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1. 发明申请

WO2014018122A1 METHOD OF FORMING A LIGHT EMITTING DIODE MODULE 审中-公开
标题翻译：形成发光二极管模块的方法
公开(公告)号：WO2014018122A1
公开(公告)日：2014-01-30
申请号：PCT/US2013/033103
申请日：2013-03-20
申请人： DOW CORNING CORPORATION , DOW CORNING TORAY CO. LTD.
发明人： DESHAZER, David , LOBODA, Mark, J. , OGAWA, Takuya , ZAMBOV, Ludmil
IPC分类号： H01L33/56 , H01L33/00 , C23C16/32 , C23C16/36 , C23C16/42
CPC分类号： C23C16/325 , C23C16/24 , C23C16/36 , C23C16/505 , H01L33/44 , H01L33/56 , H01L2933/0025
摘要： A light emitting diode module includes a transparent semiconductor having a refractive index of 2.7 ± 1.2, a polymer layer disposed on the transparent semiconductor and having a refractive index of 1.5 ± 0.1, and a compositional graded coating (CGC) disposed on the transparent semiconductor and sandwiched between the transparent semiconductor and the polymer layer. The CGC has a thickness and a refractive index varying along the thickness from a first refractive index from (2.2 ± 0.5 to 3.3 ± 0.4) at a first end to a second refractive index of 1.5 ± 0.2 at a second end adjacent to the polymer layer. The CGC also includes a gradient including SiC:H and (SiOCN:H; SiOC:H; and/or Si:H) along the thickness. The module is formed by continuously depositing the CGC on the transparent semiconductor using chemical vapor deposition, and subsequently disposing the polymer layer on the CGC.
摘要翻译：发光二极管模块包括折射率为2.7±1.2的透明半导体，设置在透明半导体上的折射率为1.5±0.1的聚合物层，以及设置在透明半导体上的组成梯度涂层（CGC），以及夹在透明半导体和聚合物层之间。 CGC的厚度和折射率沿着厚度从在第一端处的第一折射率（2.2±0.5至3.3±0.4）变化到在邻近聚合物层的第二端处的第二折射率为1.5±0.2的折射率。 CGC还包括沿着厚度的包括SiC：H和（SiOCN：H; SiOC：H;和/或Si：H）的梯度。该模块通过使用化学气相沉积在透明半导体上连续沉积CGC并随后将聚合物层设置在CGC上而形成。

2. 发明公开

EP2521756A1 CURED ORGANOPOLYSILOXANE RESIN FILM HAVING GAS BARRIER PROPERTIES AND METHOD OF PRODUCING THE SAME 审中-公开
标题翻译：根据上述制造阻气性和方法固溶硬化ORGANOPOLYSILOXANHARZFILM
公开(公告)号：EP2521756A1
公开(公告)日：2012-11-14
申请号：EP11706633.2
申请日：2011-01-07
申请人： Dow Corning Toray Co., Ltd. , Dow Corning Corporation
发明人： ITOH, Maki , SUTO, Michitaka , ZHU, Bizhong , KATSOULIS, Dimitris, Elias , ZAMBOV, Ludmil
IPC分类号： C09D183/04 , C08J5/04
CPC分类号： C09D183/04 , C08J5/24 , C08J2383/04 , Y10T428/31663 , Y10T442/2098
摘要： A cured organopolysiloxane resin film having gas barrier properties comprising a fiber-reinforced film made of a hydrosilylation-cured organopolysiloxane resin and having a transparent inorganic layer selected from silicon oxynitride layer, silicon nitride layer, and silicon oxide layer formed on the fiber-reinforced film wherein a layer of cured organopolysiloxane that contains an organic functional group, silanol group, hydrosilyl group, or an organic group produced by the polymerization of polymerizable organic functional groups is interposed between said fiber-reinforced film and inorganic layer. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.

3. 发明公开

EP1963409A2 COATED SUBSTRATES AND METHODS FOR THEIR PREPARATION 审中-公开
标题翻译：制备涂覆基材和工艺
公开(公告)号：EP1963409A2
公开(公告)日：2008-09-03
申请号：EP06803778.7
申请日：2006-09-18
申请人： Dow Corning Corporation , Dow Corning Toray Co., Ltd.
发明人： ALBAUGH, John, Dean , AMOKO, Masaaki , CAMILLETTI, Robert, Charles , CHOI, Dong , WEIDNER, William , ZAMBOV, Ludmil
IPC分类号： C08J7/04 , H01L21/312 , H01L51/52
CPC分类号： H01L21/3122 , C08J7/045 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3124 , H01L21/318 , H01L51/5256 , Y10T428/31663
摘要： Coated substrates comprising an inorganic barrier coating and an interfacial coating, wherein the interfacial coating comprises a cured product of a silicone resin having silicon-bonded radiation-sensitive groups; and methods of preparing the coated substrates.

4. 发明申请

WO2011083879A1 CURED ORGANOPOLYSILOXANE RESIN FILM HAVING GAS BARRIER PROPERTIES AND METHOD OF PRODUCING THE SAME 审中-公开
标题翻译：具有气体阻隔性的固化有机聚硅氧烷树脂膜及其制造方法
公开(公告)号：WO2011083879A1
公开(公告)日：2011-07-14
申请号：PCT/JP2011/050608
申请日：2011-01-07
申请人： DOW CORNING TORAY CO., LTD. , DOW CORNING CORPORATION , ITOH, Maki , SUTO, Michitaka , ZHU, Bizhong , KATSOULIS, Dimitris, Elias , ZAMBOV, Ludmil
发明人： ITOH, Maki , SUTO, Michitaka , ZHU, Bizhong , KATSOULIS, Dimitris, Elias , ZAMBOV, Ludmil
IPC分类号： C09D183/04 , C08J5/04
CPC分类号： C09D183/04 , C08J5/24 , C08J2383/04 , Y10T428/31663 , Y10T442/2098
摘要： A cured organopolysiloxane resin film having gas barrier properties comprising a fiber-reinforced film made of a hydrosilylation-cured organopolysiloxane resin and having a transparent inorganic layer selected from silicon oxynitride layer, silicon nitride layer, and silicon oxide layer formed on the fiber-reinforced film wherein a layer of cured organopolysiloxane that contains an organic functional group, silanol group, hydrosilyl group, or an organic group produced by the polymerization of polymerizable organic functional groups is interposed between said fiber-reinforced film and inorganic layer. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.
摘要翻译：具有阻气性的固化的有机聚硅氧烷树脂膜包含由氢化硅烷化固化的有机聚硅氧烷树脂制成的纤维增强膜，并且具有选自形成在纤维增强膜上的氧氮化硅层，氮化硅层和氧化硅层的透明无机层其中含有有机官能团，硅烷醇基，氢化硅烷基或通过可聚合有机官能团的聚合制备的有机基团的固化的有机聚硅氧烷层被插入在所述纤维增强膜和无机层之间。另外，制造具有阻气性的固化的有机聚硅氧烷树脂膜的方法。

5. 发明申请

WO2006023437A2 COATED SUBSTRATES AND METHODS FOR THEIR PREPARATION 审中-公开
标题翻译：涂层基材及其制备方法
公开(公告)号：WO2006023437A2
公开(公告)日：2006-03-02
申请号：PCT/US2005/028955
申请日：2005-08-12
申请人： DOW CORNING CORPORATION , LOBODA, Mark , SNOW, Steven , WEIDNER, William , ZAMBOV, Ludmil
发明人： LOBODA, Mark , SNOW, Steven , WEIDNER, William , ZAMBOV, Ludmil
IPC分类号： C23C16/30 , H01L21/316
CPC分类号： C23C16/45523 , C23C16/30 , C23C16/401 , H01L21/02126 , H01L21/022 , H01L21/02211 , H01L21/02216 , H01L21/02274 , H01L21/3122 , H01L21/31633 , H01L51/5256 , Y10T428/24992 , Y10T428/249921
摘要： Coated substrates containing a barrier layer comprising hydrogenated silicon oxycarbide having a density of at least 1.6 g/cm 3 and methods of preparing the coated substrates.
摘要翻译：包含密度为至少1.6g / cm 3的氢化碳氧化碳的阻挡层的涂覆基材和制备涂布的基材的方法。

6. 发明申请

WO2012039709A1 ELECTRONIC ARTICLE AND METHOD OF FORMING 审中-公开
标题翻译：电子文章和形成方法
公开(公告)号：WO2012039709A1
公开(公告)日：2012-03-29
申请号：PCT/US2010/049829
申请日：2010-09-22
申请人： DOW CORNING CORPORATION , DESHAZER, David , PERNISZ, Udo , ZAMBOV, Ludmil
发明人： DESHAZER, David , PERNISZ, Udo , ZAMBOV, Ludmil
IPC分类号： H01L31/0216 , H01L33/44
CPC分类号： H01L31/02327 , H01L31/02168 , H01L33/44 , H01L33/56 , H01L33/58 , Y02E10/50
摘要： An electronic article includes an optoelectronic semiconductor having a refractive index of 3.7 ± 2 and a dielectric layer disposed on the optoelectronic semiconductor. The dielectric layer has a thickness of at least 50 μm and a refractive index of 1.4 ± 0.1. The electronic article includes a gradient refractive index coating (GRIC) that is disposed on the optoelectronic semiconductor and that has a thickness of from 50 to 400 nm. The refractive index of the GRIC varies along the thickness from 2.7 ± 0.7 to 1.5 ± 0.1. The GRIC also includes a gradient of a carbide and an oxycarbide along the thickness. The carbide and the oxycarbide each independently include at least one silicon or germanium atom. The article is formed by continuously depositing the GRIC using plasma-enhanced chemical vapor deposition in a dual frequency configuration and subsequently disposing the dielectric layer on the GRIC.
摘要翻译：电子制品包括折射率为3.7±2的光电半导体和设置在光电子半导体上的电介质层。电介质层的厚度至少为50μm，折射率为1.4±0.1。电子制品包括设置在光电子半导体上并具有50至400nm厚度的梯度折射率涂层（GRIC）。 GRIC的折射率沿厚度从2.7±0.7变化到1.5±0.1。 GRIC还包括沿着厚度的碳化物和碳氧化物的梯度。碳化物和碳氧化物各自独立地包括至少一个硅或锗原子。该物品通过使用等离子体增强化学气相沉积以双频配置连续沉积GRIC并随后将介电层设置在GRIC上而形成。

7. 发明申请

WO2013142585A1 METHOD OF FORMING A PHOTOVOLTAIC CELL MODULE 审中-公开
标题翻译：形成光伏电池模块的方法
公开(公告)号：WO2013142585A1
公开(公告)日：2013-09-26
申请号：PCT/US2013/033122
申请日：2013-03-20
申请人： DOW CORNING CORPORATION
发明人： DESCAMPS, Pierre , MCMILLAN, Christopher , SCHALK, Paul , WOOD, Donald, Adriaan , ZAMBOV, Ludmil
IPC分类号： H01L31/0216
CPC分类号： H01L31/02168 , Y02E10/50
摘要： A photovoltaic cell module includes a photovoltaic cell having a refractive index of 3.7 + 2 and polymer layer disposed on the cell and having a refractive index of 1.5 ± 0.1. The module also includes a compositional graded coating disposed on the cell and sandwiched between the cell and the polymer layer. The compositional graded coating has a thickness and a refractive index varying along the thickness from a first refractive index at a first end to a second refractive index at a second end adjacent to the polymer layer. The compositional graded coating includes a gradient including SiC:H and SiOCN:H along the thickness. The module further includes Si:H disposed between the polymer layer and the cell. The module is formed using a method that includes continuously depositing the compositional graded coating on the cell using chemical vapor deposition and disposing the polymer layer on the compositional graded coating.
摘要翻译：光伏电池模块包括折射率为3.7±2的光伏电池和设置在电池上的折射率为1.5±0.1的聚合物层。模块还包括设置在电池上并夹在电池和聚合物层之间的组成分级涂层。组成渐变涂层的厚度和折射率沿着厚度从第一端处的第一折射率变化到与聚合物层相邻的第二端处的第二折射率。组成分级涂层包括沿着厚度的包括SiC：H和SiOCN：H的梯度。该模块还包括设置在聚合物层和电池之间的Si：H。该模块使用包括使用化学气相沉积将组合分级涂层连续沉积在电池上并将聚合物层设置在组成分级涂层上的方法形成。

8. 发明申请

WO2007044181A2 COATED SUBSTRATES AND METHODS FOR THEIR PREPARATION 审中-公开
标题翻译：涂层基材及其制备方法
公开(公告)号：WO2007044181A2
公开(公告)日：2007-04-19
申请号：PCT/US2006/036265
申请日：2006-09-18
申请人： DOW CORNING CORPORATION , DOW CORNING TORAY CO., LTD , ALBAUGH, John, Dean , AMOKO, Masaaki , CAMILLETTI, Robert, Charles , CHOI, Dong , WEIDNER, William , ZAMBOV, Ludmil
发明人： ALBAUGH, John, Dean , AMOKO, Masaaki , CAMILLETTI, Robert, Charles , CHOI, Dong , WEIDNER, William , ZAMBOV, Ludmil
IPC分类号： C08J7/04
CPC分类号： H01L21/3122 , C08J7/045 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3124 , H01L21/318 , H01L51/5256 , Y10T428/31663
摘要： Coated substrates comprising an inorganic barrier coating and an interfacial coating, wherein the interfacial coating comprises a cured product of a silicone resin having silicon-bonded radiation-sensitive groups; and methods of preparing the coated substrates.
摘要翻译：包括无机阻隔涂层和界面涂层的涂覆基材，其中所述界面涂层包含具有硅键合的辐射敏感基团的硅树脂的固化产物; 以及制备涂覆的基材的方法。

9. 发明申请

WO2007001337A2 COATED SUBSTRATES AND METHODS FOR THEIR PREPARATION 审中-公开
标题翻译：涂层基材及其制备方法
公开(公告)号：WO2007001337A2
公开(公告)日：2007-01-04
申请号：PCT/US2005/028956
申请日：2005-08-12
申请人： DOW CORNING CORPORATION , LOBODA, Mark , SNOW, Steven , WEIDNER, William , ZAMBOV, Ludmil
发明人： LOBODA, Mark , SNOW, Steven , WEIDNER, William , ZAMBOV, Ludmil
CPC分类号： C23C28/322 , C23C28/34 , C23C28/341 , C23C28/345 , C23C28/3455 , C23C28/42 , C23C28/44 , H01L21/02126 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/3145 , H01L21/31633 , Y10T428/24975 , Y10T428/24992
摘要： Coated substrates containing at least one barrier layer comprising hydrogenated silicon oxycarbide having a density of at least 1.6 g/cm 3 and at least one barrier layer selected from aluminum, aluminum oxide, aluminum nitride, aluminum oxynitride, titanium, titanium oxide, titanium nitride, and titanium oxynitride.
摘要翻译：包含至少一个阻挡层的涂覆基材包含密度为至少1.6g / cm 3的氢化硅氧烷和至少一种选自铝，氧化铝，氮化铝，氮氧化铝，钛，氧化钛，氮化钛和氮氧化钛。

10. 发明公开

EP1799883A2 COATED SUBSTRATES AND METHODS FOR THEIR PREPARATION 审中-公开
标题翻译：涂覆基片
公开(公告)号：EP1799883A2
公开(公告)日：2007-06-27
申请号：EP05858066.3
申请日：2005-08-12
申请人： Dow Corning Corporation
发明人： LOBODA, Mark , SNOW, Steven , WEIDNER, William , ZAMBOV, Ludmil
IPC分类号： C23C28/00
CPC分类号： C23C28/322 , C23C28/34 , C23C28/341 , C23C28/345 , C23C28/3455 , C23C28/42 , C23C28/44 , H01L21/02126 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/3145 , H01L21/31633 , Y10T428/24975 , Y10T428/24992
摘要： Coated substrates (100) containing first barrier layer (102) comprising hydrogenated silicon oxycarbide having a density of at least 1.6 g/cm 3 and at least two alternating buffer (104) and on the first barrier layer (102) wherein each alternating buffer layer (104) comprises hydrogenated silicon oxycarbide having a density less than 1.6 g/cm 3, and each alternating barrier layer (106) is indepenently selected from hydrogenated silicon oxycarbide having a density of at least 1.6 g/cm3, aluminum, aluminum oxide, aluminum nitride, aluminum oxynitride, titanium, titanium oxide, titanium nitride, and titanium oxynitride, provided at least one alternating barrier layer (106) is selected from aluminum, aluminum oxide, aluminum nitride, aluminum oxynitride, titanium, titanium oxide, titanium nitride, and titanium oxynitride.

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