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1. 发明授权

US5425988A Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film 失效
标题翻译：包括保护膜和单分子氟有机硅膜的记录和再现装置
公开(公告)号：US5425988A
公开(公告)日：1995-06-20
申请号：US127288
申请日：1993-09-27
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C10M105/76 , C10M107/50 , C10N40/18 , G11B5/187 , G11B5/255 , G11B5/64 , G11B5/72 , G11B5/725 , G11B5/00
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G11B5/255 , G11B5/72 , G11B5/725 , Y10S428/90 , Y10T428/261 , Y10T428/268 , Y10T428/3154 , Y10T428/31544 , Y10T428/31663
摘要： A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
摘要翻译：提供了一种记录和再现装置。该装置包括记录介质，向记录介质提供和接收记录信号的磁头，以及提供和接收记录信号的机构部分和电路部分，其中至少一个保护膜和至少一个含氟单分子膜依次形成在记录介质的记录层上或与记录层接触的头的表面上，其中所述保护膜是金属膜，氧化金属膜，半导体膜，氧化物半导体膜或有机单分子膜，并且其中所述含氟单分子膜通过在保护膜的表面上的分子末端的含有全氟烷基的特定类型的硅烷化合物的化学吸附而形成。

2. 发明授权

US5202452A Terminal perfluoroalkylsilane compound and a process for preparing the same 失效
标题翻译：末端全氟烷基硅烷化合物及其制备方法
公开(公告)号：US5202452A
公开(公告)日：1993-04-13
申请号：US753522
申请日：1991-09-03
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C07F7/12 , C07F7/18
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C07F7/12 , C07F7/182
摘要： A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.
摘要翻译：描述由以下通式（I）表示的硅烷化合物：其中R 1是具有1至4个碳原子的烷基; A是氧原子（-O-），羧基基团或烷基亚甲硅基基团，其中每个R 2和R 3是具有1至4个碳原子的烷基; x是卤素原子或烷氧基; m是1至8的整数; n为0〜2的整数; p是5至25的整数; q为0〜2的整数。作为各种基材的涂布剂，除了防污性以外，还可以提供润滑性。

3. 发明授权

US5455360A 1-pyrrolyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same 失效
标题翻译： 1-吡咯基硅化合物，由其形成的化学吸附的超薄膜及其制造方法
公开(公告)号：US5455360A
公开(公告)日：1995-10-03
申请号：US107886
申请日：1993-08-18
申请人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Katsuya Takemura
发明人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Katsuya Takemura
IPC分类号： C08G77/26 , B05D1/18 , C07F7/12 , C07F7/18 , C08G77/28 , C08J5/18 , C09K3/16 , H01B1/12 , C07F7/10 , C07D207/323
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , C07F7/12 , C07F7/182 , C07F7/1836 , C07F7/1868
摘要： Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要翻译：公开了共价键合到基材表面的导电吡咯衍生物单分子膜及其制备方法，以及用于形成导电吡咯衍生物单分子膜的单体及其制造方法。本发明涉及包含1-吡咯基和硅基团的单分子超薄膜。用于形成膜的单体是通过使ω-（1-吡咯基）-1-烯烃化合物与甲硅烷衍生物化合物反应而得到的，其中甲硅烷的四个氢原子中的三个被卤素或烷氧基取代，的过渡金属催化剂。将基材浸渍并保持在上述单体的非水溶液中，从而将单分子膜化学键合到基材表面。此外，通过单分子膜的电解或催化聚合形成聚吡咯衍生物超薄膜。

4. 发明授权

US5461166A Chemically adsorbed ultrathin film and its material, and method of manufacturing the same 失效
标题翻译：化学吸附超薄膜及其材料及其制造方法
公开(公告)号：US5461166A
公开(公告)日：1995-10-24
申请号：US384594
申请日：1995-02-03
申请人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
发明人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
IPC分类号： C07B61/00 , B01J23/42 , B05D1/18 , C07F7/08 , C07F7/12 , C07F7/18 , C09K3/00 , G03F7/075 , C07D333/02 , C08G77/08 , C08F28/06
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , C07F7/12 , C07F7/182 , C07F7/1836 , C07F7/1868
摘要： Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要翻译：公开了共价结合到基板表面的导电噻吩基衍生物单分子膜及其制造方法，以及包含用于形成导电性单分子膜的3-噻吩基（噻吩衍生物）的硅化合物及其制造方法。在本发明中形成包含3-噻吩基和硅基团的单分子超薄膜。用于形成膜的硅化合物是通过使ω-（3-噻吩基）-1-烯烃化合物与甲硅烷衍生物化合物反应而得到的，其中甲硅烷中四分之三的氢原子被卤素或烷氧基取代，过渡金属催化剂的存在。将基材浸渍并保持在上述化合物的非水溶液中，从而将单分子膜化学键合到基材表面。此外，通过单分子膜的电解或催化聚合形成噻吩衍生物超薄膜。

5. 发明授权

US5254439A Light-sensitive polymer, method for preparing the same and method for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5254439A
公开(公告)日：1993-10-19
申请号：US854696
申请日：1992-03-20
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075 , G03F7/30
CPC分类号： C08G77/48 , C08G77/60 , G03F7/0754 , G03F7/0757 , Y10S430/146
摘要： There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
摘要翻译：公开了具有对远紫外线敏感的线性-Si-O-Si键和-Si-Si-Si键或大于丙硅烷键的聚硅烷键的聚合物。聚合物是通过在惰性溶剂中在钠的存在下单独或与至少一种二氯硅烷聚合二氯硅烷来制备的。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下显示吸收峰，并且适用于制备双层系统的单层抗蚀剂或上抗蚀剂。

6. 发明授权

US5126419A Light-sensitive polymer, method for preparing the same andmethod for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5126419A
公开(公告)日：1992-06-30
申请号：US622152
申请日：1990-12-03
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075
CPC分类号： G03F7/0754 , C08G77/48 , C08G77/60 , G03F7/0757
摘要： A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.
摘要翻译：具有线性-Si-O-Si-键和-Si-Si-Si-键的聚合物，或聚硅烷键多于丙硅烷键，对远紫外线敏感。感光性聚合物可以通过在惰性溶剂中在钠的存在下使二氯二硅氧烷和二氯硅烷共聚来制备。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下表现出吸收峰，并且适用于制备双层抗蚀剂体系的单层抗蚀剂或上抗蚀剂。

7. 发明授权

US4921989A .OMEGA.silylalkynyl silane compound and method for preparation thereof 失效
标题翻译： OMEGA甲硅烷基炔基硅烷化合物及其制备方法
公开(公告)号：US4921989A
公开(公告)日：1990-05-01
申请号：US359897
申请日：1989-06-01
申请人： Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： C07F7/12 , C07F7/18
CPC分类号： B82Y30/00 , B82Y40/00 , C07F7/12 , C07F7/1832 , C07F7/1836
摘要： The novel organosilicon compound of the invention is an .omega.-silylalkynyl silane compound represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Si(CH.sub.3).sub.m X.sub.3-m, in which each R is, independently from the others, a hydrogen atom, lower alkyl group or aryl group, X is a halogen atom or a lower alkoxy group, the subscript m is 0,1 or 2 and the subscript n is an integer in the range from 10 to 30 which forms a uniform monomolecular layer on a substrate surface with silyl ethynyl groups arranged in alignment. The compound can be prepared by a Grignard reaction starting form an .omega.-silylalkynyl halide represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Y, in which R and n each have the same meaning as defined above and Y is a halogen atom, and a methyl alkoxy or halosilane of the formula (CH.sub.3).sub.m SiX.sub.4-m, in which X and m each have the same meaning as defined before.
摘要翻译：本发明的新型有机硅化合物是通式为R 3 SiC 3 CF（CH 2）n Si（CH 3）m X 3-m表示的ω-甲硅烷基炔基硅烷化合物，其中R各自独立地为氢原子，低级烷基基团或芳基，X为卤素原子或低级烷氧基，下标m为0,1或2，下标n为10〜30的整数，在基材表面上形成均匀的单分子层，甲硅烷基乙炔基排列成对齐。该化合物可以通过由通式R3SiC 3BOND C（CH2）nY表示的ω-甲硅烷基炔基卤化物的格利雅反应制备，其中R和n各自具有与上述相同的含义，Y是卤素原子，式（CH3）mSiX4-m的甲基烷氧基或卤代硅烷，其中X和m各自具有与上述相同的含义。

8. 发明授权

US5011963A Terminal perfluoroalkylsilane compounds 失效
标题翻译：末端全氟烷基硅烷化合物
公开(公告)号：US5011963A
公开(公告)日：1991-04-30
申请号：US307968
申请日：1989-02-09
申请人： Kazufumi Ogawa , Hideharu Tamura , Toshinobu Ishihara , Yasuhisa Tanaka , Mikio Endou
发明人： Kazufumi Ogawa , Hideharu Tamura , Toshinobu Ishihara , Yasuhisa Tanaka , Mikio Endou
IPC分类号： C07F7/12 , C07F7/18
CPC分类号： C07F7/12 , C07F7/1832
摘要： A terminal perfluoroalkylsilane compound F(CF.sub.2).sub.m (CH.sub.2).sub.n Si(CH.sub.3).sub.p X.sub.3-p (m+n=10 to 32 carbon atoms in fluoroalkyl group) is prepared by a hydrosilylation reaction of a terminal perfluoroalkene compounds F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 (1+q+2=n) with the hydrodiensilane HSi(CH.sub.3).sub.p X.sup.3.sub.3-p. The F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 are synthesized by a Grignard's reaction of a Grignard's reagent X.sup.2 Mg(CH.sub.2).sub.q CH.dbd.CH.sub.2 obtained from a terminal alkenyl halogen compound X.sup.2 (CH.sub.2).sub.q CH.dbd.CH.sub.2 with a terminal fluoroalkyl halogen compound F(CF.sub.2).sub.m (CH.sub.2).sub.1 X.sup.1.The terminal perfluoroalkylsilane compound has a sufficient lubricating effect and is useful for a coating agent with long and continuous lubricity.
摘要翻译：末端全氟烷基硅烷化合物F（CF2）m（CH2）nSi（CH3）pX3-p（m + n =氟代烷基中的10至32个碳原子）通过末端全氟链烯烃化合物F（CF 2）m CH2）1 + qCH = CH2（1 + q + 2 = n）与氢二硅烷HSi（CH3）pX33-p。 F（CF 2）m（CH 2）1 + q CH = CH 2通过Grignard's反应合成，格利雅反应由末端链烯基卤素化合物X2（CH2）qCH = CH2获得的格氏试剂X2Mg（CH2）qCH = CH2与末端氟烷基卤素化合物F（CF 2）m（CH 2）1 X 1。末端全氟烷基硅烷化合物具有足够的润滑效果，并且可用于具有长且连续润滑性的涂布剂。

9. 发明授权

US5326895A 3-(vinylbenzyloxy)propylsilane compounds 失效
标题翻译： 3-（乙烯基苄氧基）丙基硅烷化合物
公开(公告)号：US5326895A
公开(公告)日：1994-07-05
申请号：US976845
申请日：1992-11-16
申请人： Tohru Kubota , Toshinobu Ishihara , Mikio Endo , Katsuhiro Uehara
发明人： Tohru Kubota , Toshinobu Ishihara , Mikio Endo , Katsuhiro Uehara
IPC分类号： C07F7/18 , C07F7/14 , C08F30/08 , C07F7/08
CPC分类号： C07F7/14 , C07F7/1832 , C08F30/08
摘要： 3-(Vinylbenzyloxy)propylsilane compounds represented by the general formula, CH.sub.2 CH.PHI. CH.sub.2 OCH.sub. CH.sub.2 CH.sub.2 SiR.sup.1.sub.n (OR.sup.2).sub.3-n (wherein R.sup.1 and R.sup.2 each represent a hydrocarbon residue containing 1 to 4 carbon atoms, and n represents an integer from 0 to 2) are provided as novel styrene skeleton-containing alkoxysilane compounds which are highly useful as silane coupling agent or polymerizing monomer.
摘要翻译：由通式CH 2 CH PHI CH 2 OCHCH 2 CH 2 SiRnn（OR 2）3-n表示的3-（乙烯基苄氧基）丙基硅烷化合物（其中R 1和R 2各自表示含有1至4个碳原子的烃基，n表示0的整数提供作为硅烷偶联剂或聚合单体非常有用的新型含苯乙烯骨架的烷氧基硅烷化合物。

10. 发明授权

US4883569A Method for the preparation of a cycloalkyl silane compound 失效
标题翻译：环烷基硅烷化合物的制备方法
公开(公告)号：US4883569A
公开(公告)日：1989-11-28
申请号：US154691
申请日：1988-02-11
申请人： Mikio Endo , Minoru Takamizawa , Toshinobu Ishihara , Tohru Kubota , Toshio Shinohara
发明人： Mikio Endo , Minoru Takamizawa , Toshinobu Ishihara , Tohru Kubota , Toshio Shinohara
IPC分类号： C07F7/12 , C07B61/00 , C07F7/08 , C07F7/14 , C07F7/18
CPC分类号： C07F7/0801 , C07F7/14 , C07F7/1876
摘要： Cycloalkyl silane compound such as cyclohexyl methyl dichlorosilane can be efficiently prepared by the photochemically induced hydrosilylation reaction. For example, an equimolar mixture of cyclohexene and methyl dichlorosilane with admixture of a catalytic amount of an alcoholic solution of, chloroplatinic acid, is irradiated at a temperature up to 70.degree. C. with ultraviolet light so that the hydrosilylation reaction takes place and proceeds almost to completeness without deactivation of the platinum catalyst to give the desired product in a yield of 90% or even higher.

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