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1. 发明申请

WO2011014328A2 LIGHT-UP PREVENTION IN ELECTROSTATIC CHUCKS 审中-公开
标题翻译：静电卡匣中的防眩光
公开(公告)号：WO2011014328A2
公开(公告)日：2011-02-03
申请号：PCT/US2010/040284
申请日：2010-06-29
申请人： LAM RESEARCH CORPORATION , STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
发明人： STEVENSON, Tom , BYUN, Daniel , ULLAL, Saurabh , KADKHODAYAN, Babak , DHINDSA, Rajinder
IPC分类号： H01L21/687 , B23Q3/15 , H02N13/00
CPC分类号： H01L21/68757 , H01J37/32541 , H01J37/3255 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L21/6875
摘要： An electrostatic chuck assembly is provided comprising a ceramic contact layer, a patterned bonding layer, an electrically conductive base plate, and a subterranean arc mitigation layer. The ceramic contact layer and the electrically conductive base plate cooperate to define a plurality of hybrid gas distribution channels formed in a subterranean portion of the electrostatic chuck assembly. Individual ones of the hybrid gas distribution channels comprise surfaces of relatively high electrical conductivity presented by the electrically conductive base plate and relatively low electrical conductivity presented by the ceramic contact layer. The subterranean arc mitigation layer comprises a layer of relatively low electrical conductivity and is formed over the relatively high conductivity surfaces of the hybrid gas distribution channels in the subterranean portion of the electrostatic chuck assembly. Semiconductor wafer processing chambers are also provided.
摘要翻译：提供了一种静电吸盘组件，其包括陶瓷接触层，图案化的接合层，导电基板和地下电弧缓和层。陶瓷接触层和导电基板共同限定形成在静电吸盘组件的地下部分中的多个混合气体分配通道。混合气体分配通道中的各个混合气体分配通道包括由导电基板呈现的相对高电导率的表面以及由陶瓷接触层呈现的相对低的电导率。地下电弧缓和层包括具有相对低电导率的层并形成在静电吸盘组件的地下部分中的混合气体分配通道的相对高导电性表面上。还提供了半导体晶圆处理室。

2. 发明申请

WO2010005541A2 CLAMPED SHOWERHEAD ELECTRODE ASSEMBLY 审中-公开
标题翻译：夹式淋浴头电极组件
公开(公告)号：WO2010005541A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/003953
申请日：2009-07-06
申请人： LAM RESEARCH CORPORATION , KADKHODAYAN, Babak , DHINDSA, Rajinder , DE LA LLERA, Anthony , KELLOGG, Michael, C.
发明人： KADKHODAYAN, Babak , DHINDSA, Rajinder , DE LA LLERA, Anthony , KELLOGG, Michael, C.
IPC分类号： H05H1/34 , H05H1/38 , H01L21/3065
CPC分类号： H01J37/32532 , H01J37/32091 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01J37/32568 , H01J37/32605
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.
摘要翻译：用于半导体衬底处理中的等离子体反应室的电极组件。该组件包括上部喷头电极，该上部喷头电极包括通过夹环机械连接到背板的内电极以及通过一系列间隔开的凸轮锁附接到背板的外电极。保护环包围背板并可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以利用工具旋转以释放从外部的上表面向上延伸的凸轮销电极。为了补偿不同的热膨胀，夹环可以包括在间隔位置处的膨胀连接，这允许夹环吸收热应力。

3. 发明申请

WO2006026110A2 YTTRIA INSULATOR RING FOR USE INSIDE A PLASMA CHAMBER 审中-公开
标题翻译： YTTRIA绝缘子环用于等离子体室内
公开(公告)号：WO2006026110A2
公开(公告)日：2006-03-09
申请号：PCT/US2005/028571
申请日：2005-08-12
申请人： LAM RESEARCH CORPORATION , KADKHODAYAN, Babak , DHINDSA, Rajinder , FU, Yuehong
发明人： KADKHODAYAN, Babak , DHINDSA, Rajinder , FU, Yuehong
IPC分类号： H01L21/306 , B44C1/22
CPC分类号： C04B35/505 , C04B2235/725 , C04B2235/728 , C04B2235/77 , C04B2235/9692 , H01J37/32642 , H01J2237/0206 , Y10T29/4973
摘要： A yttria insulator ring for use in a plasma processing apparatus is provided to minimize arcing between the apparatus and a ground extension, while also increasing a mean time between cleanings (MTBC). The yttria insulator ring may be located between a ground extension and a plasma generation zone, or gap, of the chamber of the apparatus, as well as between an edge ring and the ground extension. Compared to a quartz ring, the yttria insulator ring can also provide improved semiconductor substrate uniformity because of improved RF coupling as a result of decreased reactivity and increased dielectric constant.
摘要翻译：提供用于等离子体处理装置的氧化钇绝缘体环，以最小化装置和地面延伸部之间的电弧，同时也增加清洗之间的平均时间（MTBC）。氧化钇绝缘体环可以位于设备的室的接地延伸部和等离子体产生区域或间隙之间，以及边缘环和接地延伸部之间。与石英环相比，氧化钇绝缘体环也可以提供改善的半导体衬底均匀性，因为由于反应性降低和介电常数增加导致RF耦合改善。

4. 发明申请

WO2008076408A1 SHOWERHEAD ELECTRODE ASSEMBLY WITH GAS FLOW MODIFICATION FOR EXTENDED ELECTRODE LIFE 审中-公开
标题翻译：用于延长电极寿命的喷淋电极组件
公开(公告)号：WO2008076408A1
公开(公告)日：2008-06-26
申请号：PCT/US2007/025730
申请日：2007-12-17
申请人： LAM RESEARCH CORPORATION , AUGUSTINO, Jason , DE LA LLERA, Anthony , RONNE, Allan K. , KIM, Jaehyun , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh J. , NORELL, Anthony J. , COMENDANT, Keith , DENTY, William M., Jr.
发明人： AUGUSTINO, Jason , DE LA LLERA, Anthony , RONNE, Allan K. , KIM, Jaehyun , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh J. , NORELL, Anthony J. , COMENDANT, Keith , DENTY, William M., Jr.
IPC分类号： H01L21/3065 , C23C16/505 , H01L21/205
CPC分类号： H01L21/67069 , C23C16/45565 , C23C16/45582 , H01J37/3244 , H01J37/32449 , H01J37/32541 , H01L21/67017
摘要： A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.
摘要翻译：提供了一种用于等离子体处理装置的喷头电极组件。喷头电极组件包括附接到第二构件的第一构件。第一和第二构件具有流体连通的第一和第二气体通道。当处理气体流过气体通道时，跨越第一和第二气体通道产生总压降。跨越第二气体通道的总压降的一小部分大于跨越第一气体通道的总压降的一部分。

5. 发明申请

WO2008048543A1 UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES 审中-公开
标题翻译：具有颗粒减少特性的上电极背部构件
公开(公告)号：WO2008048543A1
公开(公告)日：2008-04-24
申请号：PCT/US2007/021989
申请日：2007-10-16
申请人： LAM RESEARCH CORPORATION , DE LA LLERA, Anthony , RONNE, Allan, K. , KIM, Jaehyun , AUGUSTINO, Jason , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh, J. , NORELL, Anthony, J. , COMENDANT, Keith , DENTY, Jr., William
发明人： DE LA LLERA, Anthony , RONNE, Allan, K. , KIM, Jaehyun , AUGUSTINO, Jason , DHINDSA, Rajinder , WANG, Yen-Kun , ULLAL, Saurabh, J. , NORELL, Anthony, J. , COMENDANT, Keith , DENTY, Jr., William
IPC分类号： H01L21/205 , H01L21/203
CPC分类号： H01J37/32449 , H01J37/32009 , H01J37/32541 , H01J37/3255
摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.
摘要翻译：等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。

6. 发明申请

WO2009151538A1 SHOWERHEAD ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES 审中-公开
标题翻译：用于等离子体加工设备的淋浴电极组件
公开(公告)号：WO2009151538A1
公开(公告)日：2009-12-17
申请号：PCT/US2009/003186
申请日：2009-05-22
申请人： LAM RESEARCH CORPORATION , STEVENSON, Tom , DHINDSA, Rajinder
发明人： STEVENSON, Tom , DHINDSA, Rajinder
IPC分类号： H01L21/3065 , H01L21/205 , H05H1/34
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/52 , H01J37/32091 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , H01L21/67069
摘要： Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact regions across the backing plate; and at least one interface member separating the backing plate and the thermal control plate, or the thermal control plate and showerhead electrode, at the contact regions, the interface member having a thermally and electrically conductive gasket portion and a particle mitigating seal portion. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.
摘要翻译：公开了一种喷头电极组件，其包括适于安装在真空室内部的喷头电极; 连接到喷头电极的可选背板; 热控制板，其在跨过所述背板的多个接触区域附接到所述背板或所述喷头电极; 以及至少一个界面构件，其在所述接触区域处分离所述背板和所述热控制板或所述热控制板和喷头电极，所述界面构件具有导热和导电的垫圈部分和颗粒减轻密封部分。还公开了使用喷头电极组件处理半导体衬底的方法。

7. 发明申请

WO2013128361A1 HYBRID PLASMA PROCESSING SYSTEMS 审中-公开
标题翻译：混合等离子体处理系统
公开(公告)号：WO2013128361A1
公开(公告)日：2013-09-06
申请号：PCT/IB2013/051506
申请日：2013-02-25
申请人： LAM RESEARCH CORPORATION , LAM RESEARCH AG , DHINDSA, Rajinder
发明人： DHINDSA, Rajinder
IPC分类号： H01L23/60 , H01L23/34 , H01L21/3065
CPC分类号： H01J37/3255 , H01J37/321 , H01J37/32568
摘要： A hybrid plasma processing system and methods for manufacturing and operating same are disclosed. The hybrid plasma processing system includes an RF -powered lower electrode for supporting the substrate during processing and a hybrid upper electrode disposed in a spaced-apart relationship above the lower electrode. The hybrid upper electrode may be thermally controlled and includes a first plate formed of a first material having a first electrical resistivity, a conductive grounded plate having therein a plurality of radial slots and disposed above the first plate. The conductive plate is formed of a second material having a second electrical resistivity different from the first electrical resistivity. The hybrid upper electrode also includes an RF -powered inductive coil disposed above the conductive ground plate.
摘要翻译：公开了一种混合等离子体处理系统及其制造和操作方法。混合等离子体处理系统包括用于在处理期间支撑衬底的RF供电下电极和在下电极上方以间隔关系设置的混合上电极。混合上电极可以是热控制的，并且包括由具有第一电阻率的第一材料形成的第一板，其中具有多个径向槽并且设置在第一板上方的导电接地板。导电板由具有不同于第一电阻率的第二电阻率的第二材料形成。混合上电极还包括布置在导电接地板上方的RF施力感应线圈。

8. 发明申请

WO2013070472A2 SYSTEM, METHOD AND APPARATUS FOR PLASMA SHEATH VOLTAGE CONTROL 审中-公开
标题翻译：用于等离子体电压控制的系统，方法和装置
公开(公告)号：WO2013070472A2
公开(公告)日：2013-05-16
申请号：PCT/US2012/062867
申请日：2012-10-31
申请人： LAM RESEARCH CORPORATION , MARAKHTANOV, Alexei , DHINDSA, Rajinder , HUDSON, Eric , BAILEY III, Andrew, D.
发明人： MARAKHTANOV, Alexei , DHINDSA, Rajinder , HUDSON, Eric , BAILEY III, Andrew, D.
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01J37/32091 , H01J37/32165 , H01J37/32174
摘要： A system, method and apparatus for increasing an energy level of the ions emitted from a plasma include a plasma chamber, including a top electrode and a bottom electrode, a multiple RF sources, at least one of the RF sources being coupled to the bottom electrode. A phase locking circuit is coupled to at least two of the RF sources hereafter designated the first RF source and the second RF source. A controller is coupled to the plasma chamber, each of the RF sources and the phase locking circuit. The controller including operating system software, multiple logic circuits and a process recipe.
摘要翻译：用于增加从等离子体发射的离子的能量水平的系统，方法和装置包括等离子体室，包括顶部电极和底部电极，多个RF源，至少一个RF源耦合到底部电极。相位锁定电路耦合到以下称为第一RF源和第二RF源的至少两个RF源。控制器耦合到等离子体室，每个RF源和锁相电路。该控制器包括操作系统软件，多个逻辑电路和一个过程配方。

9. 发明申请

WO2011026126A3 A MULTI-PERIPHERAL RING ARRANGEMENT FOR PERFORMING PLASMA CONFINEMENT 审中-公开
公开(公告)号：WO2011026126A3
公开(公告)日：2011-03-03
申请号：PCT/US2010/047373
申请日：2010-08-31
申请人： LAM RESEARCH CORPORATION , DHINDSA, Rajinder , KOSHISHI, Akira , MARAKHTANOV, Alexei
发明人： DHINDSA, Rajinder , KOSHISHI, Akira , MARAKHTANOV, Alexei
IPC分类号： H05H1/46 , H01L21/3065 , C23C16/50
摘要： An arrangement for performing plasma confinement within a processing chamber during substrate processing is provided. The arrangement includes a first peripheral ring positioned next to a secondary peripheral ring. The first peripheral ring surrounds a confined chamber volume that sustains plasma for etching a substrate. The first peripheral ring includes a first plurality of slots for exhausting processed byproduct gas from the confined chamber volume. The second peripheral ring includes a second plurality of slots that is positioned next to the first plurality of slots such that the second plurality of slots does not overlap the first plurality of slots, thereby preventing a direct line-of-sight from within the confined chamber volume to an outside chamber volume (an area outside of the first peripheral ring). The arrangement also includes a manifold connecting the two rings to provide a route for exhausting the processed byproduct gas from the confined chamber volume.

10. 发明申请

WO2009058376A2 TEMPERATURE CONTROL MODULE USING GAS PRESSURE TO CONTROL THERMAL CONDUCTANCE BETWEEN LIQUID COOLANT AND COMPONENT BODY 审中-公开
标题翻译：采用气体压力控制液体冷却液和组分体之间的热导率的温度控制模块
公开(公告)号：WO2009058376A2
公开(公告)日：2009-05-07
申请号：PCT/US2008/012394
申请日：2008-10-31
申请人： LAM RESEARCH CORPORATION , DHINDSA, Rajinder , POVOLNY, Henry , ANTOLIK, Jerry K.
发明人： DHINDSA, Rajinder , POVOLNY, Henry , ANTOLIK, Jerry K.
IPC分类号： H01L21/205 , H01L21/20
CPC分类号： H01J37/32724 , C23C16/4557 , C23C16/45572 , C23C16/46 , G05D23/192 , G05D23/22 , H01J37/32522
摘要： A temperature control module for a semiconductor processing chamber comprises a thermally conductive component body, one or more channels in the component body and one or more tubes concentric therewith, such that gas filled spaces surround the tubes. By flowing a heat transfer liquid in the tubes and adjusting the gas pressure in the spaces, localized temperature of the component body can be precisely controlled. One or more heating elements can be arranged in each zone and a heat transfer liquid can be passed through the tubes to effect heating or cooling of each zone by activating the heating elements and/or varying pressure of the gas in the spaces.
摘要翻译：用于半导体处理室的温度控制模块包括导热部件主体，部件主体中的一个或多个通道和与其同心的一个或多个管，使得充满气体的空间围绕管。通过在管中流动传热液体并调节空间中的气体压力，可以精确地控制组件主体的局部温度。一个或多个加热元件可以布置在每个区域中，并且传热液体可以通过管子，以通过激活加热元件和/或改变空间中的气体的压力来实现每个区域的加热或冷却。

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