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1. 发明授权

US07100081B1 Method and apparatus for fault classification based on residual vectors 有权
标题翻译：基于残差向量的故障分类方法和装置
公开(公告)号：US07100081B1
公开(公告)日：2006-08-29
申请号：US10682019
申请日：2003-10-09
申请人： Matthew A. Purdy , Robert J. Chong , Gregory A. Cherry , Richard J. Markle
发明人： Matthew A. Purdy , Robert J. Chong , Gregory A. Cherry , Richard J. Markle
IPC分类号： G06F11/00 , G06F19/00
CPC分类号： G05B23/0254 , G05B19/41875 , G05B2219/37519 , G05B2219/45031 , Y02P90/22
摘要： A method includes receiving a current residual vector. The current residual vector is compared to a plurality of historical residual vectors. Each historical residual vector has an associated fault classification code. At least one of the historical residual vectors is selected responsive to determining that the current residual vector matches at least one of the historical residual vectors. A fault condition is classified based on the fault classification code associated with the selected historical residual vector.
摘要翻译：一种方法包括接收当前残差矢量。将当前残差向量与多个历史残差向量进行比较。每个历史残差向量都有相关的故障分类码。响应于确定当前残差向量与至少一个历史残差向量相匹配来选择至少一个历史残差向量。基于与所选择的历史残差向量相关联的故障分类码，对故障条件进行分类。

2. 发明授权

US06871114B1 Updating process controller based upon fault detection analysis 失效
标题翻译：基于故障检测分析更新过程控制器
公开(公告)号：US06871114B1
公开(公告)日：2005-03-22
申请号：US10231713
申请日：2002-08-30
申请人： Eric O. Green , Matthew A. Purdy , Elfido Coss, Jr. , Christopher A. Bode , Robert J. Chong , Gregory A. Cherry
发明人： Eric O. Green , Matthew A. Purdy , Elfido Coss, Jr. , Christopher A. Bode , Robert J. Chong , Gregory A. Cherry
IPC分类号： G05B19/404 , G06F19/00
CPC分类号： G05B19/404 , G05B2219/37252 , G05B2219/37345 , G05B2219/45031
摘要： A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.
摘要翻译：一种基于故障检测分析调整过程控制器的方法和装置。使用加工工具进行工件的加工步骤。获取与工件的加工有关的制造数据。制造数据可以包括与处理工具有关的计量学数据和/或与加工工具的工具状态有关的刀具状态数据。基于获取的制造数据执行计量/工具状态数据集成处理。计量/工具状态数据集成过程包括对与处理工具相关的工具健康进行评估，并且基于对工具健康的评估来调整计量数据的重点。

3. 发明授权

US07774670B2 Method and apparatus for dynamically determining tester recipes 有权
标题翻译：用于动态确定测试仪配方的方法和设备
公开(公告)号：US07774670B2
公开(公告)日：2010-08-10
申请号：US11853304
申请日：2007-09-11
申请人： Richard J. Markle , Douglas C. Kimbrough , Eric O. Green , Robert J. Chong
发明人： Richard J. Markle , Douglas C. Kimbrough , Eric O. Green , Robert J. Chong
IPC分类号： G01R31/28 , G06F11/00
CPC分类号： G01R31/31707 , G01R31/31721
摘要： A method includes retrieving a group test parameter determined based on test results associated with a plurality of integrated circuit devices. A particular integrated circuit device is tested using a test program and the group test parameter.
摘要翻译：一种方法包括检索基于与多个集成电路装置相关联的测试结果确定的组测试参数。使用测试程序和组测试参数测试特定的集成电路设备。

4. 发明授权

US07473566B1 Method and apparatus for controlling a film formation process with multiple objectives 有权
标题翻译：用于控制具有多个目标的成膜过程的方法和装置
公开(公告)号：US07473566B1
公开(公告)日：2009-01-06
申请号：US10770682
申请日：2004-02-03
申请人： Matthew A. Purdy , Robert J. Chong
发明人： Matthew A. Purdy , Robert J. Chong
IPC分类号： H01L21/66
CPC分类号： G05B13/024
摘要： A method includes defining a plurality of objectives for a film formation process and employing a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process. A system includes a film formation unit and a process control unit. The film formation unit is adapted to perform a film formation process in accordance with an operating recipe. The process control unit is adapted to define a plurality of objectives for the film formation process and employ a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process.
摘要翻译：一种方法包括为成膜过程定义多个目标，并采用结合多个目标的控制方程来生成用于成膜过程的至少一个操作配方参数。系统包括成膜单元和过程控制单元。成膜单元适于根据操作配方进行成膜处理。过程控制单元适于限定用于成膜过程的多个目标，并采用并入多个目标的控制方程，以生成用于成膜过程的至少一个操作配方参数。

5. 发明授权

US06907369B1 Method and apparatus for modifying design constraints based on observed performance 失效
标题翻译：基于观察性能修改设计约束的方法和装置
公开(公告)号：US06907369B1
公开(公告)日：2005-06-14
申请号：US10425227
申请日：2003-05-02
申请人： Richard J. Markle , Robert J. Chong , Alexander J. Pasadyn
发明人： Richard J. Markle , Robert J. Chong , Alexander J. Pasadyn
IPC分类号： G05B19/418 , G06F17/50 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32018 , G05B2219/32101 , G05B2219/45026 , G06F17/5068 , Y02P90/22
摘要： A method for modifying design constraints based on observed performance includes measuring a characteristic of a plurality of devices manufactured in a process flow. A design constraint associated with the characteristic is defined. A performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint is generated. The design constraint is modified based on the performance metric. A manufacturing system includes a metrology tool and a design rule monitor. The metrology tool is configured to measure a characteristic of a plurality of devices manufactured in a process flow. The design rule monitor is configured to receive a design constraint associated with the characteristic, generate a performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint, and modify the design constraint based on the performance metric.
摘要翻译：基于观察到的性能来修改设计约束的方法包括测量在处理流程中制造的多个设备的特性。定义与特性相关的设计约束。产生与测量特性和设计约束相关的设备性能的性能指标。基于性能指标修改设计约束。制造系统包括计量工具和设计规则监视器。计量工具被配置为测量在处理流程中制造的多个装置的特性。设计规则监视器被配置为接收与特性相关联的设计约束，根据测量的特性和设计约束生成与设备的性能相关的性能度量，并且基于性能度量来修改设计约束。

6. 发明授权

US06790376B1 Process control based upon weight or mass measurements, and systems for accomplishing same 失效
标题翻译：基于重量或质量测量的过程控制以及完成相同的系统
公开(公告)号：US06790376B1
公开(公告)日：2004-09-14
申请号：US09911264
申请日：2001-07-23
申请人： Richard J. Markle , Robert J. Chong
发明人： Richard J. Markle , Robert J. Chong
IPC分类号： C03C1500
CPC分类号： H01L21/67253
摘要： In general, the present invention is directed to methods of using weight or mass measurements to control various semiconductor manufacturing processes, and systems for accomplishing same. One illustrative method comprises providing a substrate, performing a deposition process to form a process layer above the substrate, determining a weight or mass of the process layer formed above the substrate, and controlling at least one parameter of the deposition process based upon the determined weight or mass of the process layer. One illustrative system in accordance with the present invention comprises a deposition tool for performing a deposition process to form a process layer above a substrate, a pressure sensor in contact with the substrate for sensing a pressure induced as a result of the process layer formed above the substrate, and a controller for controlling at least one parameter of the deposition process based upon the sensed pressure. The method and systems disclosed herein may also be used with other processes, such as etching processes.
摘要翻译：通常，本发明涉及使用重量或质量测量来控制各种半导体制造工艺的方法，以及用于实现其的系统。一个说明性方法包括提供基底，执行沉积工艺以在基底上形成工艺层，确定在基底上形成的处理层的重量或质量，以及基于确定的重量来控制沉积过程的至少一个参数或质量的处理层。根据本发明的一个说明性系统包括用于执行沉积工艺以在基板上形成工艺层的沉积工具，与基板接触的压力传感器，用于感测由于在上面形成的处理层而导致的压力基板和用于基于所感测的压力来控制沉积工艺的至少一个参数的控制器。本文公开的方法和系统也可以与诸如蚀刻工艺的其它工艺一起使用。

7. 发明授权

US07424392B1 Applying a self-adaptive filter to a drifting process 失效
标题翻译：将自适应滤波器应用于漂移过程
公开(公告)号：US07424392B1
公开(公告)日：2008-09-09
申请号：US10323502
申请日：2002-12-18
申请人： Jin Wang , Robert J. Chong , Christopher A. Bode , Si-Zhao J. Qin , Alexander J. Pasadyn
发明人： Jin Wang , Robert J. Chong , Christopher A. Bode , Si-Zhao J. Qin , Alexander J. Pasadyn
IPC分类号： G06F17/18 , G21C17/00
CPC分类号： G05B19/41875 , G05B2219/32135 , G05B2219/32182 , G05B2219/32184 , G05B2219/37224 , G05B2219/41146 , G05B2219/41147 , G05B2219/50065 , Y02P90/22
摘要： A method and an apparatus are provided for applying a self-adaptive filter to a drifting process. The method includes processing a workpiece, measuring an output characteristic of the processed workpiece and modifying a previous estimated process state based at least on the measured output characteristic. The method further includes estimating a next process state based at least on the modified previous estimated process state.
摘要翻译：提供了一种用于将自适应滤波器应用于漂移过程的方法和装置。该方法包括处理工件，测量被处理工件的输出特性，以及至少基于所测量的输出特性修改先前的估计过程状态。该方法还包括至少基于修改的先前估计的处理状态来估计下一处理状态。

8. 发明授权

US07186487B1 Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same 有权
标题翻译：通过监控光子水平来控制曝光过程的方法以及完成相同的系统
公开(公告)号：US07186487B1
公开(公告)日：2007-03-06
申请号：US10771109
申请日：2004-02-03
申请人： Robert J. Chong
发明人： Robert J. Chong
IPC分类号： G03C5/00
CPC分类号： G03F7/70558 , G03B7/00
摘要： The present invention is generally directed to various methods of controlling exposure processes by monitoring photon levels, and various systems for accomplishing same. In one embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, counting a number of photons incident on at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the counted number of photons. In another illustrative embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, determining a rate at which the photons impact at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the determined rate of the photons impacting the layer of photo-sensitive material.
摘要翻译：本发明一般涉及通过监控光子水平来控制曝光过程的各种方法以及用于实现其的各种系统。在一个实施例中，该方法包括通过产生由来自光源的多个光子组成的光来曝光光敏材料层的至少一部分，对入射在至少一部分上的光子计数的光敏材料层，并且基于计数的光子数来控制曝光过程的持续时间和光源的辐照度中的至少一个。在另一说明性实施例中，该方法包括通过产生由光源产生的多个光子的光进行曝光处理，以暴露光敏材料层的至少一部分，确定光子至少影响的速率光敏材料层的一部分，并且基于影响光敏材料层的光子的确定速率来控制曝光过程的持续时间和光源的辐照度中的至少一个。

9. 发明授权

US08359494B2 Parallel fault detection 有权
标题翻译：并行故障检测
公开(公告)号：US08359494B2
公开(公告)日：2013-01-22
申请号：US10323272
申请日：2002-12-18
申请人： Elfido Coss, Jr. , Ernest D. Adams, III , Robert J. Chong , Howard E. Castle , Thomas J. Sonderman , Alexander J. Pasadyn
发明人： Elfido Coss, Jr. , Ernest D. Adams, III , Robert J. Chong , Howard E. Castle , Thomas J. Sonderman , Alexander J. Pasadyn
IPC分类号： G06F11/00
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method and an apparatus are provided for parallel fault detection. The method comprises receiving data associated with processing of a workpiece by a first processing tool, receiving data associated with processing of a workpiece by a second processing tool and comparing at least a portion of the received data to a common fault model to determine if a fault associated with at least one of the processing of the workpiece by the first processing tool and processing of the workpiece by the second processing tool occurred.
摘要翻译：提供了用于并行故障检测的方法和装置。该方法包括接收与第一处理工具处理工件有关的数据，通过第二处理工具接收与工件的处理有关的数据，并将至少一部分接收到的数据与常见故障模型进行比较，以确定是否存在故障与通过第一处理工具处理工件和由第二处理工具处理工件的至少一个相关联。

10. 发明授权

US06912437B2 Method and apparatus for controlling a fabrication process based on a measured electrical characteristic 有权
标题翻译：基于测量的电气特性来控制制造工艺的方法和装置
公开(公告)号：US06912437B2
公开(公告)日：2005-06-28
申请号：US10262620
申请日：2002-09-30
申请人： Robert J. Chong , Jin Wang
发明人： Robert J. Chong , Jin Wang
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： H01L22/20 , H01L22/12
摘要： A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.
摘要翻译：一种方法包括根据操作配方执行用于形成半导体器件的特征的至少一个处理。测量该特征的电气性能特征。将测量的电性能特性与电性能特性的目标值进行比较。基于比较确定操作配方的至少一个参数。系统包括处理工具，计量工具和控制器。处理工具被配置为执行根据操作配方形成半导体器件的特征的至少一个处理。测量工具被配置为测量该特征的电性能特征。控制器被配置为将测量的电性能特性与电性能特性的目标值进行比较，并且基于该比较确定操作配方的至少一个参数。

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