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1. 发明授权

US5011963A Terminal perfluoroalkylsilane compounds 失效
标题翻译：末端全氟烷基硅烷化合物
公开(公告)号：US5011963A
公开(公告)日：1991-04-30
申请号：US307968
申请日：1989-02-09
申请人： Kazufumi Ogawa , Hideharu Tamura , Toshinobu Ishihara , Yasuhisa Tanaka , Mikio Endou
发明人： Kazufumi Ogawa , Hideharu Tamura , Toshinobu Ishihara , Yasuhisa Tanaka , Mikio Endou
IPC分类号： C07F7/12 , C07F7/18
CPC分类号： C07F7/12 , C07F7/1832
摘要： A terminal perfluoroalkylsilane compound F(CF.sub.2).sub.m (CH.sub.2).sub.n Si(CH.sub.3).sub.p X.sub.3-p (m+n=10 to 32 carbon atoms in fluoroalkyl group) is prepared by a hydrosilylation reaction of a terminal perfluoroalkene compounds F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 (1+q+2=n) with the hydrodiensilane HSi(CH.sub.3).sub.p X.sup.3.sub.3-p. The F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 are synthesized by a Grignard's reaction of a Grignard's reagent X.sup.2 Mg(CH.sub.2).sub.q CH.dbd.CH.sub.2 obtained from a terminal alkenyl halogen compound X.sup.2 (CH.sub.2).sub.q CH.dbd.CH.sub.2 with a terminal fluoroalkyl halogen compound F(CF.sub.2).sub.m (CH.sub.2).sub.1 X.sup.1.The terminal perfluoroalkylsilane compound has a sufficient lubricating effect and is useful for a coating agent with long and continuous lubricity.
摘要翻译：末端全氟烷基硅烷化合物F（CF2）m（CH2）nSi（CH3）pX3-p（m + n =氟代烷基中的10至32个碳原子）通过末端全氟链烯烃化合物F（CF 2）m CH2）1 + qCH = CH2（1 + q + 2 = n）与氢二硅烷HSi（CH3）pX33-p。 F（CF 2）m（CH 2）1 + q CH = CH 2通过Grignard's反应合成，格利雅反应由末端链烯基卤素化合物X2（CH2）qCH = CH2获得的格氏试剂X2Mg（CH2）qCH = CH2与末端氟烷基卤素化合物F（CF 2）m（CH 2）1 X 1。末端全氟烷基硅烷化合物具有足够的润滑效果，并且可用于具有长且连续润滑性的涂布剂。

2. 发明授权

US5202452A Terminal perfluoroalkylsilane compound and a process for preparing the same 失效
标题翻译：末端全氟烷基硅烷化合物及其制备方法
公开(公告)号：US5202452A
公开(公告)日：1993-04-13
申请号：US753522
申请日：1991-09-03
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C07F7/12 , C07F7/18
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C07F7/12 , C07F7/182
摘要： A silane compound represented by the following general Formula (I) is described: ##STR1## wherein R.sup.1 is an alkyl group with 1 to 4 carbon atoms;A is oxygen atom (--O--), carboxyl group ##STR2## or an alkylsilylene group ##STR3## wherein each R.sup.2 and R.sup.3 is an alkyl group with 1 to 4 carbon atoms;x is a halogen atom, or an alkoxyl group;m is an integer from 1 to 8;n is an integer from 0 to 2;p is an integer from 5 to 25; andq is an integer from 0 to 2.The silane compound is useful as a coating agent for various base materials, to provide lubricity, in addition to stain-proofing property.
摘要翻译：描述由以下通式（I）表示的硅烷化合物：其中R 1是具有1至4个碳原子的烷基; A是氧原子（-O-），羧基基团或烷基亚甲硅基基团，其中每个R 2和R 3是具有1至4个碳原子的烷基; x是卤素原子或烷氧基; m是1至8的整数; n为0〜2的整数; p是5至25的整数; q为0〜2的整数。作为各种基材的涂布剂，除了防污性以外，还可以提供润滑性。

3. 发明授权

US5425988A Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film 失效
标题翻译：包括保护膜和单分子氟有机硅膜的记录和再现装置
公开(公告)号：US5425988A
公开(公告)日：1995-06-20
申请号：US127288
申请日：1993-09-27
申请人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
发明人： Kazufumi Ogawa , Norihisa Mino , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Yasuhisa Tanaka
IPC分类号： B05D1/18 , C10M105/76 , C10M107/50 , C10N40/18 , G11B5/187 , G11B5/255 , G11B5/64 , G11B5/72 , G11B5/725 , G11B5/00
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G11B5/255 , G11B5/72 , G11B5/725 , Y10S428/90 , Y10T428/261 , Y10T428/268 , Y10T428/3154 , Y10T428/31544 , Y10T428/31663
摘要： A recording and reproducing device is provided. The device comprises a recording medium, a head giving and receiving recording signals to or from the recording medium, and a mechanism section and a circuit section giving and receiving the recording signals, wherein at least one protective film, and at least one fluorine-containing monomolecular film are formed in this order on the recording layer of the recording medium or on the surface of the head which comes into contact with said recording layer, wherein said protective film is a metal film, oxidized metal film, semi-conductor film, oxidized semi-conductor film, or organic monomolecular film, and wherein said fluorine-containing monomolecular film is formed by the chemical adsorption of a specific-type of silane compound that contains a perfluoroalkyl group at the molecular end on the surface of the protective film.
摘要翻译：提供了一种记录和再现装置。该装置包括记录介质，向记录介质提供和接收记录信号的磁头，以及提供和接收记录信号的机构部分和电路部分，其中至少一个保护膜和至少一个含氟单分子膜依次形成在记录介质的记录层上或与记录层接触的头的表面上，其中所述保护膜是金属膜，氧化金属膜，半导体膜，氧化物半导体膜或有机单分子膜，并且其中所述含氟单分子膜通过在保护膜的表面上的分子末端的含有全氟烷基的特定类型的硅烷化合物的化学吸附而形成。

4. 发明授权

US5254439A Light-sensitive polymer, method for preparing the same and method for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5254439A
公开(公告)日：1993-10-19
申请号：US854696
申请日：1992-03-20
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075 , G03F7/30
CPC分类号： C08G77/48 , C08G77/60 , G03F7/0754 , G03F7/0757 , Y10S430/146
摘要： There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.
摘要翻译：公开了具有对远紫外线敏感的线性-Si-O-Si键和-Si-Si-Si键或大于丙硅烷键的聚硅烷键的聚合物。聚合物是通过在惰性溶剂中在钠的存在下单独或与至少一种二氯硅烷聚合二氯硅烷来制备的。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下显示吸收峰，并且适用于制备双层系统的单层抗蚀剂或上抗蚀剂。

5. 发明授权

US5126419A Light-sensitive polymer, method for preparing the same andmethod for forming patterns 失效
标题翻译：光敏聚合物，其制备方法和形成图案的方法
公开(公告)号：US5126419A
公开(公告)日：1992-06-30
申请号：US622152
申请日：1990-12-03
申请人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
发明人： Yoshiyuki Tani , Masayuki Endou , Kazufumi Ogawa , Yasuhisa Tanaka , Toshinobu Ishihara , Tohru Kubota
IPC分类号： C08G77/48 , C08G77/60 , G03F7/075
CPC分类号： G03F7/0754 , C08G77/48 , C08G77/60 , G03F7/0757
摘要： A polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds more than trisilane bonds, sensitive to far ultraviolet rays. The light-sensitive polymer can be prepared by copolymerizing a dichlorodisiloxane and a dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet and is suitable for preparing a single layered resist or an upper resist of a two layered resist system.
摘要翻译：具有线性-Si-O-Si-键和-Si-Si-Si-键的聚合物，或聚硅烷键多于丙硅烷键，对远紫外线敏感。感光性聚合物可以通过在惰性溶剂中在钠的存在下使二氯二硅氧烷和二氯硅烷共聚来制备。聚合物用氧等离子体进行氧化以形成耐氧干蚀刻的SiO 2，仅在远紫外线下表现出吸收峰，并且适用于制备双层抗蚀剂体系的单层抗蚀剂或上抗蚀剂。

6. 发明授权

US5461166A Chemically adsorbed ultrathin film and its material, and method of manufacturing the same 失效
标题翻译：化学吸附超薄膜及其材料及其制造方法
公开(公告)号：US5461166A
公开(公告)日：1995-10-24
申请号：US384594
申请日：1995-02-03
申请人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
发明人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
IPC分类号： C07B61/00 , B01J23/42 , B05D1/18 , C07F7/08 , C07F7/12 , C07F7/18 , C09K3/00 , G03F7/075 , C07D333/02 , C08G77/08 , C08F28/06
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , C07F7/12 , C07F7/182 , C07F7/1836 , C07F7/1868
摘要： Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要翻译：公开了共价结合到基板表面的导电噻吩基衍生物单分子膜及其制造方法，以及包含用于形成导电性单分子膜的3-噻吩基（噻吩衍生物）的硅化合物及其制造方法。在本发明中形成包含3-噻吩基和硅基团的单分子超薄膜。用于形成膜的硅化合物是通过使ω-（3-噻吩基）-1-烯烃化合物与甲硅烷衍生物化合物反应而得到的，其中甲硅烷中四分之三的氢原子被卤素或烷氧基取代，过渡金属催化剂的存在。将基材浸渍并保持在上述化合物的非水溶液中，从而将单分子膜化学键合到基材表面。此外，通过单分子膜的电解或催化聚合形成噻吩衍生物超薄膜。

7. 发明授权

US5455360A 1-pyrrolyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same 失效
标题翻译： 1-吡咯基硅化合物，由其形成的化学吸附的超薄膜及其制造方法
公开(公告)号：US5455360A
公开(公告)日：1995-10-03
申请号：US107886
申请日：1993-08-18
申请人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Katsuya Takemura
发明人： Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Katsuya Takemura
IPC分类号： C08G77/26 , B05D1/18 , C07F7/12 , C07F7/18 , C08G77/28 , C08J5/18 , C09K3/16 , H01B1/12 , C07F7/10 , C07D207/323
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , C07F7/12 , C07F7/182 , C07F7/1836 , C07F7/1868
摘要： Disclosed are a conductive pyrrole derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a monomer used for forming the conductive pyrrole derivative monomolecular film and method of manufacturing the same. The invention relates to a monomolecular ultrathin film comprising 1-pyrrolyl groups and silicon groups. The monomer used for forming the film is provided by reacting .omega.-(1-pyrrolyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted monomer, thus chemically bonding a monomolecular film to a substrate surface. Furthermore, a polypyrrole derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
摘要翻译：公开了共价键合到基材表面的导电吡咯衍生物单分子膜及其制备方法，以及用于形成导电吡咯衍生物单分子膜的单体及其制造方法。本发明涉及包含1-吡咯基和硅基团的单分子超薄膜。用于形成膜的单体是通过使ω-（1-吡咯基）-1-烯烃化合物与甲硅烷衍生物化合物反应而得到的，其中甲硅烷的四个氢原子中的三个被卤素或烷氧基取代，的过渡金属催化剂。将基材浸渍并保持在上述单体的非水溶液中，从而将单分子膜化学键合到基材表面。此外，通过单分子膜的电解或催化聚合形成聚吡咯衍生物超薄膜。

8. 发明授权

US5196227A Method for making optical recording mediums 失效
标题翻译：制造光记录介质的方法
公开(公告)号：US5196227A
公开(公告)日：1993-03-23
申请号：US389395
申请日：1989-08-04
申请人： Kazufumi Ogawa , Hideharu Tamura , Norihisa Mino
发明人： Kazufumi Ogawa , Hideharu Tamura , Norihisa Mino
IPC分类号： G11B7/26 , B05D1/18 , B41M5/26 , G03C1/73 , G11B7/24 , G11B7/244 , G11B7/245
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G11B7/245
摘要： A method for making an optical recording medium having an optically responsive polydiacetylene monomolecular film or monomolecular built-up film is provided. In the method, a substrate having a hydrophilic surface is immersed in a solution, in organic solvent, of a substance containing a diacetylene group and an --Si--Cl group to form a monomolecular film of the substance on the substrate by chemical adsorption. The diacetylene groups are polymerized by energy beam irradiation to obtain the optically responsive polydiacetylene film. This medium is usable as a write-once or rewriteable medium.
摘要翻译：提供了一种制备具有光学响应的聚二乙炔单分子膜或单分子组合膜的光学记录介质的方法。在该方法中，将具有亲水性表面的基材浸渍在含有二乙炔基和-Si-Cl基的物质的有机溶剂的溶液中，通过化学吸附在基板上形成物质的单分子膜。通过能量束照射使乙炔基聚合，得到光学响应性聚二乙炔膜。该介质可用作一次写入或可重写介质。

9. 发明授权

US5035782A Method for the formation of monomolecular adsorption films or built-up films of monomolecular layers using silane compounds having an acetylene or diacetylene bond 失效
标题翻译：使用具有乙炔或二乙炔键的硅烷化合物形成单分子吸附膜或单分子层的叠层膜的方法
公开(公告)号：US5035782A
公开(公告)日：1991-07-30
申请号：US371893
申请日：1989-06-27
申请人： Hideharu Tamura , Kazufumi Ogawa
发明人： Hideharu Tamura , Kazufumi Ogawa
IPC分类号： B05D1/18 , G02F1/361 , H01B1/12 , H01L21/285 , H01L21/312
CPC分类号： B82Y30/00 , B05D1/185 , B82Y10/00 , B82Y40/00 , G02F1/3617 , H01B1/125 , H01L21/28512 , H01L21/3128
摘要： A method for the formation of monomolecular adsorption films of a silane compound having a diacetylene bond is described. The silane compound is chemically adsorbed on a substrate through .dbd.SiO-- bonds and the resultant film is significantly reduced in number of defects such as pinholes. When the monomolecular film is irradiated with actinic light, the diacetylene bonds are convered into a conjugated diacetylene polymer. Similarly, a built-up film of a desired number of monomolecular layers of a silane compound having an acetylene bond formed on a substrate by chemical adsorption and a corresponding number of monomolecular layers of an aliphatic acid or alcohol having an acetylene bond and alternately deposited on the first-mentioned layer is also provided.

10. 发明授权

US5093154A Process for preparing a monomolecular built-up film 失效
标题翻译：制备单分子组合膜的方法
公开(公告)号：US5093154A
公开(公告)日：1992-03-03
申请号：US402183
申请日：1989-09-05
申请人： Motoyoshi Hatada , Kazufumi Ogawa , Hideharu Tamura
发明人： Motoyoshi Hatada , Kazufumi Ogawa , Hideharu Tamura
IPC分类号： B05D1/20 , B05D1/18 , C08F30/08 , C09D4/00
CPC分类号： B82Y30/00 , B05D1/185 , B82Y40/00 , C09D4/00
摘要： A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.
摘要翻译：对硅烷表面活性剂单分子层的单分子层叠膜的制造方法进行说明。在此过程中，硅烷表面活性剂被化学吸附在基材的亲水表面上，并在活性气体气氛中进行高能束照射或等离子体处理以活化单分子层。该活化层进一步被硅烷表面活性剂吸附以形成积层膜。束照射或等离子体处理可以以期望的图案进行。重复进行束照射或等离子体处理和进一步的吸附，直至得到所需数量的单分子层。

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