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1. 发明授权

US4600839A Small-dimension measurement system by scanning electron beam 失效
标题翻译：通过扫描电子束的小尺寸测量系统
公开(公告)号：US4600839A
公开(公告)日：1986-07-15
申请号：US576324
申请日：1984-02-02
申请人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
发明人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
IPC分类号： G01B15/00 , G01R31/305 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00 , G01R31/305
摘要： A small-dimension measurement system by scanning electron beam comprises an electron optical column including an electron source for emitting an electron beam to scan a sample, at least one pair of detectors disposed symmetrically with respect to an optical axis of the electron optical column for detecting position information from the sample by scanning of the electron beam, and a signal selecting circuit for subjecting the outputs of the paired detectors to a predetermined signal selection. The signal selecting circuit selectively and alternately provides maximum or peak portions of the outputs of the paired detectors which portions correspond to opposite edge portions of the sample. The output of the signal selecting circuit is applied to a signal processing circuit for conversion into a dimension of a predetermined pattern on the sample.
摘要翻译：通过扫描电子束的小尺寸测量系统包括电子光学柱，其包括用于发射电子束以扫描样品的电子源，至少一对相对于电子光学柱的光轴对称设置的检测器，用于检测通过扫描电子束从样品的位置信息，以及信号选择电路，用于对成对的检测器的输出进行预定的信号选择。信号选择电路选择性地并且交替地提供成对检测器的输出的最大值或峰值部分，这些部分对应于样品的相对边缘部分。信号选择电路的输出被施加到信号处理电路，以转换成样本上的预定图案的尺寸。

2. 发明授权

US4670652A Charged particle beam microprobe apparatus 失效
标题翻译：带电粒子束微探针装置
公开(公告)号：US4670652A
公开(公告)日：1987-06-02
申请号：US737478
申请日：1985-05-24
申请人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
发明人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
IPC分类号： H01J37/22 , G01B15/00 , G01B15/04 , G01B15/08 , G01N23/225 , H01J37/28
CPC分类号： H01J37/28
摘要： A charged particle beam microprobe apparatus capable of accurately determining the three-dimensional structure of a surface is disclosed in which a detection system including at least a pair of detectors disposed symmetrically with respect to the optical axis of an charged particle beam generating instrument is used for obtaining an image signal from a surface scanned with a charged particle beam, the image signal obtained by difference detection in the detection system is compared with a pair of variable reference levels opposite in polarity to each other, to be converted into positive and negative rectangular wave signals, and information on whether the scanned surface slopes upward or downward when viewed from the detection system and information on the gradient of the scanned surface are obtained from the polarity and pulse width of each of the positive and negative rectangular wave signals, respectively, to determine the three-dimensional structure of the scanned surface. That is, the charged particle beam apparatus does not utilize a phenomenon that the coefficient of backscattered electrons is proportional to the angle of slope of a primary beam impinging surface, and hence can use secondary electron suitable for forming a high resolution scanned image.
摘要翻译：公开了一种能够精确地确定表面的三维结构的带电粒子束微探针装置，其中使用包括至少一对相对于带电粒子束产生装置的光轴对称设置的检测器的检测系统从用带电粒子束扫描的表面获得图像信号，将通过检测系统中的差分检测获得的图像信号与彼此极性相反的一对可变参考电平进行比较，以被转换为正和负矩形波信号，以及关于从检测系统观察扫描表面是向上还是向下倾斜的信息以及关于扫描表面的梯度的信息的信息分别从正和负矩形波信号的极性和脉冲宽度获得到确定扫描表面的三维结构。也就是说，带电粒子束装置没有利用背散射电子的系数与主光束入射表面的倾斜角成比例的现象，因此可以使用适于形成高分辨率扫描图像的二次电子。

3. 发明授权

US4841191A Piezoelectric actuator control apparatus 失效
标题翻译：压电致动器控制装置
公开(公告)号：US4841191A
公开(公告)日：1989-06-20
申请号：US153006
申请日：1988-02-08
申请人： Keiji Takada , Masahide Okumura , Satoru Fukuhara , Toshiyuki Morimura , Sumio Hosaka , Shigeyuki Hosoki
发明人： Keiji Takada , Masahide Okumura , Satoru Fukuhara , Toshiyuki Morimura , Sumio Hosaka , Shigeyuki Hosoki
IPC分类号： G01Q10/00 , H01L41/04 , H01L41/09
CPC分类号： G01Q10/04 , B82Y35/00 , H01L41/042
摘要： Disclosed herein are a piezoelectric actuator control apparatus comprising a capacitor connected in series with a piezoelectric actuator that has electrodes, and a control device that controls the voltage applied to the piezoelectric actuator such that the voltage of the capacitor will reach a predetermined value, as well as a piezoelectric actuator control apparatus comprising an integrating circuit connected to one electrode of a piezoelectric actuator that has electrodes, and a control device that controls the voltage of the other electrode of the piezoelectric actuator such that the output of the integration circuit will assume a predetermined magnitude.
摘要翻译：这里公开了一种压电致动器控制装置，其包括与具有电极的压电致动器串联连接的电容器，以及控制装置，其控制施加到压电致动器的电压，使得电容器的电压也达到预定值作为压电致动器控制装置，包括与具有电极的压电致动器的一个电极连接的积分电路，以及控制装置，其控制压电致动器的另一个电极的电压，使得积分电路的输出将呈现预定的大小。

4. 发明授权

US6121625A Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
公开(公告)号：US6121625A
公开(公告)日：2000-09-19
申请号：US87296
申请日：1998-05-29
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： G03F7/20 , C08F10/02 , G03F1/20 , H01J37/147 , H01J37/317 , H01L21/027 , H01J37/304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

5. 发明授权

US5402863A Apparatus to automatically adjust spring tension of an elevator brake to maintain brake torque 失效
标题翻译：自动调节电梯制动器的弹簧张力以保持制动转矩的装置
公开(公告)号：US5402863A
公开(公告)日：1995-04-04
申请号：US147472
申请日：1993-11-05
申请人： Masahide Okumura , Shigemi Iwata , Hiroyuki Ikejima
发明人： Masahide Okumura , Shigemi Iwata , Hiroyuki Ikejima
IPC分类号： B66B1/32
CPC分类号： B66B1/32
摘要： An elevator adjusting apparatus for adjusting a brake torque produced by a brake for braking travel of an elevator cage includes a brake torque adjustment mode setting unit for setting an adjustment mode for the brake torque, a cage position recognizing unit for recognizing a cage position, a cage speed detecting unit for detecting a cage speed, a brake actuation command generating unit for reissuing a brake actuation command generating unit for issuing a brake actuation command when the brake torque adjustment mode is set by the brake torque adjustment mode setting unit and the cage position recognizing unit recognizes that the cage position has reached a predetermined position of a lift passage, a brake control unit for actuating the brake in response to the brake actuation command issued from the brake actuation command generating unit, and a brake torque calculating unit for calculating the brake torque based on the cage speed detected by the cage speed detecting unit during the brake actuation. With the apparatus, the brake torque can be adjusted simply accurately and efficiently without using any weights.
摘要翻译：一种用于调节由用于制动行驶的制动器产生的制动力矩的电梯调节装置，包括用于设定制动扭矩的调整模式的制动转矩调节模式设定单元，用于识别轿厢位置的轿厢位置识别单元，用于检测轿厢速度的轿厢速度检测单元，制动促动指令发生单元，用于在制动转矩调节模式设定单元设定制动转矩调整模式时，重新发出用于发出制动动作指令的制动器动作指令生成部，识别单元识别出轿厢位置已经到达提升通道的预定位置，用于响应于从制动致动指令产生单元发出的制动器致动指令而致动制动器的制动控制单元，以及用于计算基于笼内速度检测单元在车架速度检测时的制动转矩 ake致动。利用该装置，可以简单地准确和有效地调节制动转矩，而不使用任何重量。

6. 发明授权

US5281827A Charged particle beam exposure apparatus 失效
标题翻译：带电粒子束曝光装置
公开(公告)号：US5281827A
公开(公告)日：1994-01-25
申请号：US763145
申请日：1991-09-20
申请人： Masamichi Kawano , Masahide Okumura , Haruo Yoda , Yukinobu Shibata , Tadao Konishi
发明人： Masamichi Kawano , Masahide Okumura , Haruo Yoda , Yukinobu Shibata , Tadao Konishi
IPC分类号： H01L21/30 , H01J37/302 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/302 , H01J37/3174
摘要： A column section is disposed within a thermostatic chamber within a clean room, a section for analog controlling each portion of the column section is disposed within the clean room and outside of the thermostatic chamber, and a section for digital controlling the analog control section is disposed outside of the clean room.
摘要翻译：柱部分设置在洁净室内的恒温室中，用于模拟控制柱部分的每个部分的部分设置在洁净室内和恒温室外部，并且设置用于数字控制模拟控制部分的部分在洁净室外。

7. 发明授权

US06329665B1 Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
标题翻译：用于在半导体上形成图案的带电粒子束光刻设备
公开(公告)号：US06329665B1
公开(公告)日：2001-12-11
申请号：US09621708
申请日：2000-07-21
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： H01J37304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.
摘要翻译：为了提供极大地增加图案投影数的高速和高精度的单元投影曝光装置，提供了安装传送孔和传输孔的多个模板掩模，并且通过驱动级定位，电子束通过通过其他模板掩模的透射孔，同时用光束偏转装置在模板掩模上选择孔，将传播孔连续地提供给掩模传送方向，模板掩模在与梁一起传播的同时被移动，而其它模版当指定的模板掩模孔组被曝光时，执行掩模转印。重复这些操作，以便执行所有曝光处理。

8. 发明授权

US6159644A Method of fabricating semiconductor circuit devices utilizing multiple exposures 失效
公开(公告)号：US6159644A
公开(公告)日：2000-12-12
申请号：US142077
申请日：1998-09-01
申请人： Hidetoshi Satoh , Yoshinori Nakayama , Masahide Okumura , Hiroya Ohta , Norio Saitou
发明人： Hidetoshi Satoh , Yoshinori Nakayama , Masahide Okumura , Hiroya Ohta , Norio Saitou
IPC分类号： G03F7/20 , H01J37/304 , G03F9/00
CPC分类号： G03F7/70616 , G03F7/70433 , G03F7/70458 , G03F7/70633 , H01J37/3045 , H01J2237/3175 , Y10S430/143
摘要： In a semiconductor circuit device fabricating process in which a reduction image projection exposure apparatus and an electron beam exposure apparatus are in a mixed use in its exposure process, pattern position shift errors for each exposure apparatus are measured and corrected at the time of drawing by means of an electron beam drawing apparatus, thereby enhancing the alignment accuracy.First, a pattern for measuring position shifts is exposed using a stepper and the electron beam drawing apparatus. Then, the position shift errors are measured using an identical coordinate position measuring device. Accidental errors have been mixed in the measurement result at this time. On account of this, measurement data at a certain point are smoothed by taking a summation average with data on the periphery thereof, thus decreasing influences of the accidental errors. Moreover, by inverting positive or negative signs of the data on the position shift errors, the data are made into correction data. Then, the correction data are stored. When an exposure is performed by the electron beam drawing apparatus with the pattern exposed by the stepper as a reference, the correction data for the two apparatuses are transferred to the electron beam drawing apparatus, the two data are added to detected mark positions, and at positions after the addition, pattern position shifts within a wafer surface are determined. At the time of exposure, the exposure is performed at positions obtained by subtracting the correction data from the determined pattern position shifts. This method makes it possible to correct both position shift errors within the wafer surface due to the stepper and position shift errors due to the electron beam drawing apparatus, thus allowing the alignment accuracy to be enhanced. Also, this result makes it possible to enhance yield for products in the fabricating process.

9. 发明授权

US4099054A SEM having D-C bias of video signal controlled by maximum and/or minimum of CRT beam current 失效
标题翻译：具有最大和/或最小CRT射束电流控制的视频信号的D-C偏移的SEM
公开(公告)号：US4099054A
公开(公告)日：1978-07-04
申请号：US810163
申请日：1977-06-27
申请人： Masahide Okumura , Yasushi Saito
发明人： Masahide Okumura , Yasushi Saito
IPC分类号： G01N23/225 , H01J37/256 , G01N23/00
CPC分类号： H01J37/256 , G01N23/225
摘要： A charged particle apparatus wherein a charged particle beam irradiates an object to be observed and secondary emissions such as secondary electrons thus emitted from a surface layer of the object are detected. A signal indicative of the detected secondary emissions is applied to a control grid of a cathode ray tube to modulate an electron beam irradiating a fluorescent screen thereof. A detector detects the electron beam intensity of the cathode ray tube and minimum and maximum or peak values of the detected electron beam intensity are compared with predetermined reference signals to obtain deviation signals indicative of the difference therebetween. The signal applied to the control grid of the cathode ray tube is controlled in accordance with the deviation signals.

10. 发明授权

US4090106A Field emision electron gun with controlled power supply 失效
标题翻译：具有受控电源的现场电子枪
公开(公告)号：US4090106A
公开(公告)日：1978-05-16
申请号：US751987
申请日：1976-12-20
申请人： Masahide Okumura , Yoshio Sakitani , Yukichi Ueno
发明人： Masahide Okumura , Yoshio Sakitani , Yukichi Ueno
IPC分类号： H01J3/02 , G01Q30/02 , G05F1/46 , H01J37/04 , H01J37/073 , G05F1/00 , H05B37/02
CPC分类号： G05F1/46
摘要： A field emission electron gun according to this invention comprises a cathode for emitting electrons, an anode, a high voltage source which applies a high voltage between the cathode and the anode in order to cause emission of electrons from the cathode, a reference voltage source, voltage control means for controlling and stabilizing the output voltage of the high voltage source in response to an output voltage of the reference voltage source, means for detecting the value of an emission current from the cathode, means for delivering as an output a signal corresponding to the difference between the detected value and a desired value, and means for applying the output signal to the reference voltage source through a switch. The reference voltage source includes means which, when the switch is in the closed state, controls the output voltage of the reference voltage source in response to the difference output signal, and means which, when the switch is in the open state, continues to hold the output voltage value of the reference voltage source immediately before the opening of the switch as it is. The electron gun of this invention accordingly conducts when the switch is in the closed state, a constant current operation which makes constant the emission current from the cathode, and conducts when the switch is in the open state, a constant voltage operation which makes constant the voltage applied between the cathode and the anode.
摘要翻译：根据本发明的场发射电子枪包括用于发射电子的阴极，阳极，在阴极和阳极之间施加高电压以从阴极发射电子的高电压源，参考电压源，用于响应于参考电压源的输出电压控制和稳定高电压源的输出电压的电压控制装置，用于检测来自阴极的发射电流的值的装置，用于将作为输出的信号传送到对应于检测值和期望值之间的差异，以及用于通过开关将输出信号施加到参考电压源的装置。参考电压源包括当开关处于闭合状态时响应于差分输出信号控制参考电压源的输出电压的装置，以及当开关处于打开状态时继续保持的装置直接在开关断开之前的参考电压源的输出电压值。因此，当开关处于闭合状态时，本发明的电子枪导通，使来自阴极的发射电流恒定的恒定电流操作，并且当开关处于断开状态时导通，使恒定电压施加在阴极和阳极之间的电压。

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