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    • 7. 发明授权
    • Method and apparatus for providing excitation for a process controller
    • 为过程控制器提供激励的方法和装置
    • US07020535B1
    • 2006-03-28
    • US10702877
    • 2003-11-06
    • Christopher A. BodeJ. Broc StirtonRobert J. Chong
    • Christopher A. BodeJ. Broc StirtonRobert J. Chong
    • G06F19/00
    • G05B19/41875G05B2219/32097G05B2219/37538G05B2219/45031Y02P90/22Y02P90/265
    • A method includes defining a design window for a manufacturing process performed by a tool and a process window within the design window. A workpiece likely to have a characteristic outside the process window is identified. The characteristic of the identified workpiece is measured. A control model for controlling the tool is updated using the measured characteristic. A system includes a tool, a process controller, a metrology tool, and a sampling controller. The tool is adapted to process workpieces in accordance with a manufacturing process. The manufacturing process has an associated design window and a process window defined within the design window. The process controller is adapted to control the tool using a control model. The sampling controller is adapted to identify a workpiece likely to have a characteristic outside the process window and direct the metrology tool to measure the characteristic of the identified workpiece. The process controller is further adapted to update the control model using the measured characteristic.
    • 一种方法包括定义由设计窗口内的工具和处理窗口执行的制造过程的设计窗口。 识别出可能具有处理窗口外的特征的工件。 测量所识别的工件的特性。 使用测量特性更新用于控制刀具的控制模型。 系统包括工具,过程控制器,计量工具和采样控制器。 该工具适于根据制造过程处理工件。 制造过程具有关联的设计窗口和在设计窗口内定义的过程窗口。 过程控制器适用于使用控制模型来控制工具。 采样控制器适于识别可能具有处理窗口外的特征的工件,并引导计量工具测量所识别的工件的特性。 过程控制器还适于使用所测量的特征来更新控制模型。
    • 9. 发明授权
    • Method and apparatus for controlling a fabrication process based on a measured electrical characteristic
    • 基于测量的电气特性来控制制造工艺的方法和装置
    • US06912437B2
    • 2005-06-28
    • US10262620
    • 2002-09-30
    • Robert J. ChongJin Wang
    • Robert J. ChongJin Wang
    • H01L21/66G06F19/00
    • H01L22/20H01L22/12
    • A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.
    • 一种方法包括根据操作配方执行用于形成半导体器件的特征的至少一个处理。 测量该特征的电气性能特征。 将测量的电性能特性与电性能特性的目标值进行比较。 基于比较确定操作配方的至少一个参数。 系统包括处理工具,计量工具和控制器。 处理工具被配置为执行根据操作配方形成半导体器件的特征的至少一个处理。 测量工具被配置为测量该特征的电性能特征。 控制器被配置为将测量的电性能特性与电性能特性的目标值进行比较,并且基于该比较确定操作配方的至少一个参数。