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1. 发明授权

US4420233A Projecting apparatus 失效
标题翻译：投影仪
公开(公告)号：US4420233A
公开(公告)日：1983-12-13
申请号：US381675
申请日：1982-05-24
申请人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
发明人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
IPC分类号： G03B13/36 , G02B7/28 , G03B3/10 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/34 , G03B21/28
CPC分类号： G03F7/70891 , G03B3/10 , G03F9/70
摘要： A projecting apparatus for forming an image of a mask on a wafer by a projector of a unit magnification reflection system having a concave spherical mirror and a convex spherical mirror. The distance from the projector to the mask or the upper side of a mask holder for holding the mask and the distance from the projector to the wafer are measured. An error of the image-forming position is computed from the distance measurements. At least one of the mask, the wafer and the projector is moved along the direction of projection in a manner to eliminate the error of the image-forming position computed, thus attaining automatic focus adjustment.
摘要翻译：一种用于通过具有凹球面镜和凸球面镜的单元放大反射系统的投影仪在晶片上形成掩模图像的投影设备。测量从投影仪到掩模的距离或用于保持面罩的掩模支架的上侧以及从投影仪到晶片的距离。从距离测量计算图像形成位置的误差。掩模，晶片和投影仪中的至少一个沿着投影方向移动，以消除所计算的图像形成位置的误差，从而获得自动聚焦调整。

2. 发明授权

US07020306B2 Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device 失效
标题翻译：抛光垫表面状态评价方法及其装置以及半导体装置的制造方法
公开(公告)号：US07020306B2
公开(公告)日：2006-03-28
申请号：US09774723
申请日：2001-02-01
申请人： Takenori Hirose , Hiroyuki Kojima , Mineo Nomoto , Susumu Aiuchi
发明人： Takenori Hirose , Hiroyuki Kojima , Mineo Nomoto , Susumu Aiuchi
IPC分类号： G06K9/00
CPC分类号： B24B37/20 , B24B49/12 , G01N21/41 , G01N21/55
摘要： The object of the present invention is to establish a technology for directly evaluating polishing pad surface conditions, to allow high-precision CMP process management, and to improve process throughput. The pad surface is illuminated with light. The intensity of reflected light or fluorescence from the illuminated area or an intensity distribution image is used directly evaluate the pad surface condition. Based on the results of this evaluation, conditioning conditions for a conditioner are optimized, thus allowing high-precision CMP processing while maintaining good pad surface conditions.
摘要翻译：本发明的目的是建立一种用于直接评估抛光垫表面状态，允许高精度CMP处理管理并提高工艺生产能力的技术。焊盘表面用光照亮。使用来自照射区域的反射光或荧光的强度或强度分布图像直接评估焊盘表面状况。根据该评价结果，对调理剂的调理条件进行优化，从而在保持良好的垫表面状态的同时进行高精度的CMP处理。

3. 发明授权

US4628531A Pattern checking apparatus 失效
标题翻译：图案检查装置
公开(公告)号：US4628531A
公开(公告)日：1986-12-09
申请号：US583867
申请日：1984-02-27
申请人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
发明人： Keiichi Okamoto , Kozo Nakahata , Yukio Matsuyama , Hideaki Doi , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G01B11/24 , G01N21/88 , G01N21/956 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/956 , G06T2207/10056 , G06T2207/30148
摘要： A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
摘要翻译：模式检查装置通过具有足够高的灵敏度的主要选择来执行候选缺陷的检测，以检测任何现有缺陷，然后通过控制处理器对包括检测到的候选缺陷的外围的图案进行详细分析，通过从候选者中删除不是实际意义上的缺陷的候选缺陷的次要选择，从而仅检测到真实的缺陷。

4. 发明授权

US4391511A Light exposure device and method 失效
标题翻译：曝光装置及方法
公开(公告)号：US4391511A
公开(公告)日：1983-07-05
申请号：US245193
申请日：1981-03-18
申请人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
发明人： Nobuyuki Akiyama , Yukio Kembo , Yasuo Nakagawa , Susumu Aiuchi , Mineo Nomoto
IPC分类号： G03F7/20 , G03F7/24 , G03F9/02 , H01L21/683 , G03B27/52
CPC分类号： G03F7/707 , G03F7/24 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T279/11
摘要： A light exposure device and method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface of the substrate, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposure surface and deforming means for imparting a force to the back surface of the substrate to deform the substrate, and control means for controlling the deforming means of the chuck in accordance with the curvature of the exposure surface of the substrate measured by the measuring means such that the exposure surface of the substrate conforms to an image surface of the pattern over an entire exposure area within a predetermined allowable error.
摘要翻译：一种用于在基板的曝光表面上曝光和印刷预定图案的曝光装置和方法，包括：用于测量基板的曝光表面的曲率的测量装置，包括用于吸附和保持基板的背面的吸持和保持装置的卡盘与曝光面相反的基板和用于赋予基板背面使其变形的变形机构，以及控制装置，用于根据基板的曝光面的曲率来控制卡盘的变形装置，该曲率由所述测量装置使得所述基板的曝光表面在预定的允许误差范围内在整个曝光区域上符合所述图案的图像表面。

5. 发明申请

US20070041410A1 Apparatus for fabricating a display device 审中-公开
标题翻译：用于制造显示装置的装置
公开(公告)号：US20070041410A1
公开(公告)日：2007-02-22
申请号：US11588387
申请日：2006-10-27
申请人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
发明人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
IPC分类号： H01S3/10 , G02B27/10
CPC分类号： H01L21/02683 , H01L21/0268 , H01L21/02691 , H01L21/2026 , H01L21/268 , H01L27/1285 , H01L29/04 , H01L29/66757
摘要： Apparatus for fabricating a display device includes a stage capable of mounting an insulating substrate of the display device and moving the insulating substrate, linear scales which detect a position or moving distance of the substrate, a laser oscillator which generates continuous-waves laser light, a modulator which turns ON/OFF the continuous-wave laser light, a beam forming optic which shapes the continuous-wave laser light passing through the modulator into a linear or rectangular form, an objective lens which projects the at least one of the laser light on the insulating substrate so as to irradiate the insulating substrate with the laser light. The controller counts signals generated by the linear scales for every movement of the stage for a given distance, causes the modulator to turn the generated continuous-wave laser light in an ON state at time when a position of the insulating substrate on which the laser light irradiation is to be started reaches an area on which the laser light is projected, and causes the modulator to turn the generated continuous-wave laser light in an OFF state at another time.
摘要翻译：用于制造显示装置的装置包括能够安装显示装置的绝缘基板并移动绝缘基板的台，检测基板的位置或移动距离的线性标尺，产生连续波激光的激光振荡器，将连续波激光切换为ON / OFF的调制器，将通过调制器的连续波激光成形为直线或矩形的光束形成光学器件，将至少一个激光投射到的物镜绝缘基板，以激光照射绝缘基板。控制器对于给定距离的级的每次移动来对由线性标尺产生的信号进行计数，使得调制器将产生的连续波激光在其上的激光的绝缘基板的位置处于接通状态照射开始到达投射激光的区域，并且使得调制器在另一时间将所产生的连续波激光转为OFF状态。

6. 发明申请

US20060215171A1 Method and apparatus for measuring displacement of a sample 有权
公开(公告)号：US20060215171A1
公开(公告)日：2006-09-28
申请号：US11188732
申请日：2005-07-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

7. 发明授权

US06950545B1 Nondestructive inspection method and apparatus 失效
公开(公告)号：US06950545B1
公开(公告)日：2005-09-27
申请号：US09698810
申请日：2000-10-26
申请人： Mineo Nomoto , Daiske Katsuta , Toshio Asano , Kaoru Sakai , Tetsuo Taguchi , Isao Tanaka
发明人： Mineo Nomoto , Daiske Katsuta , Toshio Asano , Kaoru Sakai , Tetsuo Taguchi , Isao Tanaka
IPC分类号： G01N27/82 , G01N21/91 , G06K9/00 , G01J4/00 , G01N21/00
CPC分类号： G06K9/4652 , G01N21/91
摘要： The present invention relates to a method for inspecting a crack in a metal surface or the like, and, particularly, to an inspection method and apparatus for nondestructive inspection such as liquid penetrant inspection and magnetic particle testing. The present invention provides a flaw inspection method that essentially comprises the steps of illuminating a surface of a sample to be inspected, obtaining an image of the surface, characterizing a potential flaw on the inspected surface by processing the obtained image, displaying an image of the potential flaw, verifying that the potential flaw is a true flaw, and storing an image of the verified flaw in memory.

8. 发明授权

US5301248A Method for pattern inspection and apparatus therefor 失效
标题翻译：图案检查方法及其设备
公开(公告)号：US5301248A
公开(公告)日：1994-04-05
申请号：US904892
申请日：1992-06-25
申请人： Ninomiya Takanori , Kazushi Yoshimura , Mineo Nomoto
发明人： Ninomiya Takanori , Kazushi Yoshimura , Mineo Nomoto
IPC分类号： G01R31/308 , G06T7/00 , G06K9/00
CPC分类号： G06T7/001 , G01R31/308 , G06T7/0006 , G06T2207/20036 , G06T2207/20144 , G06T2207/30141
摘要： A detected pattern is binarized, the binarized pattern is expanded, an image size is reduced while a connectivity of the expanded pattern is preserved and stored in a first memory. In turn, the binarized pattern is contracted, the image size is reduced while a connectivity of the contracted pattern is preserved and stored in a second memory. Then the expanded pattern is read out from the first memory and a connectivity of the pattern is selected. The contracted pattern is read out from the second pattern and the connectivity of the pattern is extracted. The selected connectivities are compared with the connectivity of a normal pattern to detect a non-coincidence. The circuit pattern having a short circuit or a semi-short circuit defect and a circuit pattern having an open circuit or a semi-open circuit defect are classified and selected in response to these non-coincidences. Further, a pattern shape stored in the first memory is analyzed to specify the position where the short circuit or a semi-short circuit defect is present.
摘要翻译：检测到的图案被二值化，二值化图案被扩展，图像尺寸减小，而扩展图案的连接被保存并存储在第一存储器中。反过来，二进制图案被缩小，图像尺寸减小，而合同图案的连接被保存并存储在第二存储器中。然后，从第一存储器读出扩展模式，并且选择模式的连接。从第二模式读出收缩模式，并提取模式的连接。将所选择的连接性与正常模式的连接进行比较以检测不重合。具有短路或半短路缺陷的电路图案以及具有开路或半开路缺陷的电路图案被分类并响应于这些非重合而选择。此外，分析存储在第一存储器中的图案形状以指定存在短路或半短路缺陷的位置。

9. 发明授权

US08629985B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08629985B2
公开(公告)日：2014-01-14
申请号：US13605395
申请日：2012-09-06
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： A displacement measurement method, an apparatus thereof, and a probe microscope. which enable stable measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air and mechanical vibration. A pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. An optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：位移测量方法，其装置和探针显微镜。这使得能够以亚纳米级或更低的精度稳定地测量被测物体的位移量和移动距离，而不受诸如空气波动和机械振动之类的扰动的影响。脉冲束被分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束在相对的方向上通过相同的延迟光路被发送到被测物体的一个脉冲周期的延迟，然后被测量对象反射。通过对两束脉冲光束进行干涉而获得由测量对象的运动引起的光学相位变化。

10. 发明授权

US08284406B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08284406B2
公开(公告)日：2012-10-09
申请号：US12063860
申请日：2006-08-09
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： The present invention provides a displacement measurement method, an apparatus thereof, a probe microscope. which make it possible to stably measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air, mechanical vibration.Specifically, with the present invention, a pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. Then, an optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：本发明提供一种位移测量方法，其装置，探针显微镜。这使得可以在不受空气波动，机械振动等干扰的影响的情况下以亚纳米级或更低的精度来稳定地测量被测物体的位移量和移动距离。具体地说，利用本发明，将脉冲光束分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束以相同的方向通过相同的延迟光路，直到被测物体的延迟为一个脉冲周期，然后被测量对象反射。然后，通过对两个脉冲光束进行干涉来获得由测量对象的运动引起的光学相位变化。

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