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1. 发明授权

US06425189B1 Probe tip locator having improved marker arrangement for reduced bit encoding error 有权
标题翻译：探针尖端定位器具有改进的标记布置以减少位编码误差
公开(公告)号：US06425189B1
公开(公告)日：2002-07-30
申请号：US09552892
申请日：2000-04-20
申请人： Jeffrey B. Bindell , Erik C. Houge , Larry E. Plew , Frederick A. Stevie
发明人： Jeffrey B. Bindell , Erik C. Houge , Larry E. Plew , Frederick A. Stevie
IPC分类号： G01B900
CPC分类号： G01B11/002 , G01Q30/06 , G01Q40/02 , Y10S977/851
摘要： A probe tip locator for, and method of, use in determining a location of a probe tip relative to the probe tip locator comprising sets of discrete location markers in which numbers and positions of the location markers in each of the sets are employable uniquely to identify corresponding specific locations on the probe tip locator, the sets being distributed about the probe tip locator to avoid unbalanced partial encroachments into both sides of a scanpath of the probe tip by location markers in sets normally adjacent the scanpath thereby to prevent an erroneous determination of location caused by unbalanced partial encroachments of the location markers into both sides of the scanpath as the probe tip traverses the scanpath.
摘要翻译：用于确定探针尖端相对于探针尖端定位器的位置的探针尖端定位器，其包括一组离散位置标记，其中每个组中的位置标记的数量和位置可用于唯一地识别探针尖端定位器上的对应的特定位置，这些组围绕探针尖端定位器分布，以避免通常位于与扫描路径相邻的组中的位置标记在探针尖端的扫描路径的两侧不平衡的部分侵入，从而防止位置的错误确定由于探针尖端穿过扫描路径，位置标记不均匀部分侵入扫描路径的两侧。

2. 发明授权

US06250143B1 Method of mapping a surface using a probe for stylus nanoprofilometry having a non-circular cross-section 有权
标题翻译：使用具有非圆形横截面的触笔纳米流变测定法的探针绘制表面的方法
公开(公告)号：US06250143B1
公开(公告)日：2001-06-26
申请号：US09386711
申请日：1999-08-31
申请人： Jeffrey B. Bindell , Erik C. Houge , Larry E. Plew , Terri L. Shofner , Frederick A. Stevie
发明人： Jeffrey B. Bindell , Erik C. Houge , Larry E. Plew , Terri L. Shofner , Frederick A. Stevie
IPC分类号： G01H2300
CPC分类号： G01Q60/38 , G01Q70/10 , H01L22/12 , Y10S977/878
摘要： The present invention provides an apparatus and a method of manufacturing that apparatus. More specifically, to a method of manufacturing probes for a stylus nanoprofilometer having a non-circular probe tip geometry and a method of measurement of semiconductor wafer features using the same. In one embodiment, the probe comprises an upper portion couplable to the stylus nanoprofilometer and a probative portion coupled to the upper portion. The probative portion has a cross section that is substantially thinner than a cross section of the upper portion. The probative portion further has a terminus distal the upper portion and a reentrant angle from the terminus to the upper portion.
摘要翻译：本发明提供一种制造该装置的装置和方法。更具体地，涉及一种制造具有非圆形探针尖端几何形状的触针式纳米探针计探针的探针的方法和使用其的半导体晶片特征的测量方法。在一个实施例中，探针包括可与触针纳米玻璃体计量器耦合的上部和耦合到上部的识别部分。证明部分具有比上部的横截面更薄的横截面。证明部分还具有远离上部的终端和从终端到上部的折返角。

3. 发明授权

US06727720B2 Probe having a microstylet 有权
标题翻译：探头有一个微型袜子
公开(公告)号：US06727720B2
公开(公告)日：2004-04-27
申请号：US09941085
申请日：2001-08-28
申请人： Erik C. Houge , Ryan K. Maynard , John M. McIntosh , Larry E. Plew , Jeffrey B. Bindell
发明人： Erik C. Houge , Ryan K. Maynard , John M. McIntosh , Larry E. Plew , Jeffrey B. Bindell
IPC分类号： G01R3102
CPC分类号： G01R3/00 , B82Y10/00 , G01R1/06755 , Y10S977/876
摘要： A probe comprising a probe body having a body longitudinal axis and a shoulder, and a microstylet mechanically coupled to the shoulder, and a method of manufacturing the same. The microstylet extends from the shoulder and has a microstylet longitudinal axis coincident the body longitudinal axis with the microstylet having a cross section substantially smaller than a cross section of the probe body.
摘要翻译：一种探针，包括具有身体纵向轴线和肩部的探针体和机械地联接到肩部的微型步骤及其制造方法。微型电动工具从肩部延伸，并且具有与主体纵向轴线重合的微型电子管纵向轴线，该微型电极具有基本上小于探针主体横截面的横截面。

4. 发明授权

US06577970B2 Method of determining a crystallographic quality of a material located on a substrate 有权
公开(公告)号：US06577970B2
公开(公告)日：2003-06-10
申请号：US09801455
申请日：2001-03-08
申请人： Erik C. Houge , John M. McIntosh , Larry E. Plew , Fred A. Stevie , Catherine Vartuli
发明人： Erik C. Houge , John M. McIntosh , Larry E. Plew , Fred A. Stevie , Catherine Vartuli
IPC分类号： G01N3700
CPC分类号： G01N23/225
摘要： The present invention provides a method of determining a crystallographic quality of a material located on a substrate. The method includes determining a set of crystallographic solutions for an unknown crystallographic orientation, and subsequently comparing the set of crystallographic solutions to adjacent known crystallographic orientations to determine the unknown crystallographic orientation. In a preferred embodiment, the set of crystallographic solutions may be a rank of crystallographic solutions which may represent the most probable crystallographic orientations. The rank of crystallographic solutions, in an alternative embodiment, may be represented by a vote, a fit and a confidence index.

5. 发明授权

US07342225B2 Crystallographic metrology and process control 有权
标题翻译：晶体计量和过程控制
公开(公告)号：US07342225B2
公开(公告)日：2008-03-11
申请号：US10505198
申请日：2003-02-24
申请人： Erik C. Houge , Brian Kempshall , Stephen M. Schwarz , Fred A. Stevie
发明人： Erik C. Houge , Brian Kempshall , Stephen M. Schwarz , Fred A. Stevie
IPC分类号： H01J37/28 , H01J37/256 , G01N23/00
CPC分类号： H01J37/295 , G01N23/203 , Y10S117/902
摘要： A system (70) for crystallography including a sample holder (74), an electron source (76) for generating an electron beam, and a scanning actuator (80) for controlling the relative movement between the electron beam and the crystalline sample, the scanning actuator being controllable for directing the electron beam at a series of spaced apart points within the sample area. The system also includes an image processor (84) for generating crystallographic data based upon electron diffraction from the crystalline sample and for determining whether sufficient data have been acquired to characterize the sample area. The system further includes a controller (86) for controlling the scanning actuator to space the points apart such that acquired data is representative of a different grains within the crystalline sample. IN other embodiments, the invention includes one or more ion beams (178, 188) for crystallography and a combination ion beam/electron beam (218, 228).
摘要翻译：一种用于晶体学的系统（70），包括样品保持器（74），用于产生电子束的电子源（76）和用于控制电子束和结晶样品之间的相对运动的扫描致动器（80），扫描致动器是可控制的，用于在样品区域内的一系列间隔开的点处引导电子束。该系统还包括一个图像处理器（84），用于根据晶体样品的电子衍射产生晶体数据，并确定是否已获取足够的数据来表征样品区域。所述系统还包括控制器（86），用于控制所述扫描致动器将所述点间隔开，使得所获取的数据代表所述结晶样品内的不同晶粒。在其它实施例中，本发明包括用于晶体学的一个或多个离子束（178,188）和离子束/电子束（218,228）的组合。

6. 发明授权

US06870950B2 Method for detecting defects in a material and a system for accomplishing the same 有权
标题翻译：用于检测材料中的缺陷的方法和用于实现其的系统
公开(公告)号：US06870950B2
公开(公告)日：2005-03-22
申请号：US09809379
申请日：2001-03-15
申请人： Erik C. Houge , Catherine Vartuli , Mike Antonell , Pam Cavanagh , Hui Ma
发明人： Erik C. Houge , Catherine Vartuli , Mike Antonell , Pam Cavanagh , Hui Ma
IPC分类号： G01N21/95 , G06K9/00
CPC分类号： G01N21/95
摘要： The present invention provides a method for detecting defects in a material and a system for accomplishing the same. The method includes obtaining an image of at least a portion of a material's surface and converting the image into an intensity profile. The method further includes determining a defect in the material's surface from the intensity profile. In one exemplary embodiment, the image is an electron image obtained using a scanning electron microscope. The method may further be used to determine a defect density in the material's surface.
摘要翻译：本发明提供了一种用于检测材料中的缺陷的方法和用于实现该缺陷的系统。该方法包括获得材料表面的至少一部分的图像并将图像转换成强度分布。该方法还包括根据强度分布来确定材料表面的缺陷。在一个示例性实施例中，图像是使用扫描电子显微镜获得的电子图像。该方法还可用于确定材料表面中的缺陷密度。

7. 发明授权

US06627885B1 Method of focused ion beam pattern transfer using a smart dynamic template 有权
标题翻译：使用智能动态模板的聚焦离子束图案转移方法
公开(公告)号：US06627885B1
公开(公告)日：2003-09-30
申请号：US09631545
申请日：2000-08-03
申请人： John M. McIntosh , Erik C. Houge , Fred A. Stevie , Catherine Vartuli , Scott Jessen
发明人： John M. McIntosh , Erik C. Houge , Fred A. Stevie , Catherine Vartuli , Scott Jessen
IPC分类号： H01J3726
CPC分类号： G03F1/74 , G03F1/84 , H01J37/28 , H01J2237/2817
摘要： The present invention provides a method of forming a dynamic template with a focused beam. The method includes forming a desired template that represents a desired image, forming an actual template that represents an actual image, such as a photolithographic mask or a semiconductor device feature, and comparing the desired template to the actual template to yield a deviation template. In one embodiment the deviation template is formed by subtracting the actual template from the desired template.
摘要翻译：本发明提供了一种用聚焦光束形成动态模板的方法。该方法包括形成表示期望图像的所需模板，形成表示实际图像的实际模板，例如光刻掩模或半导体器件特征，并将所需模板与实际模板进行比较以产生偏差模板。在一个实施例中，通过从期望的模板中减去实际模板来形成偏差模板。

8. 发明授权

US07972440B2 Monitoring and control of a fabrication process 有权
标题翻译：监控和制造过程的控制
公开(公告)号：US07972440B2
公开(公告)日：2011-07-05
申请号：US10505197
申请日：2003-02-24
申请人： Erik C. Houge , John M. McIntosh , Robert Francis Jones
发明人： Erik C. Houge , John M. McIntosh , Robert Francis Jones
IPC分类号： C30B33/00
CPC分类号： H01J37/26 , B24B37/044 , C09G1/02 , H01L22/12 , Y10T117/1004 , Y10T117/1008
摘要： A system (10) for monitoring and controlling a fabrication process includes at least a first subsystem (12), a crystallographic analysis subsystem (14), and a second subsystem (16), wherein the first subsystem and second subsystem perform respective fabrication steps on a workpiece. The crystallographic analysis subsystem may be coupled to both the first subsystem and second subsystem. The analysis subsystem acquires crystallographic information from the workpiece after the workpiece undergoes a fabrication step by the first subsystem and then provides information, based on the crystallographic information acquired, for modifying parameters associated with the respective fabrication steps. The system may also include neural networks (24, 28) to adaptively modify, based on historical process data (32), parameters provided to the respective fabrication steps. The analysis subsystem may include a electromagnetic source (61), a detector (66), a processor (67), a controller (68) and a scanning actuator (65).
摘要翻译：用于监测和控制制造过程的系统（10）至少包括第一子系统（12），结晶分析子系统（14）和第二子系统（16），其中第一子系统和第二子系统执行相应的制造步骤工件。晶体分析子系统可以耦合到第一子系统和第二子系统。分析子系统在工件经过第一子系统的制造步骤之后从工件获取晶体学信息，然后基于获得的晶体学信息提供用于修改与各个制造步骤相关的参数的信息。系统还可以包括神经网络（24,28），以根据历史过程数据（32）自适应地修改提供给各个制造步骤的参数。分析子系统可以包括电磁源（61），检测器（66），处理器（67），控制器（68）和扫描致动器（65）。

9. 发明授权

US06265235B1 Method of sectioning of photoresist for shape evaluation 失效
标题翻译：用于形状评估的光刻胶的切片方法
公开(公告)号：US06265235B1
公开(公告)日：2001-07-24
申请号：US09383154
申请日：1999-08-25
申请人： John M. McIntosh , Erik C. Houge , Brittin C. Kane , Simon J. Molloy , Catherine Vartuli
发明人： John M. McIntosh , Erik C. Houge , Brittin C. Kane , Simon J. Molloy , Catherine Vartuli
IPC分类号： H01L2166
CPC分类号： H01L22/12 , Y10S977/855
摘要： A non-destructive method for evaluating a topographical feature 16 of an integrated circuit 42, such as a photoresist runner, includes core sectioning the feature to remove a small section 22, without damage to the remainder of the wafer 36 on which the integrated circuit is formed. A tool having fine adjustment, such as a micromanipulator with a rod-shaped probe 24 in the form of a glass needle, is used to remove the section for examination and metrology. The section is separated from the underlying substrate surface 14 and can be examined from all sides. Variations in a critical dimension, such as line width W, along the length L of the section, as well as average measurements of the dimension, can be obtained.
摘要翻译：用于评估集成电路42（例如光致抗蚀剂流道）的地形特征16的非破坏性方法包括将该特征切除以去除小部分22的芯，而不损坏其上集成电路的晶片36的其余部分形成。使用具有精细调节的工具，例如具有玻璃针形式的棒状探针24的显微操纵器，用于去除用于检查和计量的部分。该部分与下面的基底表面14分离，并且可以从所有侧面进行检查。可以获得沿截面长度L的临界尺寸（例如线宽W）的变化以及尺寸的平均测量值。

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