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    • 5. 发明授权
    • .OMEGA.silylalkynyl silane compound and method for preparation thereof
    • OMEGA甲硅烷基炔基硅烷化合物及其制备方法
    • US4921989A
    • 1990-05-01
    • US359897
    • 1989-06-01
    • Toshinobu IshiharaMikio EndoTohru KubotaYasuhisa Tanaka
    • Toshinobu IshiharaMikio EndoTohru KubotaYasuhisa Tanaka
    • C07F7/12C07F7/18
    • B82Y30/00B82Y40/00C07F7/12C07F7/1832C07F7/1836
    • The novel organosilicon compound of the invention is an .omega.-silylalkynyl silane compound represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Si(CH.sub.3).sub.m X.sub.3-m, in which each R is, independently from the others, a hydrogen atom, lower alkyl group or aryl group, X is a halogen atom or a lower alkoxy group, the subscript m is 0,1 or 2 and the subscript n is an integer in the range from 10 to 30 which forms a uniform monomolecular layer on a substrate surface with silyl ethynyl groups arranged in alignment. The compound can be prepared by a Grignard reaction starting form an .omega.-silylalkynyl halide represented by the general formula R.sub.3 SiC.tbd.C(CH.sub.2).sub.n Y, in which R and n each have the same meaning as defined above and Y is a halogen atom, and a methyl alkoxy or halosilane of the formula (CH.sub.3).sub.m SiX.sub.4-m, in which X and m each have the same meaning as defined before.
    • 本发明的新型有机硅化合物是通式为R 3 SiC 3 CF(CH 2)n Si(CH 3)m X 3-m表示的ω-甲硅烷基炔基硅烷化合物,其中R各自独立地为氢原子,低级烷基 基团或芳基,X为卤素原子或低级烷氧基,下标m为0,1或2,下标n为10〜30的整数,在基材表面上形成均匀的单分子层, 甲硅烷基乙炔基排列成对齐。 该化合物可以通过由通式R3SiC 3BOND C(CH2)nY表示的ω-甲硅烷基炔基卤化物的格利雅反应制备,其中R和n各自具有与上述相同的含义,Y是卤素原子, 式(CH3)mSiX4-m的甲基烷氧基或卤代硅烷,其中X和m各自具有与上述相同的含义。