分的光酸不稳定基团; 2）聚合电子缺陷单体; 3）聚合的环烯烃部分。本发明特别优选的聚合物是四聚物或五元共聚物，优选具有不同聚合的降冰片烯单元。

3. 发明授权

US09507259B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US09507259B2
公开(公告)日：2016-11-29
申请号：US13482595
申请日：2012-05-29
申请人： Mingqi Li , Emad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
发明人： Mingqi Li , Emad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0397
摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

4. 发明申请

US20130137038A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20130137038A1
公开(公告)日：2013-05-30
申请号：US13482595
申请日：2012-05-29
申请人： Mingqi Li , Amad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
发明人： Mingqi Li , Amad Aqad , Cong Liu , Ching-Lung Chen , Shintaro Yamada , Cheng-bai Xu , Joseph Mattia
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0397
摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.
摘要翻译：光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。

5. 发明申请

US20110250538A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：光电发生器和包含相同的光电元件
公开(公告)号：US20110250538A1
公开(公告)日：2011-10-13
申请号：US12965368
申请日：2010-12-10
申请人： Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
发明人： Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
IPC分类号： G03F7/004 , C07J9/00 , C07D493/18 , G03F7/20 , C07D333/46
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07C321/30 , C07C381/12 , C07C2603/74 , C07D333/46 , C07D335/02 , C07D337/04 , C07D493/20 , C07J31/006 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
摘要翻译：提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。在特定方面，提供含锍（S +）光酸产生剂和合成锍光酸发生剂的方法。

6. 发明授权

US07022454B2 Monomers, polymers, methods of synthesis thereof and photoresist compositions 失效
标题翻译：单体，聚合物，其合成方法和光致抗蚀剂组合物
公开(公告)号：US07022454B2
公开(公告)日：2006-04-04
申请号：US09794301
申请日：2001-02-26
申请人： George G. Barclay , Wang Yueh , Joseph Mattia
发明人： George G. Barclay , Wang Yueh , Joseph Mattia
IPC分类号： G03F7/004 , G03C1/492 , G03C5/00
CPC分类号： G03F7/0397 , C07C67/14 , C07C67/347 , C07C69/753 , C07C2602/42 , C07C2603/68 , G03F7/0045 , G03F7/039 , G03F7/0395 , Y10S430/109 , C07C69/54
摘要： The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.
摘要翻译：本发明提供新的脂环族酯化降冰片烯羧酸酯单体，聚合物和光致抗蚀剂组合物，其包含作为树脂粘合剂组分的聚合物。还提供了合成本发明的单体和聚合物的方法。本发明的光致抗蚀剂组合物可以在暴露于短波长（包括亚300和亚200nm波长例如193nm和157nm）的情况下提供高度分辨的浮雕图像。

7. 发明授权

US09671689B2 Cholate photoacid generators and photoresists comprising same 有权
公开(公告)号：US09671689B2
公开(公告)日：2017-06-06
申请号：US12965339
申请日：2010-12-10
申请人： Emad Aqad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
发明人： Emad Aqad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
IPC分类号： C07J31/00 , G03F7/004 , C07C381/12 , G03F7/038
CPC分类号： G03F7/0045 , C07C381/12 , C07J31/006 , G03F7/0046 , G03F7/0382
摘要： New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

8. 发明授权

US06777157B1 Copolymers and photoresist compositions comprising same 失效
标题翻译：包含其的共聚物和光致抗蚀剂组合物
公开(公告)号：US06777157B1
公开(公告)日：2004-08-17
申请号：US09567814
申请日：2000-05-09
申请人： George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
发明人： George G. Barclay , Stefan J. Caporale , Wang Yueh , Zhibiao Mao , Joseph Mattia
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.
摘要翻译：本发明包括聚合物和光致抗蚀剂组合物，其包含作为树脂粘合剂组分的聚合物。本发明的光刻胶包括可以在短波长例如亚200nm，特别是193nm下有效成像的化学放大的正性抗蚀剂。本发明的聚合物适当地含有1）优选含有脂环族部分的光酸不稳定基团; 2）聚合电子缺陷单体; 3）聚合的环烯烃部分。本发明特别优选的聚合物是四聚物或五元共聚物，优选具有不同聚合的降冰片烯单元。

9. 发明申请

US20110250537A1 CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：卤化光电发生器和包含它的光电子器件
公开(公告)号：US20110250537A1
公开(公告)日：2011-10-13
申请号：US12965339
申请日：2010-12-10
申请人： Emad AQAD , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
发明人： Emad AQAD , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
IPC分类号： G03F7/004 , G03F7/20 , C07J9/00
CPC分类号： G03F7/0045 , C07C381/12 , C07J31/006 , G03F7/0046 , G03F7/0382
摘要： New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
摘要翻译：提供新的光酸产生剂化合物（“PAG”），其包含胆酸盐部分和包含这种PAG化合物的光致抗蚀剂组合物。

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