专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08669523B2 Contour-based defect detection using an inspection apparatus 有权
标题翻译：使用检查装置进行基于轮廓的缺陷检测
公开(公告)号：US08669523B2
公开(公告)日：2014-03-11
申请号：US13410506
申请日：2012-03-02
申请人： Chien-Huei Chen , Peter White , Michael J. Van Riet , Sankar Venkataraman , Hai Jiang , Hedong Yang , Ajay Gupta
发明人： Chien-Huei Chen , Peter White , Michael J. Van Riet , Sankar Venkataraman , Hai Jiang , Hedong Yang , Ajay Gupta
IPC分类号： H01J37/28 , G01N23/04 , G06T5/50
CPC分类号： H01J37/28 , G01N23/04 , G06T5/50 , G06T7/001 , G06T2207/30148 , H01J37/05 , H01J37/222 , H01J37/244
摘要： One embodiment relates to a method of inspecting a site location on a target substrate. Contours are obtained, the contours having been generated from a reference image using a design clip. A target image of the site location is acquired. The contours are aligned to the target image, and contrast values are computed for pixels on the contours. A threshold is applied to the contrast values to determine contour-based defect blobs. Another embodiment relates to a method of generating contours for use in inspecting a site location for defects. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及一种检查目标基板上的位置位置的方法。获得轮廓，使用设计剪辑从参考图像生成轮廓。获取站点位置的目标图像。轮廓与目标图像对齐，并且对轮廓线上的像素计算对比度值。将阈值应用于对比度值以确定基于轮廓的缺陷斑点。另一个实施例涉及一种产生用于检查位置缺陷的轮廓的方法。还公开了其它实施例，方面和特征。

2. 发明申请

US20110320149A1 Selecting One or More Parameters for Inspection of a Wafer 有权
标题翻译：选择一个或多个参数以检查晶圆
公开(公告)号：US20110320149A1
公开(公告)日：2011-12-29
申请号：US13148473
申请日：2010-02-05
申请人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
发明人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
IPC分类号： G06F19/00 , G01N21/88
CPC分类号： H01L22/20 , G01N21/9501 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.
摘要翻译：提供了计算机实现的方法，计算机可读介质和用于选择用于检查晶片的一个或多个参数的系统。

3. 发明授权

US07345753B2 Apparatus and methods for analyzing defects on a sample 有权
标题翻译：用于分析样品缺陷的装置和方法
公开(公告)号：US07345753B2
公开(公告)日：2008-03-18
申请号：US11069343
申请日：2005-02-28
申请人： Kris Bhaskar , Ardis Liang , Michael J. Van Riet
发明人： Kris Bhaskar , Ardis Liang , Michael J. Van Riet
IPC分类号： G01N21/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： Disclosed are methods and apparatus for facilitating procedures implemented on an analysis tool are provided herein. In one embodiment, an apparatus includes an analyzer module arranged for managing an analyzer tool and causing a high resolution image generated by the analyzer tool to be presented in a display. The apparatus also includes an inspector interface module arranged for simulating an inspector interface in the display. The inspector interface includes features that are available on a corresponding inspection tool, and the inspector interface is based at least in part on defect results from the inspection tool. In one embodiment, the analyzer module executes without knowledge of the inspector interface module and visa versa, and the apparatus includes a synchronization mechanism that knows about these two modules and also is capable of communicating with these two modules.
摘要翻译：本文提供了用于促进在分析工具上实现的过程的方法和装置。在一个实施例中，一种装置包括分析器模块，该分析器模块被布置用于管理分析器工具，并使分析仪工具产生的高分辨率图像呈现在显示器中。该装置还包括检查器接口模块，其布置成用于模拟显示器中的检查器接口。检查员界面包括在相应的检查工具上可用的功能，检查器界面至少部分地基于检查工具的缺陷结果。在一个实施例中，分析器模块在没有检查器接口模块的知识的情况下执行，反之亦然，并且该装置包括知道这两个模块并且还能够与这两个模块进行通信的同步机制。

4. 发明授权

US09310316B2 Selecting parameters for defect detection methods 有权
标题翻译：选择缺陷检测方法的参数
公开(公告)号：US09310316B2
公开(公告)日：2016-04-12
申请号：US13610658
申请日：2012-09-11
申请人： Kenong Wu , Chris W. Lee , Michael J. Van Riet , Yi Liu
发明人： Kenong Wu , Chris W. Lee , Michael J. Van Riet , Yi Liu
IPC分类号： G06K9/00 , G01N21/95
CPC分类号： G01N21/9501
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for a defect detection method are provided. One method includes selecting one or more parameters of a defect detection method using an optimization function and information for a set of classified defects, which includes defects of interest and nuisance defects, such that the one or more parameters satisfy an objective for the defect detection method.
摘要翻译：提供了计算机实现的方法，计算机可读介质和用于为缺陷检测方法选择一个或多个参数的系统。一种方法包括使用优化函数选择缺陷检测方法的一个或多个参数，以及一组分类缺陷的信息，所述缺陷检测方法包括感兴趣的缺陷和妨碍缺陷，使得一个或多个参数满足缺陷检测方法的目的。

5. 发明授权

US09087367B2 Determining design coordinates for wafer defects 有权
标题翻译：确定晶圆缺陷的设计坐标
公开(公告)号：US09087367B2
公开(公告)日：2015-07-21
申请号：US13601891
申请日：2012-08-31
申请人： Ellis Chang , Michael J. Van Riet , Allen Park , Khurram Zafar , Santosh Bhattacharyya
发明人： Ellis Chang , Michael J. Van Riet , Allen Park , Khurram Zafar , Santosh Bhattacharyya
IPC分类号： G06K9/62 , G06T7/00
CPC分类号： G06T7/001 , G06T7/74 , G06T2207/30148
摘要： Methods and systems for determining design coordinates for defects detected on a wafer are provided. One method includes aligning a design for a wafer to defect review tool images for defects detected in multiple swaths on the wafer by an inspection tool, determining a position of each of the defects in design coordinates based on results of the aligning, separately determining a defect position offset for each of the multiple swaths based on the swath in which each of the defects was detected (swath correction factor), the design coordinates for each of the defects, and a position for each of the defects determined by the inspection tool, and determining design coordinates for the other defects detected in the multiple swaths by the inspection tool by applying the appropriate swath correction factor to those defects.
摘要翻译：提供了用于确定在晶片上检测到的缺陷的设计坐标的方法和系统。一种方法包括对准晶片的设计以通过检查工具对晶片上的多个条带中检测到的缺陷来检查工具图像，基于对准的结果确定每个缺陷在设计坐标中的位置，分别确定缺陷基于检测到每个缺陷的条带（条纹校正因子），每个缺陷的设计坐标以及由检查工具确定的每个缺陷的位置，针对每个多个条带的位置偏移，以及通过对这些缺陷应用适当的条纹校正因子来确定检测工具在多个条中检测到的其他缺陷的设计坐标。

6. 发明申请

US20120298862A1 CONTOUR-BASED DEFECT DETECTION USING AN INSPECTION APPARATUS 有权
标题翻译：使用检查装置进行基于轮廓的缺陷检测
公开(公告)号：US20120298862A1
公开(公告)日：2012-11-29
申请号：US13410506
申请日：2012-03-02
申请人： Chien-Huei CHEN , Peter WHITE , Michael J. VAN RIET , Sankar VENKATARAMAN , Hai JIANG , Hedong YANG , Ajay GUPTA
发明人： Chien-Huei CHEN , Peter WHITE , Michael J. VAN RIET , Sankar VENKATARAMAN , Hai JIANG , Hedong YANG , Ajay GUPTA
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , G01N23/04 , G06T5/50 , G06T7/001 , G06T2207/30148 , H01J37/05 , H01J37/222 , H01J37/244
摘要： One embodiment relates to a method of inspecting a site location on a target substrate. Contours are obtained, the contours having been generated from a reference image using a design clip. A target image of the site location is acquired. The contours are aligned to the target image, and contrast values are computed for pixels on the contours. A threshold is applied to the contrast values to determine contour-based defect blobs. Another embodiment relates to a method of generating contours for use in inspecting a site location for defects. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及一种检查目标基板上的位置位置的方法。获得轮廓，使用设计剪辑从参考图像生成轮廓。获取站点位置的目标图像。轮廓与目标图像对齐，并且对轮廓线上的像素计算对比度值。将阈值应用于对比度值以确定基于轮廓的缺陷斑点。另一个实施例涉及一种产生用于检查位置缺陷的轮廓的方法。还公开了其它实施例，方面和特征。

7. 发明授权

US09601393B2 Selecting one or more parameters for inspection of a wafer 有权
公开(公告)号：US09601393B2
公开(公告)日：2017-03-21
申请号：US13148473
申请日：2010-02-05
申请人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
发明人： Chris Lee , Lisheng Gao , Tao Luo , Kenong Wu , Tommaso Torelli , Michael J. Van Riet , Brian Duffy
IPC分类号： G01N21/95 , H01L21/66
CPC分类号： H01L22/20 , G01N21/9501 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.

8. 发明授权

US08000922B2 Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm 有权
标题翻译：用于生成用于选择检测算法的一个或多个参数的值的信息的方法和系统
公开(公告)号：US08000922B2
公开(公告)日：2011-08-16
申请号：US12128979
申请日：2008-05-29
申请人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
发明人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
IPC分类号： H01L21/66
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/8854
摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
摘要翻译：提供了用于生成用于选择检测算法的参数值的信息的方法和系统。一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

9. 发明申请

US20090299681A1 METHODS AND SYSTEMS FOR GENERATING INFORMATION TO BE USED FOR SELECTING VALUES FOR ONE OR MORE PARAMETERS OF A DETECTION ALGORITHM 有权
标题翻译：用于生成用于选择检测算法的一个或多个参数的值的信息的方法和系统
公开(公告)号：US20090299681A1
公开(公告)日：2009-12-03
申请号：US12128979
申请日：2008-05-29
申请人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
发明人： Hong Chen , Michael J. Van Riet , Chien-Huei (Adam) Chen , Jason Z. Lin , Chris Maher , Michal Kowalski , Barry Becker , Stephanie Chen , Subramanian Balakrishnan , Suryanarayana Tummala
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/8854
摘要： Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
摘要翻译：提供了用于生成用于选择检测算法的参数值的信息的方法和系统。一种方法包括没有用户干预使用检查系统对晶片的区域进行扫描，以及用于检测算法的参数的默认值以检测晶片上的缺陷。该方法还包括基于用于选择检测算法的参数的值的总缺陷的预定最大数量来从扫描结果中选择一部分缺陷。该方法还包括存储信息，其包括为该部分中的缺陷确定的检测算法的参数的值。该信息可以用于选择要用于检查配方的检测算法的参数的值，而不需要在扫描之后对晶片进行附加扫描。

10. 发明申请

US20140072203A1 Selecting Parameters for Defect Detection Methods 有权
标题翻译：选择缺陷检测方法的参数
公开(公告)号：US20140072203A1
公开(公告)日：2014-03-13
申请号：US13610658
申请日：2012-09-11
申请人： Kenong Wu , Chris W. Lee , Michael J. Van Riet , Yi Liu
发明人： Kenong Wu , Chris W. Lee , Michael J. Van Riet , Yi Liu
IPC分类号： G06K9/62
CPC分类号： G01N21/9501
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for a defect detection method are provided. One method includes selecting one or more parameters of a defect detection method using an optimization function and information for a set of classified defects, which includes defects of interest and nuisance defects, such that the one or more parameters satisfy an objective for the defect detection method.
摘要翻译：提供了计算机实现的方法，计算机可读介质和用于为缺陷检测方法选择一个或多个参数的系统。一种方法包括使用优化函数选择缺陷检测方法的一个或多个参数，以及一组分类缺陷的信息，所述缺陷检测方法包括感兴趣的缺陷和妨碍缺陷，使得一个或多个参数满足缺陷检测方法的目的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式