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1. 发明授权

US10670965B2 Polymers and photoresist compositions 审中-公开
公开(公告)号：US10670965B2
公开(公告)日：2020-06-02
申请号：US13077947
申请日：2011-03-31
申请人： Emad Aqad , Cong Liu , Cheng-Bai Xu , Mingqi Li
发明人： Emad Aqad , Cong Liu , Cheng-Bai Xu , Mingqi Li
IPC分类号： G03F7/039 , G03F7/20 , G03F7/004
摘要： New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

2. 发明授权

US08703383B2 Photosensitive copolymer and photoresist composition 有权
标题翻译：光敏共聚物和光致抗蚀剂组合物
公开(公告)号：US08703383B2
公开(公告)日：2014-04-22
申请号：US13298761
申请日：2011-11-17
申请人： James W. Thackeray , Emad Aqad , Su Jin Kang , Owendi Ongayi
发明人： James W. Thackeray , Emad Aqad , Su Jin Kang , Owendi Ongayi
IPC分类号： G03F7/039 , G03F7/09 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , C08F212/08 , C08F212/14 , C08F212/34 , C08F216/12 , G03F7/0045 , G03F7/0046 , C08F216/125 , C08F216/165 , C08F216/1466
摘要： A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.
摘要翻译：共聚物具有式：其中R1-R5独立地为H，C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30酸可分解基团; 每个Ar是单环，多环或稠合的多环C 6-20芳基; 每个R 7和R 8是-OR 11或-C（CF 3）2 OR 11，其中每个R 11是H，氟化或非氟化的C5-30酸可分解基团或其组合; 每个R 9独立地为F，C 1-10烷基，C 1-10氟烷基，C 1-10烷氧基或C 1-10氟烷氧基; R10是含阳离子结合的C10-40光酸产生剂基团，摩尔分数a，b和d分别为0〜0.80，c为0.01〜0.80，e为0〜0.50，a，b，d为0， e大于0，和a + b + c + d + e为1,1，m为1〜4的整数，n为0〜5的整数。光致抗蚀剂和被覆基材各自包含共聚物。

3. 发明申请

US20110250537A1 CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：卤化光电发生器和包含它的光电子器件
公开(公告)号：US20110250537A1
公开(公告)日：2011-10-13
申请号：US12965339
申请日：2010-12-10
申请人： Emad AQAD , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
发明人： Emad AQAD , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
IPC分类号： G03F7/004 , G03F7/20 , C07J9/00
CPC分类号： G03F7/0045 , C07C381/12 , C07J31/006 , G03F7/0046 , G03F7/0382
摘要： New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
摘要翻译：提供新的光酸产生剂化合物（“PAG”），其包含胆酸盐部分和包含这种PAG化合物的光致抗蚀剂组合物。

4. 发明申请

US20130344438A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
标题翻译：光电发生器，光电元件，涂覆基板和形成电子器件的方法
公开(公告)号：US20130344438A1
公开(公告)日：2013-12-26
申请号：US13925926
申请日：2013-06-25
申请人： Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
发明人： Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0395 , G03F7/20
摘要： A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.
摘要翻译：光酸产生剂具有式（I）：其中R1，R2，R3，L1，L2，L3X，Z +，a，b，c，d，p，q和r在本文中定义。光致抗蚀剂包括光致酸产生剂，并且涂覆制品包括光致抗蚀剂。光致抗蚀剂可用于形成电子器件。

5. 发明授权

US08338077B2 Photoacid generators and photoresists comprising same 有权
标题翻译：含有它的光酸产生剂和光致抗蚀剂
公开(公告)号：US08338077B2
公开(公告)日：2012-12-25
申请号：US12820331
申请日：2010-06-22
申请人： Mingqi Li , Cheng-Bai Xu , Emad Aqad , Cong Liu
发明人： Mingqi Li , Cheng-Bai Xu , Emad Aqad , Cong Liu
IPC分类号： G03F7/028 , G03F7/029 , G03F7/039 , G03F7/26
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
摘要翻译：本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。特别地，本发明涉及包含多环内酯部分的光酸产生剂化合物。

6. 发明申请

US20110159429A1 PHOTOSENSITIVE COMPOSITIONS 有权
标题翻译：光敏组合物
公开(公告)号：US20110159429A1
公开(公告)日：2011-06-30
申请号：US12981916
申请日：2010-12-30
申请人： James W. THACKERAY , Emad Aqad
发明人： James W. THACKERAY , Emad Aqad
IPC分类号： G03F7/004 , G03F7/20 , C08F265/06
CPC分类号： G03F7/0045 , C08F28/02 , C08F220/18 , C08F220/24 , C08F220/38 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122 , C08F2220/301 , C08F220/22
摘要： Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.
摘要翻译：提供了可用于光刻工艺中的辐射敏感聚合物和组合物。聚合物和组合物对激活辐射提供增强的灵敏度。

7. 发明授权

US09671689B2 Cholate photoacid generators and photoresists comprising same 有权
公开(公告)号：US09671689B2
公开(公告)日：2017-06-06
申请号：US12965339
申请日：2010-12-10
申请人： Emad Aqad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
发明人： Emad Aqad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
IPC分类号： C07J31/00 , G03F7/004 , C07C381/12 , G03F7/038
CPC分类号： G03F7/0045 , C07C381/12 , C07J31/006 , G03F7/0046 , G03F7/0382
摘要： New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

8. 发明申请

US20140120471A1 PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING THE PHOTORESIST AND METHOD OF MAKING AN ARTICLE 有权
标题翻译：包含光致发光组合物的光致发光组合物和包含它们的光电组合物，包含光电子的涂层物和制造方法
公开(公告)号：US20140120471A1
公开(公告)日：2014-05-01
申请号：US13661553
申请日：2012-10-26
申请人： Emad Aqad , Cheng-Bai Xu , Cong Liu , Mingqi Li , Shintaro Yamada
发明人： Emad Aqad , Cheng-Bai Xu , Cong Liu , Mingqi Li , Shintaro Yamada
IPC分类号： C07C321/10 , G03F7/20 , G03F7/027
CPC分类号： C07C381/12 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/17 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfonamide, wherein R is H or C1-20 alkyl, and wherein the C1-20 alkylene group is structurally only carbon, or one or more structural carbon atoms in the C1-20 alkylene group is replaced by oxygen, carbonyl, ester, or a combination comprising at least one of the foregoing, Ar is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic cycloalkyl; or a substituted or unsubstituted, C5 or greater monocyclic, polycyclic, or fused polycyclic aryl group, wherein the cycloalkyl or aryl is a carbocycle or comprises a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, each R1 is independently a substituted C5-40 aryl, substituted C5-40 heteroaryl, C1-40 alkyl, a C3-40 cycloalkyl, wherein when x is 1, the two groups R1 are separate or bonded to each other to form a C4-40 ring structure, and Z− is a carboxylate, sulfate, sulfonate, sulfamate, or the anion of a sulfonimide, wherein when Y is a single bond, Z− is not sulfonate.
摘要翻译：具有式（I）的化合物：其中a是1至10的整数，x是1至3的整数，X 1包括氟代醇，氟化酯或氟化酐，Y是单键，C1 -20亚烷基，O，S，NR，酯，碳酸酯，磺酸酯，砜或磺酰胺，其中R是H或C 1-20烷基，其中C 1-20亚烷基在结构上仅为碳，或一个或多个结构 C 1-20亚烷基中的碳原子被氧，羰基，酯或包含至少一个前述的组合代替，Ar是取代或未取代的C5或更大单环，多环或稠合的多环环烷基; 或取代或未取代的C5或更大单环，多环或稠合多环芳基，其中环烷基或芳基是碳环或包含含O，S，N，F的杂原子，或包含至少一个上述，每个R 1独立地为取代的C 5-40芳基，取代的C 5-40杂芳基，C 1-40烷基，C 3-40环烷基，其中当x为1时，两个基团R1彼此分离或键合形成C4 -40环结构，Z-是羧酸盐，硫酸盐，磺酸盐，氨基磺酸盐或磺酰亚胺的阴离子，其中当Y是单键时，Z-不是磺酸盐。

9. 发明申请

US20120129108A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：基础反应光电发生器和包含它的光电子器件
公开(公告)号：US20120129108A1
公开(公告)日：2012-05-24
申请号：US13296949
申请日：2011-11-15
申请人： Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
发明人： Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
IPC分类号： G03F7/20 , C08G75/00 , C07C309/19
CPC分类号： C07C381/12 , C07C63/72 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/08 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/20 , C07C309/23 , C07C309/24 , C07C2602/42 , C08F220/22 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
摘要翻译：本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。特别地，本发明涉及包含可碱基裂解基团的光酸产生剂化合物。

10. 发明申请

US20120129105A1 PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION 有权
标题翻译：光敏共聚物和光电组合物
公开(公告)号：US20120129105A1
公开(公告)日：2012-05-24
申请号：US13298761
申请日：2011-11-17
申请人： James W. Thackeray , Emad Aqad , Su Jin Kang , Owendi Ongayi
发明人： James W. Thackeray , Emad Aqad , Su Jin Kang , Owendi Ongayi
IPC分类号： G03F7/20 , C08F228/06 , G03F7/027 , C08F220/68 , G03F7/004
CPC分类号： G03F7/0392 , C08F212/08 , C08F212/14 , C08F212/34 , C08F216/12 , G03F7/0045 , G03F7/0046 , C08F216/125 , C08F216/165 , C08F216/1466
摘要： A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.
摘要翻译：共聚物具有式：其中R1-R5独立地为H，C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30酸可分解基团; 每个Ar是单环，多环或稠合的多环C 6-20芳基; 每个R 7和R 8是-OR 11或-C（CF 3）2 OR 11，其中每个R 11是H，氟化或非氟化的C5-30酸可分解基团或其组合; 每个R 9独立地为F，C 1-10烷基，C 1-10氟烷基，C 1-10烷氧基或C 1-10氟烷氧基; R10是含阳离子结合的C10-40光酸产生剂基团，摩尔分数a，b和d分别为0〜0.80，c为0.01〜0.80，e为0〜0.50，a，b，d为0， e大于0，和a + b + c + d + e为1,1，m为1〜4的整数，n为0〜5的整数。光致抗蚀剂和被覆基材各自包含共聚物。

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