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    • 1. 发明申请
    • POLYHETEROSILOXANE COMPOSITION
    • 聚硅氧烷组合物
    • WO2013192404A1
    • 2013-12-27
    • PCT/US2013/046784
    • 2013-06-20
    • DOW CORNING CORPORATION
    • DESHAZER, DavidGRASMANN, MartinLIU, LizhiLIU, NanguoMCQUISTON, ElizabethMEALEY, ShawnSCHMIDT, RandallSHAHINIAN, Katherine, MarieSKINNER, KwanLU, GangCHOI, Jongwook
    • C08G77/58C08L83/14
    • C08G77/58C08L83/14
    • A polyheterosiloxane composition includes (A) a first metal (M1), (B) a second metal (M2), and (C) siloxy units having the formula (R 1 3 SiO 1/2 ), (R 1 2 SiO 2/2 ), (R 1 SiO 3/2 ), and/or (SiO 4/2 ). Each R 1 is independently a hydrocarbon or halogenated hydrocarbon group including 1 to 30 carbon atoms. The mole fractions of (A), (B), and (C) relative to each other is of the formula [(M1)] a [(M2)] b [R 1 3 SiO 1/2 ] m [R 1 2 SiO 2/2 ] d [R 1 SiO 3/2 ] t [SiO 4/2 ] q , wherein a and b are each independently from 0.001 to 0.9, m, d, t, and q are each independently from zero to 0.9, m, d, t, and q cannot all be zero, and the sum of a+b+m+d+t+q ≈ 1. At least one oxygen atom of the siloxy units is bonded to at least one of (M1) and/or (M2). The composition exhibits a quantum yield of at least 0.05% and at least one of (M1) and (M2) is a lanthanide metal.
    • 聚硅氧烷组合物包括(A)第一金属(M1),(B)第二金属(M2)和(C)具有式(R1 3SiO1 / 2),(R1SiO2 / 2),(R1SiO3 / 2),和/或(SiO 4/2)。 每个R 1独立地是含有1至30个碳原子的烃或卤代烃基。 (A),(B)和(C)相对于彼此的摩尔分数为式[(M1)] a [(M2)] b [R1 3SiO1 / 2] m [R1 2SiO2 / 2] d [R1SiO3 / 2] t [SiO4 / 2] q,其中a和b各自独立地为0.001至0.9,m,d,t和q各自独立地为0至0.9,m,d,t和q不能 全部为零,并且a + b + m + d + t + q≈1的和。所述甲硅烷氧基单元的至少一个氧原子键合到(M1)和/或(M2)中的至少一个。 该组合物显示至少0.05%的量子产率,并且(M1)和(M2)中的至少一种是镧系金属。
    • 2. 发明申请
    • POLYHETEROSILOXANE COMPOSITION AND SILICONE COMPOSITION INCLUDING A POLYHETEROSILOXANE
    • 聚硅氧烷组合物和含硅酮组合物,包括聚硅氧烷
    • WO2014152824A1
    • 2014-09-25
    • PCT/US2014/027892
    • 2014-03-14
    • DOW CORNING CORPORATION
    • LIU, LizhiDESHAZER, DavidGRASMANN, MartinLIU, NanguoSHAHINIAN, Katherine, M.
    • C08G77/58C08L83/14
    • C08G77/58C08G77/70C08L83/14
    • A sensitized polyheterosiloxane composition includes at least one non-lanthanide metal, siloxy units, and a photosensitizer. Each R 1 is independently a hydrocarbon or halogenated hydrocarbon group comprising 1 to 30 carbon atoms. The mole fractions of the at least one non- lanthanide metal and the siloxy units relative to each other is of the formula: [at least one non- lanthanide metal] a [R 1 3 SiO 1/2 ] m [R 1 2 Si0 2/2 ] d [R 1 Si0 3/2 ] t [Si0 4/2 ] q , wherein a is from 0.001 to 0.9, m is from zero to 0.9, d is from zero to 0.9, t is from zero to 0.9, and q is from zero to 0.9, and wherein m, d, t, and q cannot all be zero and the sum of a+m+d+t+q ≈ 1. The photosensitizer is present in an amount of less than 3 moles of photosensitizer per one mole of the at least one non-lanthanide metal. Moreover, the sensitized polyheterosiloxane composition is free of lanthanide metals. A silicone composition includes a curable silicone and the sensitized polyheterosiloxane composition. Moreover, the silicone composition is free of lanthanide metals.
    • 致敏的聚杂硅氧烷组合物包括至少一种非镧系金属,甲硅烷氧基单元和光敏剂。 每个R 1独立地是含有1至30个碳原子的烃或卤代烃基。 至少一种非镧系金属和甲硅烷氧基单元相对于彼此的摩尔分数具有下式:[至少一种非镧系元素金属] a [R1 3 SiO 1/2] m [R 1 SiO 2/2] d [ R1SiO3 / 2] t [Si04 / 2] q,其中a为0.001至0.9,m为0至0.9,d为0至0.9,t为0至0.9,q为0至0.9, 其中m,d,t和q不能全部为零,并且a + m + d + t + q≈1的总和。光敏剂的存在量为每摩尔至少3摩尔以上的光敏剂 一种非镧系金属。 此外,致敏的聚杂硅氧烷组合物不含镧系金属。 有机硅组合物包括可固化的硅氧烷和敏化的聚杂硅氧烷组合物。 此外,硅氧烷组合物不含镧系金属。
    • 3. 发明申请
    • COMPOSITION INCLUDING A POLYHETEROSILOXANE AND AN ORGANOSILOXANE BLOCK COPOLYMER
    • 组合物,包括聚硅氧烷和有机硅氧烷嵌段共聚物
    • WO2014152392A1
    • 2014-09-25
    • PCT/US2014/027290
    • 2014-03-14
    • DOW CORNING CORPORATION
    • DESHAZER, DavidGRASMANN, MartinHORSTMAN, John, B.LIU, LizhiLIU, NanguoMCQUISTON, ElizabethMEALEY, ShawnSCHMIDT, RandallSKINNER, KwanSWIER, Steven
    • C08G77/58C08L83/14C08L83/04C08G77/00C08G77/04
    • C08G77/58C08G77/70C08L83/14
    • A composition includes a combination of a (I) polyheterosiloxane composition and a (II) organosiloxane block copolymer. The (I) polyheterosiloxane composition includes at least one lanthanide metal and siloxy units having the formula (R 1 3 SiO 1/2 ), (R 1 2 SiO 2/2 ), (R 1 SiO 3/2 ), and/or (SiO 4/2 ). Each R 1 is independently a hydrocarbon or halogenated hydrocarbon group comprising 1 to 30 carbon atoms. The (II) organosiloxane block copolymer includes 40 to 90 mole percent dlsiloxy units of the formula [R a 2 SiO 2/2 ] arranged in linear blocks each having an average of from 10 to 400 disiloxy units [R a 2 SiO 2/2 ] per linear block. The (II) organosiloxane block copolymer also includes 10 to 60 mole percent siloxy units arranged in non-linear blocks each having a weight average molecular weight of at least 500 g/mol wherein at least one siloxy unit is a trisiloxy unit of die formula [R b SiO 3/2 ]. R a is independently a C 1 to C 30 hydrocarbyl and R b is independently a C 1 to C 20 hydrocarbyl.
    • 组合物包括(I)聚醚砜硅氧烷组合物和(II)有机硅氧烷嵌段共聚物的组合。 (I)多嵌段硅氧烷组合物包括至少一种镧系元素金属和具有式(R1 3SiO1 / 2),(R1SiO2 / 2),(R1SiO3 / 2)和/或(SiO4 / 2)的甲硅烷氧基单元。 每个R 1独立地是含有1至30个碳原子的烃或卤代烃基。 (II)有机硅氧烷嵌段共聚物包含40〜90摩尔%的以[R a 2SiO 2/2]为单位的直链嵌段平均每个线性嵌段平均具有10-400个二甲硅烷基单元[Ra 2 SiO 2/2]的式[ (II)有机硅氧烷嵌段共聚物还包括以非直链嵌段排列的重量平均分子量至少为500g / mol的10至60mol%的甲硅烷氧基单元,其中至少一个甲硅烷氧基单元是模具式[ RbSiO3 / 2]。 R a独立地为C 1至C 30烃基,R b独立地为C 1至C 20烃基。
    • 4. 发明申请
    • ELECTRONIC ARTICLE AND METHOD OF FORMING
    • 电子文章和形成方法
    • WO2012039709A1
    • 2012-03-29
    • PCT/US2010/049829
    • 2010-09-22
    • DOW CORNING CORPORATIONDESHAZER, DavidPERNISZ, UdoZAMBOV, Ludmil
    • DESHAZER, DavidPERNISZ, UdoZAMBOV, Ludmil
    • H01L31/0216H01L33/44
    • H01L31/02327H01L31/02168H01L33/44H01L33/56H01L33/58Y02E10/50
    • An electronic article includes an optoelectronic semiconductor having a refractive index of 3.7 ± 2 and a dielectric layer disposed on the optoelectronic semiconductor. The dielectric layer has a thickness of at least 50 μm and a refractive index of 1.4 ± 0.1. The electronic article includes a gradient refractive index coating (GRIC) that is disposed on the optoelectronic semiconductor and that has a thickness of from 50 to 400 nm. The refractive index of the GRIC varies along the thickness from 2.7 ± 0.7 to 1.5 ± 0.1. The GRIC also includes a gradient of a carbide and an oxycarbide along the thickness. The carbide and the oxycarbide each independently include at least one silicon or germanium atom. The article is formed by continuously depositing the GRIC using plasma-enhanced chemical vapor deposition in a dual frequency configuration and subsequently disposing the dielectric layer on the GRIC.
    • 电子制品包括折射率为3.7±2的光电半导体和设置在光电子半导体上的电介质层。 电介质层的厚度至少为50μm,折射率为1.4±0.1。 电子制品包括设置在光电子半导体上并具有50至400nm厚度的梯度折射率涂层(GRIC)。 GRIC的折射率沿厚度从2.7±0.7变化到1.5±0.1。 GRIC还包括沿着厚度的碳化物和碳氧化物的梯度。 碳化物和碳氧化物各自独立地包括至少一个硅或锗原子。 该物品通过使用等离子体增强化学气相沉积以双频配置连续沉积GRIC并随后将介电层设置在GRIC上而形成。
    • 7. 发明申请
    • POLYHETEROSILOXANE COMPOSITION
    • 聚硅氧烷组合物
    • WO2013192419A1
    • 2013-12-27
    • PCT/US2013/046813
    • 2013-06-20
    • DOW CORNING CORPORATION
    • DESHAZER, DavidGRASMANN, MartinLIU, LizhiLIU, NanguoMCQUISTON, ElizabethMEALEY, ShawnSCHMIDT, RandallSKINNER, Kwan
    • C08G77/58C08L83/14
    • C08G77/58C08L83/14
    • This disclosure provides a polyheterosiloxane composition including (A) a first metal (Ml), (B) a second metal (M2), and (C) siloxy units having the formula (R 2 3 SiO 1/2 ), (R 1 2 SiO 2/2 ), (R 1 Si0 3/2 ), and/or (Si0 4/2 ), wherein each R 1 is independently a hydrocarbon or halogenated hydrocarbon group comprising 1 to 30 carbon atoms, and wherein each R 2 is independently a hydrocarbyl group having from 1 to 20 carbon atoms or an organosiloxane having at least one disiloxy unit. The mole fractions of (A), (B), and (C) relative to each other are of the formula [(M1)]a[(M2)]b[R 2 3 Si0 1/2 ]m[R 1 2 Si0 2/2 ]d[R 1 Si0 3/2 ]t[Si0 4/2 ] q , wherein a is from 0.001 to 0.9, b is from 0.001 to 0.9, m is from 0.001 to 0.9, d is from zero to 0.9, t is from zero to 0.9, and q is from zero to 0.9. In this formula, d, t, and q cannot all be zero and the sum of a+b+m+d+t+q ≈ 1.
    • 本公开内容提供了包含(A)第一金属(M1),(B)第二金属(M2)和(C)具有式(R2 3SiO1 / 2),(R1SiO2 / 2), (R 1 SiO 3/2)和/或(SiO 4/2),其中每个R 1独立地是含有1至30个碳原子的烃或卤代烃基,并且其中每个R 2独立地是具有1至20个碳原子的烃基或 具有至少一个disiloxy单元的有机硅氧烷。 (A),(B)和(C)相对于彼此的摩尔分数具有式[(M1)] a [(M2)] b [R2 3Si01 / 2] m [R1 2Si02 / 2] d [R1SiO3 / 2] t [Si04 / 2] q,其中a为0.001至0.9,b为0.001至0.9,m为0.001至0.9,d为0至0.9,t为0至0.9, q为0〜0.9。 在该公式中,d,t和q不能全部为零,并且a + b + m + d + t + q≈1的和。