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1. 发明授权

US4600839A Small-dimension measurement system by scanning electron beam 失效
标题翻译：通过扫描电子束的小尺寸测量系统
公开(公告)号：US4600839A
公开(公告)日：1986-07-15
申请号：US576324
申请日：1984-02-02
申请人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
发明人： Mikio Ichihashi , Satoru Fukuhara , Masahide Okumura , Hisaya Murakoshi
IPC分类号： G01B15/00 , G01R31/305 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00 , G01R31/305
摘要： A small-dimension measurement system by scanning electron beam comprises an electron optical column including an electron source for emitting an electron beam to scan a sample, at least one pair of detectors disposed symmetrically with respect to an optical axis of the electron optical column for detecting position information from the sample by scanning of the electron beam, and a signal selecting circuit for subjecting the outputs of the paired detectors to a predetermined signal selection. The signal selecting circuit selectively and alternately provides maximum or peak portions of the outputs of the paired detectors which portions correspond to opposite edge portions of the sample. The output of the signal selecting circuit is applied to a signal processing circuit for conversion into a dimension of a predetermined pattern on the sample.
摘要翻译：通过扫描电子束的小尺寸测量系统包括电子光学柱，其包括用于发射电子束以扫描样品的电子源，至少一对相对于电子光学柱的光轴对称设置的检测器，用于检测通过扫描电子束从样品的位置信息，以及信号选择电路，用于对成对的检测器的输出进行预定的信号选择。信号选择电路选择性地并且交替地提供成对检测器的输出的最大值或峰值部分，这些部分对应于样品的相对边缘部分。信号选择电路的输出被施加到信号处理电路，以转换成样本上的预定图案的尺寸。

2. 发明授权

US4605860A Apparatus for focusing a charged particle beam onto a specimen 失效
标题翻译：用于将带电粒子束聚焦到样本上的装置
公开(公告)号：US4605860A
公开(公告)日：1986-08-12
申请号：US654457
申请日：1984-09-26
申请人： Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
发明人： Satoru Fukuhara , Mikio Ichihashi , Hisaya Murakoshi , Shigemitsu Seitoh
IPC分类号： H01J37/21 , H01J37/28 , H01J37/304 , G01K1/08 , H01J3/14
CPC分类号： H01J37/304 , H01J37/21
摘要： Disclosed is an apparatus for focusing a charged particle beam onto a speciman, which comprises a scanner for scanning a pre-formed standard pattern with a charged particle beam, a converging unit capable of converging the charged particle beam onto a specimen, a detector for detecting secondary charged particles emitted as a result of scanning the standard pattern by the scanner, a circuit for deriving a standard frequency component determined by the period of scanning with the charged particle beam and the shape of the portion of the standard pattern in the region being scanned with the charged particle beam, and a circuit cooperating with the converging unit for finding the maximum value of the amplitude of the standard frequency component thereby identifying attainment of focusing of the charged particle beam with high accuracy.
摘要翻译：公开了一种用于将带电粒子束聚焦到标本上的装置，其包括用于利用带电粒子束扫描预形成的标准图案的扫描器，能够将带电粒子束收敛到样本上的会聚单元，用于检测的检测器作为由扫描仪扫描标准图案的结果而发射的二次带电粒子，用于导出由带电粒子束扫描的周期确定的标准频率分量的电路和被扫描的区域中的标准图案的部分的形状带电粒子束，以及与会聚单元配合的电路，用于找到标准频率分量的振幅的最大值，从而以高精度识别带电粒子束的聚焦。

3. 发明授权

US5134289A Field emission electron device which produces a constant beam current 失效
标题翻译：产生恒流束电流的场发射电子器件
公开(公告)号：US5134289A
公开(公告)日：1992-07-28
申请号：US627976
申请日：1990-12-17
申请人： Hisaya Murakoshi , Mikio Ichihashi , Shigeto Isakozawa , Yuji Sato
发明人： Hisaya Murakoshi , Mikio Ichihashi , Shigeto Isakozawa , Yuji Sato
IPC分类号： H01J37/285 , H01J37/073 , H01J37/24
CPC分类号： H01J37/243 , H01J37/073
摘要： A field emission electron microscope in which a controller is provided to make an electron beam current fixed due to variations in an accelerating voltage or an extracting voltage to thereby make fixed the brightness of an electron beam with which a specimen is illuminated.

4. 发明授权

US4767926A Electron beam metrology system 失效
标题翻译：电子束计量系统
公开(公告)号：US4767926A
公开(公告)日：1988-08-30
申请号：US911791
申请日：1986-09-26
申请人： Hisaya Murakoshi , Mikio Ichihashi , Kenichi Yamamoto
发明人： Hisaya Murakoshi , Mikio Ichihashi , Kenichi Yamamoto
IPC分类号： G01B15/00 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , G01B15/00
摘要： Disclosed is an electron beam metrology system for measuring the width of a pattern on a specimen by scanning the specimen with a deflected electron beam, detecting a pattern image signal provided by secondary electrons emitted from the specimen, and measuring the pattern width on the specimen on the basis of the pattern detection signal. The system comprises a signal detecting device including at least one set of two detectors disposed toward the scanning direction of the electron beam in a relation symmetrical with respect to the optical axis of the electron beam for detecting pattern image signals independently of each other, a device for recognizing surface topography of the pattern using an output signal of the signal detecting device, and a device for measuring the pattern width while discriminating as to whether the pattern is a raised-profile pattern or a hollow-profile pattern.
摘要翻译：公开了一种电子束测量系统，用于通过用偏转的电子束扫描样本来测量样本上的图案的宽度，检测由样本发射的二次电子提供的图案图像信号，并测量样本上的图案宽度模式检测信号的基础。该系统包括信号检测装置，该信号检测装置包括至少一组两个检测器，其以相对于电子束的光轴对称关系的电子束的扫描方向设置，用于彼此独立地检测图案图像信号;装置用于使用信号检测装置的输出信号来识别图案的表面形貌，以及用于测量图案宽度的装置，同时鉴别图案是凸起轮廓图案还是中空轮廓图案。

5. 发明授权

US5373158A Field-emission transmission electron microscope and operation method thereof 失效
标题翻译：场发射透射电子显微镜及其操作方法
公开(公告)号：US5373158A
公开(公告)日：1994-12-13
申请号：US69838
申请日：1993-06-01
申请人： Hisaya Murakoshi , Mikio Ichihashi
发明人： Hisaya Murakoshi , Mikio Ichihashi
IPC分类号： H01J37/073 , H01J37/141 , H01J37/26
CPC分类号： H01J37/26 , H01J2237/0492 , H01J2237/06341 , H01J2237/25
摘要： An object of the present invention is to realize a field-emission transmission electron microscope which is able to cope with both observation of an electron-microscopic image of a high brightness and microanalysis. A low aberration condenser lens 4 is disposed at the farthest position from a specimen 7, and a short focal length lens 5 is disposed at the midpoint between the specimen 7 and the condenser lens 4. In the case of an observation of an electron-microscopic image, the condenser lens unit is operated for enlargement in which the condenser lens 4 and the condenser lens 5 are driven in an interlocking motion. When the size of a beam spot on a specimen is to be reduced, a condenser lens 6 disposed close to the specimen between the condenser lens 5 and the specimen 7 is driven to make the condenser lens unit be operated for reduction. The coexistence of a small illuminating angle and the illumination of a specimen with a fine beam spot is realized, which makes it possible for a field-emission transmission electron microscope to have both functions, being able to observe a bright electron microscopic image and to perform an element analysis.
摘要翻译：本发明的目的是实现能够应对高亮度和微量分析的电子显微图像的观察的场致发射透射电子显微镜。低像差聚光透镜4设置在距样本7最远的位置，并且短焦距透镜5设置在样本7和聚光透镜4之间的中点。在观察电子显微镜的情况下图像中，聚光透镜单元被操作以使聚光透镜4和聚光透镜5以互锁的方式驱动。当要减小试样上的束斑的尺寸时，驱动设置在聚光透镜5和样品7之间的样本附近的聚光透镜6，以使聚光透镜单元被操作以进行还原。实现了小的照明角度和具有精细光束点的样本的照射的共存，这使得场致发射透射电子显微镜具有两个功能，能够观察明亮的电子显微镜图像并执行元素分析。

6. 发明授权

US4751384A Electron beam metrology system 失效
标题翻译：电子束计量系统
公开(公告)号：US4751384A
公开(公告)日：1988-06-14
申请号：US13534
申请日：1987-02-11
申请人： Hisaya Murakoshi , Mikio Ichihashi , Hideo Todokoro
发明人： Hisaya Murakoshi , Mikio Ichihashi , Hideo Todokoro
IPC分类号： G01B15/00 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01B15/00
摘要： An electron beam metrology system for measuring the width of a pattern on a surface of a sample in such a manner that the surface of the sample is scanned with an electron beam, secondary electrons emitted from the surface are detected to obtain a detection signal, and the width of the pattern is measured by using the detection signal, is disclosed in which a pair of detectors are disposed symmetrically with respect to the optical axis of the electron beam in a scanning direction thereof, a ratio of one of the output signals of the detectors to the other output signal and a ratio of the other output signal to the one output signal are formed, and a sum signal indicative of the sum of two ratios is produced, to be used for measuring the width of the pattern correctly and accurately, without being affected by a change in pattern material.
摘要翻译：一种用于以样品表面用电子束扫描的方式测量样品表面上的图案的宽度的电子束计量系统，检测从表面发射的二次电子以获得检测信号，以及通过使用检测信号测量图案的宽度，公开了一对检测器相对于电子束的光轴在其扫描方向上对称设置，其中一个检测器的输出信号形成与其他输出信号的检测器和其他输出信号与一个输出信号的比率，并且产生指示两个比率之和的和信号，以用于正确且精确地测量图案的宽度，而不受图案材料变化的影响。

7. 发明授权

US08803411B2 Charged particle beam radiation apparatus 有权
标题翻译：带电粒子束辐射装置
公开(公告)号：US08803411B2
公开(公告)日：2014-08-12
申请号：US13812700
申请日：2011-06-15
申请人： Shunichi Watanabe , Takashi Onishi , Minoru Kaneda , Hisaya Murakoshi
发明人： Shunichi Watanabe , Takashi Onishi , Minoru Kaneda , Hisaya Murakoshi
IPC分类号： H01J29/84 , H01J29/48 , H01J3/40 , H01J3/02 , H01J37/02
CPC分类号： H01J29/484 , H01J3/02 , H01J3/027 , H01J3/40 , H01J29/488 , H01J37/026 , H01J37/073 , H01J37/248 , H01J2237/038 , H01J2237/06341 , H01J2237/0802
摘要： In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.
摘要翻译：在使用导电绝缘体的加速管中，导电绝缘体的表面上的掺杂剂浓度有可能变得不均匀，使得导电绝缘体的表面电阻变得不均匀。因此，在导电绝缘体加速管的内表面上形成有多个周向槽，并且金属沿着槽的内部被金属化。当加速管表面上的特定部分的电阻与特定部分周围的区域的电阻不同时，加速管内表面上的金属化区域的电位变为固定值，因此电位分布在加速管的内表面上，在垂直方向上可以保持基本上相等于圆周方向。

8. 发明授权

US07982188B2 Apparatus and method for wafer pattern inspection 有权
标题翻译：晶圆图案检查的装置和方法
公开(公告)号：US07982188B2
公开(公告)日：2011-07-19
申请号：US11336895
申请日：2006-01-23
申请人： Hiroyuki Shinada , Hisaya Murakoshi , Hideo Todokoro , Hiroshi Makino , Yoshihiro Anan
发明人： Hiroyuki Shinada , Hisaya Murakoshi , Hideo Todokoro , Hiroshi Makino , Yoshihiro Anan
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J2237/2817
摘要： An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing a component having such an energy as not to reach the surface of the sample semiconductor is reflected in the very vicinity of the surface of the sample semiconductor by action of the electric field for deceleration and then forms an image through an imaging lens. Thus images of plural fields on the surface of the sample semiconductor are obtained and are stored in image memory units. By comparing the stored images of the plural fields with one another, the presence and position of a defect in the fields are determined.
摘要翻译：在要检查的样品半导体的表面上形成用于减小电子束的电场，具有特定面积的电子束（片状电子束）并且包含具有不能到达表面的能量的成分通过用于减速的电场的作用，样品半导体在样品半导体的表面的非常附近被反射，然后通过成像透镜形成图像。因此，获得样品半导体表面上的多个场的图像并将其存储在图像存储单元中。通过将存储的多个场的图像相互比较，确定场中的缺陷的存在和位置。

9. 发明授权

US07566871B2 Method and apparatus for pattern inspection 有权
标题翻译：图案检查方法和装置
公开(公告)号：US07566871B2
公开(公告)日：2009-07-28
申请号：US11698025
申请日：2007-01-26
申请人： Masaki Hasegawa , Hisaya Murakoshi , Hiroshi Makino
发明人： Masaki Hasegawa , Hisaya Murakoshi , Hiroshi Makino
IPC分类号： G01N23/00 , G21K7/00 , A61N5/00 , G21G5/00
CPC分类号： H01J37/265 , G06T7/0004 , G06T2207/10056 , G06T2207/30148 , H01J37/29 , H01J2237/22 , H01J2237/24592
摘要： Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph.
摘要翻译：由于用于获得具有镜电子的检查对象图像的镜像电子成像型检查装置难以优化检查条件，因为该装置的图像形成原理与常规SEM型检查装置的图像形成原理不同。为了解决上述常规问题，本发明使得用户可以通过显示检查速度S，检查对象数字信号图像的值之间的关系来直观地检查诸如检查速度，检查灵敏度等条件像素尺寸D，检查对象图像尺寸L和图像信号采集周期P，使用时间延迟积分方法作为操作画面上的图形。因此，用户可以参照所显示的图形容易地确定像素尺寸，检查图像宽度和TDI传感器操作循环的一组值。

10. 发明申请

US20090039264A1 ELECTRON MICROSCOPE 有权
标题翻译：电子显微镜
公开(公告)号：US20090039264A1
公开(公告)日：2009-02-12
申请号：US12188870
申请日：2008-08-08
申请人： Akira IKEGAMI , Minoru Yamazaki , Hideyuki Kazumi , Koichiro Takeuchi , Hisaya Murakoshi
发明人： Akira IKEGAMI , Minoru Yamazaki , Hideyuki Kazumi , Koichiro Takeuchi , Hisaya Murakoshi
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/21 , H01J37/28 , H01J37/3045 , H01J2237/24564 , H01J2237/2594 , H01J2237/28 , H01J2237/2816 , H01J2237/30461
摘要： Disclosed herein are a method for applying, while a charged particle beam is in a state being irradiated toward the sample, a voltage to the sample so that the charged particle beam does not reach the sample (hereafter such state may be referred to as a mirror state) and detecting information on a potential of a sample using a signal obtained then, and a device for automatically adjusting conditions of the device based on the result of measuring.
摘要翻译：本文公开了一种在带电粒子束处于向样品照射的状态下施加电压给样品的方法，使得带电粒子束不到达样品（此后，这种状态可以称为反射镜状态），并且使用随后获得的信号检测样品的电位的信息，以及用于基于测量结果自动调整装置的状态的装置。

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